JPS6181616A - Forming method of thin film of magnetic substance - Google Patents
Forming method of thin film of magnetic substanceInfo
- Publication number
- JPS6181616A JPS6181616A JP20337084A JP20337084A JPS6181616A JP S6181616 A JPS6181616 A JP S6181616A JP 20337084 A JP20337084 A JP 20337084A JP 20337084 A JP20337084 A JP 20337084A JP S6181616 A JPS6181616 A JP S6181616A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- magnetic
- substrate
- substance
- composite plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、磁性体薄膜の形成方法の改良に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to an improvement in a method for forming a magnetic thin film.
周知の如く、例えばシリカガラス基板上に均一な磁区径
分布を持つ磁性体薄膜を形成しようとする試みが知られ
ている。しかるに、かかる磁性体薄膜は磁気センナ、磁
気記録材料として適用可能であ)、従来イオンスパッタ
法などの真空蒸着法により形成されている。As is well known, attempts have been made to form a magnetic thin film having a uniform magnetic domain diameter distribution on, for example, a silica glass substrate. However, such magnetic thin films can be applied as magnetic sensors and magnetic recording materials, and are conventionally formed by vacuum evaporation methods such as ion sputtering methods.
しかしながら、従来技術によれば、大面積の磁性体薄膜
を形成しようとする場合、蒸着粒子の流れの不均一性、
前記薄膜の厚みの不均一性。However, according to the conventional technology, when trying to form a large-area magnetic thin film, non-uniformity of the flow of deposited particles,
Non-uniformity in the thickness of the thin film.
薄膜を構成する成分組成のばらつき等により。Due to variations in the composition of the components that make up the thin film.
薄膜を均一分布を持つ磁区で構成することができない。It is not possible to construct a thin film with magnetic domains having a uniform distribution.
本発明は上記事情に鑑みてなされたもので、基板の裏面
に強磁性体微粒子を分散成形した複合板を配置し、該複
合板より形成される磁界中において磁性体薄膜の磁場中
蒸着成形を行なうことにより、均一分布を持つ磁区で構
成された磁性体薄膜を形成し得る方法を提供することを
目的とする。The present invention has been made in view of the above circumstances, and involves arranging a composite plate in which fine ferromagnetic particles are dispersed and molded on the back surface of a substrate, and depositing a magnetic thin film in a magnetic field formed by the composite plate. The present invention aims to provide a method capable of forming a magnetic thin film composed of magnetic domains having a uniform distribution.
本発明は、基板の裏面に強磁性体微粒子を分散成形した
複合板を設置し、該複合板より形成される磁界中で磁性
体薄膜の磁場中蒸着成形を行うことにより、基板表面に
成形される磁性体薄膜の磁区径の均一化を図ったことを
骨子とする。In the present invention, a composite plate in which fine ferromagnetic particles are dispersed and molded is installed on the back surface of a substrate, and a magnetic thin film is formed by vapor deposition in a magnetic field formed by the composite plate, thereby forming a thin film on the surface of the substrate. The main point is to make the magnetic domain diameter of the magnetic thin film uniform.
本発明によれば、基板の裏面に強磁性体微粒子を分散成
形した複合板を設置し、該複合板による磁界中で蒸着を
行なうことにより、基板表面に均一磁区分布を持った磁
性体薄膜を形成できる。According to the present invention, a composite plate in which fine ferromagnetic particles are dispersed and molded is installed on the back surface of a substrate, and deposition is performed in the magnetic field of the composite plate, thereby forming a magnetic thin film with a uniform magnetic domain distribution on the substrate surface. Can be formed.
以下1本発明の一実施例を第1図を参照して説明する。 An embodiment of the present invention will be described below with reference to FIG.
図において、1は真空容器である。この真空容器1内で
蒸着形成される例えばシリカがラス基板2の裏面に、強
磁性体微粒子を分散させた複合板3を配置し、該複合板
3より形成される磁界中において磁性体薄膜4の磁場中
蒸着成形を行う。なお1図中の5は蒸着源を、6はアル
ゴンイオンを、7は蒸発粒子の流れを夫々示す。In the figure, 1 is a vacuum container. A composite plate 3 in which ferromagnetic fine particles are dispersed is placed on the back surface of a lath substrate 2 in which, for example, silica is vapor-deposited in the vacuum vessel 1. Performs vapor deposition molding in a magnetic field. In FIG. 1, 5 indicates a vapor deposition source, 6 indicates an argon ion, and 7 indicates a flow of evaporated particles.
しかして、本発明によれば、基板2の裏面に強磁性体微
粒子を分散させた複合板3を配置し。According to the present invention, the composite plate 3 in which ferromagnetic fine particles are dispersed is arranged on the back surface of the substrate 2.
該複合板3より形成される磁界中において磁性体薄膜4
の磁場中蒸着成形を行うため、前記薄膜4に均一な磁区
分布をもたせることができる。In the magnetic field formed by the composite plate 3, the magnetic thin film 4
Since the evaporation molding is performed in a magnetic field, the thin film 4 can have a uniform magnetic domain distribution.
以下に、具体例を説明する。A specific example will be explained below.
具体例1
200覇X 200m+X 1mm のシリカガラス基
板(温度30℃)を用い、この基板の表面に光磁気記録
材料として有望なGd−Co合金をイオンスノ々ツタ法
により10 tastyの真空中において亨厚200
0Xの磁性体薄膜を形成する過程で。Specific example 1 A silica glass substrate (temperature: 30°C) measuring 200 x 200 m + x 1 mm was used, and a Gd-Co alloy, which is promising as a magneto-optical recording material, was deposited on the surface of the substrate to a high thickness of 10 tasty in a vacuum using the ion snort method. 200
In the process of forming a 0X magnetic thin film.
本発明法を適用した。強磁性微粒子として0.1μm(
平均粒径)のFe−Co合金をエポキシ系樹脂中に70
ωt%分散成形した厚み1日の複合板を。The method of the present invention was applied. 0.1 μm as ferromagnetic fine particles (
Fe-Co alloy with an average particle size of 70
Composite board with a thickness of 1 day, dispersion molded at ωt%.
前記基板の裏面に設置して蒸着成行を行った。Vapor deposition was performed by placing it on the back surface of the substrate.
そして、成形されたGd−c%の磁区分布を偏 −光顕
微鏡によシ観察した結果、第2図の実線(イ)に示す如
く優れた磁区分布を持つ薄膜が成形されていることが確
認された。なお1図中の点線(ロ)は従来法によるGt
−Co合金を用いた磁区径の分布を示す。As a result of observing the molded Gd-c% magnetic domain distribution using a polarizing microscope, it was confirmed that a thin film with an excellent magnetic domain distribution was molded, as shown by the solid line (A) in Figure 2. It was done. In addition, the dotted line (b) in Figure 1 indicates Gt by the conventional method.
The distribution of magnetic domain diameters using a -Co alloy is shown.
具体例2
具体例1と同様の方法により、Tb−Fe合金を蒸着成
形した。その結果、第3図の実線(イ)に示す如く優れ
た磁区分布を持つTb−Pe薄駆く成形されることが確
認された。なお図中の点線((ロ)は従来法によるTb
−Fe合金を用いた磁区径の分布を示す。Specific Example 2 A Tb-Fe alloy was vapor-deposited using the same method as in Specific Example 1. As a result, it was confirmed that a thin Tb--Pe film having an excellent magnetic domain distribution could be formed as shown by the solid line (a) in FIG. 3. In addition, the dotted line ((b) in the figure is Tb by the conventional method.
- Shows the distribution of magnetic domain diameter using Fe alloy.
なお、−ヒ記実施例では1強磁性徴粒子としてGd−C
o合金、Tb−Fe合金を用いた場合について述べたが
、これに限定されるもの・ではない。In addition, in Example 1, Gd-C was used as one ferromagnetic particle.
Although the case where an o alloy and a Tb-Fe alloy are used has been described, the present invention is not limited thereto.
以上詳述した如く本発明によれば、基体の表面に均一磁
区分布を持った磁性体薄膜を形成しi尋、工業的に価値
のある磁性体薄膜の形成方法を提供できるものである。As described in detail above, according to the present invention, it is possible to form a magnetic thin film having a uniform magnetic domain distribution on the surface of a substrate, thereby providing an industrially valuable method for forming a magnetic thin film.
して(ad−Co合金を用いた場合の従来及び本発明法
に係るは区分右図、第3図は七−曵翼−む住和叫として
T b −p e合金を用いた場合の従来及び本発明法
に係る磁区分布図である。
I・・・真空容器、2・・・シリカがラス基板、3・・
・複合板、4・・・磁性体薄膜。
出願人復代理人 弁理士 鈴 江 武 彦第2図
第3図
石数Eネそ(/、1m)
石跣ξイ仝(/J m )(The diagram on the right shows the conventional method when ad-Co alloy is used and the method according to the present invention. Figure 3 shows the conventional method when Tb-pe alloy is used as a 7-coat blade. and a magnetic domain distribution diagram according to the method of the present invention. I... Vacuum vessel, 2... Silica is a lath substrate, 3...
- Composite plate, 4... magnetic thin film. Applicant's sub-agent Patent attorney Takehiko Suzue Figure 2 Figure 3 Number of stones
Claims (1)
おいて、前記基板の裏面に強磁性体微粒子を分散成形し
た複合板を設置し、該複合板より形成される磁界中で磁
性体薄膜の磁場中蒸着成形を行うことを特徴とする磁性
体薄膜の形成方法。In a method of forming a magnetic thin film on a substrate by vacuum evaporation, a composite plate in which fine ferromagnetic particles are dispersed and molded is installed on the back surface of the substrate, and the magnetic field of the magnetic thin film is formed in the magnetic field formed by the composite plate. A method for forming a magnetic thin film, characterized by performing medium evaporation molding.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20337084A JPS6181616A (en) | 1984-09-28 | 1984-09-28 | Forming method of thin film of magnetic substance |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20337084A JPS6181616A (en) | 1984-09-28 | 1984-09-28 | Forming method of thin film of magnetic substance |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6181616A true JPS6181616A (en) | 1986-04-25 |
Family
ID=16472904
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20337084A Pending JPS6181616A (en) | 1984-09-28 | 1984-09-28 | Forming method of thin film of magnetic substance |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6181616A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62283434A (en) * | 1986-05-31 | 1987-12-09 | Nissin Electric Co Ltd | Production of magneto-optical recording medium |
-
1984
- 1984-09-28 JP JP20337084A patent/JPS6181616A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62283434A (en) * | 1986-05-31 | 1987-12-09 | Nissin Electric Co Ltd | Production of magneto-optical recording medium |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH0411625B2 (en) | ||
GB1492164A (en) | Method of forming iron oxide films | |
JPS60214417A (en) | Vertical magnetic recording medium | |
JPH0133548B2 (en) | ||
US4013534A (en) | Method of making a magnetic oxide film | |
JPS6181616A (en) | Forming method of thin film of magnetic substance | |
JPS5778123A (en) | Manufacture of anisotropic thin magnetic film | |
JPH0454367B2 (en) | ||
JPS6339124A (en) | Magnetic recording medium and its production | |
US3991233A (en) | Method of manufacturing a magnetizable layer for a magnetic domain device | |
JPS5877025A (en) | Production of magnetic recording medium | |
JPS6011372B2 (en) | Method for manufacturing magnetic recording media | |
JP2894253B2 (en) | Manufacturing method of highly functional thin film | |
JPH0194552A (en) | Manufacture of magneto-optical recording medium | |
JPS61241993A (en) | Composite magnetoresistance effect element | |
JPH0565043B2 (en) | ||
Ishii et al. | Deposition of ferromagnetic metal thin films by ion beam sputtering | |
JPH0215440A (en) | Magneto-optical recording medium and production thereof | |
JPS6031013B2 (en) | Method for manufacturing magnetic recording media | |
JPH044531B2 (en) | ||
JPS6379253A (en) | Magneto-optical material | |
JPH035643B2 (en) | ||
JPS5845375A (en) | Formation of thin film by vapor deposition | |
JP2529395B2 (en) | Method for manufacturing metal thin film magnetic recording medium | |
JPS6188511A (en) | Manufacture of magnetic thin film |