JPS6177236A - Electron gun device - Google Patents

Abstract

PURPOSE:To make a change of deflection angles of the side electrode beams to be extremely minimized even when changing focusing voltage by providing an automatically static focusing structure not only been the third grid and the fourth grid but also between the second grid and the third grid. CONSTITUTION:The ring-shaped projected parts 11a, 11b and 11c, which are projected on the second grid 2 side of the lower part electrode 3y of the third grid 3 while being formed so as to encircle the holes 3a, 3b and 3c, are made to be real circles while the center axes V of the projected parts 11a and 11c are outwardly eccentric than the center axes T of the holes 3a and 3c. Thereby, an eccentric lens can be formed while being able to make an electron beams B passing through said part to be deflected toward the central electron beam. Further, the deflection angle, which is in reversed relation to the automatic static focusing between the third grid 3 and the fourth grid 4 and to a change only of the focusing voltage of the third grid 3 while finally being given to the electron beams, does not at all change even when the focusing voltage of the third grid 3 is changed.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron gun device, and more particularly to an in-line type electron gun device in which three gunshot beams are emitted in the same plane. This is related to the configuration that concentrates on the content.

In general, an electron gun device for a color picture tube consists of three electron guns each composed of a plurality of grid electrodes, and the main lens formed by the electron guns is used as a main lens. This is to focus an electron beam and make it strike a screen. However, since this type of electron gun device is composed of three electron guns, assembly work is complicated and the assembly accuracy is poor. For this purpose, an electron gun device as shown in FIG. 1 has been proposed in recent years. In the same figure, 10a and 10b.

10c is a cathode arranged at equal intervals on the same plane, and is provided with a heater 10d inside.

1.2 is the first. At the second grid, above the cathode 10
Hole 1a is provided in the portion corresponding to a, 10b, and 10c.

It has Ib, 1c and 2a, 2bj2c. At the front of the second grid 2, there are two box-shaped upper electrodes 3x.
, a sixth grid 6 formed by joining the lower electrodes ff13y is arranged. Note that the second electrode of the lower electrode 6y
On the grid 2 side, there are holes 6a, 6b opposite to the holes 2a, 2b, 2'c.

6c is formed, and a hole 61.6c is formed at the bottom of the electrode 3X to form a main lens. '6m and 6n are formed.

4 is a fourth grid having holes 4a s 4 b + 40 at the bottom. In this case, Static Convergence! Due to the need to have ffE, the central axis S of the hole 4a, = stand 4, is eccentrically eccentric from the central axis T of the hole 3A, 61. 5 is the fourth grid 4.
This is a shield cup disposed at the end of the neck, which has a spring support that supplies voltage by press-contacting the internal graphite formed on the inner wall of the neck (not shown).

Usually, the first grid 1 has oV, the second grid 2 has 500■, the sixth grid O has 4.5■, and the fourth
A voltage of 25 KV, which gradually increases in value, is applied to the grid 4.

In such an acid-containing case, each cathode 10a, IDb.

After the electron beam B emitted from 10c is controlled by the beam generator in the first grid 1, it is transmitted to the second to fourth grids 2 to 4.
4 and shoot the arrow to a fluorescent light surface (not shown). In this case, the main lens 1d formed in this part is decentered due to the positional relationship between the holes 4a + 4c and 61.6n. A so-called automatic evaluation process is performed above.

However, with the electron gun device having such a configuration, when the focus is adjusted by changing the focus voltage applied to the sixth grid A, the deflection angle of the 1Illll electron beam changes, and the static concentration on the fluorescent surface changes. It has the disadvantage of being damaged. On the other hand, when adjusting the focus voltage, there are individual differences in whether to focus on the center of the fluorescent surface or on the entire surface, and there is also large variation between the two areas, and for this reason, the focus voltage may be set to different values. . Therefore, the thickness of the quiet error that occurs is 2
In a 0-type picture tube, the distance between both beams is 0 on the fluorescent surface.
．． In many cases, the level is between 2.0 and 0.4. and,
This phenomenon in which automatic stabilization is disturbed when the focus voltage is changed has become a more important problem in mass production.

Therefore, an object of the present invention is to minimize the change in the deflection angle of the 1II11 electron beam even if the focus voltage is changed, thereby preventing the disturbance in the center.

In order to achieve such an object, the present invention not only has the third grid and the fourth grid the same, but also the second grid and the third grid.
It provides automatic silent concentration control between the grid and the grid.
This will be explained in detail below using examples.

FIGS. 2(a) and 2(b) are a sectional view and a plan view showing a simple embodiment of an electron gun device according to the present invention, and the same parts as in FIG. 1 are designated by the same reference numerals. In the same figure, 11
a, 11b, and 11c are drilled holes 3aj3b on the second grid 2 side of the lower electrode 3y of the third grid B.

It is a ring-shaped protrusion formed to surround 3c. The protrusions 11aj, 11b and 11c are 8 yen, and the central axis V of the protrusions 11a and ≠drawing 11c is the hole 3a.

The central axis T of the hole 6c is also eccentric to the outside, and the central axis 2 of the central protrusion 11b coincides with the central axis T of the hole 3b.

FIG. 2(b) is a plan view showing this eccentric state.

According to such a configuration, the holes 2a and 2c and the hole 6a on both sides of the lower electrode 3y of the second grid 2 and the third grid B are
A decentered lens can be formed between and 3c, and the electron beam B passing through this part can be deflected toward the medium-heat electron beam side, so that so-called static concentration can be achieved. In this case, the deflection angle for the electron beam B on both sides is
It can be adjusted by appropriately setting the height and eccentricity of a and 11c. Further, according to this embodiment, automatic static concentration can be achieved between the third grid 6 and the fourth grid 4 as in the conventional case. In this case, the acid level difference between the third grid 6 and the second grid 4 and the MW difference between the second grid 2 and the fifth grid 6 are determined by the focus voltage of the sixth grid only. In an inverse relationship to the change, for example, if the voltage of the sixth grid B is increased to reduce the KM difference with the fourth grid 4, the potential difference with the second grid 2 can be increased. This is the second grid on the third grid.
This is because a higher voltage is applied to the fourth grid 4 than to the sixth grid 3, and a higher voltage is applied to the fourth grid 4 than to the sixth grid 3. Therefore, if the voltage of the third grid B is increased and the potential difference between it and the fourth grid 4 is reduced, the deflection angle of the electron beam passing through this grid will become smaller, but on the other hand, the difference between the third grid B and the second grid 2 will be Since the potential lamp becomes larger, the deflection angle of the electron beam passing through this area can be increased. Therefore, the deflection angle strategically given to the electron beam does not change at all even if the focus voltage of the sixth grid B changes. This is shown in the cross-sectional view and plan view when the voltage of the third grid B is reduced, and the same reference numerals are used for the same parts as in FIG. In the same figure, 12a, 12b, 12c
The holes 2a, 2b, 2 protrude toward the third grid 3 side.
It is a ring-shaped protrusion formed to surround c.

These protrusions 12a, 12b, 12c are also the above-mentioned protrusions 11a, 1.
1bj11c, the protrusion 12a is perfectly circular.
, 12c are eccentric inward than the central axes T of the holes 3a and 6c, and the central axis W of the central protrusion 12b coincides with the central axis T of the hole 3b. In this case, the main lens generating mechanism is the same as that shown in FIGS. 2(a) and 2(b).

Therefore, even in such a configuration, the protrusions 12a and 1
Since an eccentric lens can be formed in the part corresponding to 2C,
Automatic static focusing of the electron beam can be performed, as shown in Figure 2 (a).
4(a) and 4(b) are sectional views and plan views of essential parts showing other embodiments of the electron gun device according to the present invention. The same reference numerals are used for the same parts as in FIGS. 2(a)' and 2(b).

13a, 13b, 13c are the holes 3a, 3 of the third grid 6.
b.

The central axes X of the recesses 3a and 3c are also eccentric outwards from the central axes T of the holes 3a and 6c, and the central axis X of the recess 16b is 6b
coincides with the central axis T of In this case, the main lens generating mechanism is the same as in the case of FIGS. 2(a) and 2(b).

Even in this lt configuration, the recesses 13a and 13C.

A decentering lens can be formed in the corresponding part, and the electron beam B can be automatically statically focused in this part, and the same effect as in the above case can be obtained.
) is a cross-sectional view of main parts and a plan view showing another embodiment of the electron gun device according to the present invention, and the same parts as in FIG. 1 are denoted by the same reference numerals. In this case, the central axis Y of the holes 6a and 30 provided in the lower electrode 3y of the sixth grid B is also eccentric to the outside with respect to the central axis T of the holes 2a and 20 of the second grid 2.

In this case, the generation mechanism of the main lens is shown in Fig. 2(a) I (
This is the same as in case b).

Even in such a configuration, eccentric lenses can be formed in the portions corresponding to the holes 6a and 60, and automatic static focusing of the electron beam can be achieved.

As explained above, according to the present invention, among the electron lenses formed between the sixth grid and the fourth grid and the electron lens formed between the third grid and the second grid, the 1111'E The beam, that is, the electron lens associated with the electron beam located on the side of the central axis of the device itself, is decentered to enable two-stage automatic stabilization of the three electron beams, so that the focus of the third grid can be adjusted. Even if the voltage changes variously, the third. The change in deflection angle between the fourth grids 6.4 is shown in the second grid. This can be compensated for by changing the deflection angle between the 6th grids, and has the effect of virtually preventing changes in the static beam.

[Brief explanation of the drawing]

FIG. 1 is a sectional view showing an example of a conventional electron gun device, and FIGS. It is a cross-sectional opening. 1 to 4...first to fourth grid, 5...shield cup, 10a to 10c...cathode, 10d...
...Heater, 11a to 11c, 12a to 12c
m*M, 13a to 13c... recess. =11- Figure 3(b), 11.1 Figure 5

Claims (1)

[Claims] An in-line electron gun device that emits three electron beams in the same plane, comprising a focusing electrode to which a focusing voltage is applied, and a first electrode facing the focusing electrode at a stage before the focusing electrode. a first concentrating means for concentrating side electron beams into a central electron beam using a first electrode and the focusing electrode;
A second electrode is provided downstream of the focusing electrode and faces the focusing electrode, and a second concentrating means is provided for concentrating the side electron beams into a central electron beam using the second electrode and the focusing electrode. An electron gun device featuring: