JPS6177031A - Production of liquid crystal panel - Google Patents

Production of liquid crystal panel

Info

Publication number
JPS6177031A
JPS6177031A JP19880284A JP19880284A JPS6177031A JP S6177031 A JPS6177031 A JP S6177031A JP 19880284 A JP19880284 A JP 19880284A JP 19880284 A JP19880284 A JP 19880284A JP S6177031 A JPS6177031 A JP S6177031A
Authority
JP
Japan
Prior art keywords
transparent electrode
liquid crystal
crystal panel
electrode layer
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19880284A
Other languages
Japanese (ja)
Inventor
Toshiaki Naka
中 敏明
Fumiaki Yamada
文明 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP19880284A priority Critical patent/JPS6177031A/en
Publication of JPS6177031A publication Critical patent/JPS6177031A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a liquid crystal panel of high contrast by putting a metallic layer on a transparent electrode and using this metallic layer as a mask to etch the transparent electrode layer. CONSTITUTION:One surface of a glass substrate 1 is coated with a transparent electrode layer 20, and a metallic layer 30 is put on the surface of the transparent electrode layer 20. The metallic layer 30 is etched to form metallic layers 31, and these metallic layers 31 are used as a mask to etch the transparent electrode layer 20. A mask 17 provided with a wiring pattern for metallic layers 31 is used to print a photoresist to metallic layers 31. Etching is performed along the printed pattern, thus forming a wiring pattern 3 consisting of metallic layers along grooves of transparent electrodes 2.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は液晶パネルの不表示領域を減少させ、コントラ
ストのより良い液晶パネルの製造方法に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for manufacturing a liquid crystal panel with improved contrast by reducing the non-display area of the liquid crystal panel.

液晶による表示は電子2通信機器を始め、玩具や雑貨に
まで利用されている。液晶パネルは消費電力が少なく、
また薄形表示として各方面に幅広く活用されている。
Liquid crystal displays are used not only in electronic communication devices but also in toys and miscellaneous goods. LCD panels consume less power,
It is also widely used in various fields as a thin display.

〔従来の技術〕[Conventional technology]

第3図は従来技術による液晶パネルの要部構成を示す図
である。
FIG. 3 is a diagram showing the main part configuration of a liquid crystal panel according to the prior art.

第3図において、ガラス基板1の表面にインジューム化
合物を主成分とする透明電極層2を、厚さCでコーティ
ングされている。
In FIG. 3, the surface of a glass substrate 1 is coated with a transparent electrode layer 2 containing an indium compound as a main component to a thickness C.

この透明電極N2の表面に図示されていないフォトリソ
工程を行い、透明電極層2を50μm〜60μmの溝幅
aで工゛ツチング加工を行う。このことは、隣接する透
明電極2の最小間隙すを10μm〜20μm確保するた
めのものである。このようにして得られたガラス基板1
.11を、透明電極2,12が格子伏に交わり、かつ対
向するように係着し、ガラス基板1.11間に液晶を封
入して作られている。
A photolithography process (not shown) is performed on the surface of the transparent electrode N2, and the transparent electrode layer 2 is processed with a groove width a of 50 μm to 60 μm. This is to ensure a minimum gap between adjacent transparent electrodes 2 of 10 μm to 20 μm. Glass substrate 1 obtained in this way
.. 11, transparent electrodes 2 and 12 are intersected in a lattice pattern and are attached to each other so as to face each other, and a liquid crystal is sealed between the glass substrates 1 and 11.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記による液晶パネル製造法において透明電極の導体抵
抗を一定とするために透明電極層の厚さを小型液晶パ名
ルでは数百人、大型液晶パネルではそれ以上と厚くコー
ティングする必要がある。
In the liquid crystal panel manufacturing method described above, in order to keep the conductor resistance of the transparent electrode constant, it is necessary to coat the transparent electrode layer as thick as several hundred layers for small liquid crystal panels and more than that for large liquid crystal panels.

透明電極層が厚くなれば当然エツチング処理時間も長く
なるため、エツチング液と透明電極層との反応速度か場
所により差異を生じてくる。またフォトレジストと透明
電極との密着が均一でないため1.密着性の悪い場所に
おいては、透明電極層とフォトレジストの眉間よりエツ
チング液が浸透し透明電極層と反応してしまう。透明電
極間隙はフォトレジストにて指示した間隙より10μm
〜20pm広い70μm〜80μmになる場所もあれば
、フォトレジストと透明電極層の密着のよい場所におい
てはフォトレジストにて指示した通りの間隙となる場所
もある。
Naturally, the thicker the transparent electrode layer becomes, the longer the etching time will be, and therefore the reaction rate between the etching solution and the transparent electrode layer will vary depending on the location. Also, because the adhesion between the photoresist and the transparent electrode is not uniform, 1. In areas where the adhesion is poor, the etching solution penetrates between the eyebrows of the transparent electrode layer and the photoresist and reacts with the transparent electrode layer. The gap between the transparent electrodes is 10 μm from the gap specified by the photoresist.
There are places where the distance is 70 μm to 80 μm, which is ~20 pm wide, and where there is good adhesion between the photoresist and the transparent electrode layer, there are places where the gap is as indicated by the photoresist.

このため液晶パネル全体において透明電極の溝幅を一定
とするような精度の高い加工が困難であった。
For this reason, it has been difficult to perform highly accurate processing such as making the groove width of the transparent electrode constant over the entire liquid crystal panel.

〔問題を解決するための手段〕[Means to solve the problem]

本発明の目的は上記問題を解決し、高コントラストの液
晶パネルの製造方法を提供するもので、その手段は、透
明電極を設けた基板間に液晶を封入してなる液晶パネル
において、該透明電極上に金属層を重設し該金属層をマ
スクとして透明電極層のエツチング加工を行うことによ
りなされる。
An object of the present invention is to solve the above-mentioned problems and provide a method for manufacturing a high-contrast liquid crystal panel. This is done by overlaying a metal layer on top and etching the transparent electrode layer using the metal layer as a mask.

〔作 用〕[For production]

上記液晶パネルにおいて、透明電極層上に金属層を設の
たことにより透明電極層と金属層との密着が強固に、か
つ均一になった為、透明電極層と金属層の間にエツチン
グ液の浸透がなくなったこと、また金属層を透明電極の
配線パターンとして用いることにより、導体抵抗を減す
ることができ透明電極の厚みを薄くできる。このことに
より、エツチング時間を短くし、溝間隙も従来50μm
〜60μmであったが3μm以上と微細な加工を可能と
した。
In the above liquid crystal panel, by providing the metal layer on the transparent electrode layer, the adhesion between the transparent electrode layer and the metal layer is strong and uniform, so there is no etching solution between the transparent electrode layer and the metal layer. By eliminating penetration and by using the metal layer as a wiring pattern for the transparent electrode, conductor resistance can be reduced and the thickness of the transparent electrode can be reduced. This shortens the etching time and reduces the groove gap from 50μm compared to the conventional method.
Although the diameter was 60 μm, fine processing of 3 μm or more was possible.

〔実施例〕〔Example〕

以下図面を参照して、本発明の実施例を詳細に説明する
Embodiments of the present invention will be described in detail below with reference to the drawings.

第1図は本発明の・一実施例である液晶パネルの要部構
成を示す図。
FIG. 1 is a diagram showing the main part configuration of a liquid crystal panel according to an embodiment of the present invention.

第2図は本発明の一実施例である液晶パネルのパターン
形成工程を示した図。
FIG. 2 is a diagram showing a pattern forming process of a liquid crystal panel according to an embodiment of the present invention.

第1図において、ガラス基板1の片面にコーティングさ
れた透明電極層2を対向する透明電極12との間隙dよ
り広い間隙の溝aで分割した透明電極パターン2を多数
設け、さらに透明電極パターン2の溝に沿って金属4配
線パターン3が重設されている。この金属4配線パター
ン3を透明電極パターン2の配線パターンとして用いる
In FIG. 1, a large number of transparent electrode patterns 2 are provided in which a transparent electrode layer 2 coated on one side of a glass substrate 1 is divided by grooves a that are wider than a gap d between the opposing transparent electrode 12, and further transparent electrode patterns 2 A metal 4 wiring pattern 3 is overlaid along the groove. This metal 4 wiring pattern 3 is used as the wiring pattern of the transparent electrode pattern 2.

このような構成により成されているガラス基板1.11
をそれぞれ透明電極パターン2,12および金属層配線
パターン3,13が格子状に交わり1.かつ対向するよ
うに係着し、その間に液晶7を封入して作られている液
晶パネル。
Glass substrate 1.11 having such a configuration
Transparent electrode patterns 2, 12 and metal layer wiring patterns 3, 13 intersect in a grid pattern, respectively. A liquid crystal panel is made by attaching the liquid crystal 7 so as to face each other and sealing the liquid crystal 7 between them.

次にパターン形成について第2図を用いて詳細に説明す
る。
Next, pattern formation will be explained in detail using FIG. 2.

第2図(alはカラス基板1の片方の表面に透明電極層
20を厚さC約500人と薄くコーティングする。さら
に透明電極層20の表面に金泥層30を重設する。
In FIG. 2 (al), one surface of the glass substrate 1 is coated with a transparent electrode layer 20 to a thickness of approximately C500.Furthermore, a gold mud layer 30 is overlaid on the surface of the transparent electrode layer 20.

重設された金属l1i30に対し透明電極層20を分割
するのと同一寸法のマスク16の上面より平行光線15
を照射し、金属層30の表面に焼付ける。
Parallel light rays 15 are emitted from the upper surface of a mask 16 having the same dimensions as those used to divide the transparent electrode layer 20 into the overlaid metal l1i30.
is irradiated and baked onto the surface of the metal layer 30.

金W530は焼付されたパターンに沿ってエツチングが
行われ、第2図(blで示す溝寸法aで分割された金属
層31が得られる。
The gold W530 is etched along the baked pattern to obtain a metal layer 31 divided by groove dimensions a shown in FIG. 2 (bl).

金属層30を分割する溝寸法aは透明電極20と対向す
るガラス基板[1にコーティングされている透明電極1
2との距離dより大とするが溝寸法aは3μm以上であ
れば自由に設定できる。
The groove dimension a that divides the metal layer 30 is the transparent electrode 1 coated on the glass substrate [1] facing the transparent electrode 20.
2, but the groove dimension a can be freely set as long as it is 3 μm or more.

次に金属層31をマスクとして、透明電極層20をエツ
チング加工する。金属層31と透明電極層20との密着
(itがよいこと、また透明電極層20の厚みCが薄い
ことにより、金属層31の溝寸法aの幅で透明電極層2
0を分割し、第2図(C)で示す透明電極パターンを得
ることができる。
Next, the transparent electrode layer 20 is etched using the metal layer 31 as a mask. Due to the good adhesion (it) between the metal layer 31 and the transparent electrode layer 20 and the small thickness C of the transparent electrode layer 20, the width of the groove dimension a of the metal layer 31 allows the transparent electrode layer 2
By dividing 0, a transparent electrode pattern shown in FIG. 2(C) can be obtained.

次に第2図(diにて示すとうり金属層31に対し配線
パターンを設けたマスク17を用いフォトレジストを金
属層31に焼付ける。焼付けられたバターンに沿ってエ
ツチングが行われ、第2図(e)に示す金属層による配
線パターン3が透明電極2の溝に沿って形成される。こ
のようにして各パターンが完成される。
Next, as shown in FIG. 2 (di), a photoresist is baked on the metal layer 31 using a mask 17 provided with a wiring pattern for the metal layer 31. Etching is performed along the baked pattern, and the second pattern is etched. A wiring pattern 3 made of a metal layer shown in Figure (e) is formed along the groove of the transparent electrode 2. In this way, each pattern is completed.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれば、透明電極表面に
金属層を設けることにより透明電極の導体抵抗を減じ、
透明電極層を薄することを可能にし、金属層が透明電極
層との密着性が強固であるためエツジの鋭い透明電極パ
ターンを形成させることが可能となった。このことから
微細なパターン形成も可能となり不表示領域を小とする
ことによりコントラストの良い表示が得られ液晶パネル
の応用分野も拡がり好都合である。
As explained above, according to the present invention, the conductor resistance of the transparent electrode is reduced by providing a metal layer on the surface of the transparent electrode,
This makes it possible to make the transparent electrode layer thinner, and because the metal layer has strong adhesion to the transparent electrode layer, it has become possible to form a transparent electrode pattern with sharp edges. This makes it possible to form fine patterns, and by making the non-display area small, a display with good contrast can be obtained, which is advantageous in expanding the field of application of liquid crystal panels.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例である液晶パネルの要部構成
を示す図、第2図は本発明の一実施例であるパターン形
成を示した図、第3図は従来技術による液晶パネルの要
部構成を示す図。 1、】1はガラス基板、2.12は透明電極パターン、
20は透明電極層、3.13は金属配線パターン、3(
1,3]は金属層、7は液晶115は平行光線、16.
17はマスクパターンをそれぞれ示す。
FIG. 1 is a diagram showing the configuration of the main parts of a liquid crystal panel according to an embodiment of the present invention, FIG. 2 is a diagram showing pattern formation according to an embodiment of the present invention, and FIG. 3 is a diagram showing a liquid crystal panel according to the prior art. The figure which shows the main part structure of. 1.]1 is a glass substrate, 2.12 is a transparent electrode pattern,
20 is a transparent electrode layer, 3.13 is a metal wiring pattern, 3(
1, 3] is a metal layer, 7 is a liquid crystal 115 is a parallel light beam, 16.
17 indicates mask patterns, respectively.

Claims (1)

【特許請求の範囲】 1)透明電極を設けた基板間に液晶を封入してなる液晶
パネルにおいて、該透明電極上に金属層を重設し、該金
属層をマスクとして透明電極のエッチング加工を行うこ
とを特徴とした液晶パネルの製造方法。 2)前記透明電極のエッチングマスクとして用いた金属
層の開口部の幅を3μm以上としたことを特徴とする特
許請求の範囲第1項記載の液晶パネルの製造方法。
[Claims] 1) In a liquid crystal panel in which liquid crystal is sealed between substrates provided with transparent electrodes, a metal layer is superimposed on the transparent electrodes, and the transparent electrodes are etched using the metal layer as a mask. A method for manufacturing a liquid crystal panel characterized by: 2) The method for manufacturing a liquid crystal panel according to claim 1, wherein the width of the opening in the metal layer used as an etching mask for the transparent electrode is 3 μm or more.
JP19880284A 1984-09-21 1984-09-21 Production of liquid crystal panel Pending JPS6177031A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19880284A JPS6177031A (en) 1984-09-21 1984-09-21 Production of liquid crystal panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19880284A JPS6177031A (en) 1984-09-21 1984-09-21 Production of liquid crystal panel

Publications (1)

Publication Number Publication Date
JPS6177031A true JPS6177031A (en) 1986-04-19

Family

ID=16397153

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19880284A Pending JPS6177031A (en) 1984-09-21 1984-09-21 Production of liquid crystal panel

Country Status (1)

Country Link
JP (1) JPS6177031A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01227126A (en) * 1988-03-07 1989-09-11 Semiconductor Energy Lab Co Ltd Liquid crystal display device
JPH02827A (en) * 1987-12-30 1990-01-05 Shintoo Kemitoron:Kk Production of transparent substrate having transparent conductive pattern separated by light shieldable insulating film and surface colored body
JPH03246516A (en) * 1990-02-26 1991-11-01 Canon Inc Formation of light shielding layer

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02827A (en) * 1987-12-30 1990-01-05 Shintoo Kemitoron:Kk Production of transparent substrate having transparent conductive pattern separated by light shieldable insulating film and surface colored body
JPH01227126A (en) * 1988-03-07 1989-09-11 Semiconductor Energy Lab Co Ltd Liquid crystal display device
JPH03246516A (en) * 1990-02-26 1991-11-01 Canon Inc Formation of light shielding layer

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