JPS6173746A - Method for treating resin molding with plasma - Google Patents

Method for treating resin molding with plasma

Info

Publication number
JPS6173746A
JPS6173746A JP19606684A JP19606684A JPS6173746A JP S6173746 A JPS6173746 A JP S6173746A JP 19606684 A JP19606684 A JP 19606684A JP 19606684 A JP19606684 A JP 19606684A JP S6173746 A JPS6173746 A JP S6173746A
Authority
JP
Japan
Prior art keywords
plasma
chamber
moldings
mount
processed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19606684A
Other languages
Japanese (ja)
Inventor
Tadayoshi Nakamura
忠義 中村
Hirotoshi Fujikawa
寛敏 藤川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daihatsu Motor Co Ltd
Original Assignee
Daihatsu Motor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daihatsu Motor Co Ltd filed Critical Daihatsu Motor Co Ltd
Priority to JP19606684A priority Critical patent/JPS6173746A/en
Publication of JPS6173746A publication Critical patent/JPS6173746A/en
Pending legal-status Critical Current

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  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PURPOSE:To modify uniformly, by fixing resin moldings to a rotatable mount and rotating it normally and reversely to generate a turbulent air flow in a chamber in treating the moldings with plasma in a vacuum chamber. CONSTITUTION:A mount 10 provided with a rotating shaft 11 is arranged in a vacuum chamber 1 and resin moldings 9 to be treated are fixed to the mount 10. The chamber 1 is evacuated and plasma of, e.g., oxygen is introduced into the chamber. The moldings 9 are irradiated with plasma to modify the surfaces of the moldings. In this case, the mount 10 is normally and reversely rotated repeatedly around the rotating shaft 11 to generate a turbulent air flow in the chamber 1. In this way, the moldings 9 apart from the shaft 11 and those near the shaft 11 are equally treated with plasma and variability due to a difference in the position of fixture is decreased. Therefore a lot of the moldings 9 can be treated at once.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は樹脂成形品のプラズマ処理法に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a plasma treatment method for resin molded articles.

[従来の技術] ポリプロピレン、ポリエチレンなどのオレフィン系樹脂
の成形品はその無極性などの性質に起因して塗膜密着性
などに劣るものである。
[Prior Art] Molded products made of olefin resins such as polypropylene and polyethylene are inferior in paint film adhesion due to their non-polar properties.

そのため、これら樹脂成形品に、マイクロ波で空気、酸
素、アルゴン、ヘリウムなどのガスを励起してえられる
、いわゆるコールドプラズマを照射して、樹脂成形品に
表面改質を施すことが行なわれている。
Therefore, these resin molded products are subjected to surface modification by irradiating them with so-called cold plasma, which is obtained by exciting gases such as air, oxygen, argon, helium, etc. using microwaves. There is.

前記プラズマ処理はチャンバ内に被処理物を収容し、チ
ャンバ内を減圧状態にし、プラズマ発生器からのプラズ
マをチャンバ内に導入し、被処理物に照射することによ
って行なわれるが、被処理物をチャンバ内に定置した状
態で行なうと処理が不均一となる。
The plasma processing is performed by housing the object to be processed in a chamber, reducing the pressure inside the chamber, introducing plasma from a plasma generator into the chamber, and irradiating the object to be processed. If the process is performed while the device is stationary within the chamber, the process will be non-uniform.

そのため、被処理物を適宜の架台に装架し、被処理物を
チャンバ内で公転および(または)自転させながらプラ
ズマを照射する方法が提案されている(特開昭58−2
08326号公報参照)。
Therefore, a method has been proposed in which the object to be processed is mounted on a suitable mount and irradiated with plasma while the object to be processed revolves and/or rotates within a chamber (JP-A-58-2
(See Publication No. 08326).

[発明が解決しようとする°問題点] しかし、前記公報記載の方法はっぎのごとき問題を有す
る。   □ (1)チャンバの中心部付近に取付けた被処理物の周速
が、外周部付近に取付けた被処理物の周速より小さく、
その結果回転中心からの被処理物の距離によりプラズマ
処理のバラツキが大きい。
[Problems to be Solved by the Invention] However, the method described in the above publication has the following problems. □ (1) The circumferential speed of the workpiece attached near the center of the chamber is smaller than the circumferential speed of the workpiece attached near the outer periphery.
As a result, the plasma processing varies greatly depending on the distance of the object to be processed from the center of rotation.

(2)tiJ記11)のバラツキを小さくするために、
被処理物をすべて外周部近傍に取付けると、被処理物の
チャンバ内への収容個数が制限され、バッチ当りの生産
性がわるくなる。
(2) In order to reduce the variation in tiJ 11),
If all the objects to be processed are attached near the outer periphery, the number of objects to be processed that can be accommodated in the chamber will be limited, resulting in poor productivity per batch.

(3)さらに、前記公報の実施例では処理時間が60秒
で、その間の公転、自転の回転数は数回転である。
(3) Furthermore, in the embodiment of the publication, the processing time is 60 seconds, and the number of revolutions and rotations during that time is several revolutions.

ところで、ポリプロピレン、ポリエチレンなどの成形品
をプラズマ処理するばあい、プラズマをその固定表面に
連続して照射するばあいの処理時間は通常10〜20秒
程度でよい。
By the way, when a molded article of polypropylene, polyethylene, etc. is subjected to plasma treatment, the treatment time when the fixed surface thereof is continuously irradiated with plasma is usually about 10 to 20 seconds.

この点からすれば、前記60秒という処理時間は長ずき
るということになり、生産性を上げるために処理時間を
10〜20秒程度にすれば、その間の被処理物の公転、
自転の回転数が半回転ないし1回転にすぎず、均一処理
が期待しえない。
From this point of view, the processing time of 60 seconds is too long, and if the processing time is set to about 10 to 20 seconds in order to increase productivity, the revolution of the object to be processed during that time,
The number of rotations is only half a revolution or one revolution, so uniform processing cannot be expected.

本発明は、前記の点に鑑み、均一処理と生産性を共に満
足しうるプラズマ処理法を提供することを目的とする。
In view of the above points, the present invention aims to provide a plasma processing method that can satisfy both uniform processing and productivity.

r問題点を解決するための手段] すなわち本発明は、真空チャンバ内に収容した樹脂成形
品にプラズマを照射して表面改質するプラズマ処理法に
おいて、回転軸を有する架台に被処理物を取付け、該架
台を回転軸の回りに繰返し正転および反転させることに
よって、真空チャンバ内に乱気流を発生せることを特徴
とする樹脂成形品のプラズマ処理法に関する。
Means for Solving the Problem] That is, the present invention is a plasma processing method in which a resin molded product housed in a vacuum chamber is irradiated with plasma to modify its surface, and the object to be treated is mounted on a pedestal having a rotating shaft. , relates to a plasma processing method for a resin molded article, characterized in that a turbulent air flow is generated in a vacuum chamber by repeatedly rotating the pedestal in the normal and reverse directions around a rotation axis.

[作 用] 前記のごとく真空チャンバ内に乱気流を発生させること
により、被処理物とプラズマとの接触が、被処理物とプ
ラズマ吐出口との相対位置や相対角度などにそれほど影
響されず、はぼ均一にかつ短時間に達成されることにな
る。
[Function] By generating turbulence in the vacuum chamber as described above, the contact between the object to be processed and the plasma is not affected much by the relative position or relative angle between the object to be processed and the plasma discharge port, and the This will be achieved almost uniformly and in a short time.

[効 果] それにより、架台の回転軸に近いところに取付けた被処
理物も、回転軸から離れたところに取付けた被処理物も
ほぼ同程度に処理され、取付は位置によるバラツキが少
なくなるから、真空チャンバに一時に多数の被処理物を
収容することができ、バッチ当りの生産性が高くなる。
[Effect] As a result, objects mounted close to the rotating shaft of the stand and objects mounted far from the rotating shaft are processed to almost the same extent, and there is less variation in mounting depending on the position. Therefore, a large number of objects to be processed can be accommodated in the vacuum chamber at once, and productivity per batch is increased.

さらにバッチ当りの処理時間が短かくなるから、全体の
生産性がより一層向上される。
Furthermore, since the processing time per batch is shortened, the overall productivity is further improved.

[実施態様] つぎに図面に基づき本発明の詳細な説明する。[Embodiment] Next, the present invention will be explained in detail based on the drawings.

第1図は本発明の方法に用いるプラズマ処理装置の一実
施例を示す概略説明図、第2図は第1図の(X)、−(
X)線拡大断面図である。
FIG. 1 is a schematic explanatory diagram showing an embodiment of a plasma processing apparatus used in the method of the present invention, and FIG. 2 is a diagram showing (X), -(
It is an enlarged sectional view taken along the line X).

第1〜2図において、(1)は被処理物を処理するため
の真空チャンバである。(2)は真空ポンプであり、チ
ャンバ(1)内を所定の真空度に維持するためのもので
ある。(3)は空気、酸素、アルゴン、ヘリウムなどの
ガスボンベであり、ガスはボンベ(3)から配管(4)
を通してプラズマ発生器(5)に送られ、そこでマイク
ロ波発生器(6)からのマイクロ波によって励起されて
プラズマ状態とされ、生成したプラズマはプラズマ導入
管(71の吐出口(8)からチャンバ(1)内に導入さ
れ、被処理物(9)に照射される。
In FIGS. 1 and 2, (1) is a vacuum chamber for processing an object to be processed. (2) is a vacuum pump, which is used to maintain the inside of the chamber (1) at a predetermined degree of vacuum. (3) is a gas cylinder for air, oxygen, argon, helium, etc., and the gas is transferred from the cylinder (3) to the pipe (4).
is sent to the plasma generator (5) through the microwave generator (6), where it is excited by microwaves from the microwave generator (6) and turned into a plasma state, and the generated plasma is sent from the discharge port (8) of the plasma introduction tube (71) to the chamber ( 1) and irradiates the object to be treated (9).

(10)は被処理物(9)を取付けるための架台であり
、チャンバ(1)の中心部を貫通する回転軸(11)に
固定され、回転軸のまわりに回転するようにされている
。回転軸(11)は駆動装置(12)により駆動される
Reference numeral (10) denotes a pedestal for mounting the object to be processed (9), which is fixed to a rotating shaft (11) passing through the center of the chamber (1) and rotated around the rotating shaft. The rotating shaft (11) is driven by a drive device (12).

架台(10)は回転軸(11)から放射状に延びる棒部
材(20)と該棒部材(20)の先端部に固定されてい
る取付治具、たとえば棒部材(20)に直角に固定され
ている棒部材(21)とから構成されており、被処理物
(9)は棒部材(20)と棒部材(21)との1字コー
ナ一部に取付けられる。
The frame (10) is fixed at right angles to a rod member (20) extending radially from the rotating shaft (11) and a mounting jig fixed to the tip of the rod member (20), for example, the rod member (20). The object to be processed (9) is attached to a part of the one-character corner of the rod member (20) and the rod member (21).

前□記のごとく被処理物(9)を架台(10)に取付け
、架台(10)を回転軸(11)の回りに繰返し正転お
よび反転させる。
As described above, the object to be processed (9) is attached to the pedestal (10), and the pedestal (10) is repeatedly rotated forward and reversed around the rotation axis (11).

その際プラズマ吐出口(8)が分散せず、たとえば1カ
所に集中しているばあいには反転を繰返しながら全体と
して一定方向(たとえば矢印方向)に回転することによ
って一層効果的に処理ができる。かかるばあいの架台(
10)の回転運動による生じる被処理物(9)上の任意
の点(A)の運動の軸跡の一例を第3図に示す。第3図
において、横軸はA点・の円周上の任意の点からの距離
であり、縦軸は時間である。第3図において、(ωは正
転(第2図の矢印方向の回転)の部分、(b)は反転の
部分を示す。
At this time, if the plasma discharge ports (8) are not dispersed and are concentrated in one place, for example, the process can be made more effective by rotating the entire body in a fixed direction (for example, in the direction of the arrow) while repeating reversals. . If this occurs, the stand (
An example of the axis trace of the movement of an arbitrary point (A) on the object to be processed (9) caused by the rotational movement of 10) is shown in FIG. In FIG. 3, the horizontal axis is the distance from point A to any point on the circumference, and the vertical axis is time. In FIG. 3, (ω indicates a normal rotation (rotation in the direction of the arrow in FIG. 2)), and (b) indicates a reverse rotation.

乱気流を起すための回転条件はプラズマ吐出口(8)の
位置や個数、架台(10)の反転角度などによって異な
るが、反転回数は3〜60回/分、一定方向の回転数は
O〜30回/分が概ねの目安である。
The rotation conditions for generating turbulence vary depending on the position and number of plasma discharge ports (8), the reversal angle of the pedestal (10), etc., but the number of reversals is 3 to 60 times/min, and the rotation speed in a certain direction is 0 to 30 times/min. times/minute is a rough guide.

第2図においては、棒部材(20)の先端部のみに取付
冶具(21)を取付けているが、中間部にも取付治具(
21)を取付け、被処理物(9)をさらに多数取付ける
ようにしてもよい。
In Fig. 2, the mounting jig (21) is attached only to the tip of the rod member (20), but the mounting jig (21) is also attached to the middle part.
21) may be attached, and a larger number of objects to be processed (9) may be attached.

第4図は本発明に用いる架台(10)の他の実施例を示
す断面図であり、回転軸(11)から放射状に延びる棒
部材(20)の先端部に回転軸方向に延びる軸部材(2
2)が取付けられており、該軸部材(22)に逆T字型
の取付治具(23)が回転自在に取付けられている。該
取付冶具(23)に被処理物(9)が取付けられる。
FIG. 4 is a sectional view showing another embodiment of the pedestal (10) used in the present invention, in which a shaft member ( 2
2) is attached, and an inverted T-shaped attachment jig (23) is rotatably attached to the shaft member (22). The object to be processed (9) is attached to the attachment jig (23).

第4図に示される架台(10)も第2図のものと同様に
回転軸(11)の回りに顧返し正転および反転させらせ
るが(要すれば反転を繰返しながら全体として一定方向
に回転させる)、その際取付治具(23)は軸部材(2
2)に回転自在に取付けられているから、回転軸(11
)の正転、反転により揺動運動をすることになり、一層
乱気流の発生が容易になり、均一処理が良好に行なわれ
る。
The pedestal (10) shown in Fig. 4 is rotated forward and reversed around the rotating shaft (11) in the same way as the one shown in Fig. 2 (if necessary, it is rotated repeatedly in the same direction as a whole rotation), in which case the mounting jig (23) is attached to the shaft member (2
2), so it is rotatably attached to the rotating shaft (11
) causes an oscillating motion by normal rotation and reversal, making it easier to generate turbulence and achieving better uniform processing.

[実施例] つぎに実施例をあげて本発明の詳細な説明する。[Example] Next, the present invention will be explained in detail with reference to Examples.

実施例1 断面口字状のパンバカバーをポリプロピレンで成形し、
これを第1〜2図に示される装置でプラズマ処理した。
Example 1 A breadboard cover with a cross-sectional shape is molded from polypropylene,
This was subjected to plasma treatment using the apparatus shown in FIGS. 1 and 2.

処理条件はつぎのとおりである。The processing conditions are as follows.

真空チャンバ内圧カニ0.5トール ガ    ス :02 ガス流量: 20Jl /分 マイクロ波発生用カニ  500W 回転軸(1)から被処理物(9)までの距離:約50c
m回転条件二反転角120度3回 正転角180度3回 処理時間:20秒 プラズマ処理したパンバカバーの外表面にウレタン系塗
料(日本ビーケミカル■製R−263)を塗装し、80
℃×1時間で焼付けて厚さ35μmの塗膜を形成した。
Vacuum chamber internal pressure 0.5 toll gas: 02 Gas flow rate: 20Jl/min Microwave generation crab 500W Distance from rotating shaft (1) to object to be processed (9): Approx. 50c
m Rotation conditions Bi-reverse angle 120 degrees 3 times Forward rotation angle 180 degrees 3 times Treatment time: 20 seconds The outer surface of the plasma-treated Pamba cover was coated with urethane paint (R-263 manufactured by Nippon B Chemical ■), and
It was baked at ℃ for 1 hour to form a coating film with a thickness of 35 μm.

えられた塗膜の密着性をゴバン目剥離試験(JISに5
400)によって調べた。
The adhesion of the resulting coating film was evaluated using a cross-cut peeling test (JIS 5).
400).

結果を第1表に示す。第1表において前面、上側面およ
び下側面はそれぞれ断面略コ字状のパンバカバーの前面
、上側面および下側面を意味する。
The results are shown in Table 1. In Table 1, the front, upper, and lower surfaces respectively refer to the front, upper, and lower surfaces of the breadboard cover, which has a generally U-shaped cross section.

比較例 実施例1において、架台(10)を一方向に回転させる
のみで反転を行なわなかったほかは実施例1と同様にし
てプラズマ処理を行ない、ついで塗装を行ない、えられ
た塗膜について密着性を調べた。結果を第1表に示す。
Comparative Example Plasma treatment was carried out in the same manner as in Example 1, except that the stand (10) was only rotated in one direction without being reversed, and then painting was carried out, and the resulting coating film was adhered. I looked into gender. The results are shown in Table 1.

実施例2 プラズマ処理装置として第4図に示すものを用いたほか
は実施例1と同様にしてプラズマ処理を行ない、ついで
塗装し、えられた塗膜について密着性を調べた。結果を
第1表に示す。
Example 2 Plasma treatment was carried out in the same manner as in Example 1, except that the plasma treatment apparatus shown in FIG. 4 was used, and then coating was performed, and the adhesion of the resulting coating film was examined. The results are shown in Table 1.

第  1  表Table 1

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の方法に用いるプラズマ処理装置の一実
施例を示す概略説明図、第2図は第1図の(X)−(X
)線拡大断面図、第3図はプラズマ処理中における被処
理物の任意の点の軸跡を示すグラフ、第4図はプラズマ
処理装置の他の実施例を示す概略断面図である。 (図面の主要符号) (1)二真空チャンバ (5):プラズマ発生器 (9):被処理物 (10) :架台 (11):回転軸 21図
FIG. 1 is a schematic explanatory diagram showing an embodiment of a plasma processing apparatus used in the method of the present invention, and FIG. 2 is a diagram showing (X)-(X
3 is a graph showing the axis trace of an arbitrary point on the object to be processed during plasma processing, and FIG. 4 is a schematic sectional view showing another embodiment of the plasma processing apparatus. (Main symbols in the drawings) (1) Two vacuum chambers (5): Plasma generator (9): Processed object (10): Frame (11): Rotating shaft 21

Claims (1)

【特許請求の範囲】 1 真空チャンバ内に収容した樹脂成形品にプラズマを
照射して表面改質するプラズマ処理法において、回転軸
を有する架台に被処理物を取付け、該架台を回転軸の回
りに繰返し正転および反転させることによって、真空チ
ャンバ内に乱気流を発生させることを特徴とする樹脂成
形品のプラズマ処理法。 2 被処理物が、架台に回転自在に取付けられた取付け
治具を介して取付けられてなる特許請求の範囲第1項記
載の方法。
[Claims] 1. In a plasma treatment method in which a resin molded article housed in a vacuum chamber is irradiated with plasma to modify its surface, an object to be treated is mounted on a mount having a rotating shaft, and the mount is rotated around the rotating shaft. A plasma processing method for resin molded products, which is characterized by generating turbulent airflow in a vacuum chamber by repeatedly rotating forward and reverse. 2. The method according to claim 1, wherein the object to be processed is attached via an attachment jig that is rotatably attached to a pedestal.
JP19606684A 1984-09-19 1984-09-19 Method for treating resin molding with plasma Pending JPS6173746A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19606684A JPS6173746A (en) 1984-09-19 1984-09-19 Method for treating resin molding with plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19606684A JPS6173746A (en) 1984-09-19 1984-09-19 Method for treating resin molding with plasma

Publications (1)

Publication Number Publication Date
JPS6173746A true JPS6173746A (en) 1986-04-15

Family

ID=16351627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19606684A Pending JPS6173746A (en) 1984-09-19 1984-09-19 Method for treating resin molding with plasma

Country Status (1)

Country Link
JP (1) JPS6173746A (en)

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