JPS6171832A - Stock material supply apparatus - Google Patents

Stock material supply apparatus

Info

Publication number
JPS6171832A
JPS6171832A JP19246184A JP19246184A JPS6171832A JP S6171832 A JPS6171832 A JP S6171832A JP 19246184 A JP19246184 A JP 19246184A JP 19246184 A JP19246184 A JP 19246184A JP S6171832 A JPS6171832 A JP S6171832A
Authority
JP
Japan
Prior art keywords
raw material
gas
stock
material liquid
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19246184A
Other languages
Japanese (ja)
Other versions
JPH0212142B2 (en
Inventor
Ichiro Tsuchiya
一郎 土屋
Tetsuo Miyanochi
宮後 哲夫
Hiroshi Yokota
弘 横田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP19246184A priority Critical patent/JPS6171832A/en
Publication of JPS6171832A publication Critical patent/JPS6171832A/en
Publication of JPH0212142B2 publication Critical patent/JPH0212142B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00Feed or outlet devices; Feed or outlet control devices

Abstract

PURPOSE:To stably supply stock gas to a reaction vessel for a long time, by providing a means for supplying gas, which is not reacted with the stock solution filling a stock material tank and used as the nuclei of gas bubbles generated by the boiling of the stock solution, into the stock solution for a long period of time. CONSTITUTION:When the supply of a stock material is started, a stock material tank 1 is heated by a heater 3 to adjust a stock solution 2 to predetermined temp. and the upper space 4 of the stock material tank 1 is filled with stock gas with predetermined pressure equal to or higher than atmospheric pressure. For example, in order to adjust the pressure of the stock gas to 1kg/cm<2>G when the stock solution 2 is SiCl4, the stock solution 2 is heated to 80o. Next, an automatic valve 10 is closed while an automatic valve 7 is opened to send the stock gas to a reaction vessel. The flow amount of the stock gas is con trolled by a flow control apparatus 8. When the supply of the stock gas is finished, the automatic valve 7 is closed and the automatic valve 10 is opened to purge piping 5 with nitrogen gas.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は元ファイバ母材あるいは半導体等の製造に用い
られるS IC14+ GeCl4などの液体原料を精
密に流量制御しながら大量にかつ安定して、反応容器に
導くことができる原料供給装置に係る。
[Detailed Description of the Invention] <Industrial Application Field> The present invention is capable of stably producing liquid raw materials such as SIC14+GeCl4 used in the production of fiber base materials or semiconductors in large quantities and stably while precisely controlling the flow rate. It relates to a raw material supply device that can introduce raw materials into a reaction vessel.

〈従来の技術〉 原料供給装置を光フアイバ用母材の製造装置の場合につ
いて説明する。元ファイバ用母材の製造方法にはVAD
法、外付は法、内封は法等が知られている。これらの内
とくに長時間連続原料ガスの供給を必要とするVAD法
においては、液体ガラス原料を気化した原料ガスを大気
圧以上で反応容器に送シ酸水素バーナあるいはプラズマ
バーナで燃焼させてガラス媒体を生成し、回転する出発
部材に堆積させて棒状の多孔質母材を作シ、更にこの多
孔質母材を光ファイバに紡糸するものである。このため
に、連続して大量にかつ安定して原料ガスを反応容器へ
供給する原料供給装置が必要になった。外付は法あるい
は内封は赦おいても同様に連続して原料ガス党反応容器
へ供給する原料供給装置が用いられている。また半導体
プロセスにおいても原料ガスを大気圧以上あるいは以下
で送る同様な原料供給装置が広く用いられている。この
ような原料供給装置の1例を第3図に示す。第3図に示
す原料供給装置によれば、気密な原料タンク1には大気
中の酸素または水分と反応する原料液2が収容されてい
て、原料タンク1の外周には原料tL2を気化するため
のヒータ3が取シ付けられている。原料タンク1の上部
空間4には原料液が気化した原料ガスが原料タンク1の
温度における蒸気圧で満されておシ、原料タンク1の上
部空間4と反応容器(図示せず)との間には原料ガスを
送給する配管5が配置されている。
<Prior Art> A case will be described in which the raw material supply device is a manufacturing device for optical fiber base material. The manufacturing method of the base material for the original fiber is VAD.
Law is known as law, external law is law, internal law is law, etc. Among these, in the VAD method, which requires continuous supply of raw material gas for a long period of time, raw material gas obtained by vaporizing liquid glass raw material is sent to a reaction vessel at a pressure higher than atmospheric pressure, and is burned in a hydrogen oxide burner or a plasma burner to form a glass medium. is produced, deposited on a rotating starting member to produce a rod-shaped porous preform, and further this porous preform is spun into an optical fiber. For this reason, a raw material supply device that continuously and stably supplies a large amount of raw material gas to the reaction vessel has become necessary. Similarly, a raw material supply device is used which continuously supplies raw material gas to the reaction vessel, even if it is externally attached or internally sealed. Also in semiconductor processes, similar raw material supply devices that feed raw material gases at pressures above or below atmospheric pressure are widely used. An example of such a raw material supply device is shown in FIG. According to the raw material supply device shown in FIG. 3, an airtight raw material tank 1 contains a raw material liquid 2 that reacts with oxygen or moisture in the atmosphere, and the outer periphery of the raw material tank 1 is used to vaporize the raw material tL2. A heater 3 is installed. The upper space 4 of the raw material tank 1 is filled with raw material gas obtained by vaporizing the raw material liquid at the vapor pressure at the temperature of the raw material tank 1, and between the upper space 4 of the raw material tank 1 and the reaction vessel (not shown). A pipe 5 for supplying raw material gas is arranged.

配管5には開閉パルプ6、自動パルプ7、流量制御装置
8が介装されている。流量制御装置8には質量流量計(
マスフローコントローラ)が広く用いられている。流量
制御装置8の一次側には自動パルプ10を介在した配管
9が接続されていて、配管9を通じて窒素ガスが供給さ
れるようになっている。自動バルブ10は自動パルグア
と連動し、原料供給中は自動パルグアが開で自動パルプ
10が閉となって原料を反応容器に流し、原料供給をし
ていないときは自動パルグアが閉で自動パルプ10が開
となって配管中に窒素ガスを流して配管保護のパージを
行う。
The piping 5 is provided with an open/close pulp 6, an automatic pulp 7, and a flow rate control device 8. The flow rate control device 8 includes a mass flow meter (
mass flow controllers) are widely used. A pipe 9 with an automatic pulp 10 interposed therebetween is connected to the primary side of the flow rate control device 8, and nitrogen gas is supplied through the pipe 9. The automatic valve 10 is interlocked with the automatic pargua, and when raw materials are being supplied, the automatic pargua is open and the automatic pulp 10 is closed to allow the raw material to flow into the reaction vessel, and when raw materials are not being supplied, the automatic pargua is closed and the automatic pulp 10 is closed. is opened and nitrogen gas flows into the pipe to purge the pipe to protect it.

第3図に示した原料供給装置を用いて原料ガスを反応容
器へ導く手順は次の如くである。原料を供給していない
状態では自動パルグアは閉まシ、自動パル110が開い
ておシ、配管50反反応器側は窒素ガスによシバーソさ
れている。
The procedure for introducing the raw material gas into the reaction vessel using the raw material supply device shown in FIG. 3 is as follows. When raw materials are not being supplied, the automatic pulse 110 is closed, the automatic pulse 110 is open, and the piping 50 on the side opposite to the reactor is insulated with nitrogen gas.

このような状態から原料供給を開始するためには、まず
、ヒータ3を加熱し原料タンク内の原料液を加熱し、原
料タンクの上部空間4の原料ガス圧力を大気圧以上の所
定の直にする。例えば原料液がs 1cz4で原料ガス
の圧力を約IK9/dGにするためには、原料ガスタン
クの温度を80℃まで加熱する。次に自動パルプ10を
閉じ、自動パルグアを開いて、原料ガスを反応容器へ送
る。この際流量制御装置8は原料ガスの送給量を必要な
流量に制御する。原料ガス供給の終了時には、自動パル
グアを閉め、自動ノ9ルグ10を開いて配管5内を窒素
ガスでノ(−)する。さらに短時間で原料ガスの供給を
再開しない場合は、ヒータ3を切シ原料タンク1を冷却
する。
In order to start raw material supply from such a state, first, the heater 3 is heated to heat the raw material liquid in the raw material tank, and the raw material gas pressure in the upper space 4 of the raw material tank is raised to a predetermined level above atmospheric pressure. do. For example, in order to make the raw material gas pressure about IK9/dG when the raw material liquid is s 1 cz4, the temperature of the raw material gas tank is heated to 80°C. Next, the automatic pulp 10 is closed, the automatic pulp guar is opened, and the raw material gas is sent to the reaction vessel. At this time, the flow rate control device 8 controls the feed rate of the raw material gas to a required flow rate. At the end of supplying the raw material gas, the automatic gas valve is closed, the automatic gas valve 10 is opened, and the inside of the pipe 5 is flushed with nitrogen gas. If the supply of raw material gas is not restarted in a further short time, the heater 3 is turned off and the raw material tank 1 is cooled.

〈発明が解決しようとする問題点〉 第3図に示したような原料供給装置を使用して原料ガス
供給を行なう場合、原料タンク1の容積が51で原料ガ
スの流量が11/−程度であれば安定して送給できる。
<Problems to be solved by the invention> When raw material gas is supplied using a raw material supply device as shown in FIG. If so, stable supply can be achieved.

しかし原料がス景が1.5A/m以上になると原料液が
原料タンク内で沸騰するようになシ、安定に沸騰状襲を
継続できる配慮をしないと突沸を起し、安定に流量を制
御できなくなり、さらには装置の破損に至る問題が生じ
る。安定に沸騰を継続させる対策として、原料液内に気
泡発生源がつねにあることが一つの解決策で、例えば原
料タンクの底面を粗くするとか、原料液と反応しない多
孔質体を原料液中に入れることが行なわれていた。しか
しこれらの気泡発生源から発生する気泡の核となるのは
、これらの気泡発生源に吸着した原料タンクの圧力よシ
高い蒸気圧を持った気体である。従って、長期間にわた
って気泡発生源を原料液中に置くと、多孔質体に吸着し
ていた気体が失なわれ、気泡発生源よシ気泡が発生しな
いようになる。このため定期的に原料液を抜き去って、
窒素ガス等の原料液と反応しないガスで原料タンク内を
パージしなければならなかった。これによって窒素ガス
等が再び原料タンク内壁に及び多孔質体に吸着され、気
泡発生の機能が回復される。
However, if the flow rate of the raw material exceeds 1.5 A/m, the raw material liquid will begin to boil in the raw material tank, and if care is not taken to maintain a stable boiling state, bumping will occur, and the flow rate will be controlled stably. This may cause problems that may lead to failure or even damage to the device. One solution to ensure stable boiling is to always have a source of bubbles in the raw material liquid. For example, by making the bottom of the raw material tank rough, or by adding a porous material that does not react with the raw material liquid to the raw material liquid. It was being put into place. However, the core of the bubbles generated from these bubble generating sources is gas having a vapor pressure higher than the pressure of the raw material tank, which is adsorbed to these bubble generating sources. Therefore, if the bubble generation source is placed in the raw material liquid for a long period of time, the gas adsorbed to the porous body will be lost, and the bubble generation source will no longer generate bubbles. For this reason, the raw material liquid is removed periodically,
It was necessary to purge the inside of the raw material tank with a gas that does not react with the raw material liquid, such as nitrogen gas. As a result, nitrogen gas and the like reach the inner wall of the raw material tank again and are adsorbed by the porous body, thereby restoring the bubble generation function.

本発明はかかる従来技術の欠点に鑑みてなされたもので
、原料タンクに原料液を保ったまま、原料液の発泡の核
となる原料液と反応しない気体を供給しつづけることの
できる原料供給装置を提供することを目的とするもので
ある。
The present invention has been made in view of the drawbacks of the prior art, and is a raw material supply device capable of continuously supplying a gas that does not react with the raw material liquid, which becomes the core of foaming of the raw material liquid, while keeping the raw material liquid in the raw material tank. The purpose is to provide the following.

く問題点を解決するための手段〉 かかる目的を達成する本発明による原料供給装置の構成
は、大気中の酸素または水分と反応する原料液を収容す
る原料タンクと、該原料タンクの原料液を加熱する手段
と、上記原料タンク内で気化された原料ガスを反応容器
へ導く配管と、該配管に介装された開閉及び流量制御を
行う装置を備えた原料供給装置において、上記原料液は
上記原料タンクに常時満された状態に保ったまま、上記
原料液と反応せず、上記原料液の沸騰によシ生じる気泡
の核となる気体を、長期間にわたって上記原料液中に供
給し続ける手段を備えたことを特徴とするものである。
Means for Solving Problems> The configuration of the raw material supply device according to the present invention that achieves the above object includes a raw material tank containing a raw material liquid that reacts with oxygen or moisture in the atmosphere, and a raw material liquid in the raw material tank. In a raw material supply device equipped with a means for heating, a pipe for guiding the raw material gas vaporized in the raw material tank to a reaction vessel, and a device for opening/closing and controlling the flow rate interposed in the pipe, the raw material liquid is Means for continuously supplying gas to the raw material liquid over a long period of time while keeping the raw material tank constantly filled with gas that does not react with the raw material liquid and becomes the core of bubbles generated by boiling of the raw material liquid. It is characterized by having the following.

く笑飽例〉 本発明による原料供給装置の一実施例を図面に従って説
明する。第1因は元ファイバ母材製造装置における本発
明の原料供給装置の一実施例の構成図である。第1図に
よれば、気密な原料タンク1には大気中の酸素または水
分と反応する元ファイバ母材の原料液例えば5IC14
,GeCl4などの液体ガラス原料液が保たれている。
Embodiment> An embodiment of the raw material supply device according to the present invention will be described with reference to the drawings. The first factor is a configuration diagram of an embodiment of the raw material supply device of the present invention in the original fiber preform manufacturing device. According to FIG. 1, an airtight raw material tank 1 contains a raw material liquid of the original fiber base material, for example, 5IC14, which reacts with oxygen or moisture in the atmosphere.
, GeCl4, and other liquid glass raw materials are maintained.

また原料タンク1の外周にはヒータ3が取付けられてい
て原料液2を所定の温度に保つ。原料タンク1の上部空
間4は原料液の加熱@度の飽和蒸気圧で満されておシ、
上部空間4からは配管5が導出されていて、開閉パルプ
6、自動パルグア、のt量制御装置8を介して反応容器
(図示せず)へ通じている。流量制御装置8の一次側に
は自動パルプ10を介装した配g9が接続されている。
Further, a heater 3 is attached to the outer periphery of the raw material tank 1 to maintain the raw material liquid 2 at a predetermined temperature. The upper space 4 of the raw material tank 1 is filled with the saturated vapor pressure of the heated raw material liquid.
A piping 5 is led out from the upper space 4 and communicates with a reaction vessel (not shown) via an opening/closing pulp 6 and an automatic palguar t amount control device 8. A distribution g9 in which an automatic pulp 10 is interposed is connected to the primary side of the flow rate control device 8.

さらに原料タンク1には、原料液と反応しない多孔質体
11が挿入されており、多孔質体11には配管12が接
続されて開閉・ぐルグ13を介して原料液2と反応しな
い気体例えば、窒素ガス供給源に接続されている。
Further, a porous body 11 that does not react with the raw material liquid is inserted into the raw material tank 1, and a pipe 12 is connected to the porous body 11, and a gas that does not react with the raw material liquid 2, such as a gas that does not react with the raw material liquid 2, is connected to the porous body 11 and , connected to a nitrogen gas supply.

尚上記流量制御装置としては、質量流量計(マスフロー
コントローラ)が広く用いられる。
Note that a mass flow meter (mass flow controller) is widely used as the flow rate control device.

かかる装置において、原料ガスを反応容器へ導くには以
下の手順による。原料ガスを供給していない状態では自
動パルプ7は閉じ、自動/々ルグ10は開放して、配管
5の反応容器側は窒素ガスによυパーツされる。このよ
うな状態からぶ料供給を開始するのにはまず、ヒータ3
によって原料タシク1を加熱し原料液2を所定の温度と
し、原料タンク1の上部空間4に大気圧以上の所定の圧
力の原料ガスを充満する。例えば原料液が5iCZ4の
場合で原料ガスの圧力を約IKf/cJGにするために
は、原料液2の@匿を80℃まで加熱する。次に自動パ
ルプ10を閉じ自動パルグアを開いて、原料ガスを反応
容器へ送る。原料ガスの流量は光量制御装置8によって
制御される。原料ガスの供給を終了する時には、自動パ
ルプ7を閉め自動パルプ10を開いて配管5内を窒素、
ガスでパーツする。さらに短時間で原料ガスの供給再開
をしない場合は、ヒータ3を切)、原料タンクは冷却さ
れる。原料ガスを供給していないときに短時間開閉パル
プ13を開いて配管12に窒素ガスを送り、多孔質体1
1に供給することによ)、原料液沸騰の気泡の核となる
気体を多孔質体に補給することができる。尚原料液が連
続補給され、多孔質体11が常に原料液2中にあるとき
でも、多孔質体からの気泡発生を継続させることができ
る。この多孔質体11への窒素ガスの供給は、あま’り
@繁に行なう必要がなく、例えば、原料ガス供給の5回
に1回程度で十分である。もちろん原料ガス供給を終了
するたびに行なえばさら−に充分である。
In such an apparatus, the following procedure is used to introduce the raw material gas to the reaction vessel. When raw material gas is not being supplied, the automatic pulp 7 is closed, the automatic pulp 10 is opened, and the reaction vessel side of the piping 5 is filled with nitrogen gas. To start water supply in such a situation, first turn on heater 3.
The raw material tank 1 is heated to bring the raw material liquid 2 to a predetermined temperature, and the upper space 4 of the raw material tank 1 is filled with raw material gas at a predetermined pressure equal to or higher than atmospheric pressure. For example, when the raw material liquid is 5iCZ4, in order to make the pressure of the raw material gas about IKf/cJG, the raw material liquid 2 is heated to 80°C. Next, the automatic pulp 10 is closed, the automatic pulp guar is opened, and the raw material gas is sent to the reaction vessel. The flow rate of the source gas is controlled by a light amount control device 8. When the supply of raw material gas is finished, the automatic pulp 7 is closed, the automatic pulp 10 is opened, and the inside of the pipe 5 is filled with nitrogen.
Parts with gas. If the supply of raw material gas is not restarted in a further short time, the heater 3 is turned off) and the raw material tank is cooled. When the raw material gas is not being supplied, the open/close pulp 13 is opened for a short time to send nitrogen gas to the piping 12, and the porous body 1
1), it is possible to replenish the porous body with gas that becomes the nucleus of bubbles when the raw material liquid boils. Note that even when the raw material liquid is continuously replenished and the porous body 11 is always in the raw material liquid 2, bubble generation from the porous body can be continued. It is not necessary to supply nitrogen gas to the porous body 11 too often; for example, it is sufficient to supply nitrogen gas to the porous body 11 once every five times the raw material gas is supplied. Of course, it is even more sufficient to carry out the process every time the raw material gas supply is finished.

本発明の原料供給装置の有効性を確かめる実験を第1図
に示す装置によって行った。
An experiment was conducted to confirm the effectiveness of the raw material supply device of the present invention using the device shown in FIG.

原料タンク1は51の原料液5iCl、が収容できる容
器が用いられ、1日6時間5tc14がスを51/mで
原料ガスの供給を行った。また連続補充液装置を用いて
原料タンク1内の原料液2を3.5〜51に保った。こ
の実験の結果、原料ガスの供給をしていない時、3日に
1回窒素がスを約1分間多孔質体11に供給した場合、
10日たっても多孔質体11からは十分な気泡が発生し
、原料液の安定な沸騰が維持できた。多孔質体11に窒
素ガスを供給しなかったような場合、10日・目には多
孔質体11からは気泡の発生が殆ど見られなくなった。
The raw material tank 1 was a container capable of containing 5 iCl of the raw material liquid, and the raw material gas was supplied at a rate of 5 tc14/m for 6 hours a day. Further, the raw material liquid 2 in the raw material tank 1 was maintained at 3.5-51 using a continuous replenisher. As a result of this experiment, when nitrogen gas was supplied to the porous body 11 for about 1 minute once every 3 days when the raw material gas was not supplied,
Even after 10 days, sufficient bubbles were generated from the porous body 11, and stable boiling of the raw material liquid was maintained. In the case where nitrogen gas was not supplied to the porous body 11, almost no bubbles were generated from the porous body 11 on the 10th day.

このように、本発明によれば、原料液2が原料タンク1
に入った状態を保ったまま、原料液中に沸騰の気泡の核
となる原料液と反応しない気体を供給し続けることが可
能となった。このため原料液を安定に沸騰しつづけるこ
とができ、原料ガスを大量にかつ安定して流量制御しな
がら反応容器へ送ることが可能となった。
As described above, according to the present invention, the raw material liquid 2 is supplied to the raw material tank 1.
It has become possible to continue supplying gas that does not react with the raw material liquid, which forms the nucleus of boiling bubbles, into the raw material liquid while maintaining the state in which the liquid is contained. For this reason, the raw material liquid can be kept boiling stably, and it has become possible to send a large amount of raw material gas to the reaction vessel while stably controlling the flow rate.

本発明の以上の実施例では、原料ガスを供給していない
間に、多孔質体に原料液と反応しない気体を供給するこ
とによって、常に多孔質体に沸騰によυ生ずる気泡の核
となる気体を吸着させておくものがあるが、本発明の趣
旨は、原料液中に常に沸騰によ)生ずる気泡の核となる
気体が存在する手段が講じられていることであシ、この
気体が従来例の如く原料タンク内壁に吸着したものや、
上記の実施例の如く多孔質体に吸着したものである必要
はなく、外部から常時供給されるものであってもよい。
In the above-described embodiments of the present invention, by supplying gas that does not react with the raw material liquid to the porous body while the raw material gas is not being supplied, the nucleus of bubbles generated by boiling in the porous body is always formed. There are some products that adsorb gas, but the gist of the present invention is to take measures to ensure that there is always gas in the raw material liquid that will form the nucleus of bubbles (due to boiling). As in the conventional example, things adsorbed to the inner wall of the raw material tank,
It does not need to be adsorbed onto a porous body as in the above embodiments, and may be constantly supplied from the outside.

第2図に本発明による原料供給装置の他の実施例の構成
図を示す。第2図に示すものは、第1図に示した例では
配管12の先端に多孔質体11が接続されている代シに
、先端がノズル15になってお)、開閉パルプ13は自
動パルプ16になっている。自動パルプ16は原料供給
中に開いて窒素ガスなど不活性ガスを原料タンク1に送
る。また配管12には流量制御装置17が介装されてい
る。第2図に示す本実施例では、原料ガスを反応容器に
送るときには、原料ガスの配管系5と窒素ガス配管系1
2との自動パルプ7.16は連動して開閉し、原料ガス
を反応容器へ送出する。原料ガスを反応容器へ送ってい
る間も、原料液の沸騰により生ずる気泡の核となる微量
の窒素ガスが配管12を通じて原料液2中へノズル1,
5によって常時供給されている。本実施例の場合も原料
液2が原料タンク1円に入った状態を保ったまま、原料
液2中に沸騰によシ生ずる気泡の核となる原料液と反応
しない気体を発生しつづけることができるようになシ、
安定に沸騰を継続することによって原料ガスを安定に流
量制御しながら反応容器へ送ることができる。この場合
実験では5IC14の原料ガス流量31/調程度に対し
、原料ガスと反応しない窒素ガス流量は3Qcc/I&
  程度で充分に沸騰を継続することができることが確
かめられた。
FIG. 2 shows a configuration diagram of another embodiment of the raw material supply device according to the present invention. In the example shown in FIG. 2, the porous body 11 is connected to the tip of the pipe 12 in the example shown in FIG. It's now 16. The automatic pulp 16 is opened during raw material supply and sends an inert gas such as nitrogen gas to the raw material tank 1. Further, a flow rate control device 17 is interposed in the piping 12 . In this embodiment shown in FIG. 2, when feeding the raw material gas to the reaction vessel, a raw material gas piping system 5 and a nitrogen gas piping system 1 are used.
The automatic pulp 7.16 with 2 opens and closes in conjunction with each other to send the raw material gas to the reaction vessel. While the raw material gas is being sent to the reaction vessel, a small amount of nitrogen gas, which becomes the nucleus of bubbles generated by boiling of the raw material liquid, flows through the pipe 12 into the raw material liquid 2 through the nozzle 1,
5 is constantly supplied. In the case of this embodiment as well, it is possible to continue generating gas that does not react with the raw material liquid, which becomes the nucleus of bubbles generated by boiling in the raw material liquid 2, while maintaining the state in which 1 yen of the raw material liquid 2 is contained in the raw material tank. I wish I could do it,
By stably continuing boiling, the raw material gas can be sent to the reaction vessel while stably controlling the flow rate. In this case, in the experiment, the flow rate of the nitrogen gas that does not react with the source gas is 3Qcc/I &
It was confirmed that boiling could be continued at a sufficient temperature.

なお、反応容器へ送る原料ガスは大気圧以上のものに限
られるものではなく、大気圧以下の場合には単にサイホ
ン管を原料タンクl内に挿入するだけで気泡の核となる
不活性ガスがタンク1内に導かれる。
Note that the raw material gas to be sent to the reaction vessel is not limited to pressures above atmospheric pressure; if the pressure is below atmospheric pressure, simply inserting a siphon pipe into the raw material tank l will remove the inert gas that forms the nucleus of bubbles. Guided into tank 1.

〈発明の効果〉 本発明による原料・供給装置によれば、原料タンクの原
料液中に常に沸騰により生ずる気泡の核となる気体が存
在する手段を設けたもので、その手段としては、例えば
原料ガスを供給していない間に、多孔質体に原料ガスと
反応しない気体を供給して、多孔質体に沸騰によシ生ず
る気泡の核となる気体を吸着させておくもの、あるいは
、原料タンク中に原料液を連続的に補給することによっ
て、原料タンク中に原料液を保ったまま、かつ原料ガス
の流量を流量制御装置によって所望の値に保ったまま、
原料液中に沸騰の気泡の核となる原料液と反応しない気
体を供給しつづけることによって、反応容器に長時間大
量にかつ安定して原料ガスを供給することができる。
<Effects of the Invention> According to the raw material/supply device according to the present invention, a means is provided in which a gas serving as the core of bubbles generated by boiling is always present in the raw material liquid in the raw material tank. A device that supplies a gas that does not react with the raw material gas to the porous body while gas is not being supplied, so that the porous body adsorbs the gas that forms the nucleus of bubbles generated by boiling, or a raw material tank. By continuously replenishing the raw material liquid into the tank, the raw material liquid is kept in the raw material tank, and the flow rate of the raw material gas is maintained at the desired value by the flow rate control device.
By continuing to supply a gas that does not react with the raw material liquid, which becomes the nucleus of boiling bubbles, into the raw material liquid, a large amount of raw material gas can be stably supplied to the reaction vessel for a long period of time.

尚、本発明の上述の実施例では光ファイノ々母材の製造
のための原料供給装置について説明したが、本発明によ
る原料供給装置は半導体材料の製造の原料供給装置とし
ても全く同様に広く利用することができるものである。
In the above-described embodiments of the present invention, a raw material supply device for manufacturing optical fiber base materials has been described, but the raw material supply device according to the present invention can also be widely used as a raw material supply device for manufacturing semiconductor materials. It is something that can be done.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は本発明による原料供給装置の実施例
の構成図、第3図は従来の原料供給装置の構成図である
。 図面中、 1は原料タンク、 2は原料液、 3はヒータ、 4は原料タンクの上部空間、 5.9.12は配管、 6.13は開閉パルプ、 7.10.16は自動パルプ、 8は流量制御装置、 11は多孔質体、 15はノズル、 17は流量制御装置である。
1 and 2 are block diagrams of an embodiment of a raw material supply apparatus according to the present invention, and FIG. 3 is a block diagram of a conventional raw material supply apparatus. In the drawings, 1 is the raw material tank, 2 is the raw material liquid, 3 is the heater, 4 is the upper space of the raw material tank, 5.9.12 is the piping, 6.13 is the open/close pulp, 7.10.16 is the automatic pulp, 8 11 is a porous body, 15 is a nozzle, and 17 is a flow rate control device.

Claims (1)

【特許請求の範囲】[Claims] 大気中の酸素または水分と反応する原料液を収容する原
料タンクと、該原料タンクの原料液を加熱する手段と、
上記原料タンク内で気化された原料ガスを反応容器へ導
く配管と、該配管に装荷された開閉及び流量制御を行う
装置を備えた原料供給装置において、上記原料液が上記
原料タンク内に常時満たされた状態を保つたまま、上記
原料液と反応せず上記原料液の沸騰により生じる気泡の
核となる気体を、長期間にわたつて上記原料液中に供給
し続ける手段を備えたことを特徴とする原料供給装置。
a raw material tank containing a raw material liquid that reacts with oxygen or moisture in the atmosphere; a means for heating the raw material liquid in the raw material tank;
In a raw material supply device equipped with a pipe that guides the raw material gas vaporized in the raw material tank to a reaction vessel, and a device loaded in the pipe for opening/closing and controlling the flow rate, the raw material liquid is constantly filled in the raw material tank. It is characterized by comprising a means for continuously supplying gas, which does not react with the raw material liquid and becomes the core of bubbles generated by boiling of the raw material liquid, into the raw material liquid for a long period of time while maintaining the same state. Raw material supply equipment.
JP19246184A 1984-09-17 1984-09-17 Stock material supply apparatus Granted JPS6171832A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19246184A JPS6171832A (en) 1984-09-17 1984-09-17 Stock material supply apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19246184A JPS6171832A (en) 1984-09-17 1984-09-17 Stock material supply apparatus

Publications (2)

Publication Number Publication Date
JPS6171832A true JPS6171832A (en) 1986-04-12
JPH0212142B2 JPH0212142B2 (en) 1990-03-19

Family

ID=16291680

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19246184A Granted JPS6171832A (en) 1984-09-17 1984-09-17 Stock material supply apparatus

Country Status (1)

Country Link
JP (1) JPS6171832A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114669244A (en) * 2020-12-24 2022-06-28 中昊晨光化工研究院有限公司 Charging system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS513737U (en) * 1974-06-24 1976-01-12
JPS5312758U (en) * 1976-07-15 1978-02-02
JPS5992933A (en) * 1982-11-19 1984-05-29 Sumitomo Electric Ind Ltd Feeder for raw material gas
JPS59127644A (en) * 1983-01-06 1984-07-23 Nec Corp Apparatus for controlling generation of stock gas

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS513737U (en) * 1974-06-24 1976-01-12
JPS5312758U (en) * 1976-07-15 1978-02-02
JPS5992933A (en) * 1982-11-19 1984-05-29 Sumitomo Electric Ind Ltd Feeder for raw material gas
JPS59127644A (en) * 1983-01-06 1984-07-23 Nec Corp Apparatus for controlling generation of stock gas

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114669244A (en) * 2020-12-24 2022-06-28 中昊晨光化工研究院有限公司 Charging system

Also Published As

Publication number Publication date
JPH0212142B2 (en) 1990-03-19

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