JPS61205629A - Raw material feeder - Google Patents

Raw material feeder

Info

Publication number
JPS61205629A
JPS61205629A JP4467685A JP4467685A JPS61205629A JP S61205629 A JPS61205629 A JP S61205629A JP 4467685 A JP4467685 A JP 4467685A JP 4467685 A JP4467685 A JP 4467685A JP S61205629 A JPS61205629 A JP S61205629A
Authority
JP
Japan
Prior art keywords
raw material
automatic valve
material tank
tank
supply device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4467685A
Other languages
Japanese (ja)
Other versions
JPH0251852B2 (en
Inventor
Ichiro Tsuchiya
一郎 土屋
Hiroshi Yokota
弘 横田
Toshio Danzuka
彈塚 俊雄
Katsuji Sakamoto
勝司 坂本
Hideki Minami
秀樹 南
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP4467685A priority Critical patent/JPS61205629A/en
Publication of JPS61205629A publication Critical patent/JPS61205629A/en
Publication of JPH0251852B2 publication Critical patent/JPH0251852B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413Reactant delivery systems
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/80Feeding the burner or the burner-heated deposition site
    • C03B2207/85Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)

Abstract

PURPOSE:To keep a raw material constantly in boiling state, to prevent the bumping of the material, and to enable the stable feeding of the material, by using a raw material tank to heat and evaporate the raw material and to supply the vapor to a reaction vessel under controlled flow rate, and attaching a means to cool the evaporated raw material gas to the tank. CONSTITUTION:The liquid raw material 2 reactive with oxygen or moisture in air is stored in an air-tight raw material tank 1, and evaporated with the heater 3. The generated raw material gas is transferred from the upper space 4 through the line 5 furnished with a shut-off valve 6, a control valve 7 and a flow-controlling device 8 to a reaction vessel (omitted in the figure) under controlled flow rate. In the above raw material feeding apparatus, an assistant vessel 11 furnished with a cooling means is connected to the upper space 4 via constricted connection channel 12. The apparatus enables the constant and stable boiling of the raw material and the stable flow control of the material even in the case of abrupt increase in the supply of the raw material.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は、元ファイバ母材あるいは半導体等の製造に用
いられる5iCA!、 、 GeCl4 などの液体原
料を精密に流量制御しつつ大1にかつ安定して反応容器
に導くことができる原料供給装置に関する。
[Detailed Description of the Invention] <Industrial Application Field> The present invention is directed to 5iCA!, which is used in the production of original fiber base materials or semiconductors, etc. The present invention relates to a raw material supply device that can stably guide a liquid raw material such as GeCl4 into a reaction vessel in a large amount while precisely controlling the flow rate.

〈従来の技術〉 原料供給装置を元ファイバ用母材の製造装置の場合につ
いて説明する。光フアイバ用母材の製造方法としては、
いわゆるVAD法、外付は法、内封は法等が知られてい
る。このうち、とくに長時間連続して原料ガスの供給を
必要とするVAD法においては、液体ガラス原料を気化
し念原料ガスを大気圧以上で反応容器に送シ酸水素バー
ナあるいはプラズマバーナで燃焼させてガラス媒体を生
成し、回転する出発部材に軸方向に堆積させて棒状の多
孔質母材を作シ、更にこの多孔質母材を元ファイバに紡
糸するものである。このために、連続して大旨にかつ安
定して原料ガスを反応容器へ供給する原料供給装置が必
要であった。このような原料供給装置の一例を第7図に
示す。第7図に示す原料供給装置によれば、気密な原料
タンク1には大気中の散票または水分と反応する原料液
2が収容されていて、原料タンク1の外周には原料液2
を気化するためのヒータ3が取付けられている。原料タ
ンク1の上部空間4には原料液が気化した原料ガスが原
料タンク1の温度における蒸気圧で満されており、原料
タンク1の上部空間4と反応容器(図示せず)との間に
は原料ガスを送給する配管5が配置されている。配管5
には開閉弁6、自動弁7、流計制御装置8が介装されて
いる。流計制御装置8には質1流量計(マス70−コン
トローラ)が広く用いられている。
<Prior Art> A case where the raw material supply device is a manufacturing device for a base material for a fiber will be described. The method for manufacturing optical fiber base material is as follows:
The so-called VAD method, external method, internal method, etc. are known. Among these, in the VAD method, which requires continuous supply of raw material gas for a long period of time, the liquid glass raw material is vaporized and the raw material gas is fed to a reaction vessel at atmospheric pressure or higher and burned in a hydrogen oxide burner or a plasma burner. In this method, a glass medium is generated and deposited in the axial direction on a rotating starting member to produce a rod-shaped porous preform, and this porous preform is further spun into a base fiber. For this reason, a raw material supply device that continuously and stably supplies the raw material gas to the reaction vessel was required. An example of such a raw material supply device is shown in FIG. According to the raw material supply device shown in FIG. 7, an airtight raw material tank 1 contains a raw material liquid 2 that reacts with dust or moisture in the atmosphere, and the raw material liquid 2 is disposed on the outer periphery of the raw material tank 1.
A heater 3 is attached to vaporize the . The upper space 4 of the raw material tank 1 is filled with raw material gas obtained by vaporizing the raw material liquid at the vapor pressure at the temperature of the raw material tank 1, and there is a gap between the upper space 4 of the raw material tank 1 and the reaction vessel (not shown). A pipe 5 for supplying raw material gas is arranged. Piping 5
An on-off valve 6, an automatic valve 7, and a flow meter control device 8 are installed in the . As the flowmeter control device 8, a quality 1 flowmeter (mass 70-controller) is widely used.

流計制御装置8の一次側には自動弁10を介在した配管
9が接続されていて、配管9を通じて窒素ガスが供給さ
れるようになっている。自動弁10は自動弁7と連動し
、原料供給中は自動弁7が開き自動弁10が閉じて原料
を反応容器に流し、屏料の供給をしていないときは自動
弁7が閉じ自動弁10が開いて配管中に窒素ガスを流し
て配管保獲のパージを行なう。
A piping 9 with an automatic valve 10 interposed therebetween is connected to the primary side of the flowmeter control device 8, and nitrogen gas is supplied through the piping 9. The automatic valve 10 is interlocked with the automatic valve 7, and when the raw material is being supplied, the automatic valve 7 opens and the automatic valve 10 is closed to flow the raw material into the reaction vessel, and when the material is not being supplied, the automatic valve 7 is closed and the automatic valve is closed. 10 is opened and nitrogen gas is flowed into the piping to purge the piping.

第7図に示した原料供給装置を用いて原料ガスを反応容
器へ導く手順は次の如くである。原料を供給していない
状態では自動弁7は閉じ、自動弁10が開いて配管50
反反応器側は窒素カスニよりパージされている。このよ
うな状態から原料供給を開始するためには、まず、ヒー
タ3を加熱し原料タック内の原料液を加熱し、原料タン
クの上部空間4の原料ガス圧力を大気圧以上の所定の値
にする。例えば、原料液が5tcz4で原料がスの圧力
を1Kg/iGにするためには、原料タンクの温度を8
0℃まで加熱する。
The procedure for introducing the raw material gas into the reaction vessel using the raw material supply device shown in FIG. 7 is as follows. When the raw material is not being supplied, the automatic valve 7 closes, and the automatic valve 10 opens to close the pipe 50.
The counter reactor side is purged with nitrogen gas. In order to start supplying raw materials from such a state, first, the heater 3 is heated to heat the raw material liquid in the raw material tuck, and the raw material gas pressure in the upper space 4 of the raw material tank is brought to a predetermined value higher than atmospheric pressure. do. For example, in order to make the raw material liquid 5tcz4 and the raw material gas pressure 1Kg/iG, the temperature of the raw material tank should be 8
Heat to 0°C.

次に自動弁10を閉じ、自動弁7を開けて、原料ガスを
反応容器へ送る。この際流量制御装置8は原料ガスの送
給1を必要な流量に制御する。
Next, the automatic valve 10 is closed, the automatic valve 7 is opened, and the raw material gas is sent to the reaction vessel. At this time, the flow rate control device 8 controls the feed 1 of the raw material gas to a required flow rate.

原料ガス供給の終了時には、自動弁7を閉じ、自動弁1
0を開いて配管5内を窒素ガスでパーツする。さらに、
短時間で原料ガスの供給を再開しない場合は、ヒータ3
を切り原料タンクを冷却する。また、再開が比較的早く
予定されるときには、ヒータ3を入れたまま保温にして
いる。
At the end of raw material gas supply, automatic valve 7 is closed and automatic valve 1 is closed.
0 and parts the inside of the pipe 5 with nitrogen gas. moreover,
If supply of raw material gas is not restarted in a short time, heater 3
and cool the raw material tank. Furthermore, when restarting is scheduled relatively soon, the heater 3 is left on to keep warm.

〈発明が解決しようとする問題点〉 上述した第7図に示す構成で原料ガスの送給全土めても
なお、ヒータ3を入れておシ、原料タンクが一定温度、
例えば80℃で保たれているとき、原料タンク内は完全
な均一温度になる。
<Problems to be Solved by the Invention> With the configuration shown in FIG.
For example, when the temperature is maintained at 80°C, the temperature inside the raw material tank is completely uniform.

この状態では原料タンク内では温度分布による熱対流や
沸騰が生じなくなシ平衡状態で液面での気液相変化のみ
が生じている。このような状態で急激に自動弁7を開い
て大流量の原料ガスを反応容器へ送ろうとする場合、気
相原料ガスが流出して原料タンク内圧が低下しても、沸
騰が安定して開始しない欠点を有し、また場合によって
は原料タンク内圧が原料ガス飽和蒸気圧よシ一時的に小
さくなるため突沸が生じ流量制御された原料供給を安定
して行なうことができず、しかも突沸の場合には配管部
品の破損が最悪の事態として生ずる欠点がある。
In this state, heat convection and boiling due to temperature distribution do not occur in the raw material tank, and only gas-liquid phase changes occur at the liquid level in an equilibrium state. In such a situation, if you suddenly open the automatic valve 7 to send a large flow of raw material gas to the reaction vessel, even if the gas phase raw material gas flows out and the internal pressure of the raw material tank decreases, boiling will start stably. Moreover, in some cases, the internal pressure of the raw material tank becomes temporarily lower than the saturated vapor pressure of the raw material gas, resulting in bumping, making it impossible to stably supply raw materials with a controlled flow rate. has the disadvantage that the worst case scenario is damage to piping parts.

また、沸騰開始後原料タンクは完全に定常状態にあって
、タンクの壁温と原料の液温と気温とが略同じであるの
で、急に原料ガスを流出することによる潜熱の流出1が
非常に多くなっても壁すなわちヒータからの熱伝達が充
分期待できず、液温か一定時間下が9つづけ、この結果
飽和蒸気圧と略等しい流量制御1&置の一次側ガス圧が
減少し、一定の一次二次圧力差を必要とするa旨制御装
置による安定した光重制御ができなくなる。
In addition, after the start of boiling, the raw material tank is in a completely steady state, and the wall temperature of the tank, the liquid temperature of the raw material, and the air temperature are approximately the same, so the outflow of latent heat caused by the sudden flow of raw material gas is extremely low. Even if the temperature increases, sufficient heat transfer from the wall or heater cannot be expected, and the liquid temperature continues to drop for a certain period of time.As a result, the primary gas pressure at flow rate control 1 & 2, which is approximately equal to the saturated vapor pressure, decreases, and the temperature remains constant. Stable light weight control using a control device that requires a primary and secondary pressure difference becomes impossible.

そこで、本発明は上述の欠点に鑑み、ヒータにて原料タ
ンクを保温しているときでも原料タンク内に温度分布を
作ることによシ、気液相の交換を活発にして沸騰を常に
行なわせて安定した沸騰を行なうと共に突沸を防止し、
しかも急激な原料供給1の増加に対してもヒータからの
熱伝達を充分に行ない原料供給不足を防ぎ安定したit
制御を行なう原料供給装置の提供を目的とする。
Therefore, in view of the above-mentioned drawbacks, the present invention creates a temperature distribution in the raw material tank even when the raw material tank is kept warm by a heater, thereby actively exchanging the gas-liquid phase and constantly boiling. to achieve stable boiling and prevent bumping.
In addition, even when the raw material supply increases rapidly, sufficient heat transfer from the heater is carried out to prevent a shortage of raw material supply and to maintain a stable IT system.
The purpose is to provide a raw material supply device that performs control.

く問題を解決するための手段〉 上述の目的を達成する本発明は、大気中の酸素または水
分と反応する原料液を収容する原料タンクと、この原料
液を加熱する手段と、上記原料タンク内で気化された原
料ガスを反応容器へ導く配管と、この配管に介装された
開閉及び流量制御を行なう装置とを備える原料供給装置
において、上記原料タンク内で気化された原料ガスを冷
却する機構を上記原料タンクに備えたことを特徴とする
Means for Solving Problems> The present invention, which achieves the above-mentioned objects, includes a raw material tank containing a raw material liquid that reacts with oxygen or moisture in the atmosphere, a means for heating this raw material liquid, and A mechanism for cooling the raw material gas vaporized in the raw material tank, in a raw material supply device comprising a pipe that guides the raw material gas vaporized in the raw material tank to a reaction vessel, and a device installed in the pipe for opening/closing and controlling the flow rate. The raw material tank is equipped with the following.

く作用〉 原料ガスを冷却する機構を備えたことにより、原料タン
ク内に温度分布を連続して作ることができ、気液相の相
変化を活発化でき沸騰が安定して行なわれる。
Effect> By providing a mechanism for cooling the raw material gas, it is possible to create a continuous temperature distribution within the raw material tank, activating the phase change of the gas-liquid phase, and stably boiling.

〈実施例〉 ここで、@1図ないし第6図を参照して本発明の詳細な
説明する。なお、第7図と同一部分には同符号を付す。
<Example> The present invention will now be described in detail with reference to Figures 1 to 6. Note that the same parts as in FIG. 7 are given the same reference numerals.

第1図ないし第6図において、1は原料タンク、2は原
料液、3はヒータ、4は上部空間、5は配管、6は開閉
弁、7゜lOは自動弁、8は流量制御装置、9Fi配管
であシ、この機能は従来と同じである。
In Figures 1 to 6, 1 is a raw material tank, 2 is a raw material liquid, 3 is a heater, 4 is an upper space, 5 is a pipe, 6 is an on-off valve, 7°lO is an automatic valve, 8 is a flow rate control device, With 9Fi piping, this function is the same as before.

第1図において、原料タンク1の上蓋には補助容器11
が取付けられるが、この補助容器11は、くぴれた開口
部を連結部+12として原料タンク1の上部空間4に連
通されている。しかも、この補助容器11はそれ自体外
部から冷却するものであシ、水冷又は空冷手段(公知の
ものが多種あるので図示省略する)が備えられている。
In FIG. 1, an auxiliary container 11 is attached to the upper lid of the raw material tank 1.
The auxiliary container 11 is connected to the upper space 4 of the raw material tank 1 by using a constricted opening as a connecting portion +12. Moreover, this auxiliary container 11 itself is cooled from the outside, and is equipped with water cooling or air cooling means (not shown as there are many known types).

wc1図に示す補助容器11はくびれた開口部を有する
が、くびれていなくともすなわち筒状の補助容器でも何
ら差支えない。
Although the auxiliary container 11 shown in FIG.

このように補助容器11を原料タンク1の上部空間4と
連通させた場合、上部9間4の原料ガスは、補助容器l
l内で凝縮するので、自動弁7が閉じていて原料ガスが
送られなくとも、その凝縮による分だけ開口部から原料
ガスが入シ、凝縮・液は開口部を伝って原料タンク1内
に戻ることになる。すなわち、補助容器11の冷却1を
ある程度多めにしておき、熱対流を起こし気液相変化を
活発にして沸騰が生じている状態にしておけばよい。
When the auxiliary container 11 is communicated with the upper space 4 of the raw material tank 1 in this way, the raw material gas in the upper space 4 is transferred to the auxiliary container l.
Since the raw material gas is condensed in the tank 1, even if the automatic valve 7 is closed and raw material gas is not sent, the raw material gas will enter from the opening due to the condensation, and the condensed liquid will flow through the opening and flow into the raw material tank 1. I will be going back. That is, it is sufficient to increase the amount of cooling 1 of the auxiliary container 11 to a certain extent to generate heat convection and activate the gas-liquid phase change to bring about boiling.

かかる状態で自動弁7が開かれても、もともと沸騰して
いるので沸騰開始による不安定現象は生ぜず、また冷却
により熱伝達も確保されているので原料タンクの内圧低
下が極めて少なく流i制御装置に悪影響を及ぼさない。
Even if the automatic valve 7 is opened in such a state, since the raw material is already boiling, no unstable phenomenon will occur due to the start of boiling, and since heat transfer is ensured by cooling, the internal pressure drop in the raw material tank will be extremely small and the flow rate will be controlled. Does not adversely affect the equipment.

第2図に示す構成は、第1図に示すものとは異なり、原
料タンク1の上部に支持された補助容器11が、配管1
3a、13bを通じて原料り/り1と連通されている構
成である。より詳しくは、補助容器11の下部を配管1
3aを介して原料タンク1内の原料液2中に通し、補助
容器11の下部以外の部分(第2図では上部)を配管1
3bを介して原料タンク1の上部空間4に通している。
The configuration shown in FIG. 2 differs from that shown in FIG.
It is configured to communicate with the raw material rig/reater 1 through 3a and 13b. More specifically, the lower part of the auxiliary container 11 is connected to the piping 1.
3a into the raw material liquid 2 in the raw material tank 1, and the part other than the lower part (the upper part in FIG. 2) of the auxiliary container 11 is connected to the pipe 1.
It passes into the upper space 4 of the raw material tank 1 via 3b.

したがって、気化された原料ガスは配管13bを通って
補助容器11に入シ、また、補助容器11にて液体に凝
縮された原料は、配管131Lを通って原料タンク1の
原料液2内に入ることになる。かかる第2図の構造は、
補助容器11の冷却を増大させ、例えば空冷から水冷に
して循環1を多くするときには重要になり、例えば10
1の原料タンクから51/m程度の原料ガスを反応容器
へ送シ出す場合はともかく、数十l/厘〜1001/s
i+程度の原料ガスを送シ出す場合は有用である。
Therefore, the vaporized raw material gas enters the auxiliary container 11 through the pipe 13b, and the raw material condensed into liquid in the auxiliary container 11 enters the raw material liquid 2 in the raw material tank 1 through the pipe 131L. It turns out. The structure of FIG. 2 is as follows.
This becomes important when increasing the cooling of the auxiliary vessel 11, for example from air cooling to water cooling, increasing the circulation 1, for example 10
Regardless of the case where raw material gas of about 51/m is sent from one raw material tank to a reaction vessel, the flow rate is several tens of l/min to 1001/s.
This is useful when delivering raw material gas of about i+.

更に、第3図は他の変形例である。原料タンク1から反
応容器に大流敬の原料ガスを供給する場合、補助容器1
1による循環1が反応容器へ供給する側にとυ負担とな
って熱伝達1が少なくなるため、結果として原料ガスを
反応容器に充分送れないおそれがある。このため、第3
図のように補助容器11への配管13bに開閉弁14を
介在させ、反応容器への供給中はこの開閉弁14を閉じ
るようにすることもできる。
Furthermore, FIG. 3 shows another modification. When supplying a large flow of raw material gas from the raw material tank 1 to the reaction vessel, the auxiliary vessel 1
Since the circulation 1 caused by 1 becomes a burden υ on the side supplying the reaction vessel, the heat transfer 1 decreases, and as a result, there is a possibility that the raw material gas cannot be sufficiently sent to the reaction vessel. For this reason, the third
As shown in the figure, an on-off valve 14 may be interposed in the pipe 13b to the auxiliary container 11, and the on-off valve 14 may be closed during supply to the reaction container.

この場合、補助容器11と原料タンク1との間の開閉弁
14を第1自動弁とし、かつ自動弁7を第2自動弁とし
て、第2自動弁7を開く前すなわち原料ガスを反応容器
に送出する前、第1自動弁14が開かれてお)、また、
第2自動弁7を開いた後には直後に又は一定時間後に第
1自動弁14を閉じるようにするのがよい。この場合、
第1自動弁14の閉成を第2自動弁7の開放直後又は一
定時間後としたのは、配管抵抗や原料タンク1の気相分
の客種によシ弁の開閉が液相から気相変化の状態に影響
するまで時間遅れがあるため、開閉のタイミングをずら
して安定な流量制御を行なうことによる。
In this case, the on-off valve 14 between the auxiliary container 11 and the raw material tank 1 is used as the first automatic valve, and the automatic valve 7 is used as the second automatic valve. Before sending out, the first automatic valve 14 is opened), and
It is preferable to close the first automatic valve 14 immediately after opening the second automatic valve 7 or after a certain period of time. in this case,
The reason why the first automatic valve 14 is closed immediately after the second automatic valve 7 is opened or after a certain period of time is because the opening and closing of the valve changes from the liquid phase to the gas phase depending on piping resistance and the customer type for the gas phase in the raw material tank 1. Since there is a time delay until the state of phase change is affected, stable flow control is performed by shifting the timing of opening and closing.

更に、開閉弁14を自動弁とし、この自動弁を流量制御
装置に連動させ、流量制御8から送出される流量が一定
1より少ないとき自動弁14を開き、多いとき自動弁1
4を閉じ、または上記流量′が一定量より少ないとき上
記自動弁14をあけ、多くなって一定時間後自動弁14
を閉じるようにしてもよい。この流量制御装置8と自動
弁14との連動は、制御流歓をワイドレンツで変化させ
るとき、補助容器11を含む循環ルートの使用の是非を
制御流lのしきい値を設けて管理した方が好ましいこと
による。
Furthermore, the on-off valve 14 is an automatic valve, and this automatic valve is linked to a flow rate control device, so that when the flow rate sent from the flow rate control 8 is less than a constant 1, the automatic valve 14 is opened, and when it is higher, the automatic valve 1 is opened.
4 is closed, or when the flow rate is less than a certain amount, the automatic valve 14 is opened, and after a certain period of time when the flow rate has increased, the automatic valve 14 is opened.
You may also close it. The interlock between the flow rate control device 8 and the automatic valve 14 is such that when the control flow rate is changed over a wide range, the use of the circulation route including the auxiliary container 11 is managed by setting a threshold value for the control flow rate. This is because it is preferable.

第4図ないし第6図は、今までの説明と異なり補助容器
を備えず原料タンク1に冷却部品を直接備えた例を示す
。すなわち、第4図は原料タンク1の上蓋1a又は上部
に冷却フィン15を備えた場合を示し、第5図は、原料
タンク1の上蓋1!LK2冷又は液冷用の配管16を備
えた場合を示し、更に第6図は原料タンク1の上部空間
4に空冷又は液冷用の配管17を備えた場合を示したも
のである。これら直接冷却の構成としては他にも種々の
変形例がある。
4 to 6 show an example in which a cooling part is directly provided in the raw material tank 1 without providing an auxiliary container, unlike the previous explanation. That is, FIG. 4 shows a case where the upper lid 1a or upper part of the raw material tank 1 is provided with cooling fins 15, and FIG. 5 shows the upper lid 1! of the raw material tank 1. A case is shown in which a piping 16 for cooling LK2 or liquid cooling is provided, and FIG. 6 further shows a case in which a piping 17 for air cooling or liquid cooling is provided in the upper space 4 of the raw material tank 1. There are various other variations of these direct cooling configurations.

〈発明の効果〉 以上説明したように本発明によれば、原料タンク自体、
又は上部空間の冷却更には冷却循環ルートの形成により
、温度分布を生じて気液相の交換を活発にでき沸騰を常
に生じさせたことによシ、安定した沸騰突沸の防止、安
定した流l制御を行なうことができる。
<Effects of the Invention> As explained above, according to the present invention, the raw material tank itself,
Alternatively, by cooling the upper space and forming a cooling circulation route, a temperature distribution is created and the exchange of the gas-liquid phase is activated, and boiling is constantly generated, thereby preventing stable boiling and boiling, and stably preventing boiling. can be controlled.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図ないし第6図は本発明の実施例で、第1図は一例
の構成図、第2図は他の例の構成図、第3図はその他の
例の構成図、第4図は冷却フィンを備えた構成図、第5
図及び第6図は冷却配管を備えたm成因、第7図は従来
の構底図である。 図面中、 1は原料タンク、 3けヒータ、 4は上部空間、 5は配管、 6は開閉弁、 7は自動弁、 8は流量制御装置、 11は補助容器、 13a、13bは配管、 14は開閉弁、 15は冷却フィン、 ] 6 、17は冷却配管である。
1 to 6 show embodiments of the present invention. FIG. 1 is a block diagram of one example, FIG. 2 is a block diagram of another example, FIG. 3 is a block diagram of another example, and FIG. 4 is a block diagram of another example. Block diagram with cooling fins, fifth
Fig. 6 and Fig. 6 are a diagram of a conventional structure equipped with cooling pipes, and Fig. 7 is a bottom view of a conventional structure. In the drawings, 1 is a raw material tank, 3 heaters, 4 is an upper space, 5 is piping, 6 is an on-off valve, 7 is an automatic valve, 8 is a flow rate control device, 11 is an auxiliary container, 13a and 13b are piping, 14 is 15 is a cooling fin, ] 6 and 17 are cooling pipes.

Claims (9)

【特許請求の範囲】[Claims] (1)大気中の酸素または水分と反応する原料液を収容
する原料タンクと、この原料液を加熱する手段と、上記
原料タンク内で気化された原料ガスを反応容器へ導く配
管と、この配管に介装された開閉及び流量制御を行なう
装置とを備える原料供給装置において、上記原料タンク
内で気化された原料ガスを冷却する機構を上記原料タン
クに備えたことを特徴とする原料供給装置。
(1) A raw material tank containing a raw material liquid that reacts with oxygen or moisture in the atmosphere, means for heating this raw material liquid, piping that guides the raw material gas vaporized in the raw material tank to a reaction vessel, and this piping A raw material supply device comprising a device for opening/closing and controlling the flow rate interposed in the raw material tank, wherein the raw material tank is equipped with a mechanism for cooling the raw material gas vaporized in the raw material tank.
(2)上記特許請求の範囲第1項記載の原料供給装置に
おいて、上記機構は、原料タンクと連通しかつ冷却され
る補助容器にて形成されることを特徴とする原料供給装
置。
(2) The raw material supply device according to claim 1, wherein the mechanism is formed of an auxiliary container that communicates with the raw material tank and is cooled.
(3)上記特許請求の範囲第2項記載の原料供給装置に
おいて、上記補助容器は上記原料タンクの上部空間と連
通することを特徴とする原料供給装置。
(3) The raw material supply device according to claim 2, wherein the auxiliary container communicates with an upper space of the raw material tank.
(4)上記特許請求の範囲第2項記載の原料供給装置に
おいて、上記補助容器の下部と原料タンク内の原料液中
との間に配管が施され、かつ上記補助容器の下部以外の
部分と上記原料タンクの上部空間とが連通されることを
特徴とする原料供給装置。
(4) In the raw material supply device according to claim 2, piping is provided between the lower part of the auxiliary container and the raw material liquid in the raw material tank, and A raw material supply device characterized in that the upper space of the raw material tank is communicated with.
(5)上記特許請求の範囲第3項又は第4項に記載の原
料供給装置において、上記補助容器と上記原料タンクの
上部空間とは開閉弁を介して連通されることを特徴とす
る原料供給装置。
(5) In the raw material supply device according to claim 3 or 4, the auxiliary container and the upper space of the raw material tank are communicated with each other via an on-off valve. Device.
(6)上記特許請求の範囲第5項記載の原料供給装置に
おいて、上記補助容器と原料タンクとの間に介在される
開閉弁を第1自動弁とし、かつ原料タンクと反応容器と
の間に介装される開閉する装置を第2自動弁とし、第2
自動弁を開く前に第1自動弁を開くと共に第2自動弁を
開いた後第1自動弁を閉じることを特徴とする原料供給
装置。
(6) In the raw material supply device according to claim 5, the on-off valve interposed between the auxiliary container and the raw material tank is a first automatic valve, and the opening and closing valve interposed between the auxiliary container and the raw material tank is a first automatic valve, and the opening and closing valve interposed between the auxiliary container and the raw material tank is a first automatic valve. The interposed opening/closing device is a second automatic valve, and the second
A raw material supply device characterized in that before opening the automatic valve, a first automatic valve is opened, and after opening a second automatic valve, the first automatic valve is closed.
(7)上記特許請求の範囲第5項記載の原料供給装置に
おいて、上記補助容器と原料タンクとの間に介在される
開閉弁を自動弁とし、この自動弁を原料タンクと反応容
器との間に介在する流量制御装置に連動し、この流量制
御装置から送出される流量が一定量より少ないとき上記
自動弁を開け多いときこの自動弁を閉じ、または上記流
量が一定量より少ないとき上記自動弁を開け多くなつて
一定時間後にこの自動弁を閉じることを特徴とする原料
供給装置。
(7) In the raw material supply device according to claim 5, the on-off valve interposed between the auxiliary container and the raw material tank is an automatic valve, and the automatic valve is provided between the raw material tank and the reaction vessel. When the flow rate sent out from the flow rate control device is less than a certain amount, the automatic valve is opened, and when the flow rate is higher, the automatic valve is closed, or when the flow rate is less than a certain amount, the automatic valve is A raw material supply device characterized in that this automatic valve closes after a certain period of time after the amount of raw material is increased.
(8)上記特許請求の範囲第1項記載の原料供給装置に
おいて、原料タンクの上蓋又は上部に冷却機構を取付け
たことを特徴とする原料供給装置。
(8) The raw material supply device according to claim 1, characterized in that a cooling mechanism is attached to the upper lid or upper part of the raw material tank.
(9)上記特許請求の範囲第1項記載の原料供給装置に
おいて原料タンク内部の上部空間に冷却機構を備えたこ
とを特徴とする原料供給装置。
(9) A raw material supply device according to claim 1, characterized in that a cooling mechanism is provided in the upper space inside the raw material tank.
JP4467685A 1985-03-08 1985-03-08 Raw material feeder Granted JPS61205629A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4467685A JPS61205629A (en) 1985-03-08 1985-03-08 Raw material feeder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4467685A JPS61205629A (en) 1985-03-08 1985-03-08 Raw material feeder

Publications (2)

Publication Number Publication Date
JPS61205629A true JPS61205629A (en) 1986-09-11
JPH0251852B2 JPH0251852B2 (en) 1990-11-08

Family

ID=12698043

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4467685A Granted JPS61205629A (en) 1985-03-08 1985-03-08 Raw material feeder

Country Status (1)

Country Link
JP (1) JPS61205629A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11230489B2 (en) 2018-02-05 2022-01-25 Fujikura Ltd. Method for manufacturing porous glass fine particle body, manufacturing apparatus for porous glass fine particle body, and method for manufacturing glass preform
US11393703B2 (en) * 2018-06-18 2022-07-19 Applied Materials, Inc. Apparatus and method for controlling a flow process material to a deposition chamber

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58135146A (en) * 1982-02-03 1983-08-11 Fujikura Ltd Preparation of base material for optical fiber
JPS605029A (en) * 1983-06-21 1985-01-11 Agency Of Ind Science & Technol Method for feeding vaporized raw material for producing optical glass

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58135146A (en) * 1982-02-03 1983-08-11 Fujikura Ltd Preparation of base material for optical fiber
JPS605029A (en) * 1983-06-21 1985-01-11 Agency Of Ind Science & Technol Method for feeding vaporized raw material for producing optical glass

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11230489B2 (en) 2018-02-05 2022-01-25 Fujikura Ltd. Method for manufacturing porous glass fine particle body, manufacturing apparatus for porous glass fine particle body, and method for manufacturing glass preform
US11393703B2 (en) * 2018-06-18 2022-07-19 Applied Materials, Inc. Apparatus and method for controlling a flow process material to a deposition chamber

Also Published As

Publication number Publication date
JPH0251852B2 (en) 1990-11-08

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