JPS6171631A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPS6171631A
JPS6171631A JP59193031A JP19303184A JPS6171631A JP S6171631 A JPS6171631 A JP S6171631A JP 59193031 A JP59193031 A JP 59193031A JP 19303184 A JP19303184 A JP 19303184A JP S6171631 A JPS6171631 A JP S6171631A
Authority
JP
Japan
Prior art keywords
light
light receiving
receiving means
transfer surface
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59193031A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0548608B2 (enExample
Inventor
Yutaka Echizen
裕 越前
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59193031A priority Critical patent/JPS6171631A/ja
Publication of JPS6171631A publication Critical patent/JPS6171631A/ja
Publication of JPH0548608B2 publication Critical patent/JPH0548608B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59193031A 1984-09-15 1984-09-15 露光装置 Granted JPS6171631A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59193031A JPS6171631A (ja) 1984-09-15 1984-09-15 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59193031A JPS6171631A (ja) 1984-09-15 1984-09-15 露光装置

Publications (2)

Publication Number Publication Date
JPS6171631A true JPS6171631A (ja) 1986-04-12
JPH0548608B2 JPH0548608B2 (enExample) 1993-07-22

Family

ID=16301014

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59193031A Granted JPS6171631A (ja) 1984-09-15 1984-09-15 露光装置

Country Status (1)

Country Link
JP (1) JPS6171631A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000277413A (ja) * 1999-03-24 2000-10-06 Canon Inc 露光量制御方法、露光装置およびデバイス製造方法
WO2016045897A1 (en) * 2014-09-25 2016-03-31 Asml Netherlands B.V. Illumination system

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55143544A (en) * 1979-04-27 1980-11-08 Nippon Kogaku Kk <Nikon> Automatic exposure control device of camera

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55143544A (en) * 1979-04-27 1980-11-08 Nippon Kogaku Kk <Nikon> Automatic exposure control device of camera

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000277413A (ja) * 1999-03-24 2000-10-06 Canon Inc 露光量制御方法、露光装置およびデバイス製造方法
WO2016045897A1 (en) * 2014-09-25 2016-03-31 Asml Netherlands B.V. Illumination system
TWI575338B (zh) * 2014-09-25 2017-03-21 Ａｓｍｌ荷蘭公司 照明系統
CN106716256A (zh) * 2014-09-25 2017-05-24 Asml荷兰有限公司 照射系统
JP2017530398A (ja) * 2014-09-25 2017-10-12 エーエスエムエル ネザーランズ ビー．ブイ． 照明システム
US10146134B2 (en) 2014-09-25 2018-12-04 Asml Netherlands B.V. Illumination system

Also Published As

Publication number Publication date
JPH0548608B2 (enExample) 1993-07-22

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term