JPS6170332A - Clean bench cleaning device - Google Patents

Clean bench cleaning device

Info

Publication number
JPS6170332A
JPS6170332A JP59189617A JP18961784A JPS6170332A JP S6170332 A JPS6170332 A JP S6170332A JP 59189617 A JP59189617 A JP 59189617A JP 18961784 A JP18961784 A JP 18961784A JP S6170332 A JPS6170332 A JP S6170332A
Authority
JP
Japan
Prior art keywords
blow
rear wall
clean
air
air current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59189617A
Other languages
Japanese (ja)
Inventor
Hisayoshi Matsufuji
松藤 久良
Masahiro Inoue
雅博 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanki Engineering Co Ltd
Original Assignee
Sanki Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanki Engineering Co Ltd filed Critical Sanki Engineering Co Ltd
Priority to JP59189617A priority Critical patent/JPS6170332A/en
Publication of JPS6170332A publication Critical patent/JPS6170332A/en
Pending legal-status Critical Current

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24FAIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F3/00Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
    • F24F3/12Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
    • F24F3/16Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
    • F24F3/163Clean air work stations, i.e. selected areas within a space which filtered air is passed

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Ventilation (AREA)

Abstract

PURPOSE:To prevent a turbulent flow and a circulating flow from generating and staying by making it possible to adjust the flow amounts of a vertical falling air current from the upper part of a work room and a horizontal air current along a work bench from the rear part by blowing off pure air whose purification degree is elevated. CONSTITUTION:A work room 3 is encircled by both side walls 3s, and a rear wall 3a, the front surface is opened to the outside. On the upper surface of the work room 3 is provided a blow-off port 9 with a louver, and a vertical falling air current is blown off. Furthermore, from a flow amount adjustable blow-off port 14 opened at the lower part of the rear wall is blown off a horizontal air. The blow-off amount of the air current can be changed by adjusting the opening degree of an HS grill. Further, filters 8 and 12 are provided on the inlet sides of blow off ports 9 and 14.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、垂直気流型クリーンベンチの空気清浄度を
更に高める清浄装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a cleaning device that further improves the air cleanliness of a vertical air flow type clean bench.

〔従来の技術〕[Conventional technology]

一般に、半導体ウェハーなどの処理には、極めて清浄な
環境下での作業を要求されるため、クリーンルーム内に
おいてクリーンベンチと称する作業装置が使用され、清
浄空気の吹き出される方向によって区別される垂直気流
型と水平気流型との二種類のあることが知られている。
Generally, processing of semiconductor wafers requires work in an extremely clean environment, so a work device called a clean bench is used in a clean room, and vertical airflow is differentiated by the direction in which clean air is blown out. It is known that there are two types: a type and a horizontal airflow type.

ところで従来の垂直気流型作業装置としては、例えば特
開昭53−73076号により公開された第3図に示す
ようなものがある。
By the way, as a conventional vertical airflow type working device, there is one shown in FIG. 3 published in Japanese Patent Application Laid-Open No. 53-73076, for example.

このクリーンペンチ21は、筐体22の中部前面を開放
して三方を壁で取り囲んだ立方体状の空間を作業室23
として形成したもので、該作業室23の上部にはフィル
タ24が設けてあり、送られて来る気体を清浄する。そ
して該フィルタ24の気体吹出口付近に整流板25を任
意の手段により上下の位置移動と回転可能となるように
設置しており、更に、該整流板25に適宜数の通孔26
を穿設するとともに、摺動可能に設けた可動板27によ
って前記通孔26の大きさを適宜に調節できるようにし
である。
The clean pliers 21 has a working chamber 23, which is a cubic space surrounded by walls on three sides by opening the middle front of the housing 22.
A filter 24 is provided in the upper part of the working chamber 23 to clean the gas sent thereto. A rectifying plate 25 is installed in the vicinity of the gas outlet of the filter 24 so as to be able to move up and down and rotate by any means.
The size of the through hole 26 can be adjusted as appropriate by means of a movable plate 27 provided so as to be slidable.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかしながら、このような従来のクリーンペンチにおい
ては、整流板の位置と角度とを適宜に調整し、気体の流
通方向、流通速度及び最大流通速度の位置等を任意に得
ることができ、また、通孔の大きさを可動板の摺動によ
り調節することにより渦流や循環流等の発生をほぼ完全
に防止し得るといっても、上方から垂直方向へ吹き降り
る気流は、作業台に当たれば当然前方へ方向変換しなけ
ればならず、したがって後壁の下部と作業台とが接する
隅付近は申すまでもなく、特に該隅の両端部において渦
流や循環流の発生を回避することは不可能であり、また
、作業台上に半導体などの被処理品が載置された場合、
その周辺にも渦流や循環流が発生するが、これらの排除
も困難である。
However, in such conventional clean pliers, the position and angle of the rectifying plate can be adjusted appropriately to obtain the gas flow direction, the flow velocity, the position of the maximum flow velocity, etc. Even though it is possible to almost completely prevent the occurrence of eddy currents and circulation flows by adjusting the size of the holes by sliding the movable plate, the airflow that blows down vertically from above will naturally occur if it hits the workbench. It is necessary to change the direction forward, and therefore it is impossible to avoid the occurrence of eddy currents and circulating flows, especially at the ends of the corner, not to mention the corner where the lower part of the rear wall and the workbench meet. Yes, and if a workpiece such as a semiconductor is placed on the workbench,
Eddy currents and circulating currents also occur around them, but it is difficult to eliminate them.

そのため、使用時間の経過に伴なって渦流発生部位に塵
埃が滞留し、作業室内が汚染され、作業環境は悪化する
という問題点がある。
Therefore, there is a problem in that as the usage time passes, dust accumulates at the eddy current generation site, contaminating the working chamber and deteriorating the working environment.

また、作業室内に可動可能な整流板や摺動可能な可動板
を設けることは、これらの動作による塵の発生もあるば
かりか、作業用の空間を縮小させるという欠点もある。
Furthermore, providing a movable rectifier plate or a slidable movable plate within the working chamber not only generates dust due to these operations, but also has the drawback of reducing the working space.

〔問題点を解決するための手段〕[Means for solving problems]

この発明は、叙上の間蓋点に鑑みてなされたもので、整
流板や可動板を必要とせず、作業室の後壁下部に流量調
節可能な空気吹出口を横幅−ばいに増設し、清浄空気を
前方へ向けて水平に、垂直吹出しの空気量に対して所要
の割合をもって吹き出すことにより、これらの問題点を
解決したものである。
This invention was made in view of the above-mentioned problem, and does not require a rectifying plate or a movable plate, and has an air outlet that can adjust the flow rate added to the lower part of the rear wall of the work chamber, and These problems are solved by blowing clean air forward horizontally at a required ratio to the amount of air that would be blown vertically.

〔作 用〕[For production]

作業室の上方から垂直に吹き降ろされる清浄空気の主流
に対し、適当な割合をもって後壁下部から清浄空気を水
平方向に吹き出すので、作業合奏の隅部はもちろんのこ
と、載置された被処理品の周辺に対しても渦流°や循環
流の発生を完全に防止することができる。
Clean air is blown out horizontally from the lower part of the rear wall at an appropriate ratio to the main stream of clean air that is blown down vertically from above the work room, so that it can be used not only in the corners of the work room but also in the It is possible to completely prevent the occurrence of eddy currents and circulating flows around the product.

〔実施例〕〔Example〕

以下、この発明の一実施例を第1図及び第2図に基づい
て説明する。
An embodiment of the present invention will be described below with reference to FIGS. 1 and 2.

まず、構成を述べる。First, I will explain the configuration.

このクリーンベンチ1は、第1図に示すように、筐体2
の中部前面に開口3kをもって外部へ開放された作業室
3が両側壁3S、3S及び後壁3aに三方全敗り囲まれ
て形成されており、底面は作業台3dとなっている。
This clean bench 1 has a housing 2 as shown in FIG.
A working chamber 3, which is open to the outside with an opening 3k at the front of the middle part thereof, is formed by being surrounded on all three sides by both side walls 3S, 3S and a rear wall 3a, and the bottom surface is a working table 3d.

ファンボックス4に関しては筐体2の下部において、中
天に横向きに空気取入口(プレフィルタ付)5が開口し
ており、更に奥まった位置に送風機6が内設されている
。そして送風ダクト7は、筐体2の背面外壁2aに沿っ
て筐体2の上部に導かれている。
Regarding the fan box 4, an air intake port (with a pre-filter) 5 opens horizontally in the middle of the lower part of the housing 2, and a blower 6 is installed inside the fan box 4 at a further recessed position. The air duct 7 is guided to the upper part of the housing 2 along the rear outer wall 2a of the housing 2.

作業室3へ主たる清浄空気の垂直降下気流を送るため、
HEPAフィルタ8と吹出口(ルーバー付)9とが、ダ
クトを兼ねた蛍光灯10用のボックス11の上下に位置
して作業室3の上に設置されている。
In order to send the main vertical downdraft of clean air to the work room 3,
A HEPA filter 8 and an air outlet (with a louver) 9 are installed above and below a box 11 for a fluorescent lamp 10, which also serves as a duct, on the work chamber 3.

一方、前記フィルタ8の1/6の大きさのHEPAフィ
ルタ12を載置したダクト13が前記後壁3aの背面に
接して付設され、該後壁3aの下部に横幅全体に亘り第
2図に示すような多数の縦型スリットによる吹出口14
が開口していて、作業台3dに沿い前方へ水平方向に補
助的な清浄空気を吹き出すようになっている。なお、吹
出014の開度を任意の手段により微調節できるHSグ
リル15がダクト13側に設けられている。
On the other hand, a duct 13 in which a HEPA filter 12 of 1/6 the size of the filter 8 is mounted is attached in contact with the back surface of the rear wall 3a, and a duct 13 is installed in contact with the back surface of the rear wall 3a, and extends across the entire width of the lower part of the rear wall 3a as shown in FIG. Air outlet 14 with a large number of vertical slits as shown
is open to blow out supplementary clean air horizontally forward along the workbench 3d. Note that an HS grill 15 is provided on the duct 13 side, which allows fine adjustment of the opening degree of the air outlet 014 by any means.

なお、16は、クリーンペンチ1の移動用のキャスタで
ある。
Note that 16 is a caster for moving the clean pliers 1.

次に作用を述べる。Next, we will discuss the effect.

送風機6を起動すると、クリーンルーム内ノ空気は、空
気取入口(プレフィルタ付)5から吸入され、−次濾過
されて送風機6に入り送風ダクト7を通って筐体2内の
上部に進む。そして大部分の空気は、HEPAフィルタ
8を通って二次濾過され、清浄度を高めて吹出口(ルー
パル付)9から作業室3内へ垂直降下気流として吹き出
される。
When the blower 6 is started, air in the clean room is taken in through the air intake port (with pre-filter) 5, filtered, enters the blower 6, passes through the blower duct 7, and advances to the upper part of the housing 2. Most of the air is then subjected to secondary filtration through the HEPA filter 8, and is blown out as a vertically descending airflow into the work chamber 3 through the air outlet (with loopal) 9 with increased cleanliness.

一方、一部の空気はHEPAフィルタ12を通って同様
に二次濾過され、清浄度を高めて奥壁3aの吹出口14
から作業台3dの表面全幅に亘り、水平方向気流として
前記垂直降下気流とほぼ同じ風速金もって吹き出される
ので、垂直降下気流も円滑に前方への方向変Fl”li
−助長され、開口3kからクリーンルームへ排出する。
On the other hand, some of the air passes through the HEPA filter 12 and is similarly subjected to secondary filtration to improve the cleanliness and to
Since the horizontal airflow is blown out over the entire width of the surface of the workbench 3d at almost the same wind speed as the vertically descending airflow, the vertically descending airflow also smoothly changes its direction forward.
- It is assisted and discharged into the clean room through opening 3k.

したがって、尚流や循環流の発生箇所が皆無となり、半
導体ウェハーなどの被処理品を作業台3d上に載置した
場合、その周辺に渦流などが発生することがあっても水
平方向気流により、直ちに吹き飛ばされ消滅するため、
塵埃の滞溜することがなく作業室3内の清浄度は高度に
維持され、優良な環境下において作業を行うことかでき
る。
Therefore, there are no places where residual current or circulation flow occurs, and when a workpiece such as a semiconductor wafer is placed on the workbench 3d, even if a vortex or the like may occur around it, the horizontal airflow will Because it is immediately blown away and disappears,
A high degree of cleanliness is maintained in the work chamber 3 without the accumulation of dust, allowing work to be carried out in an excellent environment.

〔発明の効果〕〔Effect of the invention〕

以上説明してきたように、この発明は、クリーンベンチ
の前方に開口した作業室に、北方から主流の垂直降下気
流と、後方から作業台に沿って所望の割合の流量をもっ
た水平方向気流とを、それぞれ清浄度を高めた清浄空気
により吹き出す構我とし、しかも水平方向気流の流量を
適切に調節できるようにしたため、渦流や循環流の発生
、又は滞溜を完全に防止することができるという効果が
ある。
As explained above, this invention provides a work chamber that opens in front of a clean bench with a vertical descending airflow flowing from the north and a horizontal airflow with a desired flow rate flowing along the workbench from the rear. The system is designed to blow out clean air with increased purity, and the flow rate of the horizontal airflow can be adjusted appropriately, making it possible to completely prevent the generation of eddy currents, circulation flows, or stagnation. effective.

また、渦流や循環流の発生防止手段を作業室内に存在さ
せないので、作業空間を挟めることなく広々と使用する
ことができ、作業効率を向上し得るばかりか、水平方向
の吹出口流量調節機構も作業室外に設置し、動作部分も
蜜閉可能であるため、該調節機構の動作に基因する塵が
万一発生しても作業室へ侵入することはないという利点
もある。
In addition, since there is no means to prevent the generation of eddy currents or circulating flows in the work chamber, it can be used spaciously without interfering with the work space, improving work efficiency. Since it is installed outside the working room and the operating parts can be tightly closed, there is also the advantage that even if dust caused by the operation of the adjustment mechanism is generated, it will not enter the working room.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、この発明の一実施例を示すクリーンベンチの
図で、図Iは正面図、図[[は縦断面図、第2図は、水
平方向の空気の吹出口を示す一部断面拡大斜視図、第3
図は、従来のクリーンベンチの縦断面図、第4図は、同
じく整涼板の斜視図である。 1・・・・・・・・・クリーンベンチ 3・・・・・・・・・作業室 3S・・・・・・側 壁 3a・・・・・・後 壁 4・・・・・・・・・ファンボックス 8・・・・・・・・・)(EPAフィルタ9・・・・・
・・・・吹出口(ルーバー付)12・・・・・・HEP
Aフィルタ 14・・・・・・吹出口 15.17・・・・・・I(Sグリル 第1図  − 第2図
Figure 1 is a diagram of a clean bench showing an embodiment of the present invention, Figure I is a front view, Figure [[ is a vertical sectional view, and Figure 2 is a partial sectional view showing a horizontal air outlet Enlarged perspective view, 3rd
The figure is a vertical sectional view of a conventional clean bench, and FIG. 4 is a perspective view of a cooling plate. 1...Clean bench 3...Working room 3S...Side Wall 3a...Back Wall 4... ...Fun box 8...) (EPA filter 9...
...Air outlet (with louver) 12...HEP
A filter 14...Air outlet 15.17...I (S grill Fig. 1 - Fig. 2

Claims (1)

【特許請求の範囲】[Claims] 両側壁及び後壁により三方を取り囲まれ、前面を外部へ
開放した作業室に対し、上面に装備されたルーバー付き
吹出口から垂直降下気流を、また、前記後壁下部に開口
された流量調節可能な吹出口から前記垂直降下気流に対
する所望の流量割合をもつて水平方向気流を、それぞれ
フィルタを介し清浄度を高めた清浄空気により、吹き出
す構成としたことを特徴とするクリーンベンチ清浄装置
The working room is surrounded on three sides by both side walls and the rear wall, and the front side is open to the outside, and vertically descending airflow is allowed to flow through the louvered outlet installed on the top surface, and the flow rate can be adjusted through the opening at the bottom of the rear wall. 1. A clean bench cleaning device characterized in that a horizontal airflow is blown out from an air outlet at a desired flow rate with respect to the vertically descending airflow, using clean air whose cleanliness has been increased through filters.
JP59189617A 1984-09-12 1984-09-12 Clean bench cleaning device Pending JPS6170332A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59189617A JPS6170332A (en) 1984-09-12 1984-09-12 Clean bench cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59189617A JPS6170332A (en) 1984-09-12 1984-09-12 Clean bench cleaning device

Publications (1)

Publication Number Publication Date
JPS6170332A true JPS6170332A (en) 1986-04-11

Family

ID=16244296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59189617A Pending JPS6170332A (en) 1984-09-12 1984-09-12 Clean bench cleaning device

Country Status (1)

Country Link
JP (1) JPS6170332A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS613345B2 (en) * 1978-06-02 1986-01-31 Nippon Chemiphar Co

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS613345B2 (en) * 1978-06-02 1986-01-31 Nippon Chemiphar Co

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