JPS616536B2 - - Google Patents
Info
- Publication number
- JPS616536B2 JPS616536B2 JP13465177A JP13465177A JPS616536B2 JP S616536 B2 JPS616536 B2 JP S616536B2 JP 13465177 A JP13465177 A JP 13465177A JP 13465177 A JP13465177 A JP 13465177A JP S616536 B2 JPS616536 B2 JP S616536B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13465177A JPS5468169A (en) | 1977-11-11 | 1977-11-11 | Plasma processor of capacitor type |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13465177A JPS5468169A (en) | 1977-11-11 | 1977-11-11 | Plasma processor of capacitor type |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24198183A Division JPS59145533A (en) | 1983-12-23 | 1983-12-23 | Plasma processing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5468169A JPS5468169A (en) | 1979-06-01 |
| JPS616536B2 true JPS616536B2 (en) | 1986-02-27 |
Family
ID=15133346
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13465177A Granted JPS5468169A (en) | 1977-11-11 | 1977-11-11 | Plasma processor of capacitor type |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5468169A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0032788B2 (en) * | 1980-01-16 | 1989-12-06 | National Research Development Corporation | Method for depositing coatings in a glow discharge |
| JPS58117869A (en) * | 1981-12-28 | 1983-07-13 | Toshiba Corp | Film forming device |
| JPS594028A (en) * | 1982-06-30 | 1984-01-10 | Fujitsu Ltd | Manufacturing device of semiconductor |
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1977
- 1977-11-11 JP JP13465177A patent/JPS5468169A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5468169A (en) | 1979-06-01 |