JPS6159398B2 - - Google Patents

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Publication number
JPS6159398B2
JPS6159398B2 JP54142454A JP14245479A JPS6159398B2 JP S6159398 B2 JPS6159398 B2 JP S6159398B2 JP 54142454 A JP54142454 A JP 54142454A JP 14245479 A JP14245479 A JP 14245479A JP S6159398 B2 JPS6159398 B2 JP S6159398B2
Authority
JP
Japan
Prior art keywords
electrode
plating
mold
workpiece
control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54142454A
Other languages
Japanese (ja)
Other versions
JPS5665994A (en
Inventor
Kyoshi Inoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inoue Japax Research Inc
Original Assignee
Inoue Japax Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inoue Japax Research Inc filed Critical Inoue Japax Research Inc
Priority to JP14245479A priority Critical patent/JPS5665994A/en
Publication of JPS5665994A publication Critical patent/JPS5665994A/en
Publication of JPS6159398B2 publication Critical patent/JPS6159398B2/ja
Granted legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Description

【発明の詳細な説明】 本発明は電鋳型とか被メツキ加工体の加工部全
面に厚く均一なメツキ層を形成するためのメツキ
装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a plating device for forming a thick and uniform plating layer over the entire surface of a processed part of an electroforming mold or an object to be plated.

従来のメツキ加工は、メツキ液中において、型
もしくは被加工体と電極とを充分広い間隔で離隔
した状態で挿入し、被加工体の全面に電界強度を
作用させて1度にメツキするようにしていたゝ
め、被加工体表面に凹凸があるとき、凹部とかコ
ーナー部は電界強度が弱く電気的陰りが生じメツ
キ層が形成し難く、均一なメツキができなかつ
た。
In conventional plating, the mold or the workpiece is inserted into the plating solution with a sufficiently wide distance between the electrode and the workpiece, and the electric field strength is applied to the entire surface of the workpiece to plate the workpiece at once. Therefore, when there are irregularities on the surface of the workpiece, the electric field strength is weak in the recesses and corners, causing electrical shadowing, making it difficult to form a plating layer, and making uniform plating impossible.

本発明はこのため、面積の小さい電極で部分メ
ツキを行なわせ、NC制御とか倣制御装置を用い
て対向間隙の位置、間隔を制御しながら行ない、
又電極には振動装置を設けて振動させることによ
り安定した高密度の通電を維持してメツキし、更
に被加工体の加工面部分形状に対応して電極を選
択し交換しながらメツキを行ない、これにより型
もしくは被加工体の加工部全面に均一なメツキを
行なわせることを特徴とするものである。
For this reason, the present invention performs partial plating using an electrode with a small area, and performs plating while controlling the position and spacing of the facing gap using NC control or a copying control device.
In addition, a vibrating device is installed on the electrode to vibrate it, thereby maintaining stable and high-density current conduction, and plating is performed while selecting and replacing the electrode according to the shape of the machined surface of the workpiece. This is characterized in that uniform plating can be performed over the entire surface of the processed part of the mold or workpiece.

以下一実施例の図面により本発明を説明する
と、1はメツキ面に凹凸があつて均一メツキがむ
ずかしい電鋳用の型で、これに電極2を対向して
メツキする。電極は図の如く対向面積が小さく、
型1の凹部にも容易に挿入され狭い間隔で対向す
ることができる。3は電極2を取付支持する支持
体兼用の振動ホーンで、水晶等の振動子4によつ
て発生する振動を増大して電極2に作用する。こ
の振動子4、ホーン3、及び電極2は一体に固着
され、この一体の電極工具が形状寸法を異ならせ
たもの複数個が用意され、電極交換が行なえるよ
うにしてある。5は電極支持ヘツドで、例えば前
記一体の電極工具をマグネツトチヤツクで固着
し、互に直角なX軸、Y軸、及びZ軸に移動制御
でき、型1と電極2の対向間隙の位置と間隔の制
御が行なえる。6,7,8が各軸の駆動モータ
で、NC制御装置9により制御される。10はメ
ツキ液の供給ポンプで、ヘツド5からホーン3、
電極2を通して設けた噴流孔を通してメツキ液を
間隙に供給する。連通する液供給パイプ11には
〓〓〓〓〓
制御バルブ12が設けられ、このバルブ制御も前
記NC制御装置9によつて自動制御される。13
は型1を陰極、電極2を陽極とする極性で通電し
メツキ電流を供給する電源、通常パルス電源を利
用することによりメツキ効果を向上する。14は
電極2、ホーン3、及び振動子4の一体になつた
複数の電極工具2a,2b,2c……を保管する
回転板、15はマテハン装置で、いずれもNC制
御装置9によつて制御され、円板を回転し選択さ
れた電極工具をマテハン15の作動によりヘツド
5に固着されたものと交換が行なわれ、電極2の
形状、面積を型1のメツキ部分に対応させて選択
し交換して最良の電極を選んでメツキ加工を行な
うようにしている。
The present invention will be described below with reference to the drawings of one embodiment. Reference numeral 1 denotes an electroforming mold whose plating surface has irregularities and makes uniform plating difficult, and an electrode 2 is placed opposite the mold for plating. As shown in the figure, the facing area of the electrodes is small,
It can be easily inserted into the recess of the mold 1 and can be opposed to each other with a narrow interval. A vibration horn 3 serves as a support for mounting and supporting the electrode 2, and acts on the electrode 2 by increasing vibrations generated by a vibrator 4 such as crystal. The vibrator 4, the horn 3, and the electrode 2 are fixed together, and a plurality of integrated electrode tools with different shapes and dimensions are prepared so that the electrodes can be replaced. Reference numeral 5 denotes an electrode support head, which fixes the integral electrode tool with a magnetic chuck, and can control its movement in the mutually perpendicular X, Y, and Z axes, and controls the position of the opposing gap between the mold 1 and the electrode 2. You can control the interval. 6, 7, and 8 are drive motors for each axis, which are controlled by an NC control device 9. 10 is a plating liquid supply pump, which connects the head 5 to the horn 3;
The plating liquid is supplied to the gap through a jet hole provided through the electrode 2. The liquid supply pipe 11 that communicates with
A control valve 12 is provided, and this valve control is also automatically controlled by the NC control device 9. 13
The plating effect is improved by using a power source, usually a pulse power source, which supplies a plating current by applying current with polarity such that mold 1 is a cathode and electrode 2 is an anode. 14 is a rotary plate for storing a plurality of electrode tools 2a, 2b, 2c, etc. which are integrated with electrode 2, horn 3, and vibrator 4; 15 is a material handling device, both of which are controlled by NC control device 9; The disk is rotated and the selected electrode tool is replaced with the one fixed to the head 5 by the operation of the material handler 15, and the shape and area of the electrode 2 are selected to correspond to the plating part of the mold 1 and replaced. Then, we select the best electrode and perform the plating process.

保管された電極工具2a,2b,2c……には
先端電極が細いものから太いもの、又短いものか
ら長いものまで各種用意され、メツキしようとす
る型1の加工面形状に応じて溝部、凹部、角部等
を加工するときは細形電極を選択し、電極対向間
隙を狭めて電極陰り部分に能率の良いメツキを行
ない、金属析出によりそこを容易に埋めることが
できる。NC制御装置9によつてX,Y,Z軸の
モータ6,7,8の駆動制御をし、選択された電
極2を型1の加工部分の1部に0.5〜1mm程度以
下の微小間隙をもつて対向し、そこにポンプ10
から制御されたメツキ液を噴流し、電源13から
通電を行つてメツキする。メツキ加工中、電極2
には超音波等の振動が与えられ、微小間隙に新し
いメツキ液を多量に循環供給し、電極振動による
ポンプ作用、撹拌作用により発生ガス、分解物等
を容易に排除し洗浄でき、また陽極電極2の表面
に付着するイオン、酸化物等の不純物を排除し、
電極表面を常に活性状態に保つから、対向面積の
小さい細い電極2でも0.5〜5A/cm2程度の高電流
密度の通電が安定して継続でき、高密度の結晶の
緻密化した良質のメツキを高速度に行ない、また
電極振動による前記活性化状態を安定に維持しな
がら電極2移動により加工部分を徐々にメツキす
るから良質の均一メツキを端から端まで容易に行
なうことができる。型面形状に応じて形状、大き
さの最適な電極を選択しながら加工し、NC制御
装置9による移動走査を行ない、型1の加工面全
体に均一メツキを施すようにする。
The stored electrode tools 2a, 2b, 2c... are equipped with various types of tip electrodes, from thin to thick, and from short to long, and are used to create grooves and recesses depending on the shape of the machined surface of the mold 1 to be plated. When machining corners, etc., choose a thin electrode, narrow the gap between the facing electrodes, and efficiently plate the shadowed areas of the electrodes, making it easy to fill in the gaps with metal deposition. The drive of the motors 6, 7, and 8 for the X, Y, and Z axes is controlled by the NC control device 9, and the selected electrode 2 is placed in a part of the machining part of the mold 1 with a minute gap of about 0.5 to 1 mm or less. Pump 10 is placed opposite the pump.
A controlled plating liquid is jetted from the plating liquid, and electricity is supplied from the power source 13 to perform plating. Electrode 2 during plating processing
Vibration such as ultrasonic waves is applied to the electrode, and a large amount of new plating solution is circulated and supplied to the minute gap. Generated gases, decomposed products, etc. can be easily removed and cleaned by the pumping action and stirring action of the electrode vibration, and the anode electrode Eliminate impurities such as ions and oxides that adhere to the surface of 2.
Since the electrode surface is always kept in an active state, even with a thin electrode 2 with a small opposing area, a high current density of about 0.5 to 5 A/cm 2 can be stably and continuously passed, resulting in high quality plating with high density crystals. Since the process is performed at a high speed and the processed area is gradually plated by moving the electrode 2 while stably maintaining the activated state caused by electrode vibration, high-quality uniform plating can be easily achieved from end to end. Machining is carried out while selecting the optimal electrode shape and size according to the shape of the mold surface, and movement and scanning is performed by the NC control device 9, so that uniform plating is applied to the entire machining surface of the mold 1.

このような一通りのメツキ処理によつて型面凹
部等の電気的陰り部分が電着され埋められ、型面
がある程度平坦化したら、Z軸の制御によつて電
極2を後退させメツキ間隙を前よりも広げるよう
に制御し作用電界領域を広げて、同様に型面全体
に移動走査してメツキ加工を続けるようにする。
このときは既でに前記した型1の凹部が金属析出
により埋められて電気的陰り部分が無くなるか少
なくなつているので、間隙を広げて広い部分に亘
つてメツキすることにより全体に安定したメツキ
が進み、良質メツキが高速度に行なわれ、型1面
全体に所定の厚いメツキ層を形成し仕上けること
ができる。この型面凹部が析出金属により埋めら
れ電気的陰り部分が無くなつてからは広い面積の
電極に交換して加工することにより作用電界領域
を広げて加工できるから、場合によつてはNC制
御による移動走査を停止して加工することができ
る。
Through this series of plating processes, electrically dark areas such as concave parts of the mold surface are electrodeposited and filled, and once the mold surface is flattened to some extent, the electrode 2 is moved back by controlling the Z axis to close the plating gap. The electric field is controlled to be wider than before, and the working electric field area is expanded, and the plating process is continued by moving and scanning the entire mold surface in the same way.
At this time, the concave portion of the mold 1 described above has already been filled by metal deposition and the electrically shaded portion has disappeared or decreased, so by widening the gap and plating over a wide area, stable plating can be achieved over the whole. As the process progresses, high-quality plating is performed at high speed, and a predetermined thick plating layer can be formed and finished on the entire surface of the mold. After the concave part of the mold surface is filled with the deposited metal and the electrically shadowed part disappears, the working electric field area can be expanded by replacing the electrode with a larger area. Processing can be performed by stopping the moving scan.

なおNC制御装置9により電極工具2a,2
b,2c……の選択交換及びZ軸制御によりメツ
キ間隙を広げるための信号は所定のメツキステツ
プを完了する毎に段階的に行ない、制御信号はテ
ープに記録してあり、再生しながら各ステツプ制
御を進めるから全自動で目的とするメツキ、電鋳
加工を安定して容易に進めることができる。
Note that the NC control device 9 controls the electrode tools 2a, 2.
The signals for widening the plating gap by selective exchange of b, 2c, etc. and Z-axis control are carried out step by step every time a predetermined plating step is completed.The control signals are recorded on a tape, and each step is controlled during playback. Because the process proceeds fully automatically, the desired plating and electroforming processes can be carried out stably and easily.

また制御信号を発生して制御するNC制御装置
にマイコンを利用することができ、加工間隙の状
態を検出しながら対応制御でき、通電々流密度の
制御、メツキ液の流速、流量制御、電極振動の制
御等を適応制御することができる。又通電にパル
スを利用するとき、パルス巾、休止巾、周波数、
波高値等の制御も行なうことができ、電気条件を
常に最良状態に制御できる。
In addition, a microcomputer can be used in the NC control device that generates and controls control signals, and can perform corresponding control while detecting the state of the machining gap, controlling current density, plating liquid flow rate, flow rate control, and electrode vibration. can be adaptively controlled. Also, when using pulses for energization, the pulse width, pause width, frequency,
It is also possible to control the peak value, etc., and the electrical conditions can always be controlled to the best condition.

電極振動は最低50Hzから最高500KHz程度の振
動を利用し、また50〜500Hz程度の振動と1KHz以
上の超音波振動とを重畳させて振動させることが
できる。
The electrode vibration uses vibrations from a minimum of 50 Hz to a maximum of about 500 KHz, and can be made by superimposing vibrations of about 50 to 500 Hz and ultrasonic vibrations of 1 KHz or more.

また振動を断続制御して、振動の休止時間を設
けることにより変化を与えかえて安定メツキする
ことができ、電極の疲労を防止でき、細線状電極
の加工を可能とする等効果が大きい。電極には任
意の電極材が用いられるがPtメツキ等したものを
用いると耐消耗性の電極として利用できる。
In addition, by controlling the vibration intermittently and providing a rest period for the vibration, stable plating can be achieved by changing the vibration, and fatigue of the electrode can be prevented and thin wire-shaped electrodes can be processed. Any electrode material can be used for the electrode, but if one plated with Pt or the like is used, it can be used as a wear-resistant electrode.

メツキ液は図示しない加工部に対向するノズル
から噴流供給することができ、又従来のように型
〓〓〓〓〓
1及び電極をメツキ液中に浸漬した状態でメツキ
してもよい。メツキ間隙の位置、間隔の相対移動
は電極2を固定し型1を移動させて制御すること
ができ、また電極側及び型側に相対移動を分担さ
せることができる。
The plating liquid can be supplied in jet form from a nozzle facing the processing part (not shown), and the plating liquid can be supplied in a jet stream from a nozzle facing the processing part (not shown).
Plating may be performed while 1 and the electrode are immersed in a plating solution. Relative movement of the position and interval of the plating gap can be controlled by fixing the electrode 2 and moving the mold 1, or the relative movement can be shared between the electrode side and the mold side.

以上説明したように本発明は、陽極電極として
対向面積の小さい電極を設け、これを高周波振動
させながら型もしくは被加工体の一部に充分狭い
間隔で対向し、対向間隙の位置、間隔をNC制御
もしくは倣制御しながら、前記型もしくは被加工
体に全体に移動しながら順次メツキするようにし
たものであるから、常に高電流密度で良質のメツ
キが行なえ、又型若しくは被加工体の加工面部分
形状に対応して電極を選択し交換しながらメツキ
するようにしたので凹凸面の電気的陰り部分も均
一にメツキし、全体に均一なメツキを高速度に加
工でき、従来の広い対向面積の電極を型面と広い
間隔で対向して行なうものに比較して約2〜5倍
程度の高速メツキを可能にし、且つ活性化された
間隙、電極で、微小間隙で対向して高電流密度で
メツキしたことによりメツキ層の結晶が小さく伸
び率の高い良質のメツキ加工が行なえ、凹凸の大
きい、深い凹部を有する複雑な型面に、そして広
い面に良質の均一メツキができ、実用上極めて効
果の大きいものである。
As explained above, in the present invention, an electrode with a small facing area is provided as an anode electrode, and the electrode is vibrated at high frequency while facing a part of a mold or a workpiece at a sufficiently narrow interval, and the position and interval of the facing gap are adjusted by NC. Since the plating is carried out sequentially while moving over the entire surface of the mold or workpiece under control or copying control, high-quality plating can always be performed with high current density, and the machined surface of the mold or workpiece can be plated at high current density. Since the electrodes are selected and replaced according to the shape of the part, the electrically shaded areas on uneven surfaces can be evenly plated, and the entire surface can be plated uniformly at high speed. It enables high-speed plating that is about 2 to 5 times faster than when the electrodes face the mold surface with a wide gap, and the activated gap and electrodes face each other with a small gap and generate high current density. By plating, it is possible to perform high-quality plating with small crystals in the plating layer and high elongation rate, and it is possible to perform high-quality uniform plating on a complex mold surface with large irregularities and deep concave parts, and on a wide surface, which is extremely effective in practical terms. This is a large one.

メツキ、電鋳にはNi,Cr,Cu,Au,Pt,その
他の任意の材料メツキが有効に行なえる効果があ
る。
Plating and electroforming have the effect of effectively plating Ni, Cr, Cu, Au, Pt, and other arbitrary materials.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本発明の一実施例装置の構成図である。
1は型、2は電極、4は振動子、5はヘツド、
6,7,8は駆動モータ、9はNC制御装置、1
0はポンプ、12はバルブ、13は電源、14は
円板、15はマテハン装置、2a,2b,2c…
…は電極工具である。 〓〓〓〓〓
The drawing is a configuration diagram of an apparatus according to an embodiment of the present invention.
1 is the mold, 2 is the electrode, 4 is the vibrator, 5 is the head,
6, 7, 8 are drive motors, 9 is an NC control device, 1
0 is a pump, 12 is a valve, 13 is a power supply, 14 is a disc, 15 is a material handling device, 2a, 2b, 2c...
... is an electrode tool. 〓〓〓〓〓

Claims (1)

【特許請求の範囲】[Claims] 1 槽内メツキ液中に挿入した型若しくは被加工
体と電極とのメツキ液を介在させた状態で前記電
極を陽極とする極性で通電することにより陰極の
前記型若しくは被加工体にメツキする装置に於
て、前記電極として対向面積の小さい電極を設
け、該電極に振動を作用する振動装置を設け、該
振動する電極を前記型若しくは被加工体の一部に
充分狭い間隔で対向した対向間隙の位置又は位置
と間隔をNC制御若しくは倣制御する制御装置を
設け、更に前記型若しくは被加工体の加工面部分
形状に対応して電極を選択交換する電極自動交換
装置を設け、前記型若しくは被加工体の加工部分
全体にかげりのない均一メツキを行なわせること
を特徴とする電気メツキ装置。
1. A device for plating the mold or workpiece with a cathode by applying current with polarity such that the electrode serves as an anode with the electrode interposed between the mold or workpiece inserted in a plating solution in a tank and the electrode. In this method, an electrode with a small facing area is provided as the electrode, a vibration device is provided to apply vibration to the electrode, and the vibrating electrode is placed in a facing gap facing a part of the mold or workpiece at a sufficiently narrow interval. A control device for NC control or copying control of the position or position and interval of the mold or workpiece is provided, and an automatic electrode exchange device for selectively replacing the electrode according to the shape of the machined surface of the mold or workpiece is provided. An electroplating device that is capable of uniformly plating the entire processed portion of a workpiece without shadowing.
JP14245479A 1979-11-01 1979-11-01 Electroplating device Granted JPS5665994A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14245479A JPS5665994A (en) 1979-11-01 1979-11-01 Electroplating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14245479A JPS5665994A (en) 1979-11-01 1979-11-01 Electroplating device

Publications (2)

Publication Number Publication Date
JPS5665994A JPS5665994A (en) 1981-06-04
JPS6159398B2 true JPS6159398B2 (en) 1986-12-16

Family

ID=15315681

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14245479A Granted JPS5665994A (en) 1979-11-01 1979-11-01 Electroplating device

Country Status (1)

Country Link
JP (1) JPS5665994A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05271998A (en) * 1992-03-30 1993-10-19 Seiko Instr Inc Microfabrication device
JPH06256998A (en) * 1993-03-05 1994-09-13 Shimada Phys & Chem Ind Co Ltd Agitation method of plating solution

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51124634A (en) * 1975-04-24 1976-10-30 Inoue Japax Res Method of processing by electrodeposition and apparatus therefor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51124634A (en) * 1975-04-24 1976-10-30 Inoue Japax Res Method of processing by electrodeposition and apparatus therefor

Also Published As

Publication number Publication date
JPS5665994A (en) 1981-06-04

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