JPS6115958B2 - - Google Patents
Info
- Publication number
- JPS6115958B2 JPS6115958B2 JP56007352A JP735281A JPS6115958B2 JP S6115958 B2 JPS6115958 B2 JP S6115958B2 JP 56007352 A JP56007352 A JP 56007352A JP 735281 A JP735281 A JP 735281A JP S6115958 B2 JPS6115958 B2 JP S6115958B2
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- machining
- processing
- electrolytic
- supplied
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000003754 machining Methods 0.000 claims description 19
- 239000011159 matrix material Substances 0.000 claims description 12
- 239000008151 electrolyte solution Substances 0.000 claims description 11
- 239000011261 inert gas Substances 0.000 claims description 10
- 230000007797 corrosion Effects 0.000 claims description 8
- 238000005260 corrosion Methods 0.000 claims description 8
- 239000003792 electrolyte Substances 0.000 claims description 8
- 238000004070 electrodeposition Methods 0.000 claims description 5
- 230000005611 electricity Effects 0.000 claims description 3
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000005323 electroforming Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 230000001154 acute effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Electroplating Methods And Accessories (AREA)
Description
【発明の詳細な説明】
本発明は、電鋳、めつき等の電着加工或いは電
解食彫、電解研摩等の電食加工を行なう電解加工
装置の改良に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in an electrolytic processing apparatus for performing electroplating processing such as electroforming and plating, or electrolytic corrosion processing such as electrolytic engraving and electrolytic polishing.
被加工体若しくは母型の加工面にノズル電極を
対向配置し、電解液を噴射供給しながら通電して
電食若しくは電着し、前記電極を被加工体若しく
は母型の加工面を走査移動させて加工面全面の電
食、電着加工を行なうようにした装置は従来から
公知である。このような従来装置によれば、電極
に細い棒状のノズル電極を用いて任意の形状加工
を容易に行なうことができるが、加工された表面
が酸化し酸化被膜が形成されて、繰返し加圧が阻
害されたり、供給された電解液が加工不要部分或
いは既加工部分に滞溜し、そこに電解電流が流れ
て加工が行なわれ、加工精度を損う欠点がある。 Nozzle electrodes are arranged opposite to the machined surface of the workpiece or the matrix, and electricity is applied while spraying and supplying electrolytic solution to cause electrolytic corrosion or electrodeposition, and the electrodes are moved to scan the machined surface of the workpiece or the matrix. A device which performs electrolytic corrosion and electrodeposition processing on the entire surface to be processed is conventionally known. According to such conventional devices, it is possible to easily process any shape by using a thin rod-shaped nozzle electrode, but the processed surface oxidizes and an oxide film is formed, and repeated pressurization can cause problems. If the electrolytic solution is blocked or the supplied electrolytic solution accumulates in a part that does not need to be processed or a part that has already been processed, the electrolytic current flows there and performs the process, which impairs the accuracy of the process.
本発明は、このような従来装置の有する欠点を
除去することを目的として提案されたものであ
り、排気ポンプ及び不活性気体供給装置を具備す
る密閉タンクと、該タンク内に被加工体若しくは
母型を傾斜させて固定支持する支持装置を設ける
ことにより、該タンク内の不活性ガス雰囲気に於
て、噴射供給した電解液が流下して被加工体や母
型のどこにも溜らない状態で加工を行なうように
したことを特徴とするものである。 The present invention has been proposed with the aim of eliminating the drawbacks of the conventional apparatus, and includes a closed tank equipped with an exhaust pump and an inert gas supply device, and a workpiece or mother plate in the tank. By providing a support device that tilts and supports the mold in a fixed manner, processing can be performed without the injected electrolyte flowing down and accumulating anywhere on the workpiece or the mother mold in an inert gas atmosphere inside the tank. It is characterized by the fact that it performs the following.
以下、図面の実施例により本発明を説明する。 The present invention will be explained below with reference to embodiments of the drawings.
第1図は、所要形状を有する被加工体(母型)
の加工面全面に電食(電着)加工を施す実施例を
示すものであり、1が被加工体(母型)で、支持
装置2により加工面1aが横向きになるように傾
斜して固定支持される。3は被加工体(母型)の
加工面1aに対向して配置される棒状のノズル電
極で、対向方向のZ軸4の先端に固定され、Z軸
4は対向方向と直交するX軸5及び紙面に垂直な
Y軸(図示せず)方向に郁動するヘツド6に支持
されている。7はZ軸送り用モータ、8はX軸送
り用モータであり、Y軸送り用モータは図示され
ていない。Z軸送り用モータ7にはモデル9を倣
移動するスタイラス10からの検出信号が加えら
れ、電極3が加工面1aと常に一定間隙を維持し
て対向するように追従送りされる。11は電解液
供給ポンプであり、接続パイプ12を通して電極
ノズル3に電解液が供給される。13は電極3と
被加工体(母型)1間に通電する加工用電源、1
4は被加工体(母型)1を収納する密閉タンク
で、排気ポンプ15及び不活性ガス供給装置16
が設けられている。 Figure 1 shows the workpiece (matrix) having the required shape.
This shows an example in which electrolytic corrosion (electrodeposition) is applied to the entire processed surface of a workpiece, in which 1 is a workpiece (matrix), which is tilted and fixed by a support device 2 so that the processed surface 1a faces sideways. Supported. Reference numeral 3 denotes a rod-shaped nozzle electrode disposed opposite to the processing surface 1a of the workpiece (matrix), and is fixed to the tip of the Z-axis 4 in the opposing direction, and the Z-axis 4 is connected to the X-axis 5 perpendicular to the opposing direction. and a head 6 that moves in the Y-axis (not shown) direction perpendicular to the plane of the paper. 7 is a Z-axis feed motor, 8 is an X-axis feed motor, and the Y-axis feed motor is not shown. A detection signal from a stylus 10 that moves the model 9 along the model 9 is applied to the Z-axis feed motor 7, and the electrode 3 is fed so as to face the machined surface 1a with a constant gap maintained at all times. Reference numeral 11 denotes an electrolyte supply pump, which supplies electrolyte to the electrode nozzle 3 through a connecting pipe 12. 13 is a processing power supply that supplies current between the electrode 3 and the workpiece (matrix) 1;
4 is a sealed tank that houses the workpiece (matrix) 1, and is equipped with an exhaust pump 15 and an inert gas supply device 16.
is provided.
しかして、加工面の酸化を防止して安定した加
工を行なうためにN2,Ar,CO2………等の不活
性ガスの雰囲気中で加工を行ない、タンク14内
を排気ポンプ15により適宜真空排気して後、ボ
ンベ16のコツクを開いて不活性ガスを供給して
タンク14内に充填する。このようにして形成さ
れる不活性ガス雰囲気中に於て、ノズル電極3か
ら所要の電解液を加工面1aに向けて噴射供給し
ながら、加工用電源13より通電して電食(電
着)加工を行なう。 Therefore, in order to prevent oxidation of the processed surface and perform stable processing, processing is performed in an atmosphere of an inert gas such as N 2 , Ar, CO 2 , etc. After evacuation, the tank 16 is opened and inert gas is supplied to fill the tank 14. In the inert gas atmosphere thus formed, the required electrolytic solution is injected and supplied from the nozzle electrode 3 toward the processing surface 1a, and electricity is applied from the processing power source 13 to cause electrolytic corrosion (electrodeposition). Perform processing.
このとき、被加工体(母型)1は支持装置2に
より加工面1aが横向きになるように傾斜して固
定されているため、ノズル電極3から噴射供給さ
れる電解液は加工面1aに滞溜することなく流下
する。従つて加工電流は加工面1aのノズル電極
3と対向する狭い部分に集中的に流れることによ
り、他の部分への電流の漏洩を防止若しくは減少
することができ、この結果、漏洩電流による不必
要な加工を防止して、精度の良い加工を行なうこ
とができる。 At this time, the workpiece (matrix) 1 is tilted and fixed by the support device 2 so that the processing surface 1a is oriented sideways, so the electrolyte sprayed and supplied from the nozzle electrode 3 stays on the processing surface 1a. Flows down without accumulating. Therefore, the machining current flows intensively to the narrow portion of the machining surface 1a facing the nozzle electrode 3, thereby preventing or reducing current leakage to other portions. It is possible to prevent undesirable machining and perform highly accurate machining.
電極3をNC制御又は倣制御装置によつて加工
面1aの全面を隈なく移動させ、対向する狭い部
分を集中的に順次加工することにより、全体的に
高精度の加工を行なうことができ、又、タンク1
4内を不活性ガス雰囲気としてあることにより、
加工面1aの表面の酸化や電着層の酸化が起るこ
とがなく、安定した精度の良い加工を高速度に行
なうことができる。又、電解液を加工部に噴射さ
せて供給すると、電解液が加工装置の周辺に飛散
する虞れがあるが、本発明では加工が密閉タンク
内で行なわれるため、飛散する電解液によつて作
業環境が汚染されることもない。 By moving the electrode 3 over the entire surface of the machining surface 1a using NC control or a copying control device and sequentially machining opposing narrow areas intensively, it is possible to perform highly accurate machining as a whole. Also, tank 1
By creating an inert gas atmosphere inside 4,
No oxidation of the surface of the processed surface 1a or oxidation of the electrodeposited layer occurs, and stable and highly accurate processing can be performed at high speed. Furthermore, if the electrolytic solution is sprayed and supplied to the processing section, there is a risk that the electrolytic solution will scatter around the processing equipment, but in the present invention, processing is performed in a closed tank, so there is a risk that the electrolytic solution will be sprayed and supplied. The work environment will not be contaminated.
尚、ノズルから噴射させる電解液の圧力は、充
分な量の電解液を加工間隙に供給するために少な
くとも5Kg/cm2以上の圧力で噴射させることが望
ましい。 Note that the pressure of the electrolytic solution injected from the nozzle is preferably at least 5 kg/cm 2 or more in order to supply a sufficient amount of the electrolytic solution to the processing gap.
第2図は、被加工体(母型)1を横向きよりも
更に鋭角に傾斜させて固定支持した場合を示す実
施例で、この場合は噴射供給される電解液が一層
流下し易くなり流下速度も増大し、加工面の電極
と対向する狭い部分だけがより一層集中的に加工
され、漏洩電流による不必要な加工が防止される
ため、加工精度を高める上で効果が大きい。 Figure 2 shows an example in which the workpiece (matrix) 1 is fixedly supported at a more acute angle than horizontally. In this case, only the narrow portion of the processing surface facing the electrode is processed more intensively, and unnecessary processing due to leakage current is prevented, which is highly effective in improving processing accuracy.
以上のように本発明は、電鋳等の電着や電解食
彫等の電食加工を行なう装置に於て、不活性ガス
が供給充填される密閉タンク内に、被加工体若し
くは母型を供給電解液が溜らない向きに傾斜させ
て固定支持し、加工面と棒状電極との対向間隙に
電解液を噴射供給すると共に、加工面に対して棒
状電極を所定の間隙を維持した状態で相対的に移
動させながら加工するようにしたことにより、加
工の進行を阻害する酸化被膜の形成が防止され、
加工面が常に活性化された状態に保持されるた
め、加工を能率良く高速度に行なうことができ、
加工面に対する棒状電極の走査移動を繰返して、
電着層を積層させる加工や電食による除去加工を
順次深部に進行させる加工も容易に高速度に行な
うことができる。 As described above, the present invention provides an apparatus for performing electroplating such as electroforming or electrolytic corrosion processing such as electrolytic etching engraving, in which a workpiece or a matrix is placed in a sealed tank filled with an inert gas. The supplied electrolyte is tilted and fixedly supported in a direction that prevents it from accumulating, and the electrolyte is sprayed and supplied to the facing gap between the machined surface and the rod-shaped electrode, and the rod-shaped electrode is held relative to the machined surface while maintaining a predetermined gap. By moving the material while processing, the formation of an oxide film that inhibits the progress of processing is prevented.
Since the machining surface is always maintained in an activated state, machining can be performed efficiently and at high speed.
By repeating the scanning movement of the rod-shaped electrode against the processing surface,
The process of stacking electrodeposited layers and the process of removing them by electrolytic corrosion can be easily performed at high speed.
又、電解液が加工面等に滞溜することがないた
め、漏洩電流による不必要な加工を防止して精度
の良い加工を行なうことができる。従つて、本発
明によれば、精度の良い加工を高速度に行なうこ
とができ、又、加工が密閉タンク内で行なわれる
ため、噴射供給される電解液が加工装置の周辺に
飛散して作業環境を汚染することがなく、環境保
全上も効果が大きい。 Further, since the electrolytic solution does not accumulate on the machining surface or the like, unnecessary machining due to leakage current can be prevented and highly accurate machining can be performed. Therefore, according to the present invention, highly accurate machining can be performed at high speed, and since the machining is performed in a closed tank, the electrolyte that is sprayed and supplied is scattered around the machining equipment, causing damage to the work. It does not pollute the environment and is highly effective in terms of environmental conservation.
第1図は本発明の一実施例構成図、第2図は他
の実施例構成図である。
1………被加工体(母型)、1a………加工
面、2………支持装置、3………棒状電極、4…
……Z軸、5………X軸、6………ヘツド、7,
8………モータ、9………モデル、10………ス
タイラス、11………ポンプ、12………パイ
プ、13………加工電源、14………密閉タン
ク、15………排気ポンプ、16………不活性ガ
ス供給装置。
FIG. 1 is a block diagram of one embodiment of the present invention, and FIG. 2 is a block diagram of another embodiment. DESCRIPTION OF SYMBOLS 1... Workpiece (matrix), 1a... Machining surface, 2... Support device, 3... Rod-shaped electrode, 4...
...Z-axis, 5...X-axis, 6...Head, 7,
8...Motor, 9...Model, 10...Stylus, 11...Pump, 12...Pipe, 13...Processing power supply, 14...Sealed tank, 15...Exhaust pump , 16...Inert gas supply device.
Claims (1)
介して棒状電極を対向配置し、前記間隙部位に電
解液を噴射供給すると共に通電して電食若しくは
電着加工を行なう電解加工装置に於て、排気ポン
プ及び不活性気体供給装置を具備する密閉タンク
を設け、該タンク内に前記被加工体若しくは母型
を噴射供給される電解液が溜らない向きに傾斜さ
せて固定支持する支持装置を設け、前記被加工体
若しくは母型と前記棒状電極とを所定の間隙を維
持した状態で相対的に移動させる移動装置を設け
て成る電解加工装置。1. In an electrolytic machining device in which rod-shaped electrodes are arranged opposite to the machining surface of a workpiece or a matrix with a small gap therebetween, and an electrolytic solution is sprayed and supplied to the gap site, and electricity is applied to perform electrolytic corrosion or electrodeposition machining. A closed tank equipped with an exhaust pump and an inert gas supply device is provided, and a support device is provided in the tank to fixedly support the workpiece or the mother mold while tilting it in a direction in which the electrolyte supplied by injection does not accumulate. An electrolytic processing apparatus comprising: a moving device for relatively moving the workpiece or master mold and the rod-shaped electrode while maintaining a predetermined gap therebetween.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56007352A JPS57120692A (en) | 1981-01-20 | 1981-01-20 | Electrolytic working device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56007352A JPS57120692A (en) | 1981-01-20 | 1981-01-20 | Electrolytic working device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57120692A JPS57120692A (en) | 1982-07-27 |
JPS6115958B2 true JPS6115958B2 (en) | 1986-04-26 |
Family
ID=11663555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56007352A Granted JPS57120692A (en) | 1981-01-20 | 1981-01-20 | Electrolytic working device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57120692A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1991012918A1 (en) * | 1990-03-01 | 1991-09-05 | Shizuoka Seiki Co., Ltd. | Electrolytic finishing method |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5641391A (en) * | 1995-05-15 | 1997-06-24 | Hunter; Ian W. | Three dimensional microfabrication by localized electrodeposition and etching |
JP5871262B2 (en) * | 2011-11-22 | 2016-03-01 | 国立大学法人 東京大学 | Electrolyte jet machining apparatus and electrolyte jet machining method |
CN103276413A (en) * | 2013-06-08 | 2013-09-04 | 苏州市金翔钛设备有限公司 | Electroforming apparatus for large aspect ratio microgroove screen plate |
-
1981
- 1981-01-20 JP JP56007352A patent/JPS57120692A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1991012918A1 (en) * | 1990-03-01 | 1991-09-05 | Shizuoka Seiki Co., Ltd. | Electrolytic finishing method |
Also Published As
Publication number | Publication date |
---|---|
JPS57120692A (en) | 1982-07-27 |
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