JPS57120692A - Electrolytic working device - Google Patents

Electrolytic working device

Info

Publication number
JPS57120692A
JPS57120692A JP56007352A JP735281A JPS57120692A JP S57120692 A JPS57120692 A JP S57120692A JP 56007352 A JP56007352 A JP 56007352A JP 735281 A JP735281 A JP 735281A JP S57120692 A JPS57120692 A JP S57120692A
Authority
JP
Japan
Prior art keywords
working
electrolyte
head
work
electrodeposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56007352A
Other languages
Japanese (ja)
Other versions
JPS6115958B2 (en
Inventor
Kiyoshi Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INOUE JAPAX KENKYUSHO KK
Inoue Japax Research Inc
Original Assignee
INOUE JAPAX KENKYUSHO KK
Inoue Japax Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INOUE JAPAX KENKYUSHO KK, Inoue Japax Research Inc filed Critical INOUE JAPAX KENKYUSHO KK
Priority to JP56007352A priority Critical patent/JPS57120692A/en
Publication of JPS57120692A publication Critical patent/JPS57120692A/en
Publication of JPS6115958B2 publication Critical patent/JPS6115958B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating

Abstract

PURPOSE: To improve the accuracy of working in spraying electrolyte, conducting electricity and performing electoetching and electrodeposition working, by installing the work upright to prevent stagnation of the electrolyte in the work.
CONSTITUTION: A blank to be worked 1 is put in a sealed tank 14, and after the inside is evacuated with a pump 15, an inert gas such as N2 or Ar is introduced therein. The movement of a head 6 mounted with a nozzle electrode 3 is controlled by the signal emitted by the copying movement of a model 9 with a stylus 10, whereby the head is moved to the pattern similar to that of the model 9. While at this time electrolyte is injected from the nozzle electrode 3 at the leading end of the head 6, electricity is conducted with an electric power source 13 between the electrolyte and the work 1, whereby electroetching and electrodeposition working are accomplished. Since the blank 1 is supported upright, the electrolyte flows down immediately without stagnating on the working surface and therefore it is possible to perform electroetching and electrodeposition working with high accuracy of working while moving and scanning the nozzle electrode 3 over the entire working surface.
COPYRIGHT: (C)1982,JPO&Japio
JP56007352A 1981-01-20 1981-01-20 Electrolytic working device Granted JPS57120692A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56007352A JPS57120692A (en) 1981-01-20 1981-01-20 Electrolytic working device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56007352A JPS57120692A (en) 1981-01-20 1981-01-20 Electrolytic working device

Publications (2)

Publication Number Publication Date
JPS57120692A true JPS57120692A (en) 1982-07-27
JPS6115958B2 JPS6115958B2 (en) 1986-04-26

Family

ID=11663555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56007352A Granted JPS57120692A (en) 1981-01-20 1981-01-20 Electrolytic working device

Country Status (1)

Country Link
JP (1) JPS57120692A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5641391A (en) * 1995-05-15 1997-06-24 Hunter; Ian W. Three dimensional microfabrication by localized electrodeposition and etching
WO2013077308A1 (en) * 2011-11-22 2013-05-30 国立大学法人東京大学 Electrolyte jet processing device and electrolyte jet processing method
CN103276413A (en) * 2013-06-08 2013-09-04 苏州市金翔钛设备有限公司 Electroforming apparatus for large aspect ratio microgroove screen plate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03251315A (en) * 1990-03-01 1991-11-08 Shizuoka Seiki Co Ltd Control method for electrode position in electrolytic finishing

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5641391A (en) * 1995-05-15 1997-06-24 Hunter; Ian W. Three dimensional microfabrication by localized electrodeposition and etching
WO2013077308A1 (en) * 2011-11-22 2013-05-30 国立大学法人東京大学 Electrolyte jet processing device and electrolyte jet processing method
JP2013108139A (en) * 2011-11-22 2013-06-06 Univ Of Tokyo Electrolyte jet processing device and electrolyte jet processing method
CN103276413A (en) * 2013-06-08 2013-09-04 苏州市金翔钛设备有限公司 Electroforming apparatus for large aspect ratio microgroove screen plate

Also Published As

Publication number Publication date
JPS6115958B2 (en) 1986-04-26

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