JPS6158281A - Photo coupler - Google Patents
Photo couplerInfo
- Publication number
- JPS6158281A JPS6158281A JP59182084A JP18208484A JPS6158281A JP S6158281 A JPS6158281 A JP S6158281A JP 59182084 A JP59182084 A JP 59182084A JP 18208484 A JP18208484 A JP 18208484A JP S6158281 A JPS6158281 A JP S6158281A
- Authority
- JP
- Japan
- Prior art keywords
- light
- chip
- photodiode
- photo diode
- epitaxial layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001514 detection method Methods 0.000 claims abstract description 7
- 239000000758 substrate Substances 0.000 abstract description 8
- 238000009792 diffusion process Methods 0.000 abstract description 7
- 239000002184 metal Substances 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 4
- 230000035945 sensitivity Effects 0.000 abstract description 4
- 238000002955 isolation Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- RNNBHZYEKNHLKT-UHFFFAOYSA-N isopropylmethylpyrazolyl dimethylcarbamate Chemical compound CC(C)N1N=C(C)C=C1OC(=O)N(C)C RNNBHZYEKNHLKT-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- NBJBFKVCPBJQMR-APKOLTMOSA-N nff 1 Chemical compound C([C@H](NC(=O)[C@H](CCC(N)=O)NC(=O)[C@H](CCC(N)=O)NC(=O)[C@@H]1CCCN1C(=O)[C@H](CCCCN)NC(=O)[C@@H]1CCCN1C(=O)CC=1C2=CC=C(C=C2OC(=O)C=1)OC)C(=O)N[C@@H](CC=1C=CC=CC=1)C(=O)NCC(=O)N[C@@H](CC(C)C)C(=O)N[C@@H](CCCCNC=1C(=CC(=CC=1)[N+]([O-])=O)[N+]([O-])=O)C(=O)NCC(O)=O)C1=CC=CC=C1 NBJBFKVCPBJQMR-APKOLTMOSA-N 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/103—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PN homojunction type
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Light Receiving Elements (AREA)
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
Abstract
Description
【発明の詳細な説明】
く技術分野〉
本発明は特に高速応答を要求されるホトカプラの受光チ
ップの構造の改良に関するものである。DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to an improvement in the structure of a photo-receiving chip of a photocoupler, which particularly requires high-speed response.
〈従来技術〉
従来、ホトカプラは発光素子と受光素子の組み合わせに
よって構成され、パルストランスに替わる信号インター
フェイス用の素子として発展してきた。又、近年のマイ
コンの普及によりその用途は拡大し、高速応答、低電流
、駆動の機能が要求されている〇
一般にホトカプラにおける受光素子の光電流はDrif
t成分とDifusion成分からなる。受光素子とし
てホトダイオードを使った場合の充電流応答特性を第2
図に示す。同図(a)が発光素子に印加される駆動パル
ス、同図(b)が受光素子の充電流波形である。ここで
、低電流駆動(すなわち、高感度)の高速応答が要求さ
れるホトカプラにおいては第2図(b)のDifusi
on成分である寿命時間の長い光電流が応答特性の遅れ
の原因となる。第3図は従来の受光素子(ホトダイオー
ド)の構造を示す。<Prior Art> Conventionally, a photocoupler is constructed by a combination of a light emitting element and a light receiving element, and has been developed as a signal interface element in place of a pulse transformer. In addition, with the spread of microcontrollers in recent years, their uses have expanded, and high-speed response, low current, and drive functions are required. In general, the photocurrent of the photodetector in a photocoupler is Drift.
It consists of a t component and a diffusion component. The charging current response characteristics when using a photodiode as a light receiving element are shown in the second section.
As shown in the figure. FIG. 4(a) shows a driving pulse applied to the light emitting element, and FIG. 1(b) shows the charging flow waveform of the light receiving element. Here, in a photocoupler that requires low current drive (that is, high sensitivity) and high-speed response, the Diffusi
The photocurrent, which is the ON component and has a long lifetime, causes a delay in response characteristics. FIG. 3 shows the structure of a conventional light receiving element (photodiode).
同図において1はP型基板、2はN型エピタキシャル層
、3はPアイソレーシヲン層、4は透明な絶縁層である
。この構造においては、ホトダイオード周辺部において
多くのDifusion成分の光電流を発生させる光子
を遮断する手段をもっていない。一方、第4図は前面光
に対しチップ周辺部にメタル等により遮光手段5を設け
て上記欠点をカバーしたホトダイオードの構造を示す。In the figure, 1 is a P type substrate, 2 is an N type epitaxial layer, 3 is a P isolation layer, and 4 is a transparent insulating layer. This structure does not have a means for blocking photons that generate many diffusion component photocurrents in the peripheral area of the photodiode. On the other hand, FIG. 4 shows the structure of a photodiode in which a light shielding means 5 made of metal or the like is provided at the periphery of the chip against front light to cover the above-mentioned drawbacks.
しかし、第4図の構造のものにおいても、ホトダイオー
ドを半導体テップエツジに隣接して配置した構造を採用
する場合、チップ側面に照射された光による光子をひろ
う為にDifusion成分の光電流を遮断することが
できなかった。この問題を解決する為には、チップの側
面壁にAgペースト等の遮光材料を配置する等の方法が
考えられるが、材料費のアップ、製造工数のアンプある
いは歩留まりの低下等の要因があり、コスト高につなが
ってしまう。However, even in the structure shown in Fig. 4, if a structure in which the photodiode is placed adjacent to the semiconductor chip edge is adopted, the photocurrent of the diffusion component must be blocked to collect photons from the light irradiated on the side of the chip. I couldn't do it. In order to solve this problem, methods such as placing a light-shielding material such as Ag paste on the side walls of the chip can be considered, but this increases material costs, increases manufacturing man-hours, and reduces yield. This will lead to higher costs.
く目 的〉
本発明は上記欠点を解消する為になされたものであシ、
チップ側面よシ光子をひろい発生したDifusion
成分の光電流を信号検出用ホトダイオードに影響しない
ようにした構造を提案するものである。Purpose> The present invention has been made in order to eliminate the above-mentioned drawbacks.
Diffusion generated by spreading photons from the side of the chip
This paper proposes a structure in which the component photocurrent does not affect the signal detection photodiode.
〈実施例〉
第1図は本発明に係るホトカプラの一実施例の受光素子
の構造を示すもので同図(a)は一部側断面図、同図(
b)は一部平面図を示す。同図において1はP型基板、
2はNWエピタキシャル層、3はP+アイソレージコン
層、4は透明な絶縁層である。<Embodiment> FIG. 1 shows the structure of a light receiving element of an embodiment of the photocoupler according to the present invention, and FIG.
b) shows a partial plan view. In the figure, 1 is a P-type substrate;
2 is an NW epitaxial layer, 3 is a P+ isolator layer, and 4 is a transparent insulating layer.
6はチップの周辺部に設けられたN型エピタキシャル層
であシ、上記P型基板1とN型エピタキシャル層2との
PN接合からなる信号検出用の第1のホトダイオードと
は別個に、上記P型基板1及びPアイソレーン4フ層3
とN型エピタキシャル層6とのPN接合からなる第2の
ホトダイオードが形成される。7はメタル等による遮光
手段であシ、該遮光手段7によシ前面からの光によるD
ifusion成分を防止している。Reference numeral 6 denotes an N-type epitaxial layer provided at the periphery of the chip. Type substrate 1 and P isolane 4 layer 3
A second photodiode is formed by a PN junction between the N-type epitaxial layer 6 and the N-type epitaxial layer 6. Reference numeral 7 is a light shielding means made of metal or the like, and the light shielding means 7 prevents light from entering from the front.
Prevents ifusion components.
第5図に以上の受光素子の等何回路を示す。同図に示す
如く信号検出用の第1のホトダイオード8とは別個に第
2のホトダイオード9が形成され、該第2のホトダイオ
ード9のアノード及びカソードは基板電位(アース)と
している。この構造の為にはエミッタ拡散(N )とア
ース配線メタルとのコンタクトを取ればよい。FIG. 5 shows an equivalent circuit of the above light receiving element. As shown in the figure, a second photodiode 9 is formed separately from the first photodiode 8 for signal detection, and the anode and cathode of the second photodiode 9 are set at a substrate potential (ground). For this structure, it is sufficient to make contact between the emitter diffusion (N2) and the ground wiring metal.
以上の構造の受光素子においてチップ側面に照射された
光によって励起された光電流は第1のホトダイオード8
に到達することなく、第2のホトダイオード9により吸
収されてしまう。すなわち、チップ側面からのDifu
sion成分は第1のホトダイオード8の出力に影響し
なくなる。つtb前面光に対しては、メタル等による遮
光手段7を用い、側面光に対しては第2のホトダイオー
ド9による吸収手段を用いることにより、光電流のDi
fusion成分を極力おさえることが可能となる0第
6図に以上の受光素子を組み込んでなるホト−カプラの
構造を示す。同図(a)は平面図、同図(b)は側断面
図、同図(c)は正面断面図である。10は赤外発光ダ
イオードチップ、11は受光素子チップであり、これら
は同一平面上に設置される011aは受光素子チップ1
1内に設けられた信号検出用の第1のホトダイオードで
あり、llbは上記赤外発光ダイオードチップ10と第
1のホトダイオードllaの間に配置され、チップ側面
からのDifusion成分の混入を防止する為の第2
のホトダイオードである。又12は透光性樹脂、13は
ヒートシンクである。尚、受光素子チップ11はホトダ
イ−オードと、増幅・波形整形等の信号処理回路を1チ
ツプに集積化した素子(OPIC化受光床受光素子る。In the photodetector having the above structure, the photocurrent excited by the light irradiated onto the side surface of the chip is transferred to the first photodiode 8.
It is absorbed by the second photodiode 9 without reaching . In other words, Difu from the side of the chip
sion component no longer influences the output of the first photodiode 8. For the front light, a light shielding means 7 made of metal or the like is used, and for the side light, the second photodiode 9 is used as an absorption means.
FIG. 6 shows the structure of a photocoupler incorporating the above-mentioned light receiving element. 3(a) is a plan view, FIG. 2(b) is a side sectional view, and FIG. 4(c) is a front sectional view. 10 is an infrared light emitting diode chip, 11 is a light receiving element chip, and these are installed on the same plane. 011a is the light receiving element chip 1.
llb is a first photodiode for signal detection provided in the infrared light emitting diode chip 10 and the first photodiode lla, and llb is arranged between the infrared light emitting diode chip 10 and the first photodiode lla to prevent diffusion components from entering from the side of the chip. the second of
photodiode. Further, 12 is a transparent resin, and 13 is a heat sink. The light-receiving element chip 11 is an element (OPIC-based light-receiving floor light-receiving element) in which a photodiode and a signal processing circuit such as amplification and waveform shaping are integrated into one chip.
同図の如き赤外発光ダイオードチップ10と受光素子チ
ップ11とが同一平面上に設置される構造のホトカプラ
では受光素子チップ11の側面からの光の影響が強く、
本発明に係る構造が極めて有利である。In a photocoupler with a structure in which an infrared light emitting diode chip 10 and a light receiving element chip 11 are installed on the same plane as shown in the figure, the influence of light from the side of the light receiving element chip 11 is strong.
The structure according to the invention is extremely advantageous.
く効 果〉
本発明によれば高感度で高速応答のホトカプラを得るこ
とができる。Effects> According to the present invention, a photocoupler with high sensitivity and high speed response can be obtained.
第1図は本発明に係るホトカプラの一実施例の受光素子
の構造を示し、同図(a)は一部側断面図、同図(b)
は一部平面図、第2図は従来のホトカプラの充電流応答
特性を示す波形図、第3図及び第4図は従来の受光素子
の側断面図、第5図は本発明に係るホトカプラの一実施
例の受光素子の等価回路図、第6図は本発明に係るホト
カプラの一実施例の構造を示し、同図(a)は平面図、
同図(b)は側断面図、同図(c)は正面断面図を示す
。
図中 1=P型基板 2:N型エピタキシャル層 3:
Pアインレーション層 4:絶縁層5:遮光手段 6:
Nff1エピタキシャル層7:遮光手段 8:第1のホ
トダイオード 9:第2のホトダイオード 10:赤外
発光夕°イオードチノプ 11:受光素子チノフ。
代理人 弁理士 福 士 愛 彦((t!x2名)第1
図
第2図
第3図
第4図
第5図FIG. 1 shows the structure of a light-receiving element of an embodiment of the photocoupler according to the present invention, and FIG. 1(a) is a partial side sectional view, and FIG. 1(b)
is a partial plan view, FIG. 2 is a waveform diagram showing the charging current response characteristics of a conventional photocoupler, FIGS. 3 and 4 are side sectional views of a conventional photodetector, and FIG. 5 is a diagram of a photocoupler according to the present invention. FIG. 6 is an equivalent circuit diagram of a light-receiving element according to an embodiment, and FIG. 6 shows the structure of an embodiment of a photocoupler according to the present invention, and FIG.
The same figure (b) shows a side sectional view, and the same figure (c) shows a front sectional view. In the figure 1 = P type substrate 2: N type epitaxial layer 3:
P inlation layer 4: Insulating layer 5: Light shielding means 6:
Nff1 epitaxial layer 7: Light shielding means 8: First photodiode 9: Second photodiode 10: Infrared emitting diode tinop 11: Light receiving element tinop. Agent Patent Attorney Aihiko Fuku ((t! x 2 people) 1st
Figure 2 Figure 3 Figure 4 Figure 5
Claims (1)
信号検出用ホトダイオードとは別個のホトダイオードを
設けたことを特徴とするホトカプラ。1. A photocoupler characterized in that a photodiode separate from a signal detection photodiode is provided near the side surface of the light-receiving element chip on the side of the light-emitting element.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59182084A JPS6158281A (en) | 1984-08-29 | 1984-08-29 | Photo coupler |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59182084A JPS6158281A (en) | 1984-08-29 | 1984-08-29 | Photo coupler |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6158281A true JPS6158281A (en) | 1986-03-25 |
JPH0224386B2 JPH0224386B2 (en) | 1990-05-29 |
Family
ID=16112077
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59182084A Granted JPS6158281A (en) | 1984-08-29 | 1984-08-29 | Photo coupler |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6158281A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114784131A (en) * | 2022-04-11 | 2022-07-22 | 西安微电子技术研究所 | Photosensitive diode, photosensitive operational amplifier circuit and photosensitive chip |
-
1984
- 1984-08-29 JP JP59182084A patent/JPS6158281A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114784131A (en) * | 2022-04-11 | 2022-07-22 | 西安微电子技术研究所 | Photosensitive diode, photosensitive operational amplifier circuit and photosensitive chip |
CN114784131B (en) * | 2022-04-11 | 2023-05-16 | 西安微电子技术研究所 | Photosensitive diode, photosensitive operational amplifier circuit and photosensitive chip |
Also Published As
Publication number | Publication date |
---|---|
JPH0224386B2 (en) | 1990-05-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4712017A (en) | Photocoupler device having reflecting surface enhance signal transmission | |
US4318115A (en) | Dual junction photoelectric semiconductor device | |
WO2011129149A1 (en) | Semiconductor light detecting element | |
KR950003950B1 (en) | Photo-sensing device | |
JPH04111478A (en) | Light-receiving element | |
JPS5894218A (en) | Photocoupler | |
JPS6158281A (en) | Photo coupler | |
JP2998646B2 (en) | Light receiving operation element | |
JPS63160270A (en) | Semiconductor device having photosensor and signal processing element | |
EP0522746B1 (en) | Semiconductor photodetector device | |
JP2002319669A (en) | Backside incident type photodiode and photodiode array | |
JPH06163977A (en) | Photocoupler | |
JP3497977B2 (en) | Light receiving element and optical coupling device using the same | |
JPH06140613A (en) | Semiconductor light detector | |
JPS5996784A (en) | Photo coupling semiconductor device | |
JPH06177414A (en) | Semiconductor element | |
JP4459472B2 (en) | Photodetector | |
JPH0760635B2 (en) | Photoelectron emitter | |
JP2663851B2 (en) | Optical semiconductor device | |
JPS5992581A (en) | Photo coupling semiconductor device | |
JPS6355982A (en) | Photodetector | |
JPH0423334Y2 (en) | ||
JPH0481872B2 (en) | ||
JPS61127165A (en) | Semiconductor device | |
JPH0541533A (en) | Semiconductor device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |