JPS6148544A - High-conductivity copper alloy and low softening temperature - Google Patents

High-conductivity copper alloy and low softening temperature

Info

Publication number
JPS6148544A
JPS6148544A JP16994884A JP16994884A JPS6148544A JP S6148544 A JPS6148544 A JP S6148544A JP 16994884 A JP16994884 A JP 16994884A JP 16994884 A JP16994884 A JP 16994884A JP S6148544 A JPS6148544 A JP S6148544A
Authority
JP
Japan
Prior art keywords
ppm
copper
softening temperature
pure copper
copper alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16994884A
Other languages
Japanese (ja)
Other versions
JPS6247936B2 (en
Inventor
Hisashi Suzuki
寿 鈴木
Mikihiro Sugano
菅野 幹宏
Takao Maeda
貴雄 前田
Toshiyuki Osako
敏行 大迫
Shinsuke Yamazaki
信介 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP16994884A priority Critical patent/JPS6148544A/en
Publication of JPS6148544A publication Critical patent/JPS6148544A/en
Publication of JPS6247936B2 publication Critical patent/JPS6247936B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern

Landscapes

  • Conductive Materials (AREA)

Abstract

PURPOSE:To obtain a Cu alloy having a softening temp. lower than pure copper while maintaining the electric conductivity of pure copper by adding very small amounts of Se, Y, a rare earth element or Mg, and O to pure copper. CONSTITUTION:A Cu alloy is obtd. by adding, by weight, 5-50ppm Se, 5-50 ppm Y, 5-500ppm rare earth element (atomic number 57-71) or 5-200ppm Mg, and <=20ppm O to pure copper. Electrolytic copper is used so as to attain <=20 ppm O content, and melting and casting are carried out in a nonoxidizing atmosphere or in vacuum.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、軟化温度が低くて製造容易な高導電用鋼材に
関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a high conductivity steel material that has a low softening temperature and is easy to manufacture.

周知の如く純銅及び銅合金は導電性に優れ且つ良好な加
工性を有することから導電用細線、プリント配線基板用
圧延箔、フラットケーブル用銅箔条等多様な用途に用い
られている。
As is well known, pure copper and copper alloys have excellent conductivity and good workability, and are therefore used in a variety of applications, such as thin conductive wires, rolled foils for printed wiring boards, and copper foil strips for flat cables.

〔従来の技術〕[Conventional technology]

従来このような用途には、無酸素銅のようガ純銅や銅−
鉄合金等の銅合金が多く用いられている。
Conventionally, pure copper or copper-free copper such as oxygen-free copper has been used for such applications.
Copper alloys such as iron alloys are often used.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

近年省資源の為、上記材料の薄肉化が求められているた
め、これら材料を上記用途に供するまでの冷間加工率が
増大し、従りてこれらの製造過程において必要とされる
焼鈍処理の回数も増加してきている。この焼鈍処理回数
を減少させたシ、焼鈍処理温度自身を低くするととがで
きれば省エネルギー化の趨勢などの見地から好ましい。
In recent years, in order to save resources, the materials mentioned above have been required to be made thinner, so the cold working rate of these materials has increased until they are used for the above purposes, and therefore the annealing treatment required in the manufacturing process has increased. The number of occurrences is also increasing. It is preferable from the standpoint of energy saving if the number of times of this annealing treatment can be reduced and the annealing temperature itself can be lowered.

以上の点から加工性に優れ、且つ軟化温度の低い銅合金
の開発が望まれていた。
From the above points, it has been desired to develop a copper alloy that has excellent workability and a low softening temperature.

〔問題点を解決するための手段〕[Means for solving problems]

本発明者岬は上記の事情に鑑み、前記従来の銅合金よシ
導電率が同等もしくは優れ、且つ軟化温度が低くなるよ
うな銅合金を提供すべく、純銀に種々の第二元素を微量
添加して観念研究を行なった結果、電気銅に、酸素含有
量が重量で20 ppm以下になるようにし、且つ重量
忙て5〜50 ppmのスカンジウム、5〜50 pp
mのイツトリウム、5〜500 ppmの希土類元素(
k子番号57〜71)もしくは5〜200 ppmのマ
グネシウムの何れか一つを添加することによって上記目
的特に軟化温度を純銅より低くし得ることr見出し本発
明に到達した。
In view of the above circumstances, the present inventor, Misaki, added trace amounts of various secondary elements to pure silver in order to provide a copper alloy that has an electrical conductivity equal to or superior to that of the conventional copper alloy and has a lower softening temperature. As a result of conceptual research, we found that electrolytic copper should have an oxygen content of 20 ppm or less by weight, and scandium of 5 to 50 ppm by weight, and 5 to 50 ppm of scandium.
m of yttrium, 5-500 ppm of rare earth elements (
The inventors have arrived at the present invention with the finding that by adding either 57 to 71 ppm of magnesium or 5 to 200 ppm of magnesium, the above object, particularly the softening temperature, can be made lower than that of pure copper.

〔作 用〕[For production]

以下本発明を更に詳しく説明する。 The present invention will be explained in more detail below.

本発明銅合金において、添加元素の添加量を重量でスカ
ンジウム5〜50ppm、イツトリウム5〜50ppm
、希土類元素5〜500 ppmもしくはマグネシウム
5〜200 ppmに限定したのは5 ppm未満では
、それらの元素の添加による軟化温度のくなるばかシで
なく導電率が純銅のそれよシ低下してくるからである。
In the copper alloy of the present invention, the amount of additional elements added is 5 to 50 ppm by weight of scandium and 5 to 50 ppm of yttrium.
, Rare earth elements are limited to 5 to 500 ppm or magnesium is limited to 5 to 200 ppm, but if the content is less than 5 ppm, the softening temperature due to the addition of those elements will not only increase, but the conductivity will decrease compared to that of pure copper. It is from.

また、本発明銅合金中の酸素含有量を重量で20 pp
m以下に限定したのは、20 ppmを超えると軟化温
度におりる上記元素の添加効果が減少するからである。
In addition, the oxygen content in the copper alloy of the present invention is 20 pp by weight.
The reason why the amount is limited to less than 20 ppm is that if it exceeds 20 ppm, the effect of adding the above-mentioned elements, which reach the softening temperature, decreases.

本発明銅合金を製造するに際して、上記添加元つ   
  素はいずれも1重量%程度含有する銅母合金で添加
するのが望ましい。そして、該銅合金中の酸素含有量を
20 ppm以下にするためには、使用する純銅として
は雷1気銅(JIS I(2121)を適用すればよく
、1だ溶解及び鋳造の雰囲気としては非酸化性雰囲気や
真空雰囲気などが採用できる0〔実施例〕 次に本発明の実施例を比較例と共に説明する。
When producing the copper alloy of the present invention, the above-mentioned additive sources are
It is desirable that each element be added in the form of a copper master alloy containing about 1% by weight. In order to reduce the oxygen content in the copper alloy to 20 ppm or less, the pure copper used should be 1-ki copper (JIS I (2121)), and the atmosphere for melting and casting should be 1-ki copper (JIS I (2121)). 0 [Example] In which a non-oxidizing atmosphere, a vacuum atmosphere, etc. can be employed. Next, examples of the present invention will be described together with comparative examples.

実施例 セリウム、サマリウムおよびマグネシウムを夫々1重量
%前後含有する銅母合金で添加し、所望の酸素含有量に
なるように溶解中の真を度を調整することによシ溶解し
た後、該溶解と同一の雰囲気下で金型に鋳造して厚さ2
0冑、幅60m1長さ100mの鋳塊を製造した。
Example: Cerium, samarium, and magnesium were added to a copper master alloy containing about 1% by weight each, and after melting by adjusting the concentration during melting so that the desired oxygen content was obtained, the melted Cast into a mold under the same atmosphere as
An ingot with a width of 60 m and a length of 100 m was produced.

得られた鋳塊の組成は第1表のようであった。The composition of the obtained ingot was as shown in Table 1.

次にとの鋳塊表面を片側1簡ずつ面削した後、850℃
で熱間圧延して厚さ10aa+とじ、この圧延材から導
電率を測定する試料を採取した。更にこの熱間圧延材を
片側innずつ面削した後、厚さ811II+から0.
5匍まで冷間圧延を行なった。得られた板材から一辺2
0覇の正方形の板片を裁断して作成し、軟化一温度を測
定する試料とした。
Next, the surface of the ingot was milled one by one on each side, and then heated to 850°C.
The material was hot-rolled to a thickness of 10 aa+, and a sample for measuring electrical conductivity was taken from this rolled material. Furthermore, after face-milling this hot-rolled material one side at a time, the thickness ranged from 811II+ to 0.
Cold rolling was performed up to 5 liters. 2 sides from the obtained board material
A square plate piece of 0cm was cut and used as a sample for measuring the softening temperature.

軟化温度の測定は、60℃から300℃までの20℃間
隔の温度に設定した油浴または塩浴中に30分間浸漬加
熱された試料7のビッカース硬度を測定することによシ
行なった。得られた結果を第1表に示す。
The softening temperature was measured by measuring the Vickers hardness of Sample 7, which was immersed and heated for 30 minutes in an oil bath or a salt bath set at temperatures ranging from 60°C to 300°C in 20°C intervals. The results obtained are shown in Table 1.

fgx表から明らかなように、電気銅にスカンジ5〜5
0ppm、5〜500 ppm、 5ん200 ppm
添加し、酸素含有量を重量で20 ppm以下に抑えた
銅合金はいずれも導電率が100%1.A、C,S、以
上で純銅と同程度でちゃ、且つ半軟化温度が純銅よシ低
い。一方、上記添加元素の組成範囲が夫々から外れるか
、範囲内でも酸素含有量が20 ppmを超えるような
銅合金はいずれも半軟化温度が純銅と同程度かそれ以上
であることが判る。
As is clear from the FGX table, Scandi 5 to 5 is applied to electrolytic copper.
0ppm, 5-500ppm, 5-200ppm
The conductivity of all copper alloys in which the oxygen content is suppressed to 20 ppm or less by weight is 100%. A, C, and S should be on the same level as pure copper, and the semi-softening temperature is lower than that of pure copper. On the other hand, it can be seen that all copper alloys in which the composition ranges of the above-mentioned additive elements are outside the respective ranges, or in which the oxygen content exceeds 20 ppm even within the ranges, have semi-softening temperatures that are the same as or higher than that of pure copper.

〔発明の効果〕〔Effect of the invention〕

以上から明らか力ように、本発明によれば、その導電率
が純銅のそれよジ低下することなく、その軟化温度が純
銅のそれよシ低い銅合金材を提供しうるものである。
As is clear from the above, according to the present invention, it is possible to provide a copper alloy material whose conductivity is not lower than that of pure copper and whose softening temperature is lower than that of pure copper.

以下余白Margin below

Claims (1)

【特許請求の範囲】[Claims] (1)重量にて5〜50ppmのスカンジウム、5〜5
0ppmのイットリウム、5〜500ppmの希土類元
素(原子番号57〜71)もしくは5〜200ppmの
マグネシウムのうちの一つと20ppm以下の酸素を含
み、残部銅及び不可避不純物からなる軟化温度の低い高
導電用銅合金。
(1) 5-50 ppm scandium by weight, 5-5
Highly conductive copper with a low softening temperature, containing 0 ppm of yttrium, 5 to 500 ppm of a rare earth element (atomic number 57 to 71) or 5 to 200 ppm of magnesium, and 20 ppm or less of oxygen, with the balance being copper and unavoidable impurities. alloy.
JP16994884A 1984-08-16 1984-08-16 High-conductivity copper alloy and low softening temperature Granted JPS6148544A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16994884A JPS6148544A (en) 1984-08-16 1984-08-16 High-conductivity copper alloy and low softening temperature

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16994884A JPS6148544A (en) 1984-08-16 1984-08-16 High-conductivity copper alloy and low softening temperature

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP10132387A Division JPS6345339A (en) 1987-04-24 1987-04-24 Copper alloy for high electrical conduction having low softening temperature

Publications (2)

Publication Number Publication Date
JPS6148544A true JPS6148544A (en) 1986-03-10
JPS6247936B2 JPS6247936B2 (en) 1987-10-12

Family

ID=15895839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16994884A Granted JPS6148544A (en) 1984-08-16 1984-08-16 High-conductivity copper alloy and low softening temperature

Country Status (1)

Country Link
JP (1) JPS6148544A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5918724A (en) * 1982-07-23 1984-01-31 Nitto Electric Ind Co Ltd Termosetting resin composition
JPH01283333A (en) * 1987-12-25 1989-11-14 Hiroshi Sasaki High electric conductive metallic material
US5364923A (en) * 1992-09-30 1994-11-15 Dow Corning Toray Silicone Co., Ltd. Organopolysiloxane graft epoxy resins and a method for the preparation thereof
US6709753B2 (en) 2001-02-23 2004-03-23 Shin-Etsu Chemical Co., Ltd. Silicone-modified epoxy or phenolic resin compositions and semiconductor devices sealed therewith
JP2008182170A (en) * 2006-12-28 2008-08-07 Hitachi Cable Ltd Solder-plated wire for solar cell and manufacturing method thereof, and solar cell
JP2008186626A (en) * 2007-01-26 2008-08-14 Matsushita Electric Works Ltd Remote control breaker
JP2013014838A (en) * 2011-06-08 2013-01-24 Nippon Steel & Sumikin Chemical Co Ltd Copper foil, copper-clad laminate, flexible circuit board, and method for manufacturing copper-clad laminate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111455210A (en) * 2020-04-17 2020-07-28 金川集团股份有限公司 Ultra-high conductivity microalloyed copper material and processing method thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59139662A (en) * 1983-01-31 1984-08-10 Mitsubishi Metal Corp Alloy thin wire for wire bonding of semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59139662A (en) * 1983-01-31 1984-08-10 Mitsubishi Metal Corp Alloy thin wire for wire bonding of semiconductor device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5918724A (en) * 1982-07-23 1984-01-31 Nitto Electric Ind Co Ltd Termosetting resin composition
JPS6210568B2 (en) * 1982-07-23 1987-03-06 Nitto Electric Ind Co
JPH01283333A (en) * 1987-12-25 1989-11-14 Hiroshi Sasaki High electric conductive metallic material
JPH0468370B2 (en) * 1987-12-25 1992-11-02 Hiroshi Sasaki
US5364923A (en) * 1992-09-30 1994-11-15 Dow Corning Toray Silicone Co., Ltd. Organopolysiloxane graft epoxy resins and a method for the preparation thereof
US6709753B2 (en) 2001-02-23 2004-03-23 Shin-Etsu Chemical Co., Ltd. Silicone-modified epoxy or phenolic resin compositions and semiconductor devices sealed therewith
JP2008182170A (en) * 2006-12-28 2008-08-07 Hitachi Cable Ltd Solder-plated wire for solar cell and manufacturing method thereof, and solar cell
JP2008186626A (en) * 2007-01-26 2008-08-14 Matsushita Electric Works Ltd Remote control breaker
JP2013014838A (en) * 2011-06-08 2013-01-24 Nippon Steel & Sumikin Chemical Co Ltd Copper foil, copper-clad laminate, flexible circuit board, and method for manufacturing copper-clad laminate

Also Published As

Publication number Publication date
JPS6247936B2 (en) 1987-10-12

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