JPS6146970B2 - - Google Patents

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Publication number
JPS6146970B2
JPS6146970B2 JP53069476A JP6947678A JPS6146970B2 JP S6146970 B2 JPS6146970 B2 JP S6146970B2 JP 53069476 A JP53069476 A JP 53069476A JP 6947678 A JP6947678 A JP 6947678A JP S6146970 B2 JPS6146970 B2 JP S6146970B2
Authority
JP
Japan
Prior art keywords
wafer
wafers
semiconductor wafer
metal film
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53069476A
Other languages
Japanese (ja)
Other versions
JPS54159864A (en
Inventor
Yoshiaki Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP6947678A priority Critical patent/JPS54159864A/en
Publication of JPS54159864A publication Critical patent/JPS54159864A/en
Publication of JPS6146970B2 publication Critical patent/JPS6146970B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】 本発明は半導体ウエハースの収納、保管パツケ
ージに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a package for storing and storing semiconductor wafers.

半導体ウエハーは不純物拡散、酸化、写真蝕
刻、洗浄、メタライズ等の製造プロセスを経て形
成される。その後ペレツタイズ工程を経てウエハ
ーから半導体素子が分離されて半導体装置に組立
てられる。一般に半導体装置の電気的特性、特に
電流増幅率、リーク電流、低周波雑音等は半導体
素子表面の各種の汚れ例えば水分、無機的な汚
れ、有機的な汚れ等により支配され悪影響を受け
ることが知られている。したがつて半導体ウエハ
ー製造から組立完了までの全製造工程に於いては
出来る限りこの汚れを持ち込まない配慮が必要で
ある。しかしながら従来、生産管理上メタライズ
工程まで完了したウエハーをペレツタイズ工程に
送る間にウエハーの状態で一亘収納、保管するこ
ことがしばしば行われている。例えばペレツタイ
ズ工程の製造工場が遠く離れている場合またはウ
エハー状態で販売出荷する場合にはウエハーをし
かるべき収納方法で収納し包装した後運搬する。
さらに同一工場内に於いても生産調整のためウエ
ハーの状態で収納、保管することが行われる。従
来、半導体ウエハーの収納、保管パツケージとし
て、内面をポリエチレンでコーテイングしたグラ
シン紙の袋にウエハーを収納するもの、プラスチ
ツクの箱にウエハーを複数枚整列させて入れ、箱
同志を重ね合せて、テープなどで密封するものな
どが用いられている。しかしながら、前者はウエ
ハー表面が袋の内面に接触して汚れるという欠点
があり、また後者は気密性が十分に保てないため
ウエハー表面が大気にさらされる状態になりウエ
ハー表面に各種の汚れが付着乃至吸着するという
欠点があつた。このため従来のこれらの収納、保
管パツケージは、保管中に表面が汚染されるの
で、半導体装置に組立後、品質、信頼性に悪影響
を及ぼすことが多く、特に収納、保管期間が長く
なる程その影響が著しかつた。
Semiconductor wafers are formed through manufacturing processes such as impurity diffusion, oxidation, photolithography, cleaning, and metallization. Thereafter, semiconductor elements are separated from the wafer through a pelletizing process and assembled into semiconductor devices. It is generally known that the electrical characteristics of semiconductor devices, especially current amplification factor, leakage current, low frequency noise, etc., are controlled and adversely affected by various types of contamination on the surface of semiconductor elements, such as moisture, inorganic contamination, and organic contamination. It is being Therefore, care must be taken to prevent this contamination as much as possible during the entire manufacturing process from semiconductor wafer manufacture to completion of assembly. However, conventionally, for production control reasons, wafers that have completed the metallization process are often stored in the wafer state for a while while being sent to the pelletizing process. For example, if the manufacturing plant for the pelletizing process is far away, or if the wafers are sold and shipped in wafer form, the wafers are stored in an appropriate storage method, packaged, and then transported.
Furthermore, even within the same factory, wafers are stored and stored in the form of wafers for production adjustment. Traditionally, semiconductor wafers have been stored in glassine paper bags coated with polyethylene on the inside, or by placing multiple wafers in a line in a plastic box, stacking the boxes on top of each other, and using tape, etc. A sealing device is used. However, the former has the disadvantage that the wafer surface comes into contact with the inner surface of the bag and becomes dirty, and the latter does not maintain sufficient airtightness, so the wafer surface is exposed to the atmosphere and various types of dirt adhere to the wafer surface. It had the disadvantage of being adsorbed. For this reason, the surfaces of these conventional storage packages become contaminated during storage, which often has a negative effect on quality and reliability after assembly into semiconductor devices, and the longer the storage period is, the more contamination occurs. The impact was significant.

本発明の目的は、ウエハーをその清浄度を保つ
た状態で収納、保管でき、さらに運搬に便利で簡
便なウエハーの収納用パツケージを提供するもの
である。
An object of the present invention is to provide a wafer storage package that can accommodate and store wafers while maintaining their cleanliness and is convenient and simple to transport.

本発明は、複数のウエハースをまずアルミニウ
ム箔の上に表面を上にして設置しその上部からほ
ぼウエハーの体積を同程度のくぼみを有する硬質
性プラスチツクフイルム例えば塩化ビニルフイル
ムをかぶせ、ウエハーの設置されていない余白の
部分のアルミニウム箔表面と該塩化ビニルフイル
ムの平担部を不活性ガス雰囲気内例えば窒素雰囲
気内で熱圧着し、気密封着することを特徴とす
る。この際硬質性プラスチツクフイルム内壁とウ
エハー面が接触しないように該プラスチツクフイ
ルムのくぼみの側面はテーパーをつけておくこと
が重要である。即ちたとえ収納されたウエハーが
運搬中振動にあつたり又は取扱中表面が下方に向
く状態になつてもこのくぼみ側面のテーパーがウ
エハーを固定させる役割をもち、ウエハー表面は
常に空間に位置する状態を保つ。
In the present invention, a plurality of wafers are first placed with their surfaces facing up on an aluminum foil, and a hard plastic film, such as a vinyl chloride film, having a recess of approximately the same volume is covered from the top of the wafer, and the wafers are placed with their surfaces facing up. The surface of the aluminum foil in the blank space and the flat part of the vinyl chloride film are thermocompressed in an inert gas atmosphere, for example, a nitrogen atmosphere, and are hermetically sealed. At this time, it is important that the sides of the recess in the plastic film are tapered so that the inner wall of the hard plastic film does not come into contact with the wafer surface. In other words, even if the stored wafer is subjected to vibration during transportation or the surface is turned downward during handling, the taper on the side of this recess has the role of fixing the wafer, and the wafer surface is always located in the space. keep.

このようにして収納されたウエハーは、そのま
ま一搬の封筒のようなものに入れしかるべき場所
に移送してもウエハースの清浄度は収納前と比べ
全く変化せず良好な状態を保つていることが確認
された。さらにこのままの状態で特に清浄度に気
をくばらない場所例えば事務所等に長期間保管し
ても同様に良好な状態が保てることが確認され
た。さらにウエハー裏面側にアルミ箔が当接して
いる状態はMOSタイプを有する半導体ウエハー
のようにプラスチツク内で帯電しやすいウエハー
の保管には帯電防止に最適である。このよう本発
明のウエハー収納、保管パツケージはウエハー表
面が不活性ガス内の気密空間中に位置し、外気か
らの汚染を全く遮断し、さらに取扱い、運搬、保
管に簡便なようにパツクの容積を極端に小さくで
きるという特徴がある。
The cleanliness of the wafers stored in this way remains in good condition, with no change at all compared to before storage, even if the wafers are placed in an envelope-like container and transported to the appropriate location. was confirmed. Furthermore, it has been confirmed that the product can be kept in good condition even if it is stored for a long period of time in a place where cleanliness is not particularly important, such as an office. Furthermore, the state in which the aluminum foil is in contact with the back side of the wafer is ideal for preventing static electricity when storing wafers that are easily charged inside plastic, such as MOS type semiconductor wafers. As described above, in the wafer storage and storage package of the present invention, the wafer surface is located in an airtight space within an inert gas, completely blocking contamination from the outside air, and further reducing the volume of the package for easy handling, transportation, and storage. It has the characteristic of being extremely small.

次に本発明をその好ましい実施例に基づき図面
を参照して説明する。第1図は拡散、メタライズ
等のウエハー製造工程を一通り完了し、ペレツタ
イズ工程に入る前のウエハーを通常の洗浄工程例
えば有機溶剤等で洗浄した後の清浄なウエハー1
をその表面を上にして略0.1mm厚のあらかじめ洗
浄したアルミニウム箔2の上に設置した状態を示
す。尚このアルミニウム箔2の表面のウエハー設
置個所以外の部分には後の熱圧着に便ならしむる
ようにポリエチレンコーテイグ3が設けられてい
る。次に第2図に示すような硬質塩化ビニルフイ
ルム4を別に準備する。この塩化ビニルフイルム
4は第1図の状態のウエハー1の上に気密にかぶ
せるカバーの役割をするもので、厚さは略1mmで
ウエハーの周辺の肩部に当接しウエハーが振動し
たり、ウエハー表面が逆さになつた時にウエハー
表面が該カバー4の内壁に接触しないようにテー
パー5をつけた形状に加工されている。次に第1
図の状態のウエハーは窒素雰囲気中例えば窒素が
充満しているボツクスの中で第2図に示す形状の
塩化ビニルフイルム4によりカバーされ、熱圧着
装置により該塩化ビニルフイルム4の平担部とポ
リエチレンがコーテイングされたアルミニウム箔
が熱圧着される。かくして第3図に示される如く
ウエハー1はアルミニウム箔2と塩化ビニルフイ
ルム4により気密封着される。この封着部6は熱
圧着により大気より完全に遮断される。しかもウ
エハー1の表面はウエハーの収納される高さ略3
mmの空間部7にあつて常に窒素ガスにさらされ清
浄な状態を保つている。さらに外部からの振動に
隙しても塩化ビニルフイルム4のテーパー部5が
ストツパーの役割をなす。かかるウエハーの収納
パツケージはもちろん同時に複数枚を同様の方法
で実施することが可能でありこれを自動化して行
えることは云うまでもない。
Next, the present invention will be explained based on preferred embodiments thereof with reference to the drawings. Figure 1 shows a clean wafer 1 after completing all the wafer manufacturing processes such as diffusion and metallization and before entering the pelletizing process.
It is shown that the aluminum foil 2 is placed with its surface facing up on a pre-cleaned aluminum foil 2 with a thickness of approximately 0.1 mm. A polyethylene coating 3 is provided on the surface of the aluminum foil 2 other than where the wafer is to be placed so as to facilitate subsequent thermocompression bonding. Next, a hard vinyl chloride film 4 as shown in FIG. 2 is separately prepared. This vinyl chloride film 4 serves as a cover that is airtightly placed over the wafer 1 in the state shown in Fig. 1.It has a thickness of about 1 mm and comes into contact with the shoulder around the wafer, preventing the wafer from vibrating or The wafer surface is processed into a tapered shape 5 so that the wafer surface does not come into contact with the inner wall of the cover 4 when the surface is turned upside down. Then the first
The wafer in the state shown in the figure is covered with a vinyl chloride film 4 having the shape shown in FIG. The coated aluminum foil is thermocompression bonded. Thus, as shown in FIG. 3, the wafer 1 is hermetically sealed with the aluminum foil 2 and the vinyl chloride film 4. This sealed portion 6 is completely isolated from the atmosphere by thermocompression bonding. Moreover, the surface of wafer 1 has a height of approximately 3 to accommodate the wafer.
The space 7 is kept in a clean state by being constantly exposed to nitrogen gas. Furthermore, the tapered portion 5 of the vinyl chloride film 4 acts as a stopper even if vibrations from the outside occur. Of course, it is possible to store a plurality of wafers in a similar manner at the same time, and it goes without saying that this can be done automatically.

第4図は複数枚のウエハーを収納した一つの例
を示す。このような状態でそのまま他所に移送し
たり、長期間保管しておくことが出来る。例えば
このままの状態で一般の大気に2年間放置した結
果ではウエハーの表面状態は全く初期と同様であ
り、さらに半導体装置に組立た後の電気的諸特性
に対しても該保管により劣化が現われることは全
くなかつた。
FIG. 4 shows an example in which a plurality of wafers are stored. In this state, it can be transported to another location or stored for a long period of time. For example, if the wafer is left in the general atmosphere for two years, the surface condition of the wafer will be exactly the same as the initial state, and furthermore, the electrical characteristics after being assembled into a semiconductor device will deteriorate due to storage. There wasn't any.

以上述べた如く本発明のウエハーの収納パツケ
ージは極く簡便な方法で実施することが出来、収
納ケースの形状も非常に薄形で、取扱い、保管、
移送に便利であり、さらにウエハーの品質、信頼
性に全く悪影響を与えることのない特徴を有す
る。なお本発明は前記の実施例に掲げた具体的な
材質、形状等に限定されるものではない。
As described above, the wafer storage package of the present invention can be implemented in an extremely simple manner, and the storage case has a very thin shape, making it easy to handle, store, and store.
It is convenient to transport and has the characteristics of not having any negative effect on the quality or reliability of the wafer. Note that the present invention is not limited to the specific materials, shapes, etc. listed in the above embodiments.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明において、アルミニウム箔上に
半導体ウエハーを配置した状態の断面図、第2図
はプラスチツクカバーの断面図、第3図は本発明
の収納パツケージの断面図、第4図は複数枚収納
パツケージの断面図である。 1……半導体ウエハー、2……アルミニウム
箔、3……ポリエチレンコーテイング、4……塩
化ビニルフイルム、5……塩化ビニルフイルムの
テーパー部、6……封着部、7……ウエハー収納
内空間部、不活性ガス充満部。
Fig. 1 is a sectional view of a semiconductor wafer placed on an aluminum foil according to the present invention, Fig. 2 is a sectional view of a plastic cover, Fig. 3 is a sectional view of a storage package of the present invention, and Fig. 4 is a sectional view of a plurality of storage packages. FIG. 3 is a sectional view of the package storage package. DESCRIPTION OF SYMBOLS 1... Semiconductor wafer, 2... Aluminum foil, 3... Polyethylene coating, 4... Vinyl chloride film, 5... Tapered part of vinyl chloride film, 6... Sealing part, 7... Inner space for wafer storage. , inert gas filled section.

Claims (1)

【特許請求の範囲】 1 多数の半導体ウエハーが載置されるメタルフ
イルムと、前記メタルフイルムに封着された硬質
プラスチツク製カバーであつて各半導体ウエハー
の肩部に当接して各半導体ウエハーを固定させる
が各半導体ウエハー表面には接触しない形状を有
する硬質プラスチツク製カバーとを備え、前記メ
タルフイルムと前記カバーとでできる空間に不活
性ガスを充填して各半導体ウエハーを密封するよ
うにした半導体ウエハーの収納パツケージ。 2 前記メタルフイルムには部分的にプラスチツ
クフイルムがコーテイングされており、前記密封
は前記メタルフイルム上のプラスチツクコーテイ
ング部とプラスチツク製カバーの平担部との熱圧
着による封着によつてなされていることを特徴と
する特許請求の範囲第1項記載の半導体ウエハー
の収納パツケージ。
[Scope of Claims] 1. A metal film on which a large number of semiconductor wafers are placed, and a hard plastic cover sealed to the metal film, which contacts the shoulders of each semiconductor wafer to fix each semiconductor wafer. a hard plastic cover having a shape that does not contact the surface of each semiconductor wafer, and the space formed by the metal film and the cover is filled with an inert gas to seal each semiconductor wafer. Storage package cage. 2. The metal film is partially coated with a plastic film, and the sealing is achieved by thermocompression bonding between the plastic coating part on the metal film and the flat part of the plastic cover. A semiconductor wafer storage package according to claim 1, characterized in that:
JP6947678A 1978-06-08 1978-06-08 Storing package of semiconductor wafer Granted JPS54159864A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6947678A JPS54159864A (en) 1978-06-08 1978-06-08 Storing package of semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6947678A JPS54159864A (en) 1978-06-08 1978-06-08 Storing package of semiconductor wafer

Publications (2)

Publication Number Publication Date
JPS54159864A JPS54159864A (en) 1979-12-18
JPS6146970B2 true JPS6146970B2 (en) 1986-10-16

Family

ID=13403768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6947678A Granted JPS54159864A (en) 1978-06-08 1978-06-08 Storing package of semiconductor wafer

Country Status (1)

Country Link
JP (1) JPS54159864A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1989000334A1 (en) * 1987-07-08 1989-01-12 Sumitomo Electric Industries, Ltd. Preservation of semiconductor substrates

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS611149U (en) * 1984-06-09 1986-01-07 株式会社 堀場製作所 Filter element pack for automobile exhaust gas analyzer

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4933185U (en) * 1972-06-23 1974-03-23
JPS5017330U (en) * 1973-06-11 1975-02-25
JPS5443461A (en) * 1977-09-12 1979-04-06 Sumitomo Electric Ind Ltd Packing method of semiconductor wafer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4933185U (en) * 1972-06-23 1974-03-23
JPS5017330U (en) * 1973-06-11 1975-02-25
JPS5443461A (en) * 1977-09-12 1979-04-06 Sumitomo Electric Ind Ltd Packing method of semiconductor wafer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1989000334A1 (en) * 1987-07-08 1989-01-12 Sumitomo Electric Industries, Ltd. Preservation of semiconductor substrates

Also Published As

Publication number Publication date
JPS54159864A (en) 1979-12-18

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