JPS6142758B2 - - Google Patents
Info
- Publication number
- JPS6142758B2 JPS6142758B2 JP54048447A JP4844779A JPS6142758B2 JP S6142758 B2 JPS6142758 B2 JP S6142758B2 JP 54048447 A JP54048447 A JP 54048447A JP 4844779 A JP4844779 A JP 4844779A JP S6142758 B2 JPS6142758 B2 JP S6142758B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- processing
- lap
- magnetic
- gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005498 polishing Methods 0.000 claims description 45
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 32
- 239000006061 abrasive grain Substances 0.000 claims description 28
- 239000007788 liquid Substances 0.000 claims description 18
- 235000011187 glycerol Nutrition 0.000 claims description 16
- 239000000395 magnesium oxide Substances 0.000 claims description 14
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 14
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 14
- 230000035699 permeability Effects 0.000 claims description 12
- 229910000859 α-Fe Inorganic materials 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 6
- 239000002562 thickening agent Substances 0.000 claims description 5
- 239000000463 material Substances 0.000 description 18
- 239000012530 fluid Substances 0.000 description 16
- 238000003754 machining Methods 0.000 description 16
- 230000006866 deterioration Effects 0.000 description 13
- 238000007665 sagging Methods 0.000 description 9
- 230000003746 surface roughness Effects 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 230000002159 abnormal effect Effects 0.000 description 6
- 239000011162 core material Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000001066 destructive effect Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000002925 chemical effect Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4844779A JPS55139479A (en) | 1979-04-18 | 1979-04-18 | Abrasive liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4844779A JPS55139479A (en) | 1979-04-18 | 1979-04-18 | Abrasive liquid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55139479A JPS55139479A (en) | 1980-10-31 |
| JPS6142758B2 true JPS6142758B2 (enrdf_load_stackoverflow) | 1986-09-24 |
Family
ID=12803593
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4844779A Granted JPS55139479A (en) | 1979-04-18 | 1979-04-18 | Abrasive liquid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55139479A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57144654A (en) * | 1981-03-03 | 1982-09-07 | Nec Corp | Polishing method for high density magnetic disk substrate |
-
1979
- 1979-04-18 JP JP4844779A patent/JPS55139479A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55139479A (en) | 1980-10-31 |
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