JPS614139A - X-ray generator - Google Patents

X-ray generator

Info

Publication number
JPS614139A
JPS614139A JP59123863A JP12386384A JPS614139A JP S614139 A JPS614139 A JP S614139A JP 59123863 A JP59123863 A JP 59123863A JP 12386384 A JP12386384 A JP 12386384A JP S614139 A JPS614139 A JP S614139A
Authority
JP
Japan
Prior art keywords
rays
characteristic
target
electron beam
filament
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59123863A
Other languages
Japanese (ja)
Inventor
Masato Muraki
真人 村木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59123863A priority Critical patent/JPS614139A/en
Publication of JPS614139A publication Critical patent/JPS614139A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/24Tubes wherein the point of impact of the cathode ray on the anode or anticathode is movable relative to the surface thereof
    • H01J35/26Tubes wherein the point of impact of the cathode ray on the anode or anticathode is movable relative to the surface thereof by rotation of the anode or anticathode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/04Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08Anodes; Anti cathodes
    • H01J35/10Rotary anodes; Arrangements for rotating anodes; Cooling rotary anodes

Abstract

PURPOSE:To allow multiple-characteristic X-rays to be extracted from one device by fixing multiple metal members each generating specific-characteristic X- rays to a target and radiating an electron beam to an optional metal member among them. CONSTITUTION:Metal members 4A, 4B, 4C made of Al material, Si material, Pd material are fixed to the peripheral surface of a cylindrical target 3 rotatably supporting a support member 5, and a fixed filament 1 for generating an electron beam 2 is provided. The DC high voltage is applied across the filament 1 and the target 3, and the target 3 is rotated, thereby the electron beam 2 is radiated to the Al material 4A, Si material 4B, Pd material 4C, and specific- characteristic X-rays are generated respectively. Accordingly, multiple-characteristic X-rays can be optionally utilized with one device, and the life can be extended by changing the beam position even on the same metal.

Description

【発明の詳細な説明】 〔技術分野〕 本発明はX線発生装置、特に対陰極に関するものである
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to an X-ray generator, and in particular to an anticathode.

〔従来技術〕[Prior art]

従来、X線発生装置においては、1種類の金属または合
金に電子ビームを照射して当該金属または合金から発生
するX線を利用していた。その発生するX線は、連続し
た波長分布を示す連続X線と上記金属または合金に特有
な線スペクトルを示す特性X線とから成っている。した
がって、特性X線を利用する場合、1つのX線発生装置
では1種類の特性X線しか利用できなかった。X線リソ
グラフィーでは、レジスト、マスクの基盤材、吸収体の
組合わせによってその露光システムに有効な特性X線が
限定される。すなわち、1つの露光装置では1種類の特
性X線しか利用できないので、レジストやマスクの変更
が伴なうような場合には、従来のような1種類の特性X
線しか利用できないX線発生装置では特性X線の変更が
できず、利用面において甚だ不都合であった。
Conventionally, in an X-ray generator, an electron beam is irradiated onto one type of metal or alloy, and the X-rays generated from the metal or alloy are utilized. The generated X-rays consist of continuous X-rays showing a continuous wavelength distribution and characteristic X-rays showing a line spectrum specific to the metal or alloy. Therefore, when using characteristic X-rays, only one type of characteristic X-ray could be used with one X-ray generator. In X-ray lithography, the characteristic X-rays that are effective for the exposure system are limited by the combination of resist, mask base material, and absorber. In other words, one exposure device can only use one type of characteristic X-ray, so when changing the resist or mask, it is necessary to
With an X-ray generator that can only use X-rays, it is not possible to change the characteristic X-rays, which is extremely inconvenient in terms of use.

〔目的〕〔the purpose〕

本発明の目的は、上述の欠点を除去すると同時に、1つ
の装置で任意に複数の特性X線を取り出して利用するこ
とが可能なX線発生装置を提供することにある。
An object of the present invention is to provide an X-ray generating device that eliminates the above-mentioned drawbacks and at the same time allows a single device to arbitrarily extract and utilize a plurality of characteristic X-rays.

〔構成〕〔composition〕

本発明は、上述の目的を達成するために、対陰極(ター
ゲット)に、各々に特有な特性X線を発生する金属部を
複数個設け、このうちの任意の金属部に電子ビームを照
射できるように構成されている。
In order to achieve the above-mentioned object, the present invention provides an anticathode (target) with a plurality of metal parts that each generate characteristic X-rays, and makes it possible to irradiate an electron beam to any one of these metal parts. It is configured as follows.

〔実施例〕〔Example〕

以下、本発明の実施例について図面を参照しながら説明
する。
Embodiments of the present invention will be described below with reference to the drawings.

第1図(a)、(b)は本発明の一実施例を示し、それ
ぞれ正面図、側面図である。図において、1は電子ビー
ム2を発生させるための固定されたフィラメント、3は
電子ビーム2が照射される円筒状のクーゲラ)、4A、
4E、40は金属部材でそれぞれAt材、 Si材、 
pd材であり、ターゲット3の周面に強固に固着嵌合さ
れている。また、5はターゲット3の支持部材、6はX
線である。
FIGS. 1(a) and 1(b) show an embodiment of the present invention, and are a front view and a side view, respectively. In the figure, 1 is a fixed filament for generating the electron beam 2, 3 is a cylindrical Kugela to which the electron beam 2 is irradiated), 4A,
4E and 40 are metal members, respectively At material, Si material,
It is made of PD material and is firmly and securely fitted to the circumferential surface of the target 3. Further, 5 is a support member for the target 3, and 6 is an X
It is a line.

フィラメント1とターゲット3の間には、不図示の電源
により直流高電圧が印加されていて、フィラメント1よ
り発生した電子ビーム2はターゲット3上のAt材4k
に衝突し、X線6を発生する。そのX線6には、At材
4Aに特有の特性X線が含まれている。また、ターゲッ
ト3は支持部材4   5、よっ、ヶえオゎ、お9、ヵ
、っ、8いい。1装置により任意に回転移動させること
ができる。
A DC high voltage is applied between the filament 1 and the target 3 by a power source (not shown), and the electron beam 2 generated from the filament 1 is directed to the At material 4k on the target 3.
collides with and generates X-rays 6. The X-rays 6 include characteristic X-rays specific to the At material 4A. Also, the target 3 is the support member 4 5, yo, kae, oh, 9, ka, 8, 8. It can be rotated as desired by one device.

第1図(a)、(b)では、電子ビーム2をAt材4A
に衝突させた例を示しているが、ターゲット3を回転移
動させることにより、S1材4B、Pd材4Cにも衝突
させ、各々特有の特性X線を発生させることが可能であ
る。
In FIGS. 1(a) and (b), the electron beam 2 is connected to the At material 4A.
Although an example is shown in which the target 3 collides with the S1 material 4B and the Pd material 4C, by rotationally moving the target 3, it is possible to also collide with the S1 material 4B and the Pd material 4C, thereby generating characteristic X-rays unique to each.

したがって、ターゲットを回転移動させることにより任
意の特性X線を発生させ、それを利用できるようになっ
た。
Therefore, it has become possible to generate and utilize arbitrary characteristic X-rays by rotating the target.

次に、他の実施例を第2図にしたがって説明する。Next, another embodiment will be described with reference to FIG.

本実施例の特徴は、ターゲットは固定されたままで、電
子ビームを発生させるフィラメントを複数個(図では2
個)設けたことにある。すなわち、ターゲット3にはA
t材4A、Si材4Bが固着されていて、各々に衝突す
る電子ビーム8A、8Eが、異なるフィラメント7A、
7Eによって発生するものである。したがって、At材
4Aの特性Xi 9Aを利用したい場合は、フイラメン
)7Aのみを点火すればよい。もちろん、両フィラメン
)7A。
The feature of this embodiment is that the target remains fixed, and multiple filaments (two in the figure) are used to generate the electron beam.
). In other words, target 3 has A
The T material 4A and the Si material 4B are fixed, and the electron beams 8A and 8E colliding with each other are caused by different filaments 7A,
This is caused by 7E. Therefore, if it is desired to utilize the characteristic Xi 9A of the At material 4A, only the filament 7A needs to be ignited. Of course, both filaments) 7A.

7B共点火し、At材4A、S1材4Bによる2種類の
特性XJ19A、9Bを利用してもよい。
7B may be ignited together, and two types of characteristics XJ19A and 9B may be utilized by At material 4A and S1 material 4B.

更に、他の実施例を第3図にしたがって説明する。Furthermore, another embodiment will be described with reference to FIG.

本実施例の特徴は、ターゲットおよびフィラメントは固
定されたままで、フィラメントに与える電界強度を変化
させたことにある。すなわち、ターゲット3には前述の
実施例と同様にAt材4A。
The feature of this embodiment is that the target and filament remain fixed, but the electric field intensity applied to the filament is varied. That is, the target 3 is made of At material 4A as in the previous embodiment.

Si材4B 、 pa材4Cが固着されていて、フィラ
メント1の引き出し電極10の電位を制御することによ
り、電子ビームを偏向させ、11A、 、1’lB。
A Si material 4B and a PA material 4C are fixed, and by controlling the potential of the extraction electrode 10 of the filament 1, the electron beam is deflected to 11A, 1'lB.

110 のような電子ビームを任意に取り出せるように
しである。したがって、例えばAt材4Aの特性X線1
2A を利用したい場合には、引き出し電極10の電位
を強めて電子ビームIIAを発生させればよい。
This allows an arbitrary electron beam such as 110 to be taken out. Therefore, for example, the characteristic X-ray 1 of At material 4A
If it is desired to use 2A, the potential of the extraction electrode 10 may be increased to generate the electron beam IIA.

〔効果〕〔effect〕

本発明は以上説明したように、1つのXm発生装置で任
意に複数の特性Xiを利用することができる。更に、同
一の金属上でも電子ビームの衝突位置を変更することが
できるので、金属面上のあれや線量低下を防止し装置の
寿命を伸ばすことができる。
As described above, the present invention can arbitrarily utilize a plurality of characteristics Xi with one Xm generator. Furthermore, since the collision position of the electron beam can be changed even on the same metal, it is possible to prevent irregularities on the metal surface and decrease in dose, thereby extending the life of the device.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)、(b)は本発明の一実施例で、それぞれ
正面図、側面図を示し、第2図および第3図は本発明の
他の実施例を示す。 1・・・フィラメント、 2・・・電子ビーム。 3 ・・・ ターゲット、    4A・・・ At 
(アルミニウム)材。 4B・・・ Si (シリコン)材、 4C・・・ P
a (パラジウム)材。 6 ・・・ X線。 7A、7B ・・・ フィラメント。 8A、8B ・・・ 電子ビーム。 9A、9B ・・・ 特性Xm。 11A、IIB、 1i00・ 電子ビーム。 12A、 1.2B、 12C・・・ 特性X線。
FIGS. 1(a) and 1(b) show one embodiment of the invention, showing a front view and a side view, respectively, and FIGS. 2 and 3 show other embodiments of the invention. 1...Filament, 2...Electron beam. 3... Target, 4A... At
(aluminum) material. 4B...Si (silicon) material, 4C...P
a (palladium) material. 6... X-rays. 7A, 7B... Filament. 8A, 8B... Electron beam. 9A, 9B...Characteristics Xm. 11A, IIB, 1i00・Electron beam. 12A, 1.2B, 12C... Characteristic X-rays.

Claims (1)

【特許請求の範囲】[Claims] 対陰極に複数の金属部が備えられていて該複数の金属部
のうちの任意の金属部に電子ビームが照射できるように
構成されたことを特徴とするX線発生装置。
An X-ray generator characterized in that an anticathode is provided with a plurality of metal parts and is configured such that an arbitrary metal part among the plurality of metal parts can be irradiated with an electron beam.
JP59123863A 1984-06-18 1984-06-18 X-ray generator Pending JPS614139A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59123863A JPS614139A (en) 1984-06-18 1984-06-18 X-ray generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59123863A JPS614139A (en) 1984-06-18 1984-06-18 X-ray generator

Publications (1)

Publication Number Publication Date
JPS614139A true JPS614139A (en) 1986-01-10

Family

ID=14871245

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59123863A Pending JPS614139A (en) 1984-06-18 1984-06-18 X-ray generator

Country Status (1)

Country Link
JP (1) JPS614139A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03124497U (en) * 1990-02-23 1991-12-17
JPH0589809A (en) * 1992-03-04 1993-04-09 Rigaku Corp Rotary anticathode x-ray generating device
WO2010074031A1 (en) * 2008-12-22 2010-07-01 オムロン株式会社 X-ray inspection method and x-ray inspection apparatus
JP2010147017A (en) * 2008-12-19 2010-07-01 Samsung Electro-Mechanics Co Ltd X-ray tube

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03124497U (en) * 1990-02-23 1991-12-17
JPH0589809A (en) * 1992-03-04 1993-04-09 Rigaku Corp Rotary anticathode x-ray generating device
JP2010147017A (en) * 2008-12-19 2010-07-01 Samsung Electro-Mechanics Co Ltd X-ray tube
WO2010074031A1 (en) * 2008-12-22 2010-07-01 オムロン株式会社 X-ray inspection method and x-ray inspection apparatus

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