JPS6141268Y2 - - Google Patents

Info

Publication number
JPS6141268Y2
JPS6141268Y2 JP17559982U JP17559982U JPS6141268Y2 JP S6141268 Y2 JPS6141268 Y2 JP S6141268Y2 JP 17559982 U JP17559982 U JP 17559982U JP 17559982 U JP17559982 U JP 17559982U JP S6141268 Y2 JPS6141268 Y2 JP S6141268Y2
Authority
JP
Japan
Prior art keywords
chamber
gas
laser
water
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17559982U
Other languages
Japanese (ja)
Other versions
JPS5981054U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP17559982U priority Critical patent/JPS5981054U/en
Publication of JPS5981054U publication Critical patent/JPS5981054U/en
Application granted granted Critical
Publication of JPS6141268Y2 publication Critical patent/JPS6141268Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Lasers (AREA)

Description

【考案の詳細な説明】 本考案はガスレーザ発振装置に関わり、更に詳
細には循環式ガスレーザ発振装置のガス冷却室
に、ガスの流路に直交する多数の水管を立体的に
設けてなるガスレーザ発振装置に関するものであ
る。
[Detailed description of the invention] The present invention relates to a gas laser oscillation device, and more specifically to a gas laser oscillation device in which a large number of water pipes are three-dimensionally provided in the gas cooling chamber of a circulating gas laser oscillation device, which are perpendicular to the gas flow path. It is related to the device.

元来ガスレーザ発振室の放電電極部には一定温
度範囲のレーザ発振用ガス(例えば炭酸ガスな
ど)を整然と循環させて、安定したレーザを発振
させる必要がある。
Originally, it is necessary to orderly circulate a laser oscillation gas (for example, carbon dioxide gas, etc.) within a certain temperature range in the discharge electrode part of the gas laser oscillation chamber to oscillate a stable laser.

従来の上記したガスを一定温度範囲に保つため
の熱交換器は、レーザ発振器のレーザガス循環容
器とは別個に製作され、後に両方の結合が行なわ
れるものであり、熱交換器の部分には、レーザガ
スが熱交換器に直角に当るようガス流を導く整流
板が必要であり、かつ冷却効率の低い不便なもの
であつた。
The conventional heat exchanger for keeping the gas within a certain temperature range is manufactured separately from the laser gas circulation container of the laser oscillator, and the two are later combined. A current plate is required to guide the gas flow so that the laser gas hits the heat exchanger at right angles, and this is inconvenient because of its low cooling efficiency.

本考案は上記した従来装置の不都合を解消すべ
くなされたもので、以下に図面にもとずいてその
好適実施例装置を詳細に説明する。
The present invention has been made to solve the above-mentioned disadvantages of the conventional apparatus, and a preferred embodiment of the apparatus will be described in detail below with reference to the drawings.

第1図、第2図に示した本考案の実施例装置で
あるガスレーザ発振装置1は、中央上部に水平な
筒体状の発振室3を備えていて、その一側(例え
ば右側)にガス冷却室5を縦方向に設けてあり、
下部には動力室7を、続いて他側(左側)にはガ
スの流れを整然とさせる整流室9を備えている。
A gas laser oscillation device 1, which is an embodiment of the present invention shown in FIGS. 1 and 2, has a horizontal cylindrical oscillation chamber 3 at the upper center, and a gas A cooling chamber 5 is provided vertically,
A power chamber 7 is provided at the bottom, and a rectification chamber 9 is provided on the other side (left side) to make the flow of gas orderly.

このように筒体からなる4つの室の中をレーザ
発振用ガスが動力室7内の例えば送風機によつて
循環移動させられ、発振室3で温度上昇したガス
がガス冷却室5で冷却され、動力室7の送風機に
駆動され、整流室9でガスの流れを整えられて一
定の所望温度で発振室3内の放電電極部に連続し
て循環供給されるのである。
In this way, the laser oscillation gas is circulated through the four cylindrical chambers by, for example, a blower in the power chamber 7, and the gas whose temperature has risen in the oscillation chamber 3 is cooled in the gas cooling chamber 5. Driven by the blower in the power chamber 7, the flow of gas is adjusted in the rectifier chamber 9, and the gas is continuously circulated and supplied to the discharge electrode section in the oscillation chamber 3 at a constant desired temperature.

なお第1図、第2図の発振室3の中央前面に示
したのはレーザ発振用のミラー装置11であり、
第1図の動力室7が円筒状に示してあるのは送風
機に軸流式(回転フアンの軸方向に流体が送られ
る方式)のものを使用した場合の実施例であり、
第2図は角筒状をしていて、放射式(回転フアン
の軸と直交する方向に流体が送られる方式、例え
ばシロツコフアンなど)のものを使用した場合の
実施例を示したものである。
What is shown in the front center of the oscillation chamber 3 in FIGS. 1 and 2 is a mirror device 11 for laser oscillation.
The power chamber 7 shown in a cylindrical shape in FIG. 1 is an example in which an axial flow type blower (a type in which fluid is sent in the axial direction of the rotating fan) is used.
FIG. 2 shows an embodiment in which a radial type (a type in which fluid is sent in a direction perpendicular to the axis of a rotating fan, such as a Sirotskov fan), which has a rectangular tube shape, is used.

なお、第1図、第2図の記載より明らかなよう
に、発振室3と動力室7とを予め固定した組立体
の両側にはそれぞれフランジ基板が設けられてお
り、各フランジ基板に、前記冷却室5と整流室9
がそれぞれ組付けてあるものである。
As is clear from the description in FIGS. 1 and 2, flange substrates are provided on both sides of the assembly in which the oscillation chamber 3 and the power chamber 7 are fixed in advance, and each flange substrate is provided with the above-mentioned Cooling chamber 5 and rectification chamber 9
are assembled respectively.

第3図、第4図はともに本実施例装置のガス冷
却室5を示したものである。
3 and 4 both show the gas cooling chamber 5 of the apparatus of this embodiment.

ガス冷却室5は前記した発振室3と動力室7の
筒体を予め上下に固着した組立体のフランジ基板
13と連結すフランジ枠15を一側に備えた箱型
をなし、この箱型は厚板の両側板17,19と残
る3面を覆う薄板部21とで構成してある。
The gas cooling chamber 5 has a box shape with a flange frame 15 on one side connected to the flange base plate 13 of the assembly in which the cylinders of the oscillation chamber 3 and the power chamber 7 are fixed vertically in advance. It is composed of thick side plates 17, 19 and a thin plate part 21 covering the remaining three sides.

上記した両側板17と19とを貫通する水管2
3を多数を設けて例えば溶接など適宜な手段で両
側板17,19に固着してある。
Water pipe 2 passing through the above-mentioned side plates 17 and 19
3 are provided and fixed to both side plates 17 and 19 by suitable means such as welding.

第3図に示した水管23は螺線管であり、第4
図に示したのはひれ状に放熱板を取りつけたもの
が例示してある。
The water tube 23 shown in FIG. 3 is a spiral tube, and the fourth
The figure shows an example in which a heat dissipation plate is attached in the form of a fin.

前記した両側板17,19の外側には左水室2
5と右水室27とが設けてあり、左水室25には
上下方向に左水室25を2分する仕切板29が、
右水室27には上下方向に右水室27を3分する
仕切板31,33が設けてある。
There is a left water chamber 2 on the outside of the above-mentioned side plates 17 and 19.
5 and a right water chamber 27 are provided, and the left water chamber 25 has a partition plate 29 that vertically divides the left water chamber 25 into two.
The right water chamber 27 is provided with partition plates 31 and 33 that vertically divide the right water chamber 27 into three parts.

また右水室27の仕切板31の上と仕切板33
の下に冷却水の排出口35と導入口37とが設け
てあり、右水室27の上端面には空気抜の盲蓋3
9が設けてあり、左水室25の下端面には水抜の
盲蓋40が設けてある。
Also, the top of the partition plate 31 of the right water chamber 27 and the partition plate 33
A cooling water outlet 35 and an inlet 37 are provided below, and an air vent blind cover 3 is provided on the upper end surface of the right water chamber 27.
9 is provided, and a blind lid 40 for draining water is provided on the lower end surface of the left water chamber 25.

更に左右側板17,19の間に水平邪魔板41
と垂直邪魔板43とが設けてあつてガス冷却室5
に流入したガスが前記した水管23のまわりを必
ず通過するように流路を規制している。
Furthermore, a horizontal baffle plate 41 is installed between the left and right side plates 17 and 19.
and a vertical baffle plate 43 are provided in the gas cooling chamber 5.
The flow path is regulated so that the gas flowing into the water pipe 23 always passes around the water pipe 23 described above.

また前記した薄板部21の上下すみには縦方向
の補強板45が適宜固着してある。
Furthermore, longitudinal reinforcing plates 45 are appropriately fixed to the upper and lower sides of the thin plate portion 21 described above.

以上詳記したガスレーザ発振装置1は、所望の
ガス温度範囲以上になつたガスがガス冷却室5に
導かれ、水平邪魔板41と垂直邪魔板43とに案
内されガス流路と直交する多数の水管23のまわ
りを確実に下降する。一方冷却水導入口37から
右水室27に導かれた冷却水は第3図、第4図の
B図に示した矢印のように左水室25と右水室2
7との間を2往復してガスとの間に熱交換を行な
つて排出口35から排出され、比較的せまい空間
に多数の水管23を螺線状或いは放熱ひれのつい
た状態で使用してあるから熱交換の効率が高いガ
スレーザ発振装置が得られたのである。
In the gas laser oscillation device 1 described in detail above, gas whose temperature has exceeded a desired gas temperature range is guided to the gas cooling chamber 5, guided by a horizontal baffle plate 41 and a vertical baffle plate 43, and is guided through a large number of gas flow paths perpendicular to the gas flow path. It descends securely around the water pipe 23. On the other hand, the cooling water led from the cooling water inlet 37 to the right water chamber 27 flows into the left water chamber 25 and the right water chamber 2 as indicated by the arrows shown in Figures B in Figures 3 and 4.
7 and exchange heat with the gas before being discharged from the discharge port 35. A large number of water pipes 23 are used in a relatively narrow space in a spiral shape or with heat dissipation fins. As a result, a gas laser oscillation device with high heat exchange efficiency was obtained.

以上のごとき実施例の説明より理解されるよう
に、要するに本考案の要旨は実用新案登録請求の
範囲に記載のとおりであるから、その記載より明
らかなように、本考案においては、レーザの発振
室とレーザガスを循環せしめるための動力室とが
予め一体的に組立てられて1つの組立体となつて
おり、この組立体の一側部に整流室が装着され、
組立体の他側部にガス冷却室が装着されるもので
ある。そして、ガス冷却室内に形成されたレーザ
ガスの流路内に多数の冷却管を、レーザガスの流
れ方向に対して直角に配設してなるものである。
すなわち本考案においては組立体の一側部に整流
室を組付け、予めレーザガスの流路を形成し、か
つ流路内に多数の冷却管を配設してなるガス冷却
室を、組立体の他側部に組付ける構成であるか
ら、発振室から動力室へレーザガスを案内する流
路内へ熱交換器を別個に組込む必要がなく、レー
ザ発振装置の全体的組立が容易であると共に、コ
ンパクト化できるものである。
As can be understood from the above description of the embodiments, the gist of the present invention is as stated in the claims for utility model registration. The chamber and a power chamber for circulating laser gas are assembled together in advance to form one assembly, and a rectification chamber is attached to one side of this assembly.
A gas cooling chamber is attached to the other side of the assembly. A large number of cooling pipes are arranged in the laser gas flow path formed in the gas cooling chamber at right angles to the flow direction of the laser gas.
That is, in the present invention, a gas cooling chamber is formed by assembling a rectifying chamber on one side of the assembly, forming a flow path for the laser gas in advance, and arranging a large number of cooling pipes in the flow path. Since it is configured to be assembled on the other side, there is no need to separately incorporate a heat exchanger into the flow path that guides the laser gas from the oscillation chamber to the power chamber, making the overall assembly of the laser oscillation device easy and compact. It is something that can be transformed into

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の第1実施例装置の斜視図、第
2図は同上第2実施例装置の斜視図、第3図は同
上ガス冷却室の一実施例3面図、第4図は同上別
実施例の3面図である。 図面の主要部を表わす符号の説明、1……ガス
レーザ発振装置、3……発振室、5……ガス冷却
室、7……動力室、9……整流室、23……水
管、25……左水室、41……水平邪魔板。
Fig. 1 is a perspective view of the first embodiment of the device of the present invention, Fig. 2 is a perspective view of the second embodiment of the same as above, Fig. 3 is a three-sided view of one embodiment of the gas cooling chamber as above, and Fig. 4 is a perspective view of the device of the second embodiment of the invention. It is a 3-sided view of another Example same as the above. Explanation of symbols representing main parts of the drawings: 1... Gas laser oscillation device, 3... Oscillation chamber, 5... Gas cooling chamber, 7... Power chamber, 9... Rectification chamber, 23... Water tube, 25... Left water chamber, 41...Horizontal baffle board.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] レーザの発振室3とレーザガスを循環せしめる
ための動力室7とを予め一体的に組立てた組立体
の一側部に、前記発振室3へ流入するレーザガス
を整流するための整流室9を装着して設け、前記
組立体の他側部に装着したガス冷却室5内に邪魔
板を配置してレーザガスの流路を形成して設け、
上記レーザガスの流路内に、レーザガスの流れ方
向に対し直交する方向に延伸した多数の冷却管を
配設してなることを特徴とするガスレーザ発振装
置。
A rectifying chamber 9 for rectifying the laser gas flowing into the oscillating chamber 3 is attached to one side of the assembly in which the laser oscillation chamber 3 and the power chamber 7 for circulating the laser gas are integrally assembled in advance. and a baffle plate is arranged in the gas cooling chamber 5 attached to the other side of the assembly to form a flow path for the laser gas,
A gas laser oscillation device characterized in that a large number of cooling pipes extending in a direction perpendicular to the flow direction of the laser gas are disposed in the laser gas flow path.
JP17559982U 1982-11-22 1982-11-22 Gas laser oscillator Granted JPS5981054U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17559982U JPS5981054U (en) 1982-11-22 1982-11-22 Gas laser oscillator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17559982U JPS5981054U (en) 1982-11-22 1982-11-22 Gas laser oscillator

Publications (2)

Publication Number Publication Date
JPS5981054U JPS5981054U (en) 1984-05-31
JPS6141268Y2 true JPS6141268Y2 (en) 1986-11-25

Family

ID=30381994

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17559982U Granted JPS5981054U (en) 1982-11-22 1982-11-22 Gas laser oscillator

Country Status (1)

Country Link
JP (1) JPS5981054U (en)

Also Published As

Publication number Publication date
JPS5981054U (en) 1984-05-31

Similar Documents

Publication Publication Date Title
US3265126A (en) Heat exchanger
JP4623297B2 (en) Temperature control device
EP0036213B1 (en) Annular heat exchanger
DE50212342D1 (en) Air-cooled intercooler
US4271901A (en) Oil cooler for an internal combustion engine
CN117773365B (en) Laser cutting head and cooling device thereof
JPS6141268Y2 (en)
CN210832266U (en) Indoor unit of air conditioner
JPH0135277B2 (en)
JPH0619968Y2 (en) Liquid cooling device
JPH0228638Y2 (en)
JPH03204595A (en) Condenser
JPH0136030Y2 (en)
CN218002253U (en) Air-cooled heat exchanger for cooling heat-conducting oil
SU1636680A1 (en) Plate heat exchanger
JPH0351666A (en) Heat exchanger
JPS6215676Y2 (en)
SU958831A1 (en) Heat exchanger
RU2042100C1 (en) Heat exchanger for evaporative cooling of air
JP3742915B2 (en) Air-cooled absorption refrigeration system
SU896331A1 (en) Device for air heating and humidifying
JPH02144904A (en) Heat sink device
JPS6384179A (en) Cross flow type laser apparatus
KR100207557B1 (en) Heat exchanger
SU781521A2 (en) Heat exchange apparatus