JPS6138199Y2 - - Google Patents

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Publication number
JPS6138199Y2
JPS6138199Y2 JP1980121876U JP12187680U JPS6138199Y2 JP S6138199 Y2 JPS6138199 Y2 JP S6138199Y2 JP 1980121876 U JP1980121876 U JP 1980121876U JP 12187680 U JP12187680 U JP 12187680U JP S6138199 Y2 JPS6138199 Y2 JP S6138199Y2
Authority
JP
Japan
Prior art keywords
metal foil
electrode body
claws
pellet
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1980121876U
Other languages
Japanese (ja)
Other versions
JPS5747047U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1980121876U priority Critical patent/JPS6138199Y2/ja
Publication of JPS5747047U publication Critical patent/JPS5747047U/ja
Application granted granted Critical
Publication of JPS6138199Y2 publication Critical patent/JPS6138199Y2/ja
Expired legal-status Critical Current

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  • Electrodes Of Semiconductors (AREA)
  • Thyristors (AREA)
  • Die Bonding (AREA)

Description

【考案の詳細な説明】 この考案は半導体装置にかかり、特に圧接型半
導体装置における温度補償板の装着に対する改良
に関する。
DETAILED DESCRIPTION OF THE INVENTION This invention relates to semiconductor devices, and particularly to improvements in mounting a temperature compensating plate in a pressure contact type semiconductor device.

半導体装置の一例の電力用圧接型半導体装置の
中には熱疲労に耐えられるようにシリコンペレツ
トと圧接電極体との間に薄い金属箔を介在させ、
可滑動に接触させたものがある。上記金属箔を介
在させるのは次の理由による。すなわち、シリコ
ンペレツト上に電極引出し用として真空蒸着また
は合金法等によつて固着形成された金属膜が圧接
電極体に圧接された状態で半導体装置が作動する
とき、金属膜と圧接電極体とが合金化し固着す
る。この合金化は半導体装置の作動による熱と、
さらにシリコンと圧接電極体との温度膨張係数差
に基づく辷りによつて生じ、合金化し固着すると
辷りの機械的応力によりシリコンにクラツクが発
生するに至る。このシリコンのクラツクを防止す
るために、金属膜と圧接電極体とが直接接触しな
いように両者の間に機械的応力に対し弱い薄い金
属箔を挿入している。そして電力用半導体装置に
あつては、ペレツト径が大になるとともにカソー
ドパターンも種々複雑化するので、金属箔の形状
も複雑化してくる。素子部分を組み立てるときは
カソードパターンに金属箔の形状を合わせ、その
上から電極で圧接し気密封止を行なつていた。こ
の場合、金属箔の形状が複雑であればあるほど組
立てが困難で、ひいてはカソードパターンとずれ
て機能を失なわせることがある。
In a pressure contact type semiconductor device for power use, which is an example of a semiconductor device, a thin metal foil is interposed between a silicon pellet and a pressure contact electrode body in order to withstand thermal fatigue.
There is one that has sliding contact. The reason for interposing the metal foil is as follows. That is, when a semiconductor device is operated with a metal film fixedly formed on a silicon pellet by vacuum evaporation or an alloying method for leading out an electrode being pressed against a press-contact electrode body, the metal film and press-contact electrode body are is alloyed and fixed. This alloying is caused by the heat generated by the operation of the semiconductor device,
Furthermore, sliding occurs due to the difference in thermal expansion coefficient between the silicon and the pressure-welding electrode body, and when alloyed and fixed, cracks occur in the silicon due to the mechanical stress of the sliding. In order to prevent this silicon from cracking, a thin metal foil that is susceptible to mechanical stress is inserted between the metal film and the pressure contact electrode body so that they do not come into direct contact with each other. In the case of power semiconductor devices, as the pellet diameter increases, the cathode pattern also becomes more complex, and the shape of the metal foil also becomes more complex. When assembling the element, the shape of the metal foil was matched to the cathode pattern, and electrodes were pressed onto it to create an airtight seal. In this case, the more complex the shape of the metal foil, the more difficult it is to assemble, and the more the metal foil may become misaligned with the cathode pattern, resulting in a loss of functionality.

次に上記を図面によつて説明する。第1図は圧
接型半導体装置を例示するサイリスタの概要を示
す断面図、第2図は金属箔の正面図、第3図はサ
イリスタのペレツトの正面図、第4図はペレツト
とこれに圧接する圧接電極体の接触部を説明する
ための断面図である。まず、サイリスタの全体を
示す第1図において、はペレツト、2a,2c
はそれぞれアノード側の圧接電極体とカソード側
の圧接電極体、3は温度補償板、4は金属箔で、
前記温度補償板はアノード側の圧接電極体2aと
ペレツトのアノード導出用金属膜2aとペレツト
のアノード導出用金属膜1aとの間を鑞接、また
は可滑動に接続させ、金属箔はカソード側の圧接
電極体2cとペレツトのカソード導出用金属膜1
cとの間を可滑動に接続する。さらに金属箔4は
第2図に示すように環型でカソード導出用金属膜
1cに接触する形状を備えるとともに、ゲート導
出用金属膜1g(第3図)を避けるための切欠部
4aと、周縁から放射状に突出する複数の爪4
b,4b′…を有し、この爪を圧接電極体の周面に
接する如くほぼ直角に折曲げて定位するように形
成されたものである。なお、5はペレツトの表面
汚染を防止するため塗着されたシリコン樹脂の表
面保護剤層、10は気密の外囲器である。
Next, the above will be explained with reference to the drawings. Fig. 1 is a cross-sectional view showing an outline of a thyristor exemplifying a press-contact type semiconductor device, Fig. 2 is a front view of a metal foil, Fig. 3 is a front view of a pellet of the thyristor, and Fig. 4 is a pellet and a press-contact part of the thyristor. FIG. 3 is a cross-sectional view for explaining a contact portion of a press-contact electrode body. First, in Figure 1 showing the entire thyristor, 1 is a pellet, 2a, 2c
are the pressure contact electrode body on the anode side and the pressure contact electrode body on the cathode side, 3 is a temperature compensation plate, 4 is a metal foil,
The temperature compensation plate is soldered or slidably connected between the pressure contact electrode body 2a on the anode side, the metal film 2a for leading out the anode of the pellet, and the metal film 1a for leading out the anode of the pellet, and the metal foil is connected to the metal foil on the cathode side. Pressure contact electrode body 2c and pellet cathode lead metal film 1
Connect movably between c. Furthermore, as shown in FIG. 2, the metal foil 4 has an annular shape that contacts the cathode leading metal film 1c, and has a notch 4a for avoiding the gate leading metal film 1g (FIG. 3), and a peripheral edge. A plurality of claws 4 protrude radially from the
b, 4b', etc., and the claws are bent at a substantially right angle so as to be in contact with the circumferential surface of the press-contact electrode body. In addition, 5 is a surface protective agent layer of silicone resin applied to prevent surface contamination of the pellets, and 10 is an airtight envelope.

上に述べたように形成された半導体装置は金属
箔4とペレツトのカソード導出用金属膜1cとが
よく一致してないとき、カソードとゲートとの間
が金属箔によつて短絡され、サイリスタの機能が
失われることがある。また、上記事故は実際の組
立工程でしばしば生ずるもので、対策が強く要望
されている。次にも金属箔のつめの端部からコロ
ナ放電を起すことも多く、サイリスタの使用にあ
たつて破損に至ることが多い。
In the semiconductor device formed as described above, when the metal foil 4 and the cathode leading metal film 1c of the pellet do not match well, the cathode and the gate are short-circuited by the metal foil, and the thyristor is short-circuited. Functionality may be lost. Furthermore, the above-mentioned accidents often occur during actual assembly processes, and countermeasures are strongly desired. Second, corona discharge often occurs from the ends of the metal foil claws, often leading to damage when the thyristor is used.

この考案は従来の欠点にたいしこれを改良した
半導体装置の構造を提供するものである。
This invention provides a structure for a semiconductor device that overcomes the conventional drawbacks.

この考案は圧接型半導体装置の一方の電極体と
ペレツトとの間に可滑動に挿入された金属箔とこ
の金属箔の周縁に突設された複数の爪を有する圧
接型の半導体装置において、爪の端部を丸く形成
し、かつ、一部の爪を折曲して一方の電極体を定
位させるとともに、これらの爪の先端と残る折曲
されない爪を表面保護剤で被包したことを特徴と
する圧接型の半導体装置である。
This invention is a press-contact type semiconductor device having a metal foil slidably inserted between one electrode body and a pellet, and a plurality of pawls protruding from the periphery of the metal foil. The end of the electrode is rounded, some of the nails are bent to position one electrode body, and the tips of these nails and the remaining unbent nails are covered with a surface protective agent. This is a press-contact type semiconductor device.

次にこの考案を1実施例のサイリスタにつき図
面を参照して詳細に説明する。第5図ないし第7
図は1実施例の要部を説明するための図で、これ
らにより従来のサイリスタの構造との相違点につ
き詳述する。第5図はペレツトとこれに圧接する
圧接電極体の接触部を説明するための断面図、第
6図は金属箔の正面図、第7図はペレツトの正面
図である。なお、この実施例で従来の構造と変ら
ない部分は同じ符号を付して示し説明を省略し
た。第6図に示す金属箔14は円型で周縁から放
射状に複数の爪14b,14b′…を突出し、これ
らの爪は先端が円く形成され、その中の一部を直
角に折り曲げて圧接電極体の周面に接するように
形成されている。そして、図のX,X′線に沿う
断面で示すサイリスタの要部を第5図に示す。金
属箔は折曲げた爪(たとえば14b)の先端が表
面保護剤層5に埋込まれ、少し折曲げた爪(たと
えば14b′)も表面保護剤層中に埋込まれる。な
お、上記爪の埋込みは、表面保護剤層中に初めか
ら埋込まれてもよいが、固まつている表面保護剤
層の上に載せ、その上に表面保護剤層を塗付けし
て埋込み固定するようにしてもよい。
Next, this invention will be explained in detail for one embodiment of a thyristor with reference to the drawings. Figures 5 to 7
The figure is a diagram for explaining the main parts of one embodiment, and the differences from the conventional thyristor structure will be explained in detail using these figures. FIG. 5 is a cross-sectional view illustrating a contact portion between a pellet and a press-contacting electrode body that is pressed into contact with the pellet, FIG. 6 is a front view of the metal foil, and FIG. 7 is a front view of the pellet. In this embodiment, parts that are the same as those in the conventional structure are denoted by the same reference numerals, and the explanation thereof is omitted. The metal foil 14 shown in FIG. 6 has a circular shape with a plurality of claws 14b, 14b', etc. projecting radially from the periphery.The tips of these claws are rounded, and a part of the claws is bent at a right angle to form a press-contact electrode. It is formed so as to be in contact with the circumferential surface of the body. FIG. 5 shows the main parts of the thyristor in cross section taken along lines X and X' in the figure. The tip of a bent claw (for example, 14b) of the metal foil is embedded in the surface protection agent layer 5, and the slightly bent claw (for example, 14b') is also embedded in the surface protection agent layer. In addition, the above-mentioned nails may be embedded in the surface protective agent layer from the beginning, but it is also possible to place the nails on the hardened surface protective agent layer, apply the surface protective agent layer on top of the hardened surface protective agent layer, and then embed the nails. It may be fixed.

上述の如くすることにより、次にあげる利点が
ある。
By doing as described above, there are the following advantages.

(1) 金属箔周縁の複数の爪の一部を折曲して一方
の電極体を支持するとともにこれらの爪の先端
と残る爪を表面保護剤で被包するので、金属箔
の定位が強固に行なわれ、かかる構成の半導体
装置に生じやすいカソード、ゲート間の短絡が
確実に防止できる。
(1) Part of the multiple claws on the periphery of the metal foil is bent to support one electrode body, and the tips of these claws and the remaining claws are covered with a surface protective agent, so the metal foil is firmly positioned. This can reliably prevent a short circuit between the cathode and the gate, which tends to occur in a semiconductor device having such a structure.

(2) 爪の先端が円く形成され、かつ表面保護剤に
被包された構造により、コロナの発生が少なく
なり、素子の劣化が防止できることと、この部
分を被包する表面保護剤に損壊を与えない利点
もある。
(2) The structure in which the tips of the claws are rounded and encapsulated in a surface protective agent reduces the occurrence of corona and prevents deterioration of the element, and the surface protective agent that envelops this part prevents damage. There is also the advantage of not giving

(3) 接触不良がなくなりカソードと圧接電極との
間の接触抵抗が低減できる。また、金属箔のズ
レ等が無くなり表面保護剤が挾まらないので素
子のクラツク発生が防止できる。
(3) Contact failure is eliminated and contact resistance between the cathode and pressure contact electrode can be reduced. Further, since there is no displacement of the metal foil and the surface protective agent is not caught, it is possible to prevent the occurrence of cracks in the element.

また、この考案は第3図の様な、ペレツトでも
第2図の如く切欠部を設け、爪部は本考案の様に
できる事はいうまでも無い。更に、金属箔4、あ
るいは14とカソード側の圧接電極体2cとの間
に圧接による2cの変形を防ぐ目的で補助金属板
を挿入することも可能である。
It goes without saying that this invention can also be used to provide pellets with notches as shown in FIG. 2, as shown in FIG. 3, and claws as shown in the invention. Furthermore, it is also possible to insert an auxiliary metal plate between the metal foil 4 or 14 and the cathode-side press-contact electrode body 2c for the purpose of preventing deformation of 2c due to press-contact.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はサイリスタの断面図、第2図は金属箔
の正面図、第3図はサイリスタのペレツトの正面
図、第4図はペレツトと圧接電極体との接触部の
断面図、第5図以降は本考案に関し第5図はペレ
ツト圧接電極体との接触部の断面図、第6図は金
属箔の正面図、第7図はサイリスタのペレツトの
正面図である。 ……ペレツト、2a……アノード側の圧接電
極体、2c……カソード側の圧接電極体、5……
表面保護剤層、14……金属箔、14b,14
b′……金属箔の爪。
Fig. 1 is a cross-sectional view of the thyristor, Fig. 2 is a front view of the metal foil, Fig. 3 is a front view of the pellet of the thyristor, Fig. 4 is a cross-sectional view of the contact portion between the pellet and the pressure contact electrode body, Fig. 5 Hereinafter, regarding the present invention, FIG. 5 is a cross-sectional view of the contact portion with the pellet press-contact electrode body, FIG. 6 is a front view of the metal foil, and FIG. 7 is a front view of the pellet of the thyristor. 1 ... Pellet, 2a... Pressure contact electrode body on the anode side, 2c... Pressure contact electrode body on the cathode side, 5...
Surface protective agent layer, 14 ...Metal foil, 14b, 14
b′...Metal foil nails.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 圧接型の半導体装置の一方の電極体とペレツト
との間に可滑動に挿入された金属箔とこの金属箔
の周縁に突設された複数の爪を有する圧接型の半
導体装置において、爪の端部を丸く形成し、か
つ、一部の爪を折曲して一方の電極体を定位させ
るとともに、これらの爪の先端と残る爪を表面保
護剤で被包したことを特徴とする圧接型の半導体
装置。
In a pressure contact type semiconductor device having a metal foil slidably inserted between one electrode body of the pressure contact type semiconductor device and a pellet, and a plurality of claws protruding from the periphery of the metal foil, the ends of the claws A press-contact type characterized in that the electrode body is formed into a round shape, some of the claws are bent to position one electrode body, and the tips of these claws and the remaining claws are coated with a surface protective agent. Semiconductor equipment.
JP1980121876U 1980-08-29 1980-08-29 Expired JPS6138199Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1980121876U JPS6138199Y2 (en) 1980-08-29 1980-08-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1980121876U JPS6138199Y2 (en) 1980-08-29 1980-08-29

Publications (2)

Publication Number Publication Date
JPS5747047U JPS5747047U (en) 1982-03-16
JPS6138199Y2 true JPS6138199Y2 (en) 1986-11-05

Family

ID=29482517

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1980121876U Expired JPS6138199Y2 (en) 1980-08-29 1980-08-29

Country Status (1)

Country Link
JP (1) JPS6138199Y2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0760893B2 (en) * 1989-11-06 1995-06-28 三菱電機株式会社 Semiconductor device and manufacturing method thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS557342B2 (en) * 1972-05-31 1980-02-25

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS557342U (en) * 1978-06-27 1980-01-18
JPS5594064U (en) * 1978-12-21 1980-06-30

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS557342B2 (en) * 1972-05-31 1980-02-25

Also Published As

Publication number Publication date
JPS5747047U (en) 1982-03-16

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