JPS6137824A - 新しいレジスト用材料 - Google Patents
新しいレジスト用材料Info
- Publication number
- JPS6137824A JPS6137824A JP15862384A JP15862384A JPS6137824A JP S6137824 A JPS6137824 A JP S6137824A JP 15862384 A JP15862384 A JP 15862384A JP 15862384 A JP15862384 A JP 15862384A JP S6137824 A JPS6137824 A JP S6137824A
- Authority
- JP
- Japan
- Prior art keywords
- resist material
- formula
- compound
- polymer
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15862384A JPS6137824A (ja) | 1984-07-31 | 1984-07-31 | 新しいレジスト用材料 |
EP19850103038 EP0157262B1 (en) | 1984-03-19 | 1985-03-15 | Novel electron beam resist materials |
DE8585103038T DE3563273D1 (en) | 1984-03-19 | 1985-03-15 | Novel electron beam resist materials |
US06/852,198 US4751168A (en) | 1984-03-19 | 1986-04-15 | Novel electron beam resist materials |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15862384A JPS6137824A (ja) | 1984-07-31 | 1984-07-31 | 新しいレジスト用材料 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6137824A true JPS6137824A (ja) | 1986-02-22 |
JPH0548906B2 JPH0548906B2 (enrdf_load_stackoverflow) | 1993-07-22 |
Family
ID=15675752
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15862384A Granted JPS6137824A (ja) | 1984-03-19 | 1984-07-31 | 新しいレジスト用材料 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6137824A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6537736B1 (en) | 1999-03-12 | 2003-03-25 | Matsushita Electric Industrial Co., Ltd. | Patten formation method |
JP2007131703A (ja) * | 2005-11-09 | 2007-05-31 | Fujifilm Corp | 環状オレフィン系重合体、およびそれを用いた光学材料、偏光板および液晶表示装置 |
-
1984
- 1984-07-31 JP JP15862384A patent/JPS6137824A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6537736B1 (en) | 1999-03-12 | 2003-03-25 | Matsushita Electric Industrial Co., Ltd. | Patten formation method |
JP2007131703A (ja) * | 2005-11-09 | 2007-05-31 | Fujifilm Corp | 環状オレフィン系重合体、およびそれを用いた光学材料、偏光板および液晶表示装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0548906B2 (enrdf_load_stackoverflow) | 1993-07-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5728762B2 (ja) | 自己画像形成性フィルム形成ポリマー、その組成物、並びにそれから製造されるデバイス及び構造物 | |
US8715900B2 (en) | Self-imageable layer forming polymer and compositions thereof | |
JP5860193B2 (ja) | マレイミド含有シクロオレフィンポリマーおよびその利用 | |
EP1532486B1 (en) | Photosensitive compositions based on polycyclic polymers | |
JP2019524938A (ja) | 無水ナジック酸重合体及びそれに由来する感光性組成物 | |
EP0157262B1 (en) | Novel electron beam resist materials | |
US10303057B2 (en) | Fluorine free photopatternable phenol functional group containing polymer compositions | |
US9932432B2 (en) | Polymers of maleimide and cycloolefinic monomers as permanent dielectric materials | |
JP2022166033A (ja) | レジスト下層組成物及び当該組成物を使用するパターン形成方法 | |
KR20060117361A (ko) | 불소 함유 환상 화합물, 불소 함유 고분자 화합물, 이를이용한 레지스트 재료 및 패턴 형성 방법 | |
CN106893053A (zh) | 酸不稳定超支化共聚物和相关联的光致抗蚀剂组合物以及形成电子器件的方法 | |
JPS58184143A (ja) | レジスト組成物 | |
JPS6137824A (ja) | 新しいレジスト用材料 | |
JPS6137825A (ja) | 新規なレジスト用材料 | |
JPH0354336B2 (enrdf_load_stackoverflow) | ||
TW202216836A (zh) | 微影膜形成用組成物、阻劑圖型形成方法及電路圖型形成方法 | |
Reddy et al. | Ferrocene bearing non-ionic poly-aryl tosylates: synthesis, characterization and electron beam lithography applications | |
WO2025154627A1 (ja) | リソグラフィー下層膜形成組成物、リソグラフィー下層膜、ポジ型レジスト組成物、レジスト膜、及びレジストパターンの形成方法 | |
KR100504290B1 (ko) | 포토레지스트용 옥소옥사알카노노르보넨 함유 공중합체 및그를 포함하는 포토레지스트 조성물 | |
JPS62169155A (ja) | ネガ型フオトレジスト組成物 | |
JPH0364536B2 (enrdf_load_stackoverflow) | ||
JPS63282732A (ja) | レジスト材料 | |
JPH0584895B2 (enrdf_load_stackoverflow) | ||
JPH0259751A (ja) | 感光性組成物 | |
JPS62502362A (ja) | 感電子ビ−ム性ポジレジスト |