JPS6137824A - 新しいレジスト用材料 - Google Patents

新しいレジスト用材料

Info

Publication number
JPS6137824A
JPS6137824A JP15862384A JP15862384A JPS6137824A JP S6137824 A JPS6137824 A JP S6137824A JP 15862384 A JP15862384 A JP 15862384A JP 15862384 A JP15862384 A JP 15862384A JP S6137824 A JPS6137824 A JP S6137824A
Authority
JP
Japan
Prior art keywords
resist material
formula
compound
polymer
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15862384A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0548906B2 (enrdf_load_stackoverflow
Inventor
Shozo Tsuchiya
土屋 昇三
Nobuo Aoki
信雄 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Oil Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Oil Corp filed Critical Nippon Oil Corp
Priority to JP15862384A priority Critical patent/JPS6137824A/ja
Priority to EP19850103038 priority patent/EP0157262B1/en
Priority to DE8585103038T priority patent/DE3563273D1/de
Publication of JPS6137824A publication Critical patent/JPS6137824A/ja
Priority to US06/852,198 priority patent/US4751168A/en
Publication of JPH0548906B2 publication Critical patent/JPH0548906B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
JP15862384A 1984-03-19 1984-07-31 新しいレジスト用材料 Granted JPS6137824A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP15862384A JPS6137824A (ja) 1984-07-31 1984-07-31 新しいレジスト用材料
EP19850103038 EP0157262B1 (en) 1984-03-19 1985-03-15 Novel electron beam resist materials
DE8585103038T DE3563273D1 (en) 1984-03-19 1985-03-15 Novel electron beam resist materials
US06/852,198 US4751168A (en) 1984-03-19 1986-04-15 Novel electron beam resist materials

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15862384A JPS6137824A (ja) 1984-07-31 1984-07-31 新しいレジスト用材料

Publications (2)

Publication Number Publication Date
JPS6137824A true JPS6137824A (ja) 1986-02-22
JPH0548906B2 JPH0548906B2 (enrdf_load_stackoverflow) 1993-07-22

Family

ID=15675752

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15862384A Granted JPS6137824A (ja) 1984-03-19 1984-07-31 新しいレジスト用材料

Country Status (1)

Country Link
JP (1) JPS6137824A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6537736B1 (en) 1999-03-12 2003-03-25 Matsushita Electric Industrial Co., Ltd. Patten formation method
JP2007131703A (ja) * 2005-11-09 2007-05-31 Fujifilm Corp 環状オレフィン系重合体、およびそれを用いた光学材料、偏光板および液晶表示装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6537736B1 (en) 1999-03-12 2003-03-25 Matsushita Electric Industrial Co., Ltd. Patten formation method
JP2007131703A (ja) * 2005-11-09 2007-05-31 Fujifilm Corp 環状オレフィン系重合体、およびそれを用いた光学材料、偏光板および液晶表示装置

Also Published As

Publication number Publication date
JPH0548906B2 (enrdf_load_stackoverflow) 1993-07-22

Similar Documents

Publication Publication Date Title
JP5728762B2 (ja) 自己画像形成性フィルム形成ポリマー、その組成物、並びにそれから製造されるデバイス及び構造物
US8715900B2 (en) Self-imageable layer forming polymer and compositions thereof
JP5860193B2 (ja) マレイミド含有シクロオレフィンポリマーおよびその利用
EP1532486B1 (en) Photosensitive compositions based on polycyclic polymers
JP2019524938A (ja) 無水ナジック酸重合体及びそれに由来する感光性組成物
EP0157262B1 (en) Novel electron beam resist materials
US10303057B2 (en) Fluorine free photopatternable phenol functional group containing polymer compositions
US9932432B2 (en) Polymers of maleimide and cycloolefinic monomers as permanent dielectric materials
JP2022166033A (ja) レジスト下層組成物及び当該組成物を使用するパターン形成方法
KR20060117361A (ko) 불소 함유 환상 화합물, 불소 함유 고분자 화합물, 이를이용한 레지스트 재료 및 패턴 형성 방법
CN106893053A (zh) 酸不稳定超支化共聚物和相关联的光致抗蚀剂组合物以及形成电子器件的方法
JPS58184143A (ja) レジスト組成物
JPS6137824A (ja) 新しいレジスト用材料
JPS6137825A (ja) 新規なレジスト用材料
JPH0354336B2 (enrdf_load_stackoverflow)
TW202216836A (zh) 微影膜形成用組成物、阻劑圖型形成方法及電路圖型形成方法
Reddy et al. Ferrocene bearing non-ionic poly-aryl tosylates: synthesis, characterization and electron beam lithography applications
WO2025154627A1 (ja) リソグラフィー下層膜形成組成物、リソグラフィー下層膜、ポジ型レジスト組成物、レジスト膜、及びレジストパターンの形成方法
KR100504290B1 (ko) 포토레지스트용 옥소옥사알카노노르보넨 함유 공중합체 및그를 포함하는 포토레지스트 조성물
JPS62169155A (ja) ネガ型フオトレジスト組成物
JPH0364536B2 (enrdf_load_stackoverflow)
JPS63282732A (ja) レジスト材料
JPH0584895B2 (enrdf_load_stackoverflow)
JPH0259751A (ja) 感光性組成物
JPS62502362A (ja) 感電子ビ−ム性ポジレジスト