JPS6136222B2 - - Google Patents
Info
- Publication number
- JPS6136222B2 JPS6136222B2 JP3030781A JP3030781A JPS6136222B2 JP S6136222 B2 JPS6136222 B2 JP S6136222B2 JP 3030781 A JP3030781 A JP 3030781A JP 3030781 A JP3030781 A JP 3030781A JP S6136222 B2 JPS6136222 B2 JP S6136222B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- cleaning tool
- mask
- fixing plate
- fixing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004140 cleaning Methods 0.000 claims description 37
- 239000004065 semiconductor Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 229920001342 Bakelite® Polymers 0.000 description 1
- 239000004637 bakelite Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3030781A JPS57144551A (en) | 1981-03-03 | 1981-03-03 | Washing tool fixing mechanism |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3030781A JPS57144551A (en) | 1981-03-03 | 1981-03-03 | Washing tool fixing mechanism |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57144551A JPS57144551A (en) | 1982-09-07 |
JPS6136222B2 true JPS6136222B2 (enrdf_load_stackoverflow) | 1986-08-16 |
Family
ID=12300108
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3030781A Granted JPS57144551A (en) | 1981-03-03 | 1981-03-03 | Washing tool fixing mechanism |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57144551A (enrdf_load_stackoverflow) |
-
1981
- 1981-03-03 JP JP3030781A patent/JPS57144551A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS57144551A (en) | 1982-09-07 |
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