JPS6135559Y2 - - Google Patents

Info

Publication number
JPS6135559Y2
JPS6135559Y2 JP1980185668U JP18566880U JPS6135559Y2 JP S6135559 Y2 JPS6135559 Y2 JP S6135559Y2 JP 1980185668 U JP1980185668 U JP 1980185668U JP 18566880 U JP18566880 U JP 18566880U JP S6135559 Y2 JPS6135559 Y2 JP S6135559Y2
Authority
JP
Japan
Prior art keywords
baffler
exhaust gas
sealing device
water sealing
lid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1980185668U
Other languages
Japanese (ja)
Other versions
JPS57111852U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1980185668U priority Critical patent/JPS6135559Y2/ja
Publication of JPS57111852U publication Critical patent/JPS57111852U/ja
Application granted granted Critical
Publication of JPS6135559Y2 publication Critical patent/JPS6135559Y2/ja
Expired legal-status Critical Current

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  • Heat Treatment Of Strip Materials And Filament Materials (AREA)

Description

【考案の詳細な説明】 本考案はバツチ式焼鈍炉の炉内圧力をコントロ
ールするバフラーに関するものである。
[Detailed Description of the Invention] The present invention relates to a baffler for controlling the pressure inside a batch annealing furnace.

焼鈍炉内圧のコントロールは、炉内排ガスをバ
フラーと呼ぶ水封装置に引込み排ガスが水を押し
のけバブリングするその水柱圧で行つている。こ
のバフラーは焼鈍炉ベース当り3基あり、それぞ
れインナーカバー内の圧力、アウターカバー(炉
体)とインナーカバー間の圧力、大気とアウター
カバー間の圧力をコントロールしている。第1図
は従来のバフラーの概略図である。1はインナー
カバー、2は耐火物製の炉体(アウターカバ
ー)、3はバフラー、4はコイルを示す。5は排
ガス散管である。このような従来の焼鈍炉におい
ては、焼鈍炉建家内におけるコントロールの移
動、ハンドリングを容易するため、バフラーを通
過した排ガスを大気に導く排ガス放散管を建家外
に迄延長している。そのため排ガス管が長く塵
埃、結露水等の混入による配管詰まりが多発し、
この清掃にかける浪費時間は多大なるものであつ
た。
The internal pressure of the annealing furnace is controlled by drawing the exhaust gas inside the furnace into a water sealing device called a baffler and using the water column pressure, which causes the exhaust gas to displace water and create bubbles. There are three bafflers per annealing furnace base, each controlling the pressure inside the inner cover, the pressure between the outer cover (furnace body) and the inner cover, and the pressure between the atmosphere and the outer cover. FIG. 1 is a schematic diagram of a conventional baffler. 1 is an inner cover, 2 is a refractory furnace body (outer cover), 3 is a baffler, and 4 is a coil. 5 is an exhaust gas diffuser. In such conventional annealing furnaces, in order to facilitate movement and handling of controls within the annealing furnace building, an exhaust gas dissipation pipe that guides the exhaust gas that has passed through the baffler to the atmosphere is extended outside the building. As a result, the exhaust gas pipes are long and often clog due to contamination with dust, condensed water, etc.
The amount of time wasted in this cleaning was enormous.

またバフラーは、炉ベースの地下にあり、保守
点検が難しく、焼鈍作業のネツクとなつていた。
In addition, the baffler was located underground in the furnace base, making maintenance and inspection difficult and a hindrance to annealing work.

本考案は炉の直近で排ガスを燃焼させることに
より排ガス放散管を短縮し、且つこの放散管をア
ウターカバーと共に移動できるようにして従来の
欠点を解消したものである。しかも3基のバフラ
ーを1基に集約し、床面に設置することにより保
守点検、清掃頻度を少なくしたものである。
The present invention eliminates the drawbacks of the conventional method by shortening the exhaust gas dissipation pipe by burning the exhaust gas in the vicinity of the furnace, and by making the dispersion pipe movable together with the outer cover. Moreover, by consolidating three bafflers into one and installing it on the floor, maintenance inspection and cleaning frequency can be reduced.

以下図面に基づいて説明する。 This will be explained below based on the drawings.

インナーカバー1内の排ガスは、配管6により
浸漬体7の下端からバフラー3内の水面下へ放出
される。一方インナーカバー1とアウターカバー
2内の排ガスは、アウターカバー2に固定した導
管8から水封装置9の上蓋10内に供給される。
即ちこの上蓋10内には、仕切板11があつて、
仕切板11の左側(排ガス供給側a)へ供給され
る。更にこの排ガスは浸漬管12によりバフラー
3の水面下へ放出される。かくしてバフラー3の
水面下に放出された両排出ガスは、バフラー3の
上蓋13に固定した上昇管14により水封装置9
内の水面上の仕切板11の右側(排ガス排出管
b)へ導びき出され、しかるのち上蓋10に固定
された排ガス放散管15より大気中へ燃焼放散さ
れる。
The exhaust gas in the inner cover 1 is discharged from the lower end of the immersed body 7 to below the water surface in the baffler 3 through a pipe 6. On the other hand, the exhaust gas inside the inner cover 1 and the outer cover 2 is supplied into the upper lid 10 of the water sealing device 9 through a conduit 8 fixed to the outer cover 2.
That is, inside this upper lid 10 there is a partition plate 11,
The gas is supplied to the left side of the partition plate 11 (exhaust gas supply side a). Furthermore, this exhaust gas is discharged below the water surface of the baffler 3 through the immersion pipe 12. Both exhaust gases thus released below the water surface of the baffler 3 are sent to the water sealing device 9 by the riser pipe 14 fixed to the upper cover 13 of the baffler 3.
The exhaust gas is led out to the right side of the partition plate 11 above the water surface (exhaust gas exhaust pipe b), and then burned and diffused into the atmosphere through the exhaust gas diffusion pipe 15 fixed to the upper lid 10.

一方、水封装置9及びバフラー3内への水の供
給は、先ず供給源から配管15により水封装置9
内へ供給され、これをオーバーフローした水を受
け皿16で受けて配管17によりバフラー3内へ
循環し、バフラー3をオーバーフローした水は受
皿18で受けて配管19により排水される。尚、
図中20は焼鈍ガスの供給管を示す。
On the other hand, water is first supplied to the water sealing device 9 and the baffler 3 from the supply source through the piping 15 to the water sealing device 9.
Water that overflows is received by a receiving tray 16 and circulated into the baffler 3 through a pipe 17, and water that overflows the baffler 3 is received by a receiving tray 18 and drained via a pipe 19. still,
In the figure, 20 indicates a supply pipe for annealing gas.

この考案は上記の如く、アウターカバー2、導
管8、水封装置9の上蓋10及び排ガス放散管5
を一体構造とし、且つ排ガス放散を焼鈍炉の近傍
で行う様にしたので、排ガス放散管5の長さが著
しく短かくなり、管内の清掃作業が簡便となる。
排ガス放散管5が、この様に焼鈍炉の近傍にある
ことは、焼鈍コイルの搬入、搬出に支障を来たす
ことになるが、本考案では、アウターカバー2の
撤去により排ガス放散管5も一緒に退避するの
で、上記の支障は全くない。又、バフラーを床面
に設置すれば、メンテナンスも容易となるもので
ある。
As described above, this invention includes the outer cover 2, the conduit 8, the upper cover 10 of the water sealing device 9, and the exhaust gas dissipation pipe 5.
Since it has an integral structure and the exhaust gas is dissipated near the annealing furnace, the length of the exhaust gas dissipation pipe 5 is significantly shortened, and the cleaning work inside the pipe is simplified.
Having the exhaust gas diffusion pipe 5 in the vicinity of the annealing furnace in this way poses a problem when carrying in and out of the annealing coil, but in the present invention, by removing the outer cover 2, the exhaust gas diffusion pipe 5 can also be removed together with the annealing furnace. Since the location will be evacuated, the above problem will not occur at all. Also, if the baffler is installed on the floor, maintenance will be easier.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の焼鈍炉バフラーを示す概略図第
2図は本考案の焼鈍炉バフラーの図。 1……インナーカバー、2……アウターカバー
(炉体)、3……バフラー、4……コイル、5……
排ガス放散管、7……浸漬体、8……固定導管、
9……水封装置、10……上蓋、11……仕切
板、12……浸漬管、13……バフラー上蓋、1
4……上昇管。
FIG. 1 is a schematic diagram showing a conventional annealing furnace baffler. FIG. 2 is a diagram of an annealing furnace baffler according to the present invention. 1...Inner cover, 2...Outer cover (furnace body), 3...Baffler, 4...Coil, 5...
Exhaust gas diffusion pipe, 7... immersion body, 8... fixed conduit,
9...Water sealing device, 10...Upper lid, 11...Partition plate, 12...Immersion tube, 13...Baffler upper cover, 1
4...Rising pipe.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] バツチ式焼鈍炉内の雰囲気ガスをバフラー内に
供給して炉内圧を調整するようにしたものにおい
て、上記バフラーの上方に水封装置9を設け、こ
の水封装置内に浸漬する蓋10には、その内側に
仕切板11を設けると共に仕切板の両側に位置す
る蓋の外側に夫々焼鈍炉のアウターカバー2に接
続する排ガス導管8及び排ガス放散管5を設け、
上記水封装置の蓋内の排ガス供給側aと上記バフ
ラーの水中とを水封装置及びバフラー蓋13を貫
通して配管12によつて接続すると共に上記バフ
ラー蓋に設けた排ガス排出管14の先端を水封装
置を貫通して水封装置の蓋内の排ガス排出管bに
開口せしめてなるバツチ式焼鈍炉のバフラー。
In a batch type annealing furnace in which atmospheric gas is supplied into the baffler to adjust the furnace pressure, a water sealing device 9 is provided above the baffler, and a lid 10 immersed in the water sealing device is provided with a water sealing device 9 above the baffler. , a partition plate 11 is provided on the inside thereof, and an exhaust gas conduit 8 and an exhaust gas diffusion pipe 5 are provided on the outside of the lid located on both sides of the partition plate, respectively, to connect to the outer cover 2 of the annealing furnace.
The exhaust gas supply side a in the lid of the water sealing device and the water in the baffler are connected by a pipe 12 passing through the water sealing device and the baffler lid 13, and the tip of an exhaust gas discharge pipe 14 provided in the baffler lid. A baffler for a batch type annealing furnace, which is formed by passing through a water sealing device and opening into an exhaust gas discharge pipe b in the lid of the water sealing device.
JP1980185668U 1980-12-25 1980-12-25 Expired JPS6135559Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1980185668U JPS6135559Y2 (en) 1980-12-25 1980-12-25

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1980185668U JPS6135559Y2 (en) 1980-12-25 1980-12-25

Publications (2)

Publication Number Publication Date
JPS57111852U JPS57111852U (en) 1982-07-10
JPS6135559Y2 true JPS6135559Y2 (en) 1986-10-16

Family

ID=29986926

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1980185668U Expired JPS6135559Y2 (en) 1980-12-25 1980-12-25

Country Status (1)

Country Link
JP (1) JPS6135559Y2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3737317A (en) * 1971-04-12 1973-06-05 Eastman Kodak Co Photographic elements and processes

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3737317A (en) * 1971-04-12 1973-06-05 Eastman Kodak Co Photographic elements and processes

Also Published As

Publication number Publication date
JPS57111852U (en) 1982-07-10

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