JPS61291961A - Manufacture of metallic strip having brass coating layer - Google Patents

Manufacture of metallic strip having brass coating layer

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Publication number
JPS61291961A
JPS61291961A JP13205285A JP13205285A JPS61291961A JP S61291961 A JPS61291961 A JP S61291961A JP 13205285 A JP13205285 A JP 13205285A JP 13205285 A JP13205285 A JP 13205285A JP S61291961 A JPS61291961 A JP S61291961A
Authority
JP
Japan
Prior art keywords
copper
brass
plating
strip
plated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13205285A
Other languages
Japanese (ja)
Inventor
Kazuaki Chiyouhata
丁畑 和昭
Tokio Fujioka
藤岡 外喜夫
Norio Tsukiji
築地 憲夫
Toshiharu Kikko
橘高 敏晴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Nisshin Co Ltd
Original Assignee
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nisshin Steel Co Ltd filed Critical Nisshin Steel Co Ltd
Priority to JP13205285A priority Critical patent/JPS61291961A/en
Publication of JPS61291961A publication Critical patent/JPS61291961A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To easily obtain a metallic plate having a brass layer as the outermost layer without deteriorating the properties of the base metal by vacuum- depositing Zn on a metallic strip having a Cu surface and by heat treating the Zn plated strip at a prescribed temp. CONSTITUTION:Zn is vacuum-deposited on a metallic strip of Cu or a Cu plated metal. This Zn plated strip is heated to 250-420 deg.C to diffuse the Zn and Cu. Thus, a metallic plate having a brass layer as the outermost layer is easily obtd. without deteriorating the properties of the base metal.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は銅または銅めっきした金属のストリップ(板)
に亜鉛を真空蒸着めっきし、その後拡散処理を施して真
鍮層を形成することにより、真鍮めっき金属ストリップ
(板)を得る方法に関する。
[Detailed Description of the Invention] <Industrial Application Field> The present invention is directed to copper or copper-plated metal strips (plates).
This method relates to a method of obtaining a brass-plated metal strip (plate) by vacuum-evaporating zinc on a metal plate and then performing a diffusion treatment to form a brass layer.

〈従来技術〉 真鍮すなわち50%以下の亜鉛を含む銅合金は美麗な黄
金色を有し、比較的強さが大きく、ろう付けがしやすく
耐食性が良い等の利点の故に広く一般に使用され、特に
その薄板は広く利用されている。このような真鍮の特性
および黄金の色調を鋼その他の金属材料に賦与するため
には真鍮をめっきする方法がる。
<Prior art> Brass, that is, a copper alloy containing less than 50% zinc, has a beautiful golden color, is relatively strong, is easy to braze, and has good corrosion resistance, so it is widely used. Its thin plates are widely used. In order to impart the characteristics of brass and golden color to steel and other metal materials, there is a method of plating brass.

真鍮めっきは溶融めっき及び電気めっきが考えられる。Brass plating may be hot-dip plating or electroplating.

しかしながら、鋼板等の金属材料に溶融真鍮めっきする
には、例えば40%Zn−60%Cuの真鍮では融点が
約900℃と高温であるために以下に記すような問題点
がある。
However, in hot-dip brass plating on metal materials such as steel plates, for example, 40% Zn-60% Cu brass has a high melting point of about 900° C., so there are problems as described below.

1)真鍮の高融点に耐えうるめつき設備の製作が困難で
ある。
1) It is difficult to manufacture plating equipment that can withstand the high melting point of brass.

2)被めっき素材がめつき時に高温にさらされるので素
材自身の機械的性質等が影響を受ける。
2) Since the material to be plated is exposed to high temperatures during plating, the mechanical properties of the material itself are affected.

真鍮めっきの方法として電気めっき法も広く用いられて
いる。すなわち、シアン化銅、シアン化亜鉛、シアン化
カリウムを主成分とする電解液中で電着するのであるが
、有害物であるシアン化合物の使用等に甚く公害防止の
ための設備や経費が膨大になるという化学処理の一般的
不利に加えて、責な金属である銅と卑な金属である亜鉛
を同時に電着させるためには、各成分の濃度管理、電解
液の温度管理、PH管理など制御すべき条件が多すぎ、
かつ許容範囲が極めて狭く、また電流密度もIA/dm
2以下と小さいために工業的有用性に乏しい。
Electroplating is also widely used as a brass plating method. In other words, electrodeposition is performed in an electrolytic solution containing copper cyanide, zinc cyanide, and potassium cyanide as main components, but the use of cyanide, which is a hazardous substance, requires enormous equipment and expense to prevent pollution. In addition to the general disadvantages of chemical processing, such as controlling the concentration of each component, controlling the temperature of the electrolyte, and controlling the pH, in order to simultaneously electrodeposit copper, which is a negative metal, and zinc, which is a base metal, it is necessary to There are too many conditions to be met,
The tolerance range is extremely narrow, and the current density is IA/dm.
Since it is small (less than 2), it is of poor industrial utility.

特開昭58−39795号には、被めっき物に銅および
亜鉛の順に別々にめっきし、その後、所定の温度で加熱
することにより銅と亜鉛を拡散させ、黄銅(真鍮)層を
形成する真鍮めっき法が提案されている。この明細書に
は亜鉛めっきする手段については何も具体的に記載され
ていない、特に真空蒸着めっきに言及されていないこと
、およびこの種のめっきは通常片面にのみ施される事実
を考慮すれば、当該発明の発明者は電気めっきを考慮し
ていたと考えるのが至当である。
JP-A No. 58-39795 discloses a brass layer in which the object to be plated is plated with copper and zinc separately in that order, and then heated at a predetermined temperature to diffuse the copper and zinc. A plating method has been proposed. This specification does not specifically mention any means of galvanizing, especially considering that there is no mention of vacuum evaporation plating and the fact that this type of plating is usually only applied to one side. It is reasonable to assume that the inventor of the invention had electroplating in mind.

〈従来技術の問題点〉 前記の方法は、上述の化学処理の不利に加えて、銅めっ
きに続いて亜鉛めっきを施すために、各めっき液の混入
の防止、加熱処理と組合せた連続処理ラインの構成等に
困難があって工業的に成立しがたい。
<Problems with the prior art> In addition to the disadvantages of the chemical treatment described above, the above method requires the prevention of contamination of each plating solution and the need for a continuous processing line in combination with heat treatment in order to perform zinc plating subsequent to copper plating. However, it is difficult to realize it industrially due to difficulties in its structure.

〈問題解決の手段〉 上記の従来技術の問題点を解決するためには、金属帯を
、あらかじめ加熱しておいて、その表面に亜鉛を真空蒸
着めっきし、その後に加熱による拡散処理を施すことに
より真鍮めっき層が形成され、真鍮の性質および黄金の
色調を有する真鍮めっき金属板が得られる。
<Means for solving the problem> In order to solve the above-mentioned problems of the conventional technology, it is necessary to heat the metal strip in advance, vacuum-deposit zinc on its surface, and then perform a diffusion treatment by heating. A brass plating layer is formed by this, and a brass-plated metal plate having the properties of brass and a golden tone is obtained.

〈発明の構成〉 本発明は、銅または銅めっきした金属のストリップ(板
)に亜鉛を真空蒸着めっきし、その後に250〜420
℃に加熱して拡散処理を施すことからなる真鍮被覆層を
有する金属ストリップ(板)の製造方法を提供する。
<Structure of the Invention> In the present invention, copper or a copper-plated metal strip (plate) is plated with zinc by vacuum evaporation, and then
Provided is a method for manufacturing a metal strip (plate) having a brass coating layer, which comprises heating to 0.degree. C. and performing a diffusion treatment.

素材であるストリップ状の基体は、市販の銅ストリップ
または銅めっき鋼板(カッパータイト)が使用が有利に
使用される。
As the strip-shaped base material, commercially available copper strips or copper-plated steel plates (Coppertite) are advantageously used.

理論的には亜鉛と銅の相互拡散は常温でも進行するが、
連続処理ラインで適用可崩である実用的な拡散の生ずる
温度は約250℃であるので、真空蒸着亜鉛めっき後の
銅めっき金属帯の拡散処理温度は250℃以上に限定さ
れる。しかし、この温度が約420℃を超えると、蒸着
された亜鉛の溶解が実質的に生じ始めるので、420℃
以下に限定される。
Theoretically, interdiffusion between zinc and copper proceeds even at room temperature, but
Since the temperature at which practical diffusion occurs, which can be applied in a continuous processing line, is about 250°C, the diffusion treatment temperature of the copper-plated metal strip after vacuum evaporation galvanizing is limited to 250°C or higher. However, if this temperature exceeds about 420°C, substantial dissolution of the deposited zinc begins to occur;
Limited to:

なお、銅または銅めっき金属のストリップに真空蒸着亜
鉛めっきを施す際に、250〜450℃の温度範囲に予
熱すれば、真空蒸着めっきした亜鉛が金属帯表面から再
蒸発することなく銅と相互拡散し、最表層部に真鍮層が
形成されるが、後で拡散処理を行なうので金属帯の予熱
は必ずしもこの温度範囲で行なう必要はないが、真空蒸
着亜鉛めっき後の拡散処理を短時間で終了させるために
上記の温度範囲で予熱するのが有利である。
When vacuum-deposited zinc plating is applied to a strip of copper or copper-plated metal, if preheated to a temperature range of 250 to 450°C, the vacuum-deposited zinc will not reevaporate from the surface of the metal strip and will interdiffuse with the copper. However, a brass layer is formed on the outermost layer, but since diffusion treatment will be performed later, it is not necessary to preheat the metal strip within this temperature range, but the diffusion treatment after vacuum evaporation galvanizing can be completed in a short time. It is advantageous to preheat in the above temperature range in order to achieve this.

銅めっき金属帯の予熱と真空蒸着亜鉛めっき後の拡散処
理は、実質的に真空中または非酸化性雰囲気中で金属帯
を加熱できさえすればよいわけであるが、望ましくはガ
ス還元前処理炉および拡散処理炉を有する連続式真空蒸
着亜鉛めっき装置を用いる。
Preheating of the copper-plated metal strip and diffusion treatment after vacuum-deposited zinc plating can be carried out as long as the metal strip can be heated substantially in a vacuum or in a non-oxidizing atmosphere, but preferably in a gas reduction pre-treatment furnace. and a continuous vacuum evaporation galvanizing equipment equipped with a diffusion treatment furnace.

本発明の方法は、実際には、本発明者らが開発した特願
昭59−201423に記載され、以下にも概略を記述
するガス還元前処理炉を有する連続真空蒸着装置に拡散
処理炉を付加したものを使用するのが有利である。
The method of the present invention is actually described in Japanese Patent Application No. 59-201423 developed by the present inventors, and in which a diffusion treatment furnace is added to a continuous vacuum evaporation apparatus having a gas reduction pretreatment furnace, which is also outlined below. It is advantageous to use an addition.

真空中で金属ストリップを加熱することは技術的に困難
であり、また、大気中で金属ストリップを加熱すること
は容易であるが、この加熱炉を真空蒸着装置に連結して
連続処理ラインを構成することは技術的に困難である。
Although it is technically difficult to heat a metal strip in a vacuum, and it is easy to heat a metal strip in the atmosphere, it is possible to connect this heating furnace to a vacuum evaporation device to configure a continuous processing line. It is technically difficult to do so.

前記の連続真空蒸着装置はこれを解決し改良したもので
あり1合金化真鍮めっき法はこの装置の開発によって始
めて工業的に実施可能になったと言える。
The above-mentioned continuous vacuum evaporation apparatus solved and improved this problem, and it can be said that the single-alloyed brass plating method became industrially practical for the first time with the development of this apparatus.

〈発明の具体的開示〉 以下本発明を銅めっき鋼帯について具体的に説明するが
、本発明は銅および銅めっきしたあらゆる金属のストリ
ップに適用できることは自明である。
<Specific Disclosure of the Invention> The present invention will be specifically explained below regarding a copper-plated steel strip, but it is obvious that the present invention can be applied to copper and any copper-plated metal strip.

第1図は本発明方法に使用される連続真空蒸着装置の1
実施態様の概念図である。この装置は前記の連続真空蒸
着装置に拡散処理炉を付加したものである。第1図にお
いて、鋼帯1は左方の入口から連続的にガス還元焼鈍炉
2に導入されて表面の酸化物が除去されて清浄にされる
とともに焼鈍されてから、ガス還元焼鈍炉2の雰囲気ガ
スが真空蒸着系内へ流入するのを防止するための第1賦
圧室3.一連の段階的に排気して減圧するための個別に
真空排気手段を備えた隔室に納められた多数のシールロ
ールからなる第1シールロール室4を経て、真空蒸着め
っき室5に入り、ここで亜鉛を真空蒸着されてから、再
び前記同様の目的と構成の段階的に復圧する第2シール
ロール室4′、前記同様の目的の第2賦圧室3°を経て
拡散処理炉9に入り、ついで冷却室10で冷却される。
Figure 1 shows one of the continuous vacuum evaporation equipment used in the method of the present invention.
It is a conceptual diagram of an embodiment. This apparatus is the above-mentioned continuous vacuum evaporation apparatus with a diffusion treatment furnace added. In FIG. 1, the steel strip 1 is continuously introduced into the gas reduction annealing furnace 2 from the left inlet, where the oxides on the surface are removed and cleaned, and the steel strip 1 is annealed. 3. A first pressure application chamber for preventing atmospheric gas from flowing into the vacuum deposition system. The vacuum deposition plating chamber 5 is entered through a first seal roll chamber 4 consisting of a number of seal rolls housed in compartments each equipped with individual evacuation means for a series of stepwise evacuations and depressurization. After zinc is vacuum-deposited in step 1, it passes through the second seal roll chamber 4', which has the same purpose and configuration as described above, and which is gradually depressurized, and the second pressurization chamber 3°, which has the same purpose as described above, and then enters the diffusion treatment furnace 9. , and then cooled in the cooling chamber 10.

図示のように、第1賦正室の上流側および第2賦圧室の
下流側にシールロールを設けてもよい。
As shown in the figure, seal rolls may be provided on the upstream side of the first loading chamber and on the downstream side of the second loading chamber.

シールロール室の構成は特願昭59−51149号およ
び特願昭59−201423号に詳細に記載されている
。真空蒸着室5は種々に構成することができるが、ここ
に図示するものは適当な手段(電気抵抗加熱手段、電子
ビーム加熱手段、等)によって加熱される亜鉛浴6、亜
鉛蒸気を輸送するためのチャンネル7からなる蒸着手段
を収容し、被覆される基体鋼帯lの支持反転の役目を果
すロール8を備えている。このロールは加熱手段を具え
ていてもよい。
The structure of the seal roll chamber is described in detail in Japanese Patent Application No. 59-51149 and Japanese Patent Application No. 59-201423. The vacuum deposition chamber 5 can be configured in various ways, but the one shown here includes a zinc bath 6 heated by suitable means (electrical resistance heating means, electron beam heating means, etc.) for transporting the zinc vapor. It contains a vapor deposition means consisting of channels 7 and is equipped with rolls 8 which serve as support and inversion for the base steel strip l to be coated. This roll may be equipped with heating means.

鋼帯1はガス還元前処理炉で、例えばN2あるいはH2
3%残部N2よりなる非酸化性ガス雰囲気で400〜6
00℃の温度に加熱される。加熱手段はラジアントチュ
ーブあるいは電気抵抗加熱器が適当である。第1図に示
した装置では、シールロール室の長さにもよるが、ガス
還元前処理炉出口側の温度を400〜600℃にすれば
、真空蒸着時に250〜450℃の好適温度が達成され
る。蒸着を終った鋼帯は第2シールロール室4°と第2
賦圧室3゛を経由してガス還元前処理炉と同じ雰囲気の
拡散処理炉9内で拡散処理を受ける。真空蒸着亜鉛めっ
き後、拡散処理炉に到達した時点での板温度は200〜
400℃になっているので、250〜420°Cの温度
に加熱する。ついで同じ雰囲気の冷却室10内で冷却さ
れる。冷却しないで大気中に取り出すと真鍮が酸化され
て変色する。
The steel strip 1 is in a gas reduction pre-treatment furnace, for example N2 or H2
400-6 in a non-oxidizing gas atmosphere consisting of 3% balance N2
It is heated to a temperature of 00°C. A suitable heating means is a radiant tube or an electric resistance heater. In the apparatus shown in Figure 1, if the temperature on the outlet side of the gas reduction pretreatment furnace is set to 400 to 600°C, a suitable temperature of 250 to 450°C can be achieved during vacuum deposition, depending on the length of the seal roll chamber. be done. The steel strip after vapor deposition is transferred to the second seal roll chamber 4° and the second seal roll chamber 4°.
The material passes through the pressure chamber 3' and undergoes a diffusion treatment in a diffusion treatment furnace 9 having the same atmosphere as the gas reduction pretreatment furnace. After vacuum evaporation galvanizing, the temperature of the plate when it reaches the diffusion treatment furnace is 200~200℃.
Since the temperature is 400°C, heat it to a temperature of 250 to 420°C. Then, it is cooled in the cooling chamber 10 with the same atmosphere. If you take it out into the atmosphere without cooling it, the brass will oxidize and change color.

実施例1 上述の装置を用いて銅めっき溝帯に本発明に従って、真
空蒸着亜鉛めっきを施した0条件は次の通りであった・ 銅めっき鋼帯寸法:    0.5mm厚X30hm幅
鋼帯の銅めっき厚さ:   !1lL−通板速度:  
      10 m /膳!nガス還元前処理炉から
真空蒸着めっき室までの距  離:         
       30  m真空蒸着めっき室から拡散処
理炉までの距gi:0  m 亜鉛蒸着めっき時の銅めっき鋼板の温度:350℃蒸着
めっき室の真空度:  0.01 tarr亜鉛蒸着め
っき付着量:  20g/ m 2拡散処理時の銅めっ
き鋼板の温度:350℃第2図は上記によって真鍮めっ
き鋼板を得る場合の過程を示す断面図である。(a)は
銅めっき鋼板の断面図である。鋼素地11の上に銅めっ
き層12が存在する。(b)はその上に真空蒸着亜鉛め
っきを施した段階を示し、最表層に真鍮層13が形成さ
れている。(C)は拡散処理を施した後の断面で、銅め
っき層は全部真鍮層13となっている。エネルギー分散
型X線マイクロアナライザーによる分析の結果、この真
鍮層はZn38%−Cu62%の真鍮であり1表面は黄
金色を呈していた。
Example 1 Vacuum-deposited zinc plating was applied to the copper-plated groove strip according to the present invention using the above-mentioned apparatus. The conditions were as follows. Copper-plated steel strip dimensions: 0.5 mm thick x 30 hm wide steel strip. Copper plating thickness: ! 1lL - Threading speed:
10m/meal! Distance from n gas reduction pretreatment furnace to vacuum evaporation plating chamber:
30 m Distance gi from vacuum evaporation plating chamber to diffusion treatment furnace: 0 m Temperature of copper-plated steel sheet during zinc evaporation plating: 350°C Vacuum degree of evaporation plating chamber: 0.01 tarr Zinc evaporation plating coating amount: 20 g/m 2. Temperature of copper-plated steel sheet during diffusion treatment: 350° C. FIG. 2 is a sectional view showing the process of obtaining a brass-plated steel sheet by the above method. (a) is a sectional view of a copper-plated steel sheet. A copper plating layer 12 is present on the steel base 11. (b) shows a stage in which vacuum evaporated zinc plating is applied thereon, and a brass layer 13 is formed on the outermost layer. (C) is a cross section after the diffusion treatment, in which the entire copper plating layer has become a brass layer 13. As a result of analysis using an energy dispersive X-ray microanalyzer, this brass layer was found to be brass containing 38% Zn and 62% Cu, and had a golden yellow color on its surface.

実施例2 実施例1と同様に真鍮めっき鋼板を製造した。Example 2 A brass-plated steel plate was manufactured in the same manner as in Example 1.

条件は次の通りであった。The conditions were as follows.

銅めっき鋼帯寸法:    0.5mm厚X 300m
■幅鋼帯の銅めっき厚さ=  5ル■ 通板速度:        10m/winガス還元前
処理炉から真空蒸着めっき室までの距  離:    
           30 議真空蒸着めっき室から
拡散処理炉までの距離:20麿 亜鉛蒸着時の銅めっき鋼帯の温度:250℃蒸着めっき
室の真空度:  0.01 torr亜鉛蒸着めっき付
着量=  15g/m2拡散処理時の銅めっき鋼板の温
度:250℃上記条件で亜鉛を蒸着めっきした銅めっき
鋼板を同様に分析した結果、鋼素地の上にZn28%−
Cu72%の真鍮の層が形成され、この真鍮層は黄金色
であった。
Copper-plated steel strip dimensions: 0.5mm thick x 300m
■ Thickness of copper plating on wide steel strip = 5 l ■ Threading speed: 10 m/win Distance from gas reduction pretreatment furnace to vacuum evaporation plating chamber:
30 Distance from the vacuum evaporation plating chamber to the diffusion treatment furnace: 20m2 Temperature of the copper-plated steel strip during zinc evaporation: 250℃ Vacuum degree of the evaporation plating chamber: 0.01 torr Zinc evaporation coating amount = 15g/m2 diffusion Temperature of copper-plated steel sheet during treatment: 250°C As a result of a similar analysis of a copper-plated steel sheet coated with zinc by vapor deposition under the above conditions, it was found that 28% Zn was deposited on the steel base.
A brass layer of 72% Cu was formed, and this brass layer was golden yellow.

実施例3 次の条件で真鍮めっきを繰り返した。Example 3 Brass plating was repeated under the following conditions.

銅めっき鋼帯寸法:    0.5iv厚X 300i
+m幅鋼帯の銅めっき厚さ:   5ル■ 通板速度:        Iom/麿inガス還元前
処理炉から真空蒸着めっき室までの距gl:     
     30m 真空蒸着めっき室から拡散処理炉までの距離:0  m 亜鉛蒸着時の銅めっき鋼φの温度=420℃蒸着めっき
室の真空度:  0.01 torr亜鉛蒸着めっき付
着量:  30g/m2拡散処理時の銅めっき鋼板の温
度:420℃得られた真鍮めっき鋼板を前記と同様に分
析した結果、鋼素地の上に存在する真鍮層はZn46%
−Cu54%の真鍮であった。この真鍮層は黄金色であ
った。
Copper plated steel strip dimensions: 0.5iv thickness x 300i
Copper plating thickness of +m wide steel strip: 5 ru ■ Strip threading speed: Iom/maroin Distance from gas reduction pretreatment furnace to vacuum evaporation plating chamber gl:
30 m Distance from vacuum evaporation plating chamber to diffusion treatment furnace: 0 m Temperature of copper-plated steel φ during zinc evaporation = 420℃ Vacuum degree of evaporation plating chamber: 0.01 torr Zinc evaporation plating coating amount: 30 g/m2 Diffusion treatment Temperature of copper-plated steel sheet: 420°C As a result of analyzing the obtained brass-plated steel sheet in the same manner as above, it was found that the brass layer present on the steel base contained 46% Zn.
- It was brass with 54% Cu. This brass layer was golden yellow.

以上鋼めっきを施した鋼板の片面に真鍮めっきを施す場
合について記載したが、本発明の方法によって両面を銅
めっきした素地の両面に真鍮めっきを施すことができる
ことは自明である。また素材は銅めっき鋼板に限らず、
銅自体または銅めっきした鋼以外の金属についても実施
できることも自明である。
The case where brass plating is applied to one side of a steel plate that has been subjected to steel plating has been described above, but it is obvious that brass plating can be applied to both sides of a substrate whose both sides are copper plated by the method of the present invention. In addition, the material is not limited to copper-plated steel sheet.
It is also obvious that metals other than copper itself or copper-plated steel can be used.

く効果〉 本発明により、表層に真鍮被覆層を有する金属板を、素
材の性質を損することなく容易に製造することができる
。本発明の方法は金属ストリップの表面に真鍮の金属学
的化学的特性および美感を容易に賦与することを可能に
したものであり、その産業上の有用性は甚だ大である。
Effects> According to the present invention, a metal plate having a brass coating layer on the surface layer can be easily manufactured without impairing the properties of the material. The method of the present invention makes it possible to easily impart the metallurgical chemical properties and aesthetic appearance of brass to the surface of a metal strip, and its industrial utility is enormous.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の方法を実施するための装置の概念を示
す。 第2図は本発明方法によって形成された真鍮めっき層の
構造を示す。
FIG. 1 shows the concept of an apparatus for carrying out the method of the invention. FIG. 2 shows the structure of a brass plating layer formed by the method of the present invention.

Claims (1)

【特許請求の範囲】[Claims] 1、銅または銅めっきした金属のストリップに亜鉛を真
空蒸着めっきし、その後に250〜420℃に加熱して
拡散処理を施すことからなる最表層に真鍮被覆層を有す
る金属ストリップの製造方法。
1. A method for producing a metal strip having a brass coating layer on the outermost layer, which comprises vacuum-evaporating zinc on a strip of copper or copper-plated metal, and then heating it to 250 to 420°C to perform a diffusion treatment.
JP13205285A 1985-06-19 1985-06-19 Manufacture of metallic strip having brass coating layer Pending JPS61291961A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13205285A JPS61291961A (en) 1985-06-19 1985-06-19 Manufacture of metallic strip having brass coating layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13205285A JPS61291961A (en) 1985-06-19 1985-06-19 Manufacture of metallic strip having brass coating layer

Publications (1)

Publication Number Publication Date
JPS61291961A true JPS61291961A (en) 1986-12-22

Family

ID=15072394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13205285A Pending JPS61291961A (en) 1985-06-19 1985-06-19 Manufacture of metallic strip having brass coating layer

Country Status (1)

Country Link
JP (1) JPS61291961A (en)

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