JPS61291485A - Single crystal growth apparatus - Google Patents

Single crystal growth apparatus

Info

Publication number
JPS61291485A
JPS61291485A JP12825885A JP12825885A JPS61291485A JP S61291485 A JPS61291485 A JP S61291485A JP 12825885 A JP12825885 A JP 12825885A JP 12825885 A JP12825885 A JP 12825885A JP S61291485 A JPS61291485 A JP S61291485A
Authority
JP
Japan
Prior art keywords
single crystal
growth apparatus
reflecting plate
crystal growth
heat reflecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12825885A
Other languages
Japanese (ja)
Inventor
Tadao Komi
小見 忠雄
Masao Tsunoda
角田 柾雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP12825885A priority Critical patent/JPS61291485A/en
Publication of JPS61291485A publication Critical patent/JPS61291485A/en
Pending legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To stabilize pulling up conditions and pull up a large-diameter single crystal of good quality having a high melting point, by mounting reinforcing beads in the longitudinal direction on the surface of a heat reflecting plate in a single crystal growth apparatus. CONSTITUTION:A single crystal growth apparatus for pulling up a single crystal from a crystal melt in a crucible with a seed crystal. An almost domed metal heat reflecting plate 1 having reinforcing beads 6 in the longitudinal direction on the surface thereof is applied above the crucible. The above-mentioned beads 6 having a thickness of twice or more based on the thickness of the metal of the body and a width of twice or more thereof are effective. The number of the beads 6 is preferably 4 or more in symmetry.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は引上げ法による結晶成長装置に関し、特に高周
波加熱炉の熱反射板に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a crystal growth apparatus using a pulling method, and particularly to a heat reflecting plate for a high frequency heating furnace.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

高融点の単結晶を引上げ法(チョクラルスキイー法)で
作る場合、高周波加熱炉が用いられることが多い。この
場合、得られる結晶の品質けるつぼの固液界面の温度分
布によ勺大きく影響される。
When producing a single crystal with a high melting point by the pulling method (Czochralskiy method), a high-frequency heating furnace is often used. In this case, the quality of the crystals obtained is greatly influenced by the temperature distribution at the solid-liquid interface of the crucible.

一般の高周波炉では温度勾配が大きく;引き上げ単結晶
が冷却時に割れたり、クラックの発生が起きやすい。こ
の対策として、従来、るつぼ上に稲々の熱反射板が使用
されている。
Typical high-frequency furnaces have large temperature gradients; pulled single crystals tend to break or develop cracks during cooling. As a countermeasure against this problem, a rice heat reflecting plate has conventionally been used on the crucible.

上記熱反射板としては第1図に示す様な円筒状ないしは
、第2図の様な円錐台形筒状としたものが用いられてい
る。ところが周波数が1001d(以上の高周波加熱炉
の場合はこれら閉回路をなす熱反射体ではその熱反射板
に高周波うず電流が流れ、アフターヒーターとしての効
果が出すぎ、ざらには熱反射板に亀裂かハ仏る事故がひ
んばんに生じ、引き上げ条件を不安定なものにしていた
The heat reflecting plate used has a cylindrical shape as shown in FIG. 1 or a truncated conical tube as shown in FIG. 2. However, in the case of a high-frequency heating furnace with a frequency of 1001 d or more, high-frequency eddy current flows through the heat reflector in these closed circuit heat reflectors, making it too effective as an after-heater, and even cracking the heat reflector. Frequent accidents occurred, making the conditions for raising the ship unstable.

具体的には (1)種子結晶からの熱の放射が悪くなる。in particular (1) Heat radiation from the seed crystal deteriorates.

(2)種子結晶が溶は易くなるために長い種子結晶が必
要となる。
(2) Long seed crystals are required because the seed crystals dissolve easily.

(3)融液の温度より融液面上の温度が高くなる。(3) The temperature on the surface of the melt becomes higher than the temperature of the melt.

等の不都合がδった。また、円筒状の熱反射板では大口
径結晶の場合に径方向の温度勾配が縦方向の温度勾配に
くらべて大きく、余p改善されない。
There were many inconveniences such as: Further, in the case of a cylindrical heat reflecting plate, the temperature gradient in the radial direction is larger than the temperature gradient in the longitudinal direction in the case of a large-diameter crystal, so that no improvement is achieved by the extra p.

一方、第3図に示す様な略ドーム状をなし、且、開回路
とした熱反射板なども使用されているが、この場合は開
いた部分が機械的強度が弱くなるため、高価な貴金属性
熱反射板を厚くせざるを得ないなどの欠点が有った。
On the other hand, as shown in Figure 3, heat reflecting plates that are approximately dome-shaped and have an open circuit are also used, but in this case, the mechanical strength of the open part is weakened, so expensive precious metals are used. There were drawbacks such as the need to make the heat reflecting plate thicker.

さらには厚くすることにより熱の放散も悪化し、熱分布
が従来よりも改善されない難点があった。
Furthermore, increasing the thickness also worsens heat dissipation, making it difficult to improve heat distribution compared to conventional methods.

さらに最近はインバータ一方式の発振機が使用さされる
様になり、周波数が低くなりルーズ状の熱反射体が使用
されることがらるが、この場合も熱反射板のこしが弱シ
、引上げ条件が劣化する欠点があった。
Furthermore, recently, single-inverter type oscillators have been used, and the frequency has become lower and loose heat reflectors have been used, but in this case too, the stiffness of the heat reflectors is weak and the pulling conditions are It had the disadvantage of deterioration.

〔発明の目的〕[Purpose of the invention]

この発明の目的は上記した点に鑑でなされたもので熱反
射板を改良することに品質の良い高融点の大口径単結晶
を引上げることを可能にした単結晶成長装置を提供する
ものである。
The purpose of the present invention was made in view of the above-mentioned points, and it is an object of the present invention to provide a single crystal growth apparatus capable of pulling a high-quality, high-melting-point, large-diameter single crystal in order to improve a heat reflecting plate. be.

〔発明の概要〕[Summary of the invention]

本発明は、高周波加熱炉を用い、るつぼ内の結晶引上げ
を行なう結晶成長装置であって、前記る゛つぼ上に略ド
ーム状の金属製熱反射板を具備するものにおいて、この
熱反射板の表面には縦方向の補強ビードを有することを
特徴としている。
The present invention relates to a crystal growth apparatus that uses a high-frequency heating furnace to pull up crystals in a crucible, and is equipped with a substantially dome-shaped metal heat reflecting plate on the crucible. It is characterized by having longitudinal reinforcing beads on the surface.

〔発明の実施例〕[Embodiments of the invention]

上記目的を達成するために、この発明では第4図に示す
様なビードをつけることによって従来に比して引上げ条
件の安定かが図れた。表1は従来のタイプと本発明の実
施例を比較したものでらる。
In order to achieve the above object, the present invention provides a bead as shown in FIG. 4, thereby making the pulling conditions more stable than in the past. Table 1 shows a comparison between the conventional type and the embodiment of the present invention.

(以下余白) 表  1 本発明の形状は第5図のa、b図のどちらかでも効果が
あった。ビードは本体の金属の厚さの2倍以上の厚さで
、幅も2倍以上にすれば効果的でめった。ビードの本数
は対称に4ケ所以上入っていれば効果的でろる。方向は
第4図の様に縦に入れるのが効果があった。
(Margins below) Table 1 The shape of the present invention was effective in either figures a or b of Fig. 5. It would be effective if the bead was at least twice as thick as the metal of the main body, and at least twice as wide. It will be effective if the number of beads is symmetrically placed in four or more places. It was effective to insert it vertically as shown in Figure 4.

スリット幅は20m5以下でよい。The slit width may be 20 m5 or less.

以下具体的な実施例に従ってこの発明を説明する0 〔比較例1〕 発振周波数120KHzの発振機を使用し、第3図タイ
プのPi−R,h30%0.5 を熱反射体を使用し、
L 1Ta03単結晶の3’ X 1004の引上げを
連続的に行なった。結果は40回の引上で熱反射板が劣
化し、著しい場合は単結晶と接触してクラックが入るこ
とがめった。引上歩留りも75%でらった。
[Comparative Example 1] An oscillator with an oscillation frequency of 120 KHz was used, and a heat reflector was used for Pi-R, h30% 0.5 of the type shown in Fig. 3.
A 3'×1004 L 1Ta03 single crystal was continuously pulled. The results showed that the heat reflector deteriorated after 40 pullings, and in severe cases it rarely came into contact with the single crystal and cracked. The pulling yield was also 75%.

〔実施例1〕 発振周波数120 KHzの発振機を使用し、第4図ら
)に示す形状のPt−Rh30%0.5を熱反射板に対
称に4ケ所熱反射体の厚さの4倍の厚さの厚さで幅10
11I+のビード5ケ所もつものを使用し、LiTaO
3単結晶の3’X100Lの引上げを連続的に行なった
[Example 1] Using an oscillator with an oscillation frequency of 120 KHz, Pt-Rh 30% 0.5 in the shape shown in Fig. 4, etc.) was symmetrically placed on a heat reflector at four locations with a thickness four times the thickness of the heat reflector. Width 10 in thickness
Use one with 5 beads of 11I+, and use LiTaO
3 single crystals were pulled 3′×100L continuously.

結果は60回まで引上条件が安定して続いた。60回ま
での引上げ歩留りは90%と良好でめった。
As a result, the pulling conditions continued stably up to 60 times. The pulling yield up to 60 times was as good as 90%.

〔比較例2〕 発振周波数7KHzの発振機を使用し、第4図(m1図
タイプのPi−Rh30%0.5 を熱反射板でビード
をつけないタイプによりLiTaO33’X 100 
 の引上げを行った所、結果ハ50回で熱反射板に劣化
が見られ、変形により結晶が熱反射板から取り出せなく
なった。引上歩留りも85%と悪かった。
[Comparative Example 2] Using an oscillator with an oscillation frequency of 7 KHz, LiTaO33'
When the crystal was pulled up 50 times, deterioration of the heat reflecting plate was observed, and the crystal could no longer be removed from the heat reflecting plate due to deformation. The pulling yield was also poor at 85%.

〔実施例2〕 発振周波数7KHzの発振機を使用し、第4図(a)タ
イプのPt−Rh30%0.51熱反射板を使用し、L
 1Ta03の3’X100Lの引上げを行った。結果
は80回使用しても引上が安定化し、引上歩留シも92
チと良好であった。
[Example 2] An oscillator with an oscillation frequency of 7 KHz was used, a Pt-Rh 30% 0.51 heat reflecting plate of the type shown in Fig. 4(a) was used, and L
A 3′×100L pull-up of 1Ta03 was carried out. The results showed that the pulling was stable even after 80 uses, and the pulling yield was 92.
It was very good.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、単結晶成長装置の熱反射板にビードや
スリットを取付けることによって、引上条件の安定化が
図れ、さらには熱反射板の厚さの低減と修理コストも低
下させることが可能となる。
According to the present invention, by attaching beads or slits to the heat reflection plate of a single crystal growth apparatus, it is possible to stabilize pulling conditions, and furthermore, to reduce the thickness of the heat reflection plate and repair costs. It becomes possible.

又、高周波加熱の周波数が 〜10KHzでも効果があ
ることがわかった。
It was also found that high-frequency heating at a frequency of ~10 KHz is effective.

【図面の簡単な説明】[Brief explanation of drawings]

第1図および第2図は従来の単結晶育成装置を示す図、
第3図は半球状一部開放形の熱反射板を示す図、第4図
は本発明に係るビード付き熱反射板を示す図、第5図は
本発明に係るビードの形状を示す図である。 1・・・熱反射板    2・・・るつぼ4・・・単結
晶     6・・・ビード代理人 弁理士 則 近 
憲 佑 (ほか1名)第  1 図 第  2 図 第3図 (aン (b) 第  4 図 (0L) 第  5 図
Figures 1 and 2 are diagrams showing a conventional single crystal growth apparatus;
FIG. 3 is a diagram showing a partially open hemispherical heat reflecting plate, FIG. 4 is a diagram showing a beaded heat reflecting plate according to the present invention, and FIG. 5 is a diagram showing the shape of the bead according to the present invention. be. 1... Heat reflecting plate 2... Crucible 4... Single crystal 6... Bead agent Patent attorney Nori Chika
Kensuke (and 1 other person) Figure 1 Figure 2 Figure 3 (a) Figure 4 (0L) Figure 5

Claims (4)

【特許請求の範囲】[Claims] (1)高周波加熱炉を用い、るつぼ内の結晶融液から種
子結晶により単結晶引上げを行なう結晶育成装置であつ
て、前記るつぼ上に、略ドーム状金属製熱反射板を具備
するものにおいて、この熱反射板の表面には縦方向の補
強ビードを有することを特徴とする単結晶育成装置。
(1) A crystal growth apparatus that uses a high-frequency heating furnace to pull a single crystal from a crystal melt in a crucible with a seed crystal, and is equipped with a substantially dome-shaped metal heat reflecting plate on the crucible, A single crystal growth device characterized in that the surface of the heat reflecting plate has a reinforcing bead in the vertical direction.
(2)前記ドーム状の熱反射板には縦方向の幅20mm
以下のスリツトを有することを特徴とする特許請求の範
囲第1項記載の単結晶育成装置。
(2) The dome-shaped heat reflecting plate has a vertical width of 20 mm.
A single crystal growth apparatus according to claim 1, characterized in that it has the following slits.
(3)前記単結晶がLiTaO_3単結晶であることを
特徴とする特許請求の範囲第1項記載の単結晶育成装置
(3) The single crystal growth apparatus according to claim 1, wherein the single crystal is a LiTaO_3 single crystal.
(4)前記単結晶がLiNbO_3単結晶であることを
特徴とする特許請求の範囲第1項記載の単結晶育成装置
(4) The single crystal growth apparatus according to claim 1, wherein the single crystal is a LiNbO_3 single crystal.
JP12825885A 1985-06-14 1985-06-14 Single crystal growth apparatus Pending JPS61291485A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12825885A JPS61291485A (en) 1985-06-14 1985-06-14 Single crystal growth apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12825885A JPS61291485A (en) 1985-06-14 1985-06-14 Single crystal growth apparatus

Publications (1)

Publication Number Publication Date
JPS61291485A true JPS61291485A (en) 1986-12-22

Family

ID=14980400

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12825885A Pending JPS61291485A (en) 1985-06-14 1985-06-14 Single crystal growth apparatus

Country Status (1)

Country Link
JP (1) JPS61291485A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004123510A (en) * 2002-06-13 2004-04-22 Hitachi Ltd Apparatus for manufacturing single crystal and method for manufacturing the same
JP2015191960A (en) * 2014-03-27 2015-11-02 株式会社ニューフレアテクノロジー Deposition apparatus, deposition method and reflector unit
JP2016132596A (en) * 2015-01-20 2016-07-25 トヨタ自動車株式会社 Single crystal production apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS545877A (en) * 1977-06-16 1979-01-17 Toshiba Corp Crystal growing device
JPS54128987A (en) * 1978-03-31 1979-10-05 Toshiba Corp Preparation of single crystal

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS545877A (en) * 1977-06-16 1979-01-17 Toshiba Corp Crystal growing device
JPS54128987A (en) * 1978-03-31 1979-10-05 Toshiba Corp Preparation of single crystal

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004123510A (en) * 2002-06-13 2004-04-22 Hitachi Ltd Apparatus for manufacturing single crystal and method for manufacturing the same
JP2015191960A (en) * 2014-03-27 2015-11-02 株式会社ニューフレアテクノロジー Deposition apparatus, deposition method and reflector unit
JP2016132596A (en) * 2015-01-20 2016-07-25 トヨタ自動車株式会社 Single crystal production apparatus

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