JPS61288067A - スパツタ装置 - Google Patents

スパツタ装置

Info

Publication number
JPS61288067A
JPS61288067A JP12887185A JP12887185A JPS61288067A JP S61288067 A JPS61288067 A JP S61288067A JP 12887185 A JP12887185 A JP 12887185A JP 12887185 A JP12887185 A JP 12887185A JP S61288067 A JPS61288067 A JP S61288067A
Authority
JP
Japan
Prior art keywords
substrate
film
magnetic
magnetic field
bar magnets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12887185A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0359139B2 (enExample
Inventor
Yoichi Oshita
陽一 大下
Tadashi Sato
忠 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12887185A priority Critical patent/JPS61288067A/ja
Publication of JPS61288067A publication Critical patent/JPS61288067A/ja
Publication of JPH0359139B2 publication Critical patent/JPH0359139B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)
  • Physical Vapour Deposition (AREA)
JP12887185A 1985-06-13 1985-06-13 スパツタ装置 Granted JPS61288067A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12887185A JPS61288067A (ja) 1985-06-13 1985-06-13 スパツタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12887185A JPS61288067A (ja) 1985-06-13 1985-06-13 スパツタ装置

Publications (2)

Publication Number Publication Date
JPS61288067A true JPS61288067A (ja) 1986-12-18
JPH0359139B2 JPH0359139B2 (enExample) 1991-09-09

Family

ID=14995422

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12887185A Granted JPS61288067A (ja) 1985-06-13 1985-06-13 スパツタ装置

Country Status (1)

Country Link
JP (1) JPS61288067A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4865709A (en) * 1987-06-16 1989-09-12 Hitachi, Ltd. Magnetron sputter apparatus and method for forming films by using the same apparatus
US6290824B1 (en) * 1992-10-28 2001-09-18 Hitachi, Ltd. Magnetic film forming system
US6491802B2 (en) 1992-10-28 2002-12-10 Hitachi, Ltd. Magnetic film forming system
KR100550094B1 (ko) * 2003-05-28 2006-02-08 주식회사 솔고 바이오메디칼 3차원 구조물에 백금을 코팅하기 위해 사용되는 홀더
US11111577B2 (en) * 2016-03-29 2021-09-07 Ulvac, Inc. Film-forming apparatus and film-forming method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5540597U (enExample) * 1978-09-11 1980-03-15
JPS5591975A (en) * 1978-12-28 1980-07-11 Seiko Epson Corp Thin film forming method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5540597U (enExample) * 1978-09-11 1980-03-15
JPS5591975A (en) * 1978-12-28 1980-07-11 Seiko Epson Corp Thin film forming method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4865709A (en) * 1987-06-16 1989-09-12 Hitachi, Ltd. Magnetron sputter apparatus and method for forming films by using the same apparatus
EP0295649A3 (en) * 1987-06-16 1990-05-09 Hitachi, Ltd. Magnetron sputter apparatus and method for forming films by using the same apparatus
US6290824B1 (en) * 1992-10-28 2001-09-18 Hitachi, Ltd. Magnetic film forming system
US6491802B2 (en) 1992-10-28 2002-12-10 Hitachi, Ltd. Magnetic film forming system
KR100550094B1 (ko) * 2003-05-28 2006-02-08 주식회사 솔고 바이오메디칼 3차원 구조물에 백금을 코팅하기 위해 사용되는 홀더
US11111577B2 (en) * 2016-03-29 2021-09-07 Ulvac, Inc. Film-forming apparatus and film-forming method

Also Published As

Publication number Publication date
JPH0359139B2 (enExample) 1991-09-09

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees