JPS61287401A - Thin film flowing down evaporator - Google Patents
Thin film flowing down evaporatorInfo
- Publication number
- JPS61287401A JPS61287401A JP12669485A JP12669485A JPS61287401A JP S61287401 A JPS61287401 A JP S61287401A JP 12669485 A JP12669485 A JP 12669485A JP 12669485 A JP12669485 A JP 12669485A JP S61287401 A JPS61287401 A JP S61287401A
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- Japan
- Prior art keywords
- heating element
- shell
- fluid
- heated
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Abstract
Description
【発明の詳細な説明】 産棗↓■利−ｍ薪野 本発明は、薄膜流下型蒸発器に関するものである。[Detailed description of the invention] Natsume ↓ ■ Ri-m Takino The present invention relates to a thin film falling type evaporator.
従ＩＪ−７７）技−術−
薄膜流下型蒸発器としては、例えば実公昭５８−３０５
６２号公報に開示された流下フィルム式蒸発装置がある
。この流下フィルム式蒸発装置は、第７図に示す如く、
円筒状をしたシェル（１）と、シェル（１）内に設けら
れた複数個の中空プレート状をした加熱素子（２）と、
加熱素子（２）の上方に設けられ、加熱素子（２）外表
面上に被加熱用流体を供給ず乙ディス］−リビコ４−タ
（３）と、シェル（１）の底部に溜った被加熱用流体を
循環パイプ（４）を介してディストリビュータ（３）に
ｉ盾工領さｌるｉ盾■量ボンフ。Sub IJ-77) Technology - As a thin film falling type evaporator, for example,
There is a falling film type evaporator disclosed in Japanese Patent No. 62. This falling film type evaporator, as shown in Figure 7,
a cylindrical shell (1); a plurality of hollow plate-shaped heating elements (2) provided within the shell (1);
It is installed above the heating element (2) and does not supply the fluid to be heated onto the outer surface of the heating element (2). The heating fluid is sent to the distributor (3) via the circulating pipe (4).
（５）とからなっている。又、上記シェル（１）の上端
部には、加熱素子（２）の外表面から発生する蒸発蒸気
をシェル（１）のＡ部に導出させるための蒸発蒸気出口
（６）が、シェル（１）の上部外周面には、シェル（１
）内に設けた加熱素子（２）の中空部内に加熱用蒸気を
供給するための加熱蒸気入口（７）が、又、シェル（１
）の下部外周面には、シェル（１）の底部に被加熱用流
体を供給するための被加熱用流体供給口（８）がそれぞ
れ設けである。更に、加熱素子（２）の下端には、加熱
素子（２）の中空部内を通過した加熱用蒸気を収集し、
シェル（１）の夕）部に排出するためのコンデンセート
出ｒ、Ｊ（９）を自１−るコンデンセ−１−・＼ノダ（
１０）が取付けである。It consists of (5). Further, an evaporative vapor outlet (6) for leading out evaporative vapor generated from the outer surface of the heating element (2) to part A of the shell (1) is provided at the upper end of the shell (1). ) has a shell (1
) A heating steam inlet (7) for supplying heating steam into the hollow part of the heating element (2) provided in the shell (1
) are respectively provided with heated fluid supply ports (8) for supplying heated fluid to the bottom of the shell (1). Furthermore, at the lower end of the heating element (2), the heating steam that has passed through the hollow part of the heating element (2) is collected;
The condensate output r, J (9) for discharging into the shell (1) section, is connected to the condenser
10) is installation.
上記構成からなる流下フィルム式蒸発器の加熱蒸気入口
（７）から加熱素子（２）の中空部内に加熱用蒸気を導
入すると同時に、被加熱用流体供給口（８）からシェル
（１）の底部に被加熱用流体を供給すると、加熱用蒸気
は加熱素子（２）の中空部を通過した後コンデンセート
ヘッダ（１０）に集められ、コンデンセート出口ダ（１
０）と連通したコンデンセート出口（９）からシェル（
１）の外部に排出される。一方、シェル（１）の底部に
導入された被加熱用流体は、シェル（１）の底部から循
環パイプ（４）を通り、ｊ盾環ボンフ゛（５）によりデ
ィストリビュータ（３）に供給される。ここで被加熱用
流体は加熱素子（２）の外表面上に分配供給され、当該
外表面を流下し、この時加熱素子（２）の中空部内を流
れる加熱用蒸気との間で熱交換が行われる。そして加熱
素子（２）外表面上の被加熱用流体の一部が蒸発し、蒸
発蒸気は加熱素子両側方に流出し、シェル（１）の上端
に設けた蒸発蒸気出口（６）から次段の装置に送られる
。又、加熱素子（２）の外表面から蒸発しなかった被加
熱用流体は、加熱素子（２）の下端からシェル（１）の
底部に落下し、シェル（１）の底部に導入された被加熱
用流体と共に再び循環パイプ（４）を通り循環ポンプ（
５）によりディストリビュータ（３）に供給される。In the falling film type evaporator having the above structure, heating steam is introduced into the hollow part of the heating element (2) from the heating steam inlet (7), and at the same time, the heating steam is introduced into the bottom of the shell (1) from the heated fluid supply port (8). When the fluid to be heated is supplied to the heating element (2), the heating steam passes through the hollow part of the heating element (2) and then is collected in the condensate header (10), and is then passed through the condensate outlet header (10).
0) from the condensate outlet (9) communicating with the shell (
1) is discharged to the outside. On the other hand, the fluid to be heated introduced into the bottom of the shell (1) passes through the circulation pipe (4) from the bottom of the shell (1) and is supplied to the distributor (3) by the J-shield ring bomb (5). Here, the fluid to be heated is distributed and supplied onto the outer surface of the heating element (2), flows down the outer surface, and at this time, heat exchange occurs with the heating steam flowing inside the hollow part of the heating element (2). It will be done. Then, a part of the fluid to be heated on the outer surface of the heating element (2) evaporates, and the evaporated vapor flows out to both sides of the heating element and passes through the evaporative vapor outlet (6) provided at the upper end of the shell (1) to the next stage. is sent to the device. Further, the fluid to be heated that has not evaporated from the outer surface of the heating element (2) falls from the lower end of the heating element (2) to the bottom of the shell (1), and is absorbed by the fluid introduced into the bottom of the shell (1). It passes through the circulation pipe (4) together with the heating fluid again to the circulation pump (
5) to the distributor (3).
発朋−２！！ｉ解−火−レよ一ゲ≧−１４問題点−上記
形式の流下フィルム式蒸発装置は長い伝熱長を要求され
るが、この流下フィルム式蒸発装置の加熱素子（２）は
外表面が平滑面のため、伝熱長を長く取ると必然的に加
熱素子（２）の全長が長くなり、装置全体の高さ方向の
全長が長くなるといった問題点があった。又加熱素子（
２）の表面を平滑面にすると、加熱素子（２）の外表面
を被加熱用流体が流下する時、水平方向の液偏流が起こ
り、熱交換率が低下するといった問題点もあった。Hatsuho-2! ! i Solution - Tue - Le Yoichige ≧ -14 Problem - The falling film type evaporator of the above type is required to have a long heat transfer length, but the heating element (2) of this falling film type evaporator has a Since the surface is smooth, there is a problem in that if the heat transfer length is made long, the total length of the heating element (2) becomes long, and the total length of the entire device in the height direction becomes long. Also, the heating element (
When the surface of 2) is made smooth, there is also a problem that when the fluid to be heated flows down the outer surface of the heating element (2), horizontal liquid drift occurs and the heat exchange rate decreases.
問題止）解決３１人−め一部」」支
ＷＩＮ流下型蒸発器を、円筒状をし、かつ、内周面及び
外周面に伸斜溝を有する加熱素子と、この加熱素子を収
納するシェルとによって構成し、上記シェル内に収納さ
れた加熱素子の外周面と内周面とにそれぞれ２種類の流
体を供給することにより熱交換を行うようにしたもので
ある。Problem solved) 31 people - part of the WIN down-flow evaporator includes a heating element that is cylindrical and has diagonal grooves on the inner and outer peripheral surfaces, and a shell that houses the heating element. Heat exchange is performed by supplying two types of fluids to the outer circumferential surface and inner circumferential surface of the heating element housed in the shell, respectively.
］Ｌ阻
加熱素子を円筒状に形成し、かつ、内周面及び外周面に
伸斜溝を設けておけば、加熱素子の全長を長くすること
なく伝熱長を長くできる。] By forming the L heating element in a cylindrical shape and providing diagonal grooves on the inner and outer peripheral surfaces, the heat transfer length can be increased without increasing the overall length of the heating element.
実ｎ貫
第１図は、本発明に係る薄膜流下型蒸発器の第１の実施
例を示す図面であり、この図に示す薄膜流下型蒸発器は
、両端開口部が蓋体（２０ａ）（２０ｂ ）によって閉
塞された円筒状をし、かつ、その内周面及び外周面に所
定の傾斜角を有する伸斜溝（イ）を設けた加熱素子（ロ
）と、この加熱素子（ロ）を収納する両端が閉塞した円
筒状のシェル（２１）とによって構成されている。上記
シェル（２１）の上端部には、加熱素子（ロ）の外周面
から発生する蒸発蒸気をシェル（２１）の外部に導出す
るための蒸発蒸気出口（２２）が設けてあり、シェル（
２１）の下端部には、加熱素子（ロ）の外周面で濃縮さ
れた濃縮液をシェル（２１）の外部に導出するための濃
縮液排出管（２３）が接続しである。又加熱素子（ロ）
の上部周面には、シェル（２１）を貫通し、加熱素子（
ロ）の内部に加熱用蒸気を供給するための加熱蒸気導入
筒（２４）が接続してあり、加熱素子（ロ）の下部周面
には、加熱素子（ロ）の内部に供給された加熱用蒸気を
シェル（２１）の外部に排出するための排出筒（２５）
が接続しである。又加熱素子（ロ）の上方には、加熱素
子（ロ）の外周面に被加熱流体を供給するための被加熱
用流体供給筒（２６）の先端部が開孔している。FIG. 1 is a drawing showing a first embodiment of the thin film falling type evaporator according to the present invention. 20b), the heating element (b) has a cylindrical shape and is provided with an oblique groove (a) having a predetermined inclination angle on its inner and outer circumferential surfaces; It is composed of a cylindrical shell (21) with both ends closed. An evaporative vapor outlet (22) is provided at the upper end of the shell (21) for guiding evaporative vapor generated from the outer peripheral surface of the heating element (b) to the outside of the shell (21).
A concentrated liquid discharge pipe (23) is connected to the lower end of the heating element (21) for discharging the concentrated liquid concentrated on the outer peripheral surface of the heating element (b) to the outside of the shell (21). Also heating element (b)
A heating element (21) is provided on the upper peripheral surface of the
A heating steam introduction tube (24) for supplying heating steam is connected to the inside of the heating element (b), and the lower peripheral surface of the heating element (b) is connected to the heating steam introduced into the inside of the heating element (b). Exhaust pipe (25) for discharging steam to the outside of the shell (21)
is connected. Further, above the heating element (B), the tip of a heated fluid supply cylinder (26) for supplying the heated fluid to the outer peripheral surface of the heating element (B) is opened.
第３図乃至第６図は、上記した薄膜流下型蒸発器に用い
る加熱素子（ロ）の製造方法を説明するための図面であ
る。この加熱素子（ロ）は、第３図に示す如く、平板（
口°）の表面にプレス加工又はロール加工によって伸斜
溝（イ°）を形成した後、この伸斜溝（イ”）を有する
平板（口′）を第４図に示す如く円筒状に加工するか、
又は、第５図に示す如く、長尺な帯状板（口″）の表面
に、プレス加工又はロール加工によって長平方向に延び
るストレートな′ａ（イ″）を形成し、このストレート
な溝（イ”）を有する帯状板（口”）を第６図に示す如
くスパイラル状に巻き、その両端部（ハ）（ハ）をカン
トすることにより、周面に伸斜溝（イ）を有する円筒状
に加工する。尚、帯状板（口″）をスパイラル状に巻い
て円筒にする場合、帯状板（口”）の両端部（ハ） （
ハ）は第５図に示す如くフラフトなままの状態にしてお
き、当該部分をカントする時、カットが容易に行えるよ
うにしてもよい。3 to 6 are drawings for explaining a method of manufacturing the heating element (b) used in the above-mentioned thin film falling type evaporator. This heating element (b) is a flat plate (
After forming the diagonal grooves (A°) on the surface of the diagonal grooves (A) by press working or roll processing, the flat plate (A') having the diagonal grooves (A'') is processed into a cylindrical shape as shown in Fig. 4. Or,
Alternatively, as shown in Fig. 5, a straight groove ``a'' extending in the longitudinal direction is formed on the surface of a long strip plate (mouth'') by pressing or rolling, and this straight groove ``a'' is formed. By winding a strip plate (opening) in a spiral shape as shown in Fig. 6 and canting both ends (C) (C), a cylindrical shape having an oblique groove (A) on the circumferential surface is formed. Process it into In addition, when winding the strip plate (mouth'') into a cylinder by spirally winding it, both ends (c) of the strip plate (mouth'') are
C) may be left in a flat state as shown in FIG. 5 so that the cut can be easily made when canting the part.
上記構成からなる薄膜流下型蒸発器の加熱蒸気導入筒（
２４）から加熱素子（ロ）の内部に加熱用蒸気を導入す
ると同時に、被加熱用流体供給筒（２６）から加熱素子
（ロ）の外周面上に被加熱用流体を供給すると、加熱用
蒸気は加熱素子（ロ）の内部を通過した後、加熱素子（
ロ）の下部に接続された排出筒（２５）を通り外部に排
出される。一方、被加熱用流体供給筒（２６）から加熱
素子（ロ）の外周面上端部に供給された被加熱用流体は
、加熱素子（ロ）の外周面に設けたｗ４斜溝（イ）に沿
って加熱素子（ロ）の外周面上を旋回しながら流下して
行く。そしてこの時、加熱素子（ロ）の内部を流れる加
熱用蒸気との間で熱交換が行われ、被加熱用流体の一部
が蒸発し、蒸発蒸気はシェル（２１）の上端に設けた蒸
発蒸気出口（２２）から次段の装置に送られる。又加熱
素子（ロ）の外周面から蒸発しなかった被加熱用流体は
、加熱素子（ロ）の下端からシェル（２１）の底部に落
下し、シェル（２１）の底部に接続した濃縮液排出管（
２３）を通って外部に導出される。The heating steam introduction tube of the thin film falling type evaporator with the above configuration (
When heating steam is introduced into the heating element (b) from 24) and, at the same time, the fluid to be heated is supplied onto the outer peripheral surface of the heating element (b) from the fluid to be heated cylinder (26), the heating steam passes through the heating element (b), then the heating element (
b) is discharged to the outside through the discharge pipe (25) connected to the lower part of the pipe. On the other hand, the heated fluid supplied from the heated fluid supply cylinder (26) to the upper end of the outer circumferential surface of the heating element (b) flows into the w4 diagonal groove (a) provided on the outer circumferential surface of the heating element (b). The liquid flows down along the heating element (b) while swirling on the outer circumferential surface of the heating element (b). At this time, heat exchange is performed with the heating steam flowing inside the heating element (b), a part of the fluid to be heated is evaporated, and the evaporated steam is transferred to the evaporator provided at the upper end of the shell (21). The steam is sent from the steam outlet (22) to the next stage of equipment. In addition, the fluid to be heated that has not evaporated from the outer peripheral surface of the heating element (B) falls from the lower end of the heating element (B) to the bottom of the shell (21), and is discharged from the concentrated liquid discharge connected to the bottom of the shell (21). tube(
23) to the outside.
第２図は本発明に係る薄膜流下型蒸発器の第２の実施例
を示す図面であり、この図に示す薄膜流下型蒸発器は、
両端が開口した円筒状をしく８）
、かつ、その内周面及び外周面に、第１の実施例と同じ
く所定の傾斜角を有する傾斜ａ（イ）を設けた加熱素子
（ロ）と、この加熱素子（ロ）を収納する両端が閉塞し
た円筒状のシェル（３ｏ）トニよって構成されている。FIG. 2 is a drawing showing a second embodiment of the thin film falling type evaporator according to the present invention, and the thin film falling type evaporator shown in this figure is as follows:
A heating element (b) having a cylindrical shape with both ends open and having an inclination a (a) having a predetermined inclination angle on the inner and outer peripheral surfaces thereof, as in the first embodiment; The heating element (b) is housed in a cylindrical shell (3o) closed at both ends.
上記シェル（３ｏ）の上端部には、加熱素子（ロ）の内
周面から発生する蒸発蒸気をシェル（３０）の外部に導
出するための蒸発蒸気出口（３１）が設けてあり、シェ
ル（３０）の下端部には、加熱素子（ロ）の内周面で濃
縮された濃縮液をシェル（３ｏ）の外部に導出するため
の濃縮液排出筒（３２）が接続しである。又上記加熱素
子（ロ）はシェル（３ｏ）内の上部及び下部に配置した
仕切板（３３ａ）（３３ｂ ）によって支持されており
、この仕切板（３３ａ）（３３ｂ）によって加熱素子（
ロ）の外周にリング状の密閉された空間（３４）が形成
しである。又図中（３５）は上記空間（３４）内に加熱
用蒸気を供給するため、シェル（３ｏ）の上部周面に設
けた加熱蒸気導入口、（３６）は空間（３４）内に供給
された加熱蒸気をシェル（３０）の外部に排出するため
、シェル（３０）の下部周面に設けた排出口、（３７）
はシ１ル（３０）内の上部に配置した仕切板（３３ａ）
の上面に先端部が開孔した被加熱用流体供給筒である。An evaporative vapor outlet (31) is provided at the upper end of the shell (3o) for guiding evaporative vapor generated from the inner circumferential surface of the heating element (b) to the outside of the shell (30). A concentrated liquid discharge tube (32) is connected to the lower end of the heating element (b) for discharging the concentrated liquid concentrated on the inner circumferential surface of the heating element (b) to the outside of the shell (3o). The heating element (b) is supported by partition plates (33a) (33b) arranged at the upper and lower parts of the shell (3o), and the heating element (b) is supported by the partition plates (33a) (33b).
A ring-shaped sealed space (34) is formed around the outer periphery of (b). In the figure, (35) is a heating steam inlet provided on the upper peripheral surface of the shell (3o) for supplying heating steam into the space (34), and (36) is a heating steam inlet for supplying heating steam into the space (34). an exhaust port (37) provided on the lower peripheral surface of the shell (30) in order to discharge heated steam to the outside of the shell (30);
is the partition plate (33a) placed at the top of the seal (30)
This is a heated fluid supply tube with a hole in the top surface at the tip.
上記構成からなる薄膜流下型蒸発器の加熱蒸気導入口（
３５）から加熱素子（ロ）の外周に設けた空間（３４）
内に加熱用蒸気を導入すると同時に、被加熱用流体供給
筒（３７）から仕切板（３３ａ）の上面に被加熱用流体
を供給すると、加熱・用蒸気は加熱素子（ロ）の外周に
設けた空間（３４）を通過した後、シェル（３０）の下
部周面に設けた排出口（３６）から外部に排出される。The heated steam inlet of the thin film falling type evaporator with the above configuration (
35) to the space (34) provided around the outer periphery of the heating element (b)
At the same time as the heating steam is introduced into the heating element (b), the heating fluid is supplied from the heating fluid supply cylinder (37) to the upper surface of the partition plate (33a). After passing through the space (34), the gas is discharged to the outside from the discharge port (36) provided on the lower peripheral surface of the shell (30).
一方、被加熱用流体供給筒（３７）がら仕切板（３３ａ
）の上面に供給された被加熱用流体は、仕切板（３３ａ
）の上面から加熱素子（ロ）の内周面に流入し、加熱素
子（ロ）の内周面に設けた伸斜溝（イ）に沿って加熱素
子（ロ）の内周面上を旋回しながら流下して行く。そし
てこの時、加熱素子（ロ）の外周を流れる加熱用蒸気と
の間で熱交換が行われ、被加熱用流体の一部が蒸発し、
蒸発蒸気は、シェル（３０）の−）［に設ＬＪた蒸発蒸
気出口（３１）から次段の装置番こ送られる。又加熱素
子（１ニア ）の内周面から蒸発（２なかった被加熱用
流体は、加熱素Ｔｆ−（ロ）の１・端からシェル（３０
）の底部に落下し、シェル（３０）の底部に接続した濃
縮液排出筒（３２）を通って外部に導出される。On the other hand, the partition plate (33a
) The heated fluid supplied to the top surface of the partition plate (33a
) flows into the inner circumferential surface of the heating element (b) from the top surface of the heating element (b), and turns on the inner circumferential surface of the heating element (b) along the diagonal groove (a) provided on the inner circumferential surface of the heating element (b). It flows down the river. At this time, heat exchange is performed with the heating steam flowing around the outer circumference of the heating element (b), and a part of the heated fluid evaporates.
The evaporated steam is sent to the next stage of equipment from the evaporated steam outlet (31) installed at LJ of the shell (30). In addition, the heated fluid that has not evaporated (2) from the inner circumferential surface of the heating element (1 near) is evaporated from the shell (30
) and is led out to the outside through a concentrate discharge tube (32) connected to the bottom of the shell (30).
尚、」二記２つの実施例は、シェル（２１） （３０
）内に円筒状をした加熱素子（ロ）を１つだけ収納した
例について説明し７たが、シェル（２１）（３０）内に
は複数本の加熱素子（ロ）を収納し、各加熱素子（ロ）
の内周面及び外周面に加熱用蒸気及び被加熱用流体を供
給してもよい。又、それぞれ径の異なる加熱素子（ロ）
を枚数本用意しておき、この加熱素子（ロ）をシェル（
２１＞ （３０）内に同心円状に配置し、各加熱素子
（ロ）間に形成される空間内に加熱用蒸気及び被加熱用
流体を交互に供給してもよい。又、シェル（２１）
（３０）の形状は、円筒形以外でもよい。In addition, the two embodiments are shell (21) (30
), an example in which only one cylindrical heating element (b) is housed in the shell (21) and (30) was explained, but multiple heating elements (b) are housed in the shell (21) and (30), and each heating Motoko (b)
Heating steam and fluid to be heated may be supplied to the inner peripheral surface and outer peripheral surface of. Also, heating elements (b) with different diameters
Prepare several sheets of heating element (b), and insert this heating element (b) into the shell (
21> The heating elements (30) may be arranged concentrically, and the heating steam and the fluid to be heated may be alternately supplied into the space formed between each heating element (b). Also, shell (21)
The shape of (30) may be other than cylindrical.
発明の効果
！、記した如く、シェル内に収納する加熱素子を円筒伏
乙こ形成し、か・つ、その内周面及び外周面に伸斜溝を
設置ノでｔ昌ノぽ、加熱素子の全長を長くするごとなく
伝熱長をしくでき乙。従って装置全体の高さｈ゛向の全
長４短くでき、薄膜流下型蒸発器の小型化が可能となる
。又、加熱素子の内面に伸斜溝を設４ＪておｉＪば、加
熱素子の周面を被加熱用流体が流下する時、被加熱用流
体は伸斜溝に沿っ°（流下するため、液偏流が起こるの
を防１１できる。Effect of the invention! As described above, the heating element to be housed in the shell is formed into a cylindrical shape, and diagonal grooves are installed on the inner and outer circumferential surfaces of the heating element, thereby increasing the overall length of the heating element. You can easily increase the heat transfer length. Therefore, the total length of the entire device in the height direction h can be reduced by 4, making it possible to downsize the thin film falling type evaporator. In addition, if a diagonal groove is provided on the inner surface of the heating element, when the fluid to be heated flows down the circumferential surface of the heating element, the fluid to be heated flows along the diagonal groove (flows down, so the liquid It is possible to prevent the occurrence of drifting flow11.
第１図は本発明に係る薄膜流下型材発器の第１の実施例
を示す部分断面図、第２図は第２の実施例を示す部分断
面図、第３図乃至第６図は本発明に係る加熱素子の製造
方法を説明するための説明図、第７図は薄膜流下型蒸発
器の従来例を示す斜視図である。
（イ） 伸斜溝、（ロ）−加熱素子、（２１）（３０）
シェル。
第１図
ｃｙ
第２１スＩ
Ｊ？
第３１４ 第４図ｆフ
第５１４ 第６図
ハFIG. 1 is a partial sectional view showing a first embodiment of a thin film falling material generator according to the present invention, FIG. 2 is a partial sectional view showing a second embodiment, and FIGS. FIG. 7 is a perspective view showing a conventional example of a thin film falling type evaporator. (A) Expansion groove, (B) - Heating element, (21) (30)
shell. Figure 1 cy No. 21 I J? 314 Figure 4 f 514 Figure 6 C
Claims (1)
有する加熱素子と、この加熱素子を収納するシェルとか
らなり、上記シェル内に収納された加熱素子の外周面と
内周面とにそれぞれ２種類の流体を供給することにより
熱交換を行うことを特徴とする薄膜流下型蒸発器。(1) Consisting of a heating element that is cylindrical and has diagonal grooves on its inner and outer circumferential surfaces, and a shell that houses this heating element, the outer circumferential surface of the heating element that is housed in the shell and A thin film falling type evaporator characterized in that heat exchange is performed by supplying two types of fluid to each inner peripheral surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12669485A JPS61287401A (en) | 1985-06-11 | 1985-06-11 | Thin film flowing down evaporator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12669485A JPS61287401A (en) | 1985-06-11 | 1985-06-11 | Thin film flowing down evaporator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61287401A true JPS61287401A (en) | 1986-12-17 |
| JPH0454481B2 JPH0454481B2 (en) | 1992-08-31 |
Family
ID=14941533
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12669485A Granted JPS61287401A (en) | 1985-06-11 | 1985-06-11 | Thin film flowing down evaporator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61287401A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4932468A (en) * | 1988-12-19 | 1990-06-12 | E. L. Nickell Co., Inc. | Vertical falling film multi-tube heat exchanger |
| JP2015217371A (en) * | 2014-05-20 | 2015-12-07 | 国立大学法人 東京大学 | Surface flow-down type concentration device and surface flow-down type concentration method, and device using the method |
-
1985
- 1985-06-11 JP JP12669485A patent/JPS61287401A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4932468A (en) * | 1988-12-19 | 1990-06-12 | E. L. Nickell Co., Inc. | Vertical falling film multi-tube heat exchanger |
| JP2015217371A (en) * | 2014-05-20 | 2015-12-07 | 国立大学法人 東京大学 | Surface flow-down type concentration device and surface flow-down type concentration method, and device using the method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0454481B2 (en) | 1992-08-31 |
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| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |