JPS61282229A - 防塵カセツト - Google Patents

防塵カセツト

Info

Publication number
JPS61282229A
JPS61282229A JP60122182A JP12218285A JPS61282229A JP S61282229 A JPS61282229 A JP S61282229A JP 60122182 A JP60122182 A JP 60122182A JP 12218285 A JP12218285 A JP 12218285A JP S61282229 A JPS61282229 A JP S61282229A
Authority
JP
Japan
Prior art keywords
lid
cover
mask
upper lid
cassette
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60122182A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0348097B2 (enrdf_load_stackoverflow
Inventor
Shinji Tsutsui
慎二 筒井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60122182A priority Critical patent/JPS61282229A/ja
Priority to US06/750,282 priority patent/US4611967A/en
Publication of JPS61282229A publication Critical patent/JPS61282229A/ja
Publication of JPH0348097B2 publication Critical patent/JPH0348097B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Packaging Frangible Articles (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Sheets, Magazines, And Separation Thereof (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60122182A 1984-07-06 1985-06-05 防塵カセツト Granted JPS61282229A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60122182A JPS61282229A (ja) 1985-06-05 1985-06-05 防塵カセツト
US06/750,282 US4611967A (en) 1984-07-06 1985-07-01 Cassette-type container for a sheet-like member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60122182A JPS61282229A (ja) 1985-06-05 1985-06-05 防塵カセツト

Publications (2)

Publication Number Publication Date
JPS61282229A true JPS61282229A (ja) 1986-12-12
JPH0348097B2 JPH0348097B2 (enrdf_load_stackoverflow) 1991-07-23

Family

ID=14829605

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60122182A Granted JPS61282229A (ja) 1984-07-06 1985-06-05 防塵カセツト

Country Status (1)

Country Link
JP (1) JPS61282229A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6444035A (en) * 1987-08-12 1989-02-16 Hitachi Ltd Production using single wafer carrier
JPH0269955A (ja) * 1988-09-06 1990-03-08 Canon Inc マスクローディング機構
JPH0346928A (ja) * 1989-07-12 1991-02-28 Nec Corp 自動用紙幅合わせ機構
JPH06104331A (ja) * 1992-08-04 1994-04-15 Internatl Business Mach Corp <Ibm> 加圧密封式可搬性コンテナ
JP2008219032A (ja) * 2001-08-10 2008-09-18 Asml Holding Nv レチクルを保護及び搬送する装置及び方法
JP2024058652A (ja) * 2022-10-14 2024-04-25 家登精密工業股▲ふん▼有限公司 非矩形レチクルの容器

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6444035A (en) * 1987-08-12 1989-02-16 Hitachi Ltd Production using single wafer carrier
JPH0269955A (ja) * 1988-09-06 1990-03-08 Canon Inc マスクローディング機構
JPH0346928A (ja) * 1989-07-12 1991-02-28 Nec Corp 自動用紙幅合わせ機構
JPH06104331A (ja) * 1992-08-04 1994-04-15 Internatl Business Mach Corp <Ibm> 加圧密封式可搬性コンテナ
JP2008219032A (ja) * 2001-08-10 2008-09-18 Asml Holding Nv レチクルを保護及び搬送する装置及び方法
JP2024058652A (ja) * 2022-10-14 2024-04-25 家登精密工業股▲ふん▼有限公司 非矩形レチクルの容器

Also Published As

Publication number Publication date
JPH0348097B2 (enrdf_load_stackoverflow) 1991-07-23

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term