JPS61276258A - Optical-electric integrated element - Google Patents

Optical-electric integrated element

Info

Publication number
JPS61276258A
JPS61276258A JP60116387A JP11638785A JPS61276258A JP S61276258 A JPS61276258 A JP S61276258A JP 60116387 A JP60116387 A JP 60116387A JP 11638785 A JP11638785 A JP 11638785A JP S61276258 A JPS61276258 A JP S61276258A
Authority
JP
Japan
Prior art keywords
circuit
signal
optical
clock signal
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60116387A
Other languages
Japanese (ja)
Other versions
JPH0638489B2 (en
Inventor
Masaru Nakamura
優 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP11638785A priority Critical patent/JPH0638489B2/en
Publication of JPS61276258A publication Critical patent/JPS61276258A/en
Publication of JPH0638489B2 publication Critical patent/JPH0638489B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Electronic Switches (AREA)

Abstract

PURPOSE:To reduce signal delay and the increase of wiring length by sharing a signal such as a clock signal as a common signal in an electronic circuit to an optical semiconductor element. CONSTITUTION:A plurality of circuit units 2 consisting of single or a plurality of logic elements are integrated to an integrated circuit substrate 1, and one or two or more of semiconductor light-emitting elements 3 are formed at a central section in the integrated circuit substrate 1 in a monolithic manner. Semiconductor photo-detecting elements coupled with electric elements are unified and shaped to each circuit unit 2. When a clock signal is transmitted over several circuit unit 2, the clock signal is applied to the semiconductor light-emitting elements 3, and optical signals corresponding to the clock signal are emitted. Optical signals emitted in response to the clock signal are detected simultaneously by the photo-detecting elements formed in the monolithic manner at every circuit unit 2, and the detecting signals are transmitted over the electric elements constituting a logic circuit as clock signals.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は光素子と電気素子とを集積化した光・電気集積
化素子に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to an optical/electrical integrated device that integrates an optical device and an electrical device.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

半導体集積回路の集積度が年々増大するなかで現時点に
於ける問題点の一つは、高密度実装状態での配線長や負
荷の増大に伴う信号遅延や、配線の複雑化による設計、
製造コストの上昇等である。
As the degree of integration of semiconductor integrated circuits increases year by year, one of the current problems is signal delay due to increased wiring length and load in high-density packaging, and design problems due to complicated wiring.
This includes increases in manufacturing costs.

すなわち論理IC等(;於いてはクロック信号はシステ
ム動作上置も基本的な信号であり、チップ内でのクロッ
ク信号分配置:関しては同時性が必要とされるのである
が、高密度実装下では上記のような信号遅延が生じ同時
性が損われることから重大な問題となっている。またク
ロック信号は論理ユニットに少なくとも1個以上接続さ
れているためIC全体に重めるクロック配線の比率は大
きく、従って高集積化への一つの障害となっている。こ
のような従来技術に於いて、高速で同時性が十分確保さ
れかつ分配の容易な信号分配が望まれていた。
In other words, in logic ICs, etc., the clock signal is a fundamental signal for system operation, and concurrency is required when distributing the clock signal within the chip, but high-density packaging This is a serious problem because the signal delay described above occurs and synchronization is lost.Also, since the clock signal is connected to at least one logic unit, the clock wiring that is added to the entire IC is a serious problem. The ratio is large, and is therefore an obstacle to high integration.In such conventional technology, there has been a desire for high-speed signal distribution that ensures sufficient simultaneity and is easy to distribute.

〔発明の目的〕[Purpose of the invention]

本発明は上記の点に鑑みてなされたもので、゛電子集積
回路に元半導体素子を一体的(;複合化した光・−気集
積化素子を提供することを目的とする。
The present invention has been made in view of the above points, and an object of the present invention is to provide an optical/vapor integrated device in which an original semiconductor device is integrated into an electronic integrated circuit.

すなわち光半導体素子に′亀子回路での共通信号である
、例えはクロック信号を担わせることにより従来の信号
遅延や配線長の増大を軽減することを目的とする。
That is, the purpose is to reduce the conventional signal delay and increase in wiring length by having the optical semiconductor element carry a common signal in the Kameko circuit, for example, a clock signal.

〔発明の概要〕[Summary of the invention]

複数の回路ユニットからなる集積回路と、この集積回路
が形成された基板に一体化形成された1個又は2個以上
の半導体発光素子と、複数の回路ユニットに各一体化形
成され半導体発光素子からの共通光信号を検出しこの検
出した信号を回路ユニットに供給する半導体光検出素子
とからなり。
An integrated circuit consisting of a plurality of circuit units, one or more semiconductor light emitting elements integrally formed on a substrate on which this integrated circuit is formed, and semiconductor light emitting elements each integrally formed in a plurality of circuit units. and a semiconductor photodetector element that detects a common optical signal and supplies the detected signal to the circuit unit.

かつこの共通光信号は選択的に手導体光検出素子のみで
検出されることからなる光パ鴫気集積化素子を得るもの
である。
Moreover, this common optical signal is selectively detected only by the hand conductor photodetecting element, thereby obtaining an optical-polar-air-air integrated element.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、&1理回路(=よるクロックなこの論
理回路基板に一体化形成した光半導体素子1:より供給
することで、数m1lI四方のチップであれは全領域へ
の光クロックの伝搬遅延差が僅か数10psの言わば、
略同時のクロックを分配できる。各回路ユニットは半導
体発光素子からの光を検出する受光素子を1個付加する
だけで良く、タロツク分配)二関する配線が不要となる
。その為ICの有効面積が増えさらに集積度が増加する
。また従来のタロツクの配線に於いては配線の1箇所が
切断されるとその配線に接続された全回路ユニットが動
作不良を生ずるが、本発明による光クロックでは個別分
配方式とも言うべき機能を果すため、そのような問題は
生じない。さらにICのクロック配線を省略することが
できるので、設計自由度が増大し、パターンレイアクト
も格段に容易となる。
According to the present invention, by supplying a clock from the optical semiconductor element 1 integrated into the logic circuit board, the optical clock can be propagated to the entire area of a chip of several millimeters square. So to speak, the delay difference is only a few tens of ps.
Almost simultaneous clocks can be distributed. Each circuit unit only needs to have one light receiving element for detecting light from the semiconductor light emitting element, and wiring related to tarock distribution is not required. This increases the effective area of the IC and further increases the degree of integration. In addition, in conventional taro clock wiring, if one part of the wiring is cut, all the circuit units connected to that wiring will malfunction, but the optical clock according to the present invention performs a function that can be called an individual distribution system. Therefore, such a problem does not occur. Furthermore, since the clock wiring of the IC can be omitted, the degree of freedom in design is increased and pattern layout becomes much easier.

又共通光信号は選択的;二元検出素子のみで検出する様
にしたことで、とかく問題となりがちな回路ユニット内
の゛尾子回路素子が僅かではあるが光検出特性を持つこ
とからくる誤動作等を防げることが可能となる。
In addition, the common optical signal is selective; by detecting it only with the dual detection element, it is possible to prevent malfunctions caused by the optical detection characteristics of the optical circuit elements in the circuit unit, which tend to have a slight optical detection characteristic. etc. can be prevented.

〔発明の実施例〕[Embodiments of the invention]

以下本発明の実施例を図面を参照して説明する。 Embodiments of the present invention will be described below with reference to the drawings.

′s1図は本発明の詳細な説明する為の概念図を示すも
のであり、集積回路基板(1a )+:単単数−は複数
の論理素子からなる回路ユニツ) (2a)が複数集積
化され、さらにこの集積回路基板(la)内には中央部
に1個又は2個以上の半導体発光素子(3a)がモノリ
シックに形成されている。また各回路ユニッ) (2a
)には、電気素子に結合した半導体光検出素子が一体化
形成されている。各回路ユニット(2a)にクロック信
号を供給する場合は、このタロツク信号を半導体発光素
子(3a)に印加し、クロック信号に応じた光信号を放
出させる。このクロック(a号に応じて放出された光信
号は、複数の各回路二二ツ) (2a)ごとにモノリシ
ック形成された光検出素子で一斉(:検出されこの検出
された信号はクロック信号として論理回路を構成する電
気素子に供給される。次に半導体発光素子、光検出素子
及び亀子回路の一部を構成するFBTがモノリシックに
形成された部分の断面図を第2図(a)に示し、その等
価向路を第2図(b) E示し、これを用いて説明する
Figure 's1 shows a conceptual diagram for explaining the present invention in detail, and shows an integrated circuit board (1a) +: a circuit unit consisting of a plurality of logic elements) (2a) is integrated. Furthermore, one or more semiconductor light emitting elements (3a) are monolithically formed in the center of this integrated circuit board (la). Also, each circuit unit) (2a
) is integrally formed with a semiconductor photodetector element coupled to an electrical element. When a clock signal is supplied to each circuit unit (2a), this tarlock signal is applied to the semiconductor light emitting element (3a) to cause it to emit an optical signal according to the clock signal. The optical signal emitted in response to this clock (a) is detected simultaneously by a monolithically formed photodetector element for each of the plurality of circuits (2a), and this detected signal is detected as a clock signal. The light is supplied to the electrical elements that make up the logic circuit.Next, a cross-sectional view of a portion where the semiconductor light emitting device, the photodetecting device, and the FBT forming part of the Kameko circuit are monolithically formed is shown in Fig. 2(a). , and its equivalent direction path is shown in FIG. 2(b) E, and will be explained using this.

LED部(1)はダブルへテロ構造で、1μm程度の活
性層(4)は3μm程度のP−GaAfflAS層(3
)と10 μm程度のn −GaAA人S層(6)とで
はさまれた形となっている。又LEDは発光効率を高め
るために2μm程度のP −Ga人形人S層(5)によ
り磁流通路が狭窄された形となっている。LHADから
の光出力を受光すべく光検出器は5μm程度のi −G
aAs層(7)内にPドーパントを拡散、あるいはイオ
ン打ち込みにより形成されたP領域とn −(Ja日人
S層(6)との間で作らオするP−I−Ni造となって
いる。回路ユニットの初段FITはi −GaAs上に
イオンインプラで形成されたソースaυ、ドレインH,
ゲート部@からなり、ゲート部はPIN−PD (フォ
トダイオード)のP′磁極と接続されている。又PIN
−FDのN電極はLEDのN電橋と共通HA (6)で
接続され。
The LED part (1) has a double heterostructure, and the active layer (4) with a thickness of about 1 μm has a P-GaAfflAS layer (3 μm) with a thickness of about 3 μm.
) and an n -GaAAA human S layer (6) of about 10 μm. In addition, the LED has a shape in which the magnetic flow path is constricted by a P-Ga doll S layer (5) of about 2 μm in order to increase luminous efficiency. In order to receive the optical output from LHAD, the photodetector has an i-G of about 5 μm.
The P-I-Ni structure is formed between the P region formed by diffusing P dopants in the aAs layer (7) or by ion implantation and the n-(Japanese S layer) (6). The first stage FIT of the circuit unit has a source aυ, a drain H, and a drain H formed on i-GaAs by ion implantation.
It consists of a gate part @, and the gate part is connected to the P' magnetic pole of the PIN-PD (photodiode). Also PIN
-The N electrode of the FD is connected to the N bridge of the LED through a common HA (6).

外部端子QJを持つ。以上の回路の等価回路を第1図の
下部に示す。この様な構造に於ては、光入力を必要とす
るどの様な場所に於いてもPIN−PDのP+螺極を深
く形成することで、あたかも井戸を掘るがごとく光を受
光することが出来る。又1−GaAs層(力は数μm以
上であれば光のほとんどを吸収し、FETには達つせず
、このことで共通光信号は選択的(=光検出素子のみに
到達させることが出来る。
It has an external terminal QJ. An equivalent circuit of the above circuit is shown in the lower part of FIG. In such a structure, by forming the P+ spiral pole of the PIN-PD deep in any location that requires light input, it is possible to receive light as if digging a well. . In addition, the 1-GaAs layer (with a force of several μm or more absorbs most of the light and does not reach the FET, so that the common optical signal can be selective (= reach only the photodetector element). .

第3図は本発明の他の実施例を示し、(a)は部分断面
図、(b)はその等価回路図である。先の例では受光部
はPIN−FDであったが、ここでは製作の容易なフォ
トコンダクタ(pc)を用いたことである。LED部、
FET部は先の実施例と同じである。
FIG. 3 shows another embodiment of the present invention, in which (a) is a partial sectional view and (b) is an equivalent circuit diagram thereof. In the previous example, the light receiving section was a PIN-FD, but here a photoconductor (PC), which is easy to manufacture, is used. LED section,
The FET section is the same as in the previous embodiment.

1− GaAs jii G!I中のPC部の磁位とL
IDでのn−GaA−gAsJi(イ)の4位とは一般
的EA6ため1位分離の為のi −GaAJ3人S層を
必要とする。この分離層はIの一度により絶縁度が異る
ため、必要ならはもう−R4P −GaA−g人sr−
をi −GaAAAs層(3)とn −GaA4As層
C埼の間に入れる対処も考えられる。
1- GaAs jii G! The magnetic potential of the PC part in I and L
The 4th place of n-GaA-gAsJi (a) in ID is a general EA6, so an i-GaAJ 3-person S layer is required to separate the 1st place. Since the degree of insulation of this separation layer differs depending on the degree of I, if necessary, -R4P -GaA-gpersonsr-
It is also conceivable to put this between the i-GaAAAs layer (3) and the n-GaA4As layer C.

PC部を深く堀り込んだのはi −GaAs層が5μm
と厚い為であることは第1の実施例と同様である。
The i-GaAs layer is 5 μm deep in the PC part.
This is because it is thick, as in the first embodiment.

等価回路を第2図の下部に示すが、LED部と回路ユニ
ット部は竜位的には共通点は無い。この例でも共通光信
号は選択的にフォトコンでのみ受光される。
The equivalent circuit is shown at the bottom of FIG. 2, but the LED part and the circuit unit part have nothing in common. In this example as well, the common optical signal is selectively received only by the photoconverter.

先に述べたがFETのゲート自身も僅かではあるが、受
光感度を有する。もし回路動作上このFgTを光検出素
子として用いようとする場合F’ETを先の光検出素子
のごとく形成し・ても良いことは勿論のことである。
As mentioned earlier, the gate of the FET itself has light receiving sensitivity, although it is small. Of course, if this FgT is to be used as a photodetecting element for circuit operation, the F'ET may be formed like the photodetecting element described above.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例を説明するための概念図、第
2図は第1図の一部断面図とその等価回路図、第3図は
他の実施例を示す図である。 2・・・基板     1・・・半導体発光素子部9・
・・半導体光検出素子部  10・・・FEIT部代理
人 弁理士 則 近 憲 佑 ゛(ほか1名)第  1
 図 第  2 区
FIG. 1 is a conceptual diagram for explaining one embodiment of the present invention, FIG. 2 is a partial sectional view of FIG. 1 and its equivalent circuit diagram, and FIG. 3 is a diagram showing another embodiment. 2... Substrate 1... Semiconductor light emitting element section 9.
...Semiconductor Photodetector Element Department 10...FEIT Department Representative Patent Attorney Noriyuki Chika (and 1 other person) No. 1
Figure 2nd ward

Claims (2)

【特許請求の範囲】[Claims] (1)複数の回路ユニットからなる集積回路と、該集積
回路が形成された基板に一体化形成された1個又は2個
以上の半導体発光素子と、前記複数の回路ユニットに各
一体化形成され前記半導体発光素子からの共通光信号を
検出し、該検出した信号を前記回路ユニットに供給する
半導体光検出素子とを具備し、かつこの共通光信号は選
択的に前記半導体光検出素子のみで検出されることを特
徴とする光・電気集積化素子。
(1) An integrated circuit consisting of a plurality of circuit units, one or more semiconductor light emitting elements integrally formed on a substrate on which the integrated circuit is formed, and each integrated circuit formed integrally on the plurality of circuit units. a semiconductor photodetection element that detects a common optical signal from the semiconductor light emitting element and supplies the detected signal to the circuit unit, and the common optical signal is selectively detected only by the semiconductor photodetection element. An optical/electrical integrated device characterized by:
(2)半導体光検出素子は回路ユニットとともに低濃度
層に形成され、かつ選択的に受光する様に前記低濃度層
内に深く形成されたP−I−Nフォトダイオードあるい
はフォトコンダクタであることを特徴とする特許請求の
範囲第1項記載の光・電気集積化素子。
(2) The semiconductor photodetector element is formed in a low concentration layer together with the circuit unit, and is a P-I-N photodiode or photoconductor formed deep within the low concentration layer so as to selectively receive light. An optical/electrical integrated device according to claim 1.
JP11638785A 1985-05-31 1985-05-31 Optical / electrical integrated device Expired - Fee Related JPH0638489B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11638785A JPH0638489B2 (en) 1985-05-31 1985-05-31 Optical / electrical integrated device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11638785A JPH0638489B2 (en) 1985-05-31 1985-05-31 Optical / electrical integrated device

Publications (2)

Publication Number Publication Date
JPS61276258A true JPS61276258A (en) 1986-12-06
JPH0638489B2 JPH0638489B2 (en) 1994-05-18

Family

ID=14685760

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11638785A Expired - Fee Related JPH0638489B2 (en) 1985-05-31 1985-05-31 Optical / electrical integrated device

Country Status (1)

Country Link
JP (1) JPH0638489B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01109758A (en) * 1987-10-23 1989-04-26 Hitachi Ltd Large scale logic integrated circuit
JP2001237411A (en) * 2000-02-21 2001-08-31 Sony Corp Optoelectric integrated circuit device
JP2006140269A (en) * 2004-11-11 2006-06-01 Toshiba Corp Optical clock lsi and system thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01109758A (en) * 1987-10-23 1989-04-26 Hitachi Ltd Large scale logic integrated circuit
JP2001237411A (en) * 2000-02-21 2001-08-31 Sony Corp Optoelectric integrated circuit device
JP2006140269A (en) * 2004-11-11 2006-06-01 Toshiba Corp Optical clock lsi and system thereof
JP4537832B2 (en) * 2004-11-11 2010-09-08 株式会社東芝 Optical clock distribution device and optical clock distribution system

Also Published As

Publication number Publication date
JPH0638489B2 (en) 1994-05-18

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