JPS61275327A - Polyamide resin composition and its production - Google Patents
Polyamide resin composition and its productionInfo
- Publication number
- JPS61275327A JPS61275327A JP60117093A JP11709385A JPS61275327A JP S61275327 A JPS61275327 A JP S61275327A JP 60117093 A JP60117093 A JP 60117093A JP 11709385 A JP11709385 A JP 11709385A JP S61275327 A JPS61275327 A JP S61275327A
- Authority
- JP
- Japan
- Prior art keywords
- polyamide resin
- aromatic
- resin composition
- polycarboxylic acid
- derivative
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title claims description 21
- 229920006122 polyamide resin Polymers 0.000 title claims description 19
- 238000004519 manufacturing process Methods 0.000 title description 4
- 229920005989 resin Polymers 0.000 claims abstract description 43
- 239000011347 resin Substances 0.000 claims abstract description 43
- 239000002253 acid Substances 0.000 claims abstract description 33
- 239000004760 aramid Substances 0.000 claims abstract description 23
- 229920003235 aromatic polyamide Polymers 0.000 claims abstract description 23
- 229920000768 polyamine Polymers 0.000 claims abstract description 20
- 125000003118 aryl group Chemical group 0.000 claims abstract description 17
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000002904 solvent Substances 0.000 claims abstract description 15
- 150000004984 aromatic diamines Chemical class 0.000 claims abstract description 7
- 229920001228 polyisocyanate Polymers 0.000 claims abstract description 7
- 239000005056 polyisocyanate Substances 0.000 claims abstract description 7
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 claims abstract description 7
- 238000002156 mixing Methods 0.000 claims description 6
- 150000004985 diamines Chemical class 0.000 claims description 4
- 150000002989 phenols Chemical class 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 28
- 239000000203 mixture Substances 0.000 abstract description 6
- 239000003054 catalyst Substances 0.000 abstract description 4
- 239000003960 organic solvent Substances 0.000 abstract description 3
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 abstract description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 abstract description 2
- GIWKOZXJDKMGQC-UHFFFAOYSA-L lead(2+);naphthalene-2-carboxylate Chemical compound [Pb+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 GIWKOZXJDKMGQC-UHFFFAOYSA-L 0.000 abstract description 2
- 150000007513 acids Chemical class 0.000 description 12
- -1 aliphatic dicarboxylic acids Chemical class 0.000 description 11
- 150000008065 acid anhydrides Chemical class 0.000 description 8
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 7
- 229930003836 cresol Natural products 0.000 description 7
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 6
- 239000004962 Polyamide-imide Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229920002312 polyamide-imide Polymers 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 150000008064 anhydrides Chemical class 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000004135 Bone phosphate Substances 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000010292 electrical insulation Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- PWSKHLMYTZNYKO-UHFFFAOYSA-N heptane-1,7-diamine Chemical compound NCCCCCCCN PWSKHLMYTZNYKO-UHFFFAOYSA-N 0.000 description 2
- 239000012456 homogeneous solution Substances 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- 239000002184 metal Chemical class 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 2
- RTTZISZSHSCFRH-UHFFFAOYSA-N 1,3-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC(CN=C=O)=C1 RTTZISZSHSCFRH-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- OHLKMGYGBHFODF-UHFFFAOYSA-N 1,4-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=C(CN=C=O)C=C1 OHLKMGYGBHFODF-UHFFFAOYSA-N 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- VGVRPFIJEJYOFN-UHFFFAOYSA-N 2,3,4,6-tetrachlorophenol Chemical class OC1=C(Cl)C=C(Cl)C(Cl)=C1Cl VGVRPFIJEJYOFN-UHFFFAOYSA-N 0.000 description 1
- BGCSUUSPRCDKBQ-UHFFFAOYSA-N 2,4,8,10-tetraoxaspiro[5.5]undecane Chemical compound C1OCOCC21COCOC2 BGCSUUSPRCDKBQ-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- 241000270298 Boidae Species 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- WMTLVUCMBWBYSO-UHFFFAOYSA-N N=C=O.N=C=O.C=1C=CC=CC=1OC1=CC=CC=C1 Chemical compound N=C=O.N=C=O.C=1C=CC=CC=1OC1=CC=CC=C1 WMTLVUCMBWBYSO-UHFFFAOYSA-N 0.000 description 1
- 241000282373 Panthera pardus Species 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 240000008866 Ziziphus nummularia Species 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 150000007860 aryl ester derivatives Chemical class 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N beta-methyl-butyric acid Natural products CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical class OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- YQLZOAVZWJBZSY-UHFFFAOYSA-N decane-1,10-diamine Chemical compound NCCCCCCCCCCN YQLZOAVZWJBZSY-UHFFFAOYSA-N 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 150000002085 enols Chemical class 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229940100630 metacresol Drugs 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- NSKIPIAUYVRHTO-UHFFFAOYSA-N morpholine-3,4-diamine Chemical compound NC1COCCN1N NSKIPIAUYVRHTO-UHFFFAOYSA-N 0.000 description 1
- ZETYUTMSJWMKNQ-UHFFFAOYSA-N n,n',n'-trimethylhexane-1,6-diamine Chemical compound CNCCCCCCN(C)C ZETYUTMSJWMKNQ-UHFFFAOYSA-N 0.000 description 1
- 125000005608 naphthenic acid group Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- SXJVFQLYZSNZBT-UHFFFAOYSA-N nonane-1,9-diamine Chemical compound NCCCCCCCCCN SXJVFQLYZSNZBT-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000002411 thermogravimetry Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
技術分野
本発明は電気絶縁フェス等として有用で新規なポリアミ
ド系樹脂組成物およびその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to a novel polyamide resin composition useful as electrically insulating panels and the like, and a method for producing the same.
(発明の技術的背景とその問題点)
省資源、省エネルギーの必要性と周辺機器の小型化、@
量化に伴ない電気機器自体の高性能、小型化が進められ
ている近年において、耐熱性、機械的嬌性、電気的特性
、経済性のバランスのとれているポリアミドイミド南北
は電気絶縁フェスを始めとする絶縁材料の分野において
その1璧性が増大している。(Technical background of the invention and its problems) Necessity of resource and energy conservation and miniaturization of peripheral equipment, @
In recent years, as electrical equipment itself has become more efficient and more compact due to increased quantification, polyamide-imide Nanboku, which has a good balance of heat resistance, mechanical strength, electrical properties, and economic efficiency, has been used for electrical insulation panels and other applications. Its popularity in the field of insulating materials is increasing.
従来から、トリメシン)&無水物と芳香族ジアミンを、
例えばN−メチル−2−ピロリドン、ジメチルアセトア
ミド等の非プロトン系極性溶媒中で反応させることによ
シ高重合度のポリアミドイミド樹脂組成物が得られるこ
とは公知でめる〇しかしこの方法に用いられる極性溶媒
の吸湿性が強く、疑似ゲル化現象、白濁現象等がフェス
使用時に起シ易いためフェスの保管、管理が困難である
という難点を有していた0更に特殊な非プロトン系極性
溶媒を用いるためフェスの価格が高くな夛工東的有用性
に乏しいという難点も有していtC。Traditionally, trimesin) & anhydride and aromatic diamine,
For example, it is known that a polyamide-imide resin composition with a high degree of polymerization can be obtained by reacting in an aprotic polar solvent such as N-methyl-2-pyrrolidone or dimethylacetamide. The polar solvent used in the festival has strong hygroscopicity, and pseudo-gelling phenomena and cloudy phenomena are likely to occur when the festival is used, making it difficult to store and manage the festival. It also has the disadvantage of being expensive and lacking in usefulness due to the use of tC.
このため電気絶縁ワニスの溶媒として極めて一般的に用
いられているフェノール系溶媒ヲ用いたポリアミドイミ
ド樹脂の提案が多くなされている(例えは特公昭51−
23999号、特公昭56−17374号、特公昭56
−22330号、特公昭56−34210号)。For this reason, many proposals have been made for polyamide-imide resins using phenolic solvents, which are extremely commonly used as solvents for electrical insulating varnishes (for example,
No. 23999, Special Publication No. 56-17374, Special Publication No. 17374
-22330, Special Publication No. 56-34210).
しかし、単にトリメリット酸無水物と4.4’−ジアミ
ノジフェニルメタンのような芳香族ジアミン金7エノー
ル系溶媒中で反応させてポリアミドイミド・脂血を得よ
うとしても、白濁沈澱してしまうか又は均一溶液を得よ
りとしてフェノール系溶媒の沸点以上の高温下で反応さ
せても末端にアリールエステル等が生成してしまい実用
的な絶線ワニスに供しうる高分子量ポリマーが得らnな
いのが果状でろる。However, even if an attempt is made to obtain polyamideimide/lipemia by simply reacting trimellitic anhydride with aromatic diamine gold 7-enol solvent such as 4,4'-diaminodiphenylmethane, a cloudy precipitate or Even if the reaction is carried out at a high temperature above the boiling point of the phenolic solvent to obtain a homogeneous solution, aryl esters, etc. are generated at the terminals, making it impossible to obtain a high molecular weight polymer that can be used as a practical wire varnish. It's like that.
また脂肪族ジカルボン酸、ラクタム等を用いた場合には
、フェノール系溶媒に対する溶解性は向上するが、その
反面耐熱性、物に絶縁電線とした時の耐熱軟化温度が芳
香族ポリアミドイミド樹脂と比較して劣るという難点t
−Vしている。In addition, when aliphatic dicarboxylic acids, lactams, etc. are used, the solubility in phenolic solvents improves, but on the other hand, the heat resistance and the heat softening temperature when used as insulated wires are lower than that of aromatic polyamideimide resins. The disadvantage is that it is inferior to
-V is on.
(発明の目的)
発明明石はポリカルボン酸とポリアミンの反応t−i々
検討し友ところ、芳香族ポリアミド樹脂共存下の反応に
おいて耐熱性に優れ極めて高1合度のポリマーが得ら九
ること、および共存する芳香族ポリアミド街脂と生成し
た芳香族ポリアミド系樹脂が一体とな)耐熱性、溶解性
の潰れた膚丁規なポリアミド系樹脂が得ら扛ること、お
よび該樹脂のフェノール系溶液中にフェノール類でマス
クされた芳香族ポリイノシアネート全配合することによ
υ成膜性の優f′した樹脂が慟らnることを見出した0
本発明はかかる知見に基づきなされたもので、上述した
従来の欠点のないポリアミド系4R脂組成物およびその
製造方法を提供しようとするものでぶ入−
(発明のa畳)
すなわち、本発明のポリアミド系樹脂組成物は、ポリカ
ルボン酸又はその誘導体とポリアミンとを、芳香族ポリ
アミド樹脂共存下において反応させてなること′に%徴
とするポリアミド系樹脂組成物、並びに前記樹脂組成物
に、更にフェノール類でマスクされた芳香族ポリイソシ
アネートを配合してなるポリアミド系樹脂組成物および
それらの製造方法を提供しようとするものである。(Purpose of the invention) Akashi, the inventor of the invention, has repeatedly studied the reaction between polycarboxylic acids and polyamines, and has found that a polymer with excellent heat resistance and an extremely high degree of polymerization can be obtained in the reaction in the coexistence of an aromatic polyamide resin. (and the coexisting aromatic polyamide resin and the produced aromatic polyamide resin are integrated) to obtain a heat-resistant, soluble, flat, regular polyamide resin, and a phenolic solution of the resin. It has been discovered that a resin with excellent film-forming properties can be obtained by completely blending an aromatic polyinocyanate masked with phenols in the resin.The present invention was made based on this knowledge. In other words, the polyamide resin composition of the present invention is intended to provide a polyamide-based 4R resin composition free from the above-mentioned conventional drawbacks and a method for producing the same. A polyamide resin composition characterized by reacting a derivative and a polyamine in the coexistence of an aromatic polyamide resin, and the resin composition further contains an aromatic polyisocyanate masked with a phenol. It is an object of the present invention to provide polyamide-based resin compositions and methods for producing them.
本発明において使用するポリカルボン酸としては二塩基
酸又はその誘導体、三塩基酸無水物又はその誘導体およ
び四塩基酸無水物又はその誘導体があシ、二塩基酸無水
物又はその誘導体および三塩基酸無水物又はその誘導体
は単独又は他のポリカルボン酸に一部t装置き換えるこ
とによシ、又四塩基酸無水物又は誘導体は他のポリカル
ボン酸と混合することによシ使用できる0
ここで使用される二塩基酸又はその誘導体としては、例
えばシュウ酸および(1)式で示される二塩基酸、二塩
基酸エステル等がめる。The polycarboxylic acids used in the present invention include dibasic acids or their derivatives, tribasic acid anhydrides or their derivatives, tetrabasic acid anhydrides or their derivatives, dibasic acid anhydrides or their derivatives, and tribasic acids. Anhydrides or derivatives thereof can be used alone or by partial replacement with other polycarboxylic acids, and tetrabasic acid anhydrides or derivatives can be used by mixing with other polycarboxylic acids. Examples of dibasic acids or derivatives thereof that may be used include oxalic acid and dibasic acids and dibasic acid esters represented by formula (1).
これら二塩基酸又はその誘導体の中でも耐熱性の観点よ
シ芳香族二塩基酸又はその誘導体が豹に好適である。Among these dibasic acids or derivatives thereof, aromatic dibasic acids or derivatives thereof are suitable for leopards from the viewpoint of heat resistance.
三塩基酸無水物又はその誘導体としては、クエン酸ある
いは例えは式(■′)、(1)で示される芳香族トリカ
ルボン酸、芳香族トリカルボン酸エステル、芳香族トリ
カルボン酸無水物等が用いられる。As the tribasic acid anhydride or its derivative, citric acid or, for example, aromatic tricarboxylic acid, aromatic tricarboxylic acid ester, aromatic tricarboxylic acid anhydride, or the like represented by formula (■') or (1) is used.
几2(C00RI )s ・・・・パ・ (
1)一般的には、耐熱性、高い反応性、経済性等の見地
よりトリメリット酸無水物が好適である。几2(C00RI)s...Pa・(
1) Generally, trimellitic anhydride is preferred from the viewpoints of heat resistance, high reactivity, economic efficiency, etc.
四塩基酸無水物又はその誘導体は、例えはピロメット酸
無水物、3・3’、4.4’−ベンゾフェノンテトラカ
ルボン酸無水物、3.3’、4.4’−ジフェニルテト
ラカルボン酸無水物、ナフタレンテトラカルボンば無水
物、ブタンテトラカルボン酸無水物等の酸無水物又は酸
、エステル等の誘導体がある。Tetrabasic acid anhydrides or derivatives thereof include, for example, pyrometic anhydride, 3,3',4,4'-benzophenonetetracarboxylic anhydride, and 3,3',4,4'-diphenyltetracarboxylic anhydride. , naphthalenetetracarboxylic anhydride, butanetetracarboxylic anhydride and other acid anhydrides, acids, esters and other derivatives.
本発明に使用するポリアミンとしては脂肪族、脂環族、
芳香族のジアミンが主に用いられる。The polyamines used in the present invention include aliphatic, alicyclic,
Aromatic diamines are mainly used.
適当なジアミンとしてはエチレンジアミン、トリメチレ
ンジアミン、テトラメチレンジアミン、ペンタメチレン
ジアミン、ヘプタメチレンジアミン、ヘプタメチレンジ
アミン、オクタメチレンジアミン、ノナメチレンジアミ
ン、デカメチレンジアミン、トリメチルへキサメチレン
ジアミン、モルフォリンジアミン、シクロヘキサン−1
,4−ジアミン、3.9−ビス(3−アミノプロピル)
−2,4,8,10−テトラオキサスピロ〔5・5〕ウ
ンデカン等の脂肪族、脂環族ジアミン類、4.4′−ジ
アミノジフェニルメタン、4.4’−ジアミノジフェニ
ルエーテル、4.4’−ジアミノジフェニルプロパン、
4.4’−ジアミノジフェニルスルホン、3.3’−ジ
アミノジフェニルスルホン、4.47−ジアミツジフエ
ニルスルフイツド、3゜3′−ジメチル−4,4′−ジ
アミノジフェニルメタン、3.3′−ジクロロ−4,4
′−ジアミノジフェニルメタン、3.3′−ジメトキシ
−4,4′−ジアミノジフェニル、3.3′−ジメチル
−4,4′−ジアミノジフェニル、4.4’−ジアミノ
ジフェニルm−フェニレンジアミン、p−フェニレンジ
アミン、2.4−ジアミノトルエン、2# 6−ジアミ
ノトルエン、m−キシリレンジアミン、p−キシリレン
ジアミン等の芳香族ジアミン類がア)、これらは単独又
は混合して使用できる。ジアミンの一部を架橋成分全項
やす目的で3# 3’# 4’−) ジアミノジフェニ
ルメタン、3.3’、 4.4’−テトラアミノジフェ
ニルメタン等の3価以上のポリアミンで置換えることも
出来る。Suitable diamines include ethylenediamine, trimethylenediamine, tetramethylenediamine, pentamethylenediamine, heptamethylenediamine, heptamethylenediamine, octamethylenediamine, nonamethylenediamine, decamethylenediamine, trimethylhexamethylenediamine, morpholinediamine, and cyclohexane. -1
, 4-diamine, 3.9-bis(3-aminopropyl)
-Aliphatic and alicyclic diamines such as 2,4,8,10-tetraoxaspiro[5.5]undecane, 4.4'-diaminodiphenylmethane, 4.4'-diaminodiphenyl ether, 4.4'- diaminodiphenylpropane,
4.4'-diaminodiphenylsulfone, 3.3'-diaminodiphenylsulfone, 4.47-diaminodiphenylsulfide, 3°3'-dimethyl-4,4'-diaminodiphenylmethane, 3.3'- dichloro-4,4
'-Diamino diphenylmethane, 3.3'-dimethoxy-4,4'-diaminodiphenyl, 3.3'-dimethyl-4,4'-diaminodiphenyl, 4.4'-diaminodiphenyl m-phenylenediamine, p-phenylene Aromatic diamines such as diamine, 2,4-diaminotoluene, 2#6-diaminotoluene, m-xylylene diamine, and p-xylylene diamine are a), and these can be used alone or in combination. A part of the diamine can be replaced with a trivalent or higher polyamine such as 3#3'#4'-)diaminodiphenylmethane, 3.3', 4.4'-tetraaminodiphenylmethane, etc., for the purpose of reducing all the crosslinking components. .
前記ポリアミンの中で耐熱性、絶縁皮膜の機械特性の面
から判に芳香族ジアミンが好適である。Among the polyamines, aromatic diamines are preferred from the viewpoint of heat resistance and mechanical properties of the insulating film.
ポリカルボン酸又はその誘導体とポリアミンとの反応に
際し共存さnる芳香族ポリアミド樹脂は、酸又はアミン
成分として芳香族環を富むものでりシ、例えば芳香族ジ
カルボン酸と脂肪族ジアミンとの反応によシ得られる0
又全芳香族ポリアミド樹脂のうちフェノール系溶媒に高
温時に溶解するものも使用可能である。The aromatic polyamide resin that coexists in the reaction between a polycarboxylic acid or its derivative and a polyamine is rich in aromatic rings as an acid or amine component. Good value 0
Furthermore, among wholly aromatic polyamide resins, those that dissolve in phenolic solvents at high temperatures can also be used.
ポリカルボン酸又はその誘導体とポリアミンとの芳香族
ポリアミド樹脂共存下における反応は、有機溶媒の存在
下において150〜250℃の温夏で2〜20時間反応
せしめることによυ行なわれる。The reaction between a polycarboxylic acid or a derivative thereof and a polyamine in the presence of an aromatic polyamide resin is carried out in the presence of an organic solvent at a temperature of 150 to 250° C. for 2 to 20 hours.
本発明に好適な有機溶媒としては、フェノール、0−ク
レゾール、m−クレゾール、p−クレゾール、各抽のキ
シレノール酸、各種のクロルフェノール類、ニトロベン
ゼン、N−メチル−2−ヒロリドン、ジメチルホルムア
ミド、ジメチルアセトアミド、ヘキテメテルホスホルア
ミド、ジメチルスルホオ〒サイド等がるシ、こnらと併
用できる溶媒としてはベンゼン、トルエン、高沸点炭化
水素@(例えば丸壱石油製スワゾール1000.スワゾ
ール1500.日本石油製日石)−イゾール100゜等
)、エチレングリコールモノメチルエーテルアセテート
等かめる。Suitable organic solvents for the present invention include phenol, 0-cresol, m-cresol, p-cresol, xylenolic acid of various extractions, various chlorophenols, nitrobenzene, N-methyl-2-hyrolidone, dimethylformamide, dimethyl Examples of solvents that can be used in combination with these include acetamide, hexitemetherphosphoramide, and dimethyl sulfoside, such as benzene, toluene, and high-boiling hydrocarbons (e.g., Swazol 1000, Swazol 1500, manufactured by Maruichi Oil Co., Ltd.). Nippon Oil Co., Ltd.) - Isol 100°, etc.), ethylene glycol monomethyl ether acetate, etc.
箱に好ましい反応溶媒は出発物質に対する溶解性、およ
び得られる樹脂溶液の安定性、成膜性、経済性等の見地
からフェノール、クレゾール、キシレノール等のフェノ
ール系溶媒であり、電気絶縁フェスとして用いられる場
合の溶媒には、前記フェノール系溶媒と高沸点の芳香族
炭化水素系溶媒の混合物が好適でおる。Preferred reaction solvents for the box are phenolic solvents such as phenol, cresol, xylenol, etc. from the viewpoint of solubility for the starting materials, stability of the resulting resin solution, film formability, economic efficiency, etc., and are used as electrical insulation panels. In this case, a mixture of the phenolic solvent and a high-boiling aromatic hydrocarbon solvent is suitable.
ポリカルボン酸又はその誘導体とポリアミンとの配合割
合は、ポリカルボン酸又はその誘導体を2当量として、
ポリアミンのアミノ基当υl当量とじ友場合、当量比で
ほぼl対lが好ましい。しかしいずれか一方の10当I
li%以下の過剰は許容される範囲である。本発明の合
成反応における芳香族ポリアミド樹脂の働きは、明確で
はないが、ポリカルボン酸又はその誘導体とポリアミン
との反応全署しく促進すること、得らf′した樹脂が潰
7L7’(溶解性を示すこと、および赤外チャート、熱
重量分析、ゲル浸透クロマトグラフによる分子量分布両
足結果等から生成した芳香族ポリアミド系樹脂と合成時
に使用した芳香族ポリアミド樹脂が相互に反応し一体化
していることが推測されることから、ポリカルボン酸又
はその誘導体とポリアミンとの反応において芳香族ポリ
アミド樹脂がマトリックス効果を示すと同時に芳香族ポ
リアミド樹脂のアミド基音中心に高分子化反応が起って
いるものと考えられる。The blending ratio of polycarboxylic acid or its derivative and polyamine is 2 equivalents of polycarboxylic acid or its derivative,
When the amino group equivalents of the polyamine are the same, the equivalent ratio is preferably about 1:1. However, either one of the 10
An excess of li% or less is within an acceptable range. The function of the aromatic polyamide resin in the synthesis reaction of the present invention is not clear, but it is believed that the entire reaction between the polycarboxylic acid or its derivative and the polyamine is accelerated, and that the resulting resin is crushed 7L7' (solubility and that the aromatic polyamide resin produced and the aromatic polyamide resin used during synthesis react with each other and become integrated, based on the molecular weight distribution results from infrared charts, thermogravimetric analysis, and gel permeation chromatography. It is assumed that the aromatic polyamide resin exhibits a matrix effect in the reaction between polycarboxylic acid or its derivative and polyamine, and at the same time, a polymerization reaction occurs at the amide radical center of the aromatic polyamide resin. Conceivable.
この丸め芳香族ポリアミド樹脂の使用割合は、マトリッ
クス効果を発現させるのに充分な童又は得られる樹脂の
使用目的、賛求考性に応じて変えることができる。例え
は電気絶縁フェスとして使用する場合、樹脂分全体に対
し3〜40重量%が好適である。3重量チ未滴であると
充分なマトリックス効果を示さず、40重量%を越える
と絶縁フェスより得られるエナメル線の耐熱性が低下す
る。一方フイルム又は成型品として使用する場合には芳
香族ポリアミド樹脂t−40重1i%以上使用すること
も賛求叫性に応じて可能となる。The proportion of the rounded aromatic polyamide resin to be used can be varied depending on the amount of resin sufficient to produce the matrix effect, the intended use of the resulting resin, and the suitability of the resin. For example, when used as an electrically insulating board, the amount is preferably 3 to 40% by weight based on the total resin content. If the amount is less than 3% by weight, a sufficient matrix effect will not be exhibited, and if it exceeds 40% by weight, the heat resistance of the enameled wire obtained from the insulating face will decrease. On the other hand, when used as a film or molded product, it is possible to use aromatic polyamide resin T-40 in an amount of 1i% or more by weight depending on the demand.
ポリカルボン酸又はその誘導体とポリアミンと芳香族ポ
リアミド樹脂は反応開始時に同時に仕込んでも良く、ま
た一方を溶剤に溶解させておき他方會一時に、または数
回に分けて仕込むことも出来、特に仕込方法について制
限はない。しかしながら芳香族ポリアミド樹脂は反応開
始時から仕込むのが高分子量ポリアミド系樹脂を得るた
めには層に好ましい。一方電気絶縁フェスとして用いる
場合には、エナメル皮膜となる焼付工程においても反応
が進行するので、フェス合成段階においては比較的反応
の後半に芳香族ポリアミド樹脂を加えることも出来る。The polycarboxylic acid or its derivative, the polyamine, and the aromatic polyamide resin may be charged at the same time at the start of the reaction, or one may be dissolved in a solvent and the other may be charged at the same time or in several batches. There are no restrictions on However, in order to obtain a high molecular weight polyamide resin, it is preferable to add the aromatic polyamide resin to the layer from the start of the reaction. On the other hand, when used as an electrically insulating face, the reaction proceeds even during the baking step to form an enamel film, so the aromatic polyamide resin can be added relatively late in the reaction in the face synthesis stage.
前記反応は無触媒下において充分圧進行するがポリアミ
ンの反応に通常用いられる触媒によシ本発明の反応を促
進することができる。Although the reaction proceeds under sufficient pressure in the absence of a catalyst, the reaction of the present invention can be accelerated by a catalyst commonly used in reactions of polyamines.
適当な触媒の例としては、−酸化鉛、ホウ酸、ナフテン
酸鉛、亜鉛等のナフテン酸の金属塩、リン酸、ポリリン
酸、トリエチルアミン等がl)、好適な使用量は仕込時
の固型弁当シ0.O1〜511L1%である。Examples of suitable catalysts include - lead oxide, boric acid, metal salts of naphthenic acids such as lead naphthenate, zinc, phosphoric acid, polyphosphoric acid, triethylamine, etc. The preferred amount used is the solid state at the time of charging. Lunch box 0. O1-511L1%.
フェノール系溶媒中での反応は、70℃付近から脱水金
体ないながら始まシ、通常は180〜210℃、3〜1
2時間の反応条件で実用的な高分子量ポリアミド系樹脂
が得られる。The reaction in a phenolic solvent starts at around 70°C with no dehydration, usually at 180-210°C and 3-1°C.
A practical high molecular weight polyamide resin can be obtained under reaction conditions of 2 hours.
かくして得られたポリアミド系樹脂組成物はそのまま電
気絶縁フェス等として使用することが出来るが、特にエ
ナメル線製造用の電気絶縁フェスとして近年の高線速、
高能率的な焼付機に使用する場合、#!縁線時おいて発
泡しやすいとの難点會有している。The polyamide resin composition thus obtained can be used as it is as an electrically insulating board, etc., but it is particularly suitable for use in recent years at high wire speeds and as an electrically insulating board for enamelled wire production.
When used in a highly efficient printing machine, #! It has the disadvantage that it tends to foam at the edges.
これらの問題につき検討を進め友ところ前記ポリアミド
系樹脂溶液にフェノール類でマスクされた芳香族ポリイ
ンシアネートを配合することによシ、前記難点が大幅に
改善させることが見出され7t。After further investigation into these problems, it was discovered that by blending an aromatic polyincyanate masked with phenols into the polyamide resin solution, the above-mentioned difficulties could be significantly improved.
フェノール類でマスクさf’した芳香族ポリイソシアネ
ートとしては、4.4’−ジフェニルメタンジインシア
ネート、2・ 4−トリレンジインシアネ−)、2.6
−)リレンジインシアネート、m−キシリレンジインシ
アネート、p−キシリレンジイソシアネート、4.4’
−ジフェニルエーテルジイソシアネートのインシアネー
ト基金フェノール、クレゾール、キシレノール等の7エ
ノール類でマスクしたポリインシアネート誘導体が使用
できる。Examples of aromatic polyisocyanates masked with phenols include 4,4'-diphenylmethane diincyanate, 2.4-tolylene diincyanate), and 2.6
-) lylene diisocyanate, m-xylylene diisocyanate, p-xylylene diisocyanate, 4.4'
-Incyanate foundation of diphenyl ether diisocyanate Polyincyanate derivatives masked with 7 enols such as phenol, cresol, and xylenol can be used.
使用割合は樹脂全体に対してポリイソシアネートとして
3〜40!量チが好適である。3重量う未満でめると発
泡しゃすくなシ、可撓性、軟化温度に対する改善が顕著
でなく40重量%を越えるとエナメル線としての可撓性
、耐摩擦性が低下する。The ratio of polyisocyanate to the entire resin is 3 to 40! Quantity is suitable. If the amount is less than 3% by weight, the improvement in foaming resistance, flexibility, and softening temperature will not be significant, and if it exceeds 40% by weight, the flexibility and abrasion resistance of the enamelled wire will decrease.
またマスクされた芳香族ポリインシアネート金加える時
の温度は咎に制限はないが、200℃付近で長時間撹拌
t−aける、と樹脂溶液が一部不透明になシ、沈澱を生
ずることがあるので、加える温度は140℃以下が好ま
しい。There is no limit to the temperature when adding the masked aromatic polyincyanate gold, but if it is stirred for a long time at around 200°C, the resin solution may become partially opaque and precipitates may form. Therefore, the temperature at which it is added is preferably 140°C or lower.
本発明の樹脂組成物は必セに応じて他の樹脂全ブレンド
することもできる。また他の多官能性化合物、例えばポ
リオール、ポリアミン、ポリカルボン酸を加えて史に反
応させることによシ変性ポリアミド系樹脂組成物金作る
こともできる。The resin composition of the present invention may be blended with other resins as necessary. It is also possible to make a modified polyamide resin composition by adding other polyfunctional compounds such as polyols, polyamines, and polycarboxylic acids and reacting them.
(発明の実施例) 以下実施例によシ本発明を詳述する。(Example of the invention) The present invention will be explained in detail below with reference to Examples.
実施例1
温度計、撹拌器、冷却管、窒素導入管等をつけm3/4
ツロフラスコにトリメリット酸無水物192.1g(1
0モル)4.4’−ジアミノジフェニルメタン+98g
(1,0モル)、レニー(三菱iス化学社’JMfイo
ンM8 L) 5 ) 4 Q gSm−クレゾール
酸(JIS K2451.メタクレゾール酸1号相当
)400gt”仕込み、鼠累気流中で約1時間かけて2
00℃まで昇温させ几。70〜160℃にかけて脱水に
基づく多くの発泡がみられた。反応温度を205℃に設
定し常圧で反応させた。205℃で反応開始直後透明で
あった内容物は一時不透明となったが約2時間後に赤褐
色透明で均一な溶液となった。205℃で8時間経過後
、内容物が撹拌困難な程度に粘稠溶液となったところで
、クレゾール619gQ加えて反応を停止させた。この
樹脂溶液は赤褐色透明で不揮発分(200°C! X
1.5時間)30.3g愈チ、粘度(30’Q ) 3
50ボイズの粘度を有してい友。得られた樹脂溶液を縦
1OcIILS横3α、厚さ0.1簡の銅板に塗膜厚さ
約15μmとなるよう均一に塗布し、230℃で30分
間加熱し友ところ、銅板k 180゜折り曲けてもクラ
ック金主じない可撓性める塗膜が得らn丸。Example 1 Attach a thermometer, stirrer, cooling pipe, nitrogen introduction pipe, etc. m3/4
192.1 g of trimellitic anhydride (1
0 mol) 4.4'-diaminodiphenylmethane + 98g
(1.0 mol), Lenny (Mitsubishi IS Chemical Co., Ltd.'JMf Io
(M8 L) 5) 4 Q gSm-cresylic acid (JIS K2451. Meta-cresylic acid No. 1 equivalent) 400gt" was prepared and heated in a rat stream for about 1 hour.
Raise the temperature to 00℃. Many foams due to dehydration were observed at temperatures ranging from 70 to 160°C. The reaction temperature was set at 205°C and the reaction was carried out at normal pressure. The contents, which were transparent immediately after the start of the reaction at 205° C., temporarily became opaque, but after about 2 hours became a reddish-brown, transparent, and uniform solution. After 8 hours at 205°C, when the contents became a viscous solution that was difficult to stir, 619 gQ of cresol was added to stop the reaction. This resin solution is reddish-brown and transparent with a non-volatile content (200°C!
1.5 hours) 30.3g, viscosity (30'Q) 3
It has a viscosity of 50 boids. The obtained resin solution was uniformly applied to a copper plate measuring 10cm x 3α and 0.1cm thick so that the film thickness was approximately 15 μm, heated at 230°C for 30 minutes, and then bent at 180°. A flexible coating film that does not cause cracks even when applied is obtained.
常法に従い、炉長7m、炉温430−38°〇−280
(上→下)、線速10 m / m i nの条件で・
得られ7′C棟脂溶液を用い1.0闘中の銅線上に7回
塗布焼付を行ない皮膜厚約38μmの絶縁電線を得た。According to the usual method, the furnace length is 7 m, and the furnace temperature is 430-38°〇-280.
(Top → Bottom), at a linear speed of 10 m/min.
The resulting 7'C ridge fat solution was coated and baked 7 times on a 1.0% copper wire to obtain an insulated wire with a coating thickness of about 38 μm.
JIS C3003に準じて測定し友特性は第1表の
通夛でめった。Measurements were made according to JIS C3003, and the characteristics were found as shown in Table 1.
第 1 表
比較例
実施例1と同じ装置を用いて、トリメリット酸無水物1
92.1g(1,0モル)、4.4′−ジアミノジフェ
ニルメタン198.3g(1,0モル)、m−クレゾー
ルtR(JIS K2451.メタクレゾール醒1−
Q相当)i300g仕込み、実施例1と同様にして反応
させた。実施例1と同様な発泡が70〜160℃にかけ
てみられたが、実施例1と異な夛205℃直後より不透
明とな95時間経過しても透明とならなかった。5時間
後りレゾール全一部貿出せながら反応温度を220℃に
上昇させ更に3時間、205℃で反応開始後、合計8時
間反応を継続したところ透明な溶液が得られた。Table 1 Comparative Example Using the same equipment as in Example 1, trimellitic anhydride 1
92.1 g (1.0 mol), 4.4'-diaminodiphenylmethane 198.3 g (1.0 mol), m-cresol tR (JIS K2451. Metacresol 1-
Corresponding to Q) i, 300 g was charged, and the reaction was carried out in the same manner as in Example 1. Foaming similar to Example 1 was observed at 70 to 160°C, but unlike Example 1, it became opaque at 205°C and did not become transparent even after 95 hours. After 5 hours, the reaction temperature was raised to 220° C. while all of the resol was being exported, and the reaction was started at 205° C. for an additional 3 hours. The reaction was continued for a total of 8 hours, and a transparent solution was obtained.
留出クレゾールは29gでめった。この時点でクレゾー
ル559g′t−加え反応を停止させた。得られた樹脂
溶液は赤褐色透明で不揮発分30.1重量%、粘度(3
0℃)93ボイズを有していた。実施例1と同一の条件
で銅板に塗膜を作成し丸が、180°折曲げによシフラ
ック金主じ可撓性める塗膜は得られなかった。Distilled cresol weighed 29 g. At this point, 559 g of cresol was added to stop the reaction. The resulting resin solution was reddish-brown and transparent, had a nonvolatile content of 30.1% by weight, and a viscosity of (3
0°C) had 93 voids. A coating film was formed on a copper plate under the same conditions as in Example 1, but no coating film was obtained that was as flexible as the shifrak metal when bent by 180 degrees.
実施例2
実施例1と同一の装置、出発原料を用い、200〜20
5℃の温度で5時間反応させた。クレゾール400gt
−加え反応を停止させ、樹脂溶液が70℃になったとこ
ろでマスクされ九芳香族ポリイソシアネート(日本ポリ
ウレタン社製M8−50.4#4′−ジフェニルメタン
ジイソシアネートとして約50重量%含有)sogt−
加え充分撹拌し、均一な溶液とした。Example 2 Using the same equipment and starting materials as Example 1, 200 to 20
The reaction was carried out at a temperature of 5° C. for 5 hours. Cresol 400gt
-The reaction was stopped, and when the resin solution reached 70°C, it was masked and nine aromatic polyisocyanate (containing about 50% by weight as M8-50.4#4'-diphenylmethane diisocyanate manufactured by Nippon Polyurethane Co., Ltd.) sogt-
The mixture was added and thoroughly stirred to obtain a homogeneous solution.
クレゾール210 g、ソルベントナフサ90gの混合
溶媒で稀釈した樹脂溶液は赤褐色透明で不揮発分31.
8!ii%、30℃における粘度78ポイズの性状を示
した。実施例1と同様にして線速12m/分で得られ友
皮膜厚約38μmの絶縁電線の峙性は第2表の通シでa
つ九〇
第 2 宍
実施例3〜5
実施例1と同一の装置t−用い、m3表に示す出発原料
、合成条件で、いずれも赤褐色透明な樹脂溶液を得九。The resin solution diluted with a mixed solvent of 210 g of cresol and 90 g of solvent naphtha was reddish-brown and transparent with a nonvolatile content of 31.
8! ii%, and a viscosity of 78 poise at 30°C. The straightness of the insulated wire obtained in the same manner as in Example 1 at a line speed of 12 m/min and having a coating thickness of about 38 μm is shown in Table 2.
90 No. 2 Examples 3 to 5 Using the same equipment as in Example 1 and using the starting materials and synthesis conditions shown in Table M3, a reddish-brown transparent resin solution was obtained in each case.
得られた樹脂溶媒溶液上用い実施例1と同様に炉長7m
の焼付炉によす炉温430−380−280(上→下)
、線速12m/分の条件で1. OUφの銅線上に7回
塗布焼付を行ない皮膜厚約38μmの絶縁電+11に得
72゜JIS C3003GC準じて測定した肴性結
朱を第4表に示す通シであった0
(以 下 余 白 )
第 3 表
棗
TMA;)リメリット酸無水物
IPM ; イソブタン酸
BTDA ; ベンゾフェノンナト2カルボン酸無
水物1)AM ; 4.4’ −ジアミノジフ
ェニルメタン芳香族ポリアミド; メタキシレンジアミ
ンとアジピン酸を反応して得られたもの
レニー(三菱カス化学社製 ナイロ
ンMSD6)
第 4 表
(発明の効果)The furnace length was 7 m as in Example 1.
Furnace temperature 430-380-280 (top → bottom)
, 1 at a linear speed of 12 m/min. Coated and baked on OUφ copper wire 7 times to obtain an insulating film with a thickness of approximately 38 μm +11. ) Table 3 Jujube TMA;) Limelic acid anhydride IPM; Isobutanoic acid BTDA; Benzophenonato dicarboxylic acid anhydride 1) AM; 4.4'-diaminodiphenylmethane aromatic polyamide; Meta-xylene diamine and adipic acid are reacted. Table 4 (Effects of the invention)
Claims (1)
当量比でほぼ1対1の割合で、芳香族ポリアミド樹脂共
存下に反応させて成ることを特徴とするポリアミド系樹
脂組成物。 2、ポリカルボン酸又はその誘導体が、芳香族ポリカル
ボン酸である特許請求の範囲第1項記載のポリアミド系
樹脂組成物。 3、芳香族ポリカルボン酸が、トリメリット酸無水物で
ある特許請求の範囲第1項または第2項記載のポリアミ
ド系樹脂組成物。 4、ポリアミンが、芳香族ジアミンである特許請求の範
囲第1項乃至第3項のいずれか1項記載のポリアミド系
樹脂組成物。 5、ポリカルボン酸又はその誘導体とジアミンとを、当
量比でほぼ1対1の割合で、芳香族ポリアミド樹脂共存
下に反応させて成る樹脂組成物にフェノール類でマスク
させた芳香族ポリイソシアネートを配合して成ることを
特徴とするポリアミド系樹脂組成物。 6、ポリカルボン酸又はその誘導体が、芳香族ポリカル
ボン酸である特許請求の範囲第5項記載のポリアミド系
樹脂組成物。 7、芳香族ポリカルボン酸が、トリメリット酸無水物で
ある特許請求の範囲第5項または第6項記載のポリアミ
ド系樹脂組成物。 8、ポリアミンが、芳香族ジアミンである特許請求の範
囲第5項乃至第7項のいずれか1項記載のポリアミド系
樹脂組成物。 9、ポリカルボン酸又はその誘導体とポリアミンとを、
当量比でほぼ1対1の割合で、フェノール系溶媒中で芳
香族ポリアミド樹脂共存下に反応させ、しかる後フェノ
ール類でマスクされた芳香族ポリイソシアネートを配合
することを特徴とするポリアミド系樹脂組成物の製造方
法。[Claims] 1. A polycarboxylic acid or its derivative and a polyamine,
A polyamide resin composition characterized by being reacted in the coexistence of an aromatic polyamide resin at an equivalent ratio of approximately 1:1. 2. The polyamide resin composition according to claim 1, wherein the polycarboxylic acid or its derivative is an aromatic polycarboxylic acid. 3. The polyamide resin composition according to claim 1 or 2, wherein the aromatic polycarboxylic acid is trimellitic anhydride. 4. The polyamide resin composition according to any one of claims 1 to 3, wherein the polyamine is an aromatic diamine. 5. Aromatic polyisocyanate masked with phenols is added to a resin composition obtained by reacting a polycarboxylic acid or a derivative thereof and a diamine at an equivalent ratio of approximately 1:1 in the coexistence of an aromatic polyamide resin. A polyamide resin composition characterized in that it is made by blending. 6. The polyamide resin composition according to claim 5, wherein the polycarboxylic acid or its derivative is an aromatic polycarboxylic acid. 7. The polyamide resin composition according to claim 5 or 6, wherein the aromatic polycarboxylic acid is trimellitic anhydride. 8. The polyamide resin composition according to any one of claims 5 to 7, wherein the polyamine is an aromatic diamine. 9. Polycarboxylic acid or its derivative and polyamine,
A polyamide resin composition characterized by reacting in a phenolic solvent in the coexistence of an aromatic polyamide resin at an equivalent ratio of approximately 1:1, and then blending an aromatic polyisocyanate masked with a phenol. How things are manufactured.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60117093A JPS61275327A (en) | 1985-05-30 | 1985-05-30 | Polyamide resin composition and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60117093A JPS61275327A (en) | 1985-05-30 | 1985-05-30 | Polyamide resin composition and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61275327A true JPS61275327A (en) | 1986-12-05 |
Family
ID=14703219
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60117093A Pending JPS61275327A (en) | 1985-05-30 | 1985-05-30 | Polyamide resin composition and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61275327A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012115216A1 (en) * | 2011-02-24 | 2012-08-30 | 日産化学工業株式会社 | Aromatic polyamide and composition for film formation containing same |
WO2014003092A1 (en) * | 2012-06-29 | 2014-01-03 | 日産化学工業株式会社 | Aromatic polyamide and film-forming composition containing same |
WO2015059921A1 (en) * | 2013-10-23 | 2015-04-30 | Akron Polymer Systems Inc. | Resin composition, method of manufacturing resin composition, substrate, method of manufacturing electronic device and electronic device |
-
1985
- 1985-05-30 JP JP60117093A patent/JPS61275327A/en active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012115216A1 (en) * | 2011-02-24 | 2012-08-30 | 日産化学工業株式会社 | Aromatic polyamide and composition for film formation containing same |
JP5942980B2 (en) * | 2011-02-24 | 2016-06-29 | 日産化学工業株式会社 | Method for producing aromatic polyamide |
JP2016145365A (en) * | 2011-02-24 | 2016-08-12 | 日産化学工業株式会社 | Aromatic polyamide and composition for film formation containing the same |
WO2014003092A1 (en) * | 2012-06-29 | 2014-01-03 | 日産化学工業株式会社 | Aromatic polyamide and film-forming composition containing same |
JPWO2014003092A1 (en) * | 2012-06-29 | 2016-06-02 | 日産化学工業株式会社 | Aromatic polyamide and film-forming composition containing the same |
US9382381B2 (en) | 2012-06-29 | 2016-07-05 | Nissan Chemical Industries, Ltd. | Aromatic polyamide and film-forming composition containing same |
WO2015059921A1 (en) * | 2013-10-23 | 2015-04-30 | Akron Polymer Systems Inc. | Resin composition, method of manufacturing resin composition, substrate, method of manufacturing electronic device and electronic device |
CN105960436A (en) * | 2013-10-23 | 2016-09-21 | 亚克朗聚合物系统公司 | Resin composition, method of manufacturing resin composition, substrate, method of manufacturing electronic device and electronic device |
JP2017501532A (en) * | 2013-10-23 | 2017-01-12 | アクロン ポリマー システムズ,インク. | Method for manufacturing substrate for manufacturing electronic device, resin composition, method for manufacturing resin composition, substrate for manufacturing electronic device and method for manufacturing electronic device |
JP2017106027A (en) * | 2013-10-23 | 2017-06-15 | アクロン ポリマー システムズ,インク. | Resin composition, method for manufacturing resin composition, substrate for manufacturing electronic element, and electronic device |
CN105960436B (en) * | 2013-10-23 | 2018-09-04 | 亚克朗聚合物系统公司 | Resin combination, the method for manufacturing resin combination, substrate, the method and electronic device for manufacturing electronic device |
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