JPS6126791B2 - - Google Patents
Info
- Publication number
- JPS6126791B2 JPS6126791B2 JP1905578A JP1905578A JPS6126791B2 JP S6126791 B2 JPS6126791 B2 JP S6126791B2 JP 1905578 A JP1905578 A JP 1905578A JP 1905578 A JP1905578 A JP 1905578A JP S6126791 B2 JPS6126791 B2 JP S6126791B2
- Authority
- JP
- Japan
- Prior art keywords
- copper
- reaction
- chloride
- silicon
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000006243 chemical reaction Methods 0.000 claims description 25
- -1 vinyloxy group Chemical group 0.000 claims description 23
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 11
- 239000005749 Copper compound Substances 0.000 claims description 10
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 9
- 239000010949 copper Substances 0.000 claims description 9
- 150000001880 copper compounds Chemical class 0.000 claims description 9
- 150000002576 ketones Chemical class 0.000 claims description 8
- 150000001299 aldehydes Chemical class 0.000 claims description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 150000003377 silicon compounds Chemical class 0.000 claims description 6
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 30
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 23
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 22
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 16
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 235000005074 zinc chloride Nutrition 0.000 description 11
- 239000011592 zinc chloride Substances 0.000 description 11
- GBFVZTUQONJGSL-UHFFFAOYSA-N ethenyl-tris(prop-1-en-2-yloxy)silane Chemical compound CC(=C)O[Si](OC(C)=C)(OC(C)=C)C=C GBFVZTUQONJGSL-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 238000010992 reflux Methods 0.000 description 9
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 8
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 8
- 229940045803 cuprous chloride Drugs 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 229960003280 cupric chloride Drugs 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 5
- 239000005050 vinyl trichlorosilane Substances 0.000 description 5
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- AMIMRNSIRUDHCM-UHFFFAOYSA-N Isopropylaldehyde Chemical compound CC(C)C=O AMIMRNSIRUDHCM-UHFFFAOYSA-N 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000007033 dehydrochlorination reaction Methods 0.000 description 4
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 4
- 239000011259 mixed solution Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 3
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000005055 methyl trichlorosilane Substances 0.000 description 3
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000005292 vacuum distillation Methods 0.000 description 3
- OJVAMHKKJGICOG-UHFFFAOYSA-N 2,5-hexanedione Chemical group CC(=O)CCC(C)=O OJVAMHKKJGICOG-UHFFFAOYSA-N 0.000 description 2
- ZIXLDMFVRPABBX-UHFFFAOYSA-N 2-methylcyclopentan-1-one Chemical compound CC1CCCC1=O ZIXLDMFVRPABBX-UHFFFAOYSA-N 0.000 description 2
- YGHRJJRRZDOVPD-UHFFFAOYSA-N 3-methylbutanal Chemical compound CC(C)CC=O YGHRJJRRZDOVPD-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- AKGGYBADQZYZPD-UHFFFAOYSA-N benzylacetone Chemical compound CC(=O)CCC1=CC=CC=C1 AKGGYBADQZYZPD-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- ULDHMXUKGWMISQ-UHFFFAOYSA-N carvone Chemical compound CC(=C)C1CC=C(C)C(=O)C1 ULDHMXUKGWMISQ-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- DCFKHNIGBAHNSS-UHFFFAOYSA-N chloro(triethyl)silane Chemical compound CC[Si](Cl)(CC)CC DCFKHNIGBAHNSS-UHFFFAOYSA-N 0.000 description 2
- 229940043350 citral Drugs 0.000 description 2
- 229940116318 copper carbonate Drugs 0.000 description 2
- 229910000365 copper sulfate Inorganic materials 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 2
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 description 2
- MLUCVPSAIODCQM-UHFFFAOYSA-N crotonaldehyde Natural products CC=CC=O MLUCVPSAIODCQM-UHFFFAOYSA-N 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- BYLOHCRAPOSXLY-UHFFFAOYSA-N dichloro(diethyl)silane Chemical compound CC[Si](Cl)(Cl)CC BYLOHCRAPOSXLY-UHFFFAOYSA-N 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- LABTWGUMFABVFG-UHFFFAOYSA-N methyl propenyl ketone Chemical compound CC=CC(C)=O LABTWGUMFABVFG-UHFFFAOYSA-N 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 230000003472 neutralizing effect Effects 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 239000005054 phenyltrichlorosilane Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- OOXSLJBUMMHDKW-UHFFFAOYSA-N trichloro(3-chloropropyl)silane Chemical compound ClCCC[Si](Cl)(Cl)Cl OOXSLJBUMMHDKW-UHFFFAOYSA-N 0.000 description 2
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 2
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 2
- 239000005051 trimethylchlorosilane Substances 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- MBDOYVRWFFCFHM-SNAWJCMRSA-N (2E)-hexenal Chemical compound CCC\C=C\C=O MBDOYVRWFFCFHM-SNAWJCMRSA-N 0.000 description 1
- DTCCTIQRPGSLPT-ONEGZZNKSA-N (E)-2-pentenal Chemical compound CC\C=C\C=O DTCCTIQRPGSLPT-ONEGZZNKSA-N 0.000 description 1
- NDFKTBCGKNOHPJ-AATRIKPKSA-N (E)-hept-2-enal Chemical compound CCCC\C=C\C=O NDFKTBCGKNOHPJ-AATRIKPKSA-N 0.000 description 1
- FXZFFVCJWZTTMX-UHFFFAOYSA-N 1-methylcyclohexane-1-carbaldehyde Chemical compound O=CC1(C)CCCCC1 FXZFFVCJWZTTMX-UHFFFAOYSA-N 0.000 description 1
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 1
- JHHZQADGLDKIPM-AATRIKPKSA-N 3-Hepten-2-one Chemical compound CCC\C=C\C(C)=O JHHZQADGLDKIPM-AATRIKPKSA-N 0.000 description 1
- LJDGUWKQRLXXLT-UHFFFAOYSA-N 3-chloropropyl-tris(prop-1-en-2-yloxy)silane Chemical compound CC(=C)O[Si](OC(C)=C)(OC(C)=C)CCCCl LJDGUWKQRLXXLT-UHFFFAOYSA-N 0.000 description 1
- LPCWMYHBLXLJJQ-UHFFFAOYSA-N 3-hexen-2-one Chemical compound CCC=CC(C)=O LPCWMYHBLXLJJQ-UHFFFAOYSA-N 0.000 description 1
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 1
- IYMKNYVCXUEFJE-PLNGDYQASA-N 5-methyl-3-hexen-2-one Chemical compound CC(C)\C=C/C(C)=O IYMKNYVCXUEFJE-PLNGDYQASA-N 0.000 description 1
- 239000005973 Carvone Substances 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- WTEVQBCEXWBHNA-UHFFFAOYSA-N Citral Natural products CC(C)=CCCC(C)=CC=O WTEVQBCEXWBHNA-UHFFFAOYSA-N 0.000 description 1
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 1
- 239000005750 Copper hydroxide Substances 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical class [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000006001 Methyl nonyl ketone Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- KMPQYAYAQWNLME-UHFFFAOYSA-N Undecanal Natural products CCCCCCCCCCC=O KMPQYAYAQWNLME-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- UZFLPKAIBPNNCA-BQYQJAHWSA-N alpha-ionone Chemical compound CC(=O)\C=C\C1C(C)=CCCC1(C)C UZFLPKAIBPNNCA-BQYQJAHWSA-N 0.000 description 1
- UZFLPKAIBPNNCA-UHFFFAOYSA-N alpha-ionone Natural products CC(=O)C=CC1C(C)=CCCC1(C)C UZFLPKAIBPNNCA-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- ODWXUNBKCRECNW-UHFFFAOYSA-M bromocopper(1+) Chemical compound Br[Cu+] ODWXUNBKCRECNW-UHFFFAOYSA-M 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- FXMNVBZEWMANSQ-UHFFFAOYSA-N chloro(silyl)silane Chemical class [SiH3][SiH2]Cl FXMNVBZEWMANSQ-UHFFFAOYSA-N 0.000 description 1
- NNKJLYMBVRDUEI-UHFFFAOYSA-N chloro-tris(ethenyl)silane Chemical compound C=C[Si](Cl)(C=C)C=C NNKJLYMBVRDUEI-UHFFFAOYSA-N 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229910001956 copper hydroxide Inorganic materials 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- PUHAKHQMSBQAKT-UHFFFAOYSA-L copper;butanoate Chemical compound [Cu+2].CCCC([O-])=O.CCCC([O-])=O PUHAKHQMSBQAKT-UHFFFAOYSA-L 0.000 description 1
- HFDWIMBEIXDNQS-UHFFFAOYSA-L copper;diformate Chemical compound [Cu+2].[O-]C=O.[O-]C=O HFDWIMBEIXDNQS-UHFFFAOYSA-L 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- MLUCVPSAIODCQM-NSCUHMNNSA-N crotonaldehyde Chemical compound C\C=C\C=O MLUCVPSAIODCQM-NSCUHMNNSA-N 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- 125000000000 cycloalkoxy group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- KVFDZFBHBWTVID-UHFFFAOYSA-N cyclohexanecarbaldehyde Chemical compound O=CC1CCCCC1 KVFDZFBHBWTVID-UHFFFAOYSA-N 0.000 description 1
- SBEMOANGDSSPJY-UHFFFAOYSA-N cyclohexen-1-yloxy(trimethyl)silane Chemical compound C[Si](C)(C)OC1=CCCCC1 SBEMOANGDSSPJY-UHFFFAOYSA-N 0.000 description 1
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
- MAYIDWCWWMOISO-UHFFFAOYSA-N dichloro-bis(ethenyl)silane Chemical compound C=C[Si](Cl)(Cl)C=C MAYIDWCWWMOISO-UHFFFAOYSA-N 0.000 description 1
- YLJJAVFOBDSYAN-UHFFFAOYSA-N dichloro-ethenyl-methylsilane Chemical compound C[Si](Cl)(Cl)C=C YLJJAVFOBDSYAN-UHFFFAOYSA-N 0.000 description 1
- OHABWQNEJUUFAV-UHFFFAOYSA-N dichloro-methyl-(3,3,3-trifluoropropyl)silane Chemical compound C[Si](Cl)(Cl)CCC(F)(F)F OHABWQNEJUUFAV-UHFFFAOYSA-N 0.000 description 1
- GNEPOXWQWFSSOU-UHFFFAOYSA-N dichloro-methyl-phenylsilane Chemical compound C[Si](Cl)(Cl)C1=CC=CC=C1 GNEPOXWQWFSSOU-UHFFFAOYSA-N 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical class Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- JOJYIOOVPHLXBQ-UHFFFAOYSA-N dimethyl-bis(prop-1-en-2-yloxy)silane Chemical compound CC(=C)O[Si](C)(C)OC(C)=C JOJYIOOVPHLXBQ-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000000796 flavoring agent Substances 0.000 description 1
- WTEVQBCEXWBHNA-JXMROGBWSA-N geranial Chemical compound CC(C)=CCC\C(C)=C\C=O WTEVQBCEXWBHNA-JXMROGBWSA-N 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- ZWXYOPPJTRVTST-UHFFFAOYSA-N methyl-tris(prop-1-en-2-yloxy)silane Chemical compound CC(=C)O[Si](C)(OC(C)=C)OC(C)=C ZWXYOPPJTRVTST-UHFFFAOYSA-N 0.000 description 1
- 239000005048 methyldichlorosilane Substances 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- XGIZTLFJCDBRDD-UHFFFAOYSA-N phenyl-tris(prop-1-en-2-yloxy)silane Chemical compound CC(=C)O[Si](OC(C)=C)(OC(C)=C)C1=CC=CC=C1 XGIZTLFJCDBRDD-UHFFFAOYSA-N 0.000 description 1
- 229920001470 polyketone Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- DZJFHEYIKLHBCH-UHFFFAOYSA-N prop-1-en-2-yloxysilicon Chemical compound CC(=C)O[Si] DZJFHEYIKLHBCH-UHFFFAOYSA-N 0.000 description 1
- KRIOVPPHQSLHCZ-UHFFFAOYSA-N propiophenone Chemical compound CCC(=O)C1=CC=CC=C1 KRIOVPPHQSLHCZ-UHFFFAOYSA-N 0.000 description 1
- 239000005053 propyltrichlorosilane Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- WEUBQNJHVBMUMD-UHFFFAOYSA-N trichloro(3,3,3-trifluoropropyl)silane Chemical compound FC(F)(F)CC[Si](Cl)(Cl)Cl WEUBQNJHVBMUMD-UHFFFAOYSA-N 0.000 description 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 1
- DOEHJNBEOVLHGL-UHFFFAOYSA-N trichloro(propyl)silane Chemical compound CCC[Si](Cl)(Cl)Cl DOEHJNBEOVLHGL-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- ILWRPSCZWQJDMK-UHFFFAOYSA-N triethylazanium;chloride Chemical compound Cl.CCN(CC)CC ILWRPSCZWQJDMK-UHFFFAOYSA-N 0.000 description 1
- KYWIYKKSMDLRDC-UHFFFAOYSA-N undecan-2-one Chemical compound CCCCCCCCCC(C)=O KYWIYKKSMDLRDC-UHFFFAOYSA-N 0.000 description 1
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000010626 work up procedure Methods 0.000 description 1
Description
【発明の詳細な説明】
本発明は、硅素原子に結合したビニルオキシ基
を有する硅素化合物の有利な製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an advantageous process for producing silicon compounds having a vinyloxy group bonded to a silicon atom.
硅素原子に結合したビニルオキシ基を有する硅
素化合物の製造方法としては、特公昭42−16611
号および特公昭42−23567号公報に記載の方法が
知られている。特公昭42−235671号の方法は塩化
硅素化合物からイソプロペノキシ硅素化合物を製
造する際に塩化硅素化合物を金属ナトリウムおよ
びアセトンと反応させるものである。この方法は
工業的に取扱いにくい金属ナトリウムを使用する
こと、および反応に際して水素ガスを大量に発生
し工場操作において危険を伴うという大きな欠点
がある。特公昭42−16611号の方法は硅素原子に
結合する塩素原子を有する硅素化合物とエノール
化できるカルボニル基を有するアルデヒドまたは
ケトンとを塩化亜鉛と遊離塩化水素結合剤との存
在下に反応させるものである。 A method for producing a silicon compound having a vinyloxy group bonded to a silicon atom is described in Japanese Patent Publication No. 42-16611.
The method described in Japanese Patent Publication No. 42-23567 is known. The method disclosed in Japanese Patent Publication No. 42-235671 involves reacting a silicon chloride compound with metallic sodium and acetone when producing an isopropenoxy silicon compound from a silicon chloride compound. This method has the major disadvantages of using metallic sodium, which is difficult to handle industrially, and of generating a large amount of hydrogen gas during the reaction, which is dangerous in factory operations. The method disclosed in Japanese Patent Publication No. 42-16611 involves reacting a silicon compound having a chlorine atom bonded to a silicon atom with an aldehyde or ketone having an enolizable carbonyl group in the presence of zinc chloride and a free hydrogen chloride binding agent. be.
本発明者等は塩化硅素化合物とエノール化でき
るカルボニル基を有するアルデヒド類またはケト
ン類を脱塩化水素剤の存在の下に反応させて硅素
原子に結合したビニルオキシ基を有する硅素化合
物を製造するに際し、金属銅および銅化合物より
選ばれた1種またはそれ以上の物質を反応系に存
在させることによつて、塩化亜鉛を使用する場合
よりも反応が速やかに終結し且つ副生物の生成が
少なく、目的物を純度よく有利に製造できること
を見出した。 In producing a silicon compound having a vinyloxy group bonded to a silicon atom by reacting a silicon chloride compound with an aldehyde or ketone having an enolizable carbonyl group in the presence of a dehydrochlorination agent, the present inventors By having one or more substances selected from metallic copper and copper compounds present in the reaction system, the reaction is completed more quickly and fewer by-products are produced than when zinc chloride is used. We have discovered that it is possible to advantageously produce products with high purity.
例えば、アセトン、トリエチルアミンおよびビ
ニルトリクロロシランを実施例1に記載した割合
で使用し、これにビニルトリクロロシランの
0.675×10-2倍モルの塩化亜鉛を加えてかきまぜ
つつ還流して反応させた場合と、同じく0.675×
10-2倍モルの塩化第二銅を加えて同様に反応させ
た場合とにおいて、反応開始から20時間後の反応
液の組成を調べると両者共出発原料であるビニル
トリクロロシランは殆んど完全に消失している
が、目的物であるビニルトリイソプロペノキシシ
ランとその前駆物質であるビニルジイソプロペノ
キシクロロシランの濃度の比(ビニルトリイソプ
ロペノキシシランに対するビニルジイソプロペノ
キシクロロシランの百分比)は、塩化亜鉛の場合
は5%であるのに対して塩化第二銅の場合は0.15
%であつた。そしてまた、塩化亜鉛を用いてこの
比を0.15%にするには40時間以上を必要とする。
このように塩化亜鉛を使用した場合は塩化銅を使
用した場合に比べてビニルジイソプロペノキシク
ロロシランのビニルトリイソプロペノキシシラン
への変化が遅く、従つて生成物中に混入するビニ
ルジイソプロペノキシクロロシランの量が多くな
り、このことはビニルトリイソプロペノキシシラ
ンを例えばシーリング剤の原料として使用する際
にその中の塩素含有量が大となる原因であつて使
用上不利である。また上記の反応において塩化亜
鉛を用いて反応生成物中のビニルトリイソプロペ
ノキシシランとビニルジイソプロペノキシクロロ
シランの濃度の比を反応開始から20時間後に0.15
%以下にするためには反応をオートクレーブ中で
高温高圧の下で行うことが必要になるのである
が、触媒として銅あるいは銅化合物を使用した場
合には同一の温度および圧力の条件下で数時間で
反応は完結する。このように触媒として銅あるい
は銅化合物を使用することは塩化亜鉛を使用する
場合に比べて反応を速やかに且つ容易に進行させ
るのであつて、塩化亜鉛を用いた場合にはオート
クレーブを使用しないと進行が困難であるかある
いは完結に非常に長時間を要する反応も銅あるい
は銅化合物を使用することによつて常圧の下で容
易に行うことが可能となり、高温高圧の下で行え
ばさらに速やかに反応を完結させることができ
る。そのうえ、塩化亜鉛を使用した際には生成物
中に白色絮状のコロイド性懸濁物が多く、この懸
濁物は過あるいは精留によつても分離除去が困
難である。また、カルボニル基を有する化合物と
してアセトンを使用する反応において塩化亜鉛を
用いるとメジチルオキシドが副生し、これは製品
に異臭を与える原因となる。塩化亜鉛を使用した
際にみられるこれらの欠点は金属銅あるいは銅化
合物を用いた際には全くみられず、このことは両
者の場合全く異なる反応機構によつて反応が進行
することによるものと考えられる。 For example, using acetone, triethylamine and vinyltrichlorosilane in the proportions described in Example 1, adding vinyltrichlorosilane to
The same 0.675×
When the same reaction was carried out with the addition of 10 -2 times the mole of cupric chloride, the composition of the reaction solution 20 hours after the start of the reaction was examined, and in both cases, the starting material vinyltrichlorosilane was almost completely removed. However, the ratio of the concentrations of vinyltriisopropenoxysilane, the target product, and vinyldiisopropenoxychlorosilane, its precursor (percentage ratio of vinyldiisopropenoxychlorosilane to vinyltriisopropenoxysilane) is 5% for zinc chloride and 0.15 for cupric chloride.
It was %. Also, using zinc chloride to achieve this ratio of 0.15% requires more than 40 hours.
In this way, when zinc chloride is used, the conversion of vinyl diisopropenoxychlorosilane to vinyl triisopropenoxysilane is slower than when copper chloride is used, and therefore, vinyl diisopropenoxychlorosilane is less likely to be mixed into the product. The amount of oxychlorosilane increases, which is disadvantageous in terms of use, as it causes a large chlorine content when vinyltriisopropenoxysilane is used as a raw material for a sealant, for example. In addition, in the above reaction, zinc chloride was used to adjust the concentration ratio of vinyltriisopropenoxysilane and vinyldiisopropenoxychlorosilane in the reaction product to 0.15 20 hours after the start of the reaction.
% or less, it is necessary to carry out the reaction in an autoclave at high temperature and pressure, but when copper or a copper compound is used as a catalyst, the reaction can be carried out for several hours under the same temperature and pressure conditions. The reaction is completed. In this way, using copper or a copper compound as a catalyst allows the reaction to proceed more quickly and easily than when using zinc chloride, and when zinc chloride is used, the reaction proceeds without using an autoclave. By using copper or copper compounds, reactions that are difficult to complete or require a very long time to complete can be easily carried out under normal pressure, and even more quickly if carried out at high temperature and pressure. The reaction can be completed. Moreover, when zinc chloride is used, the product contains many colloidal suspensions in the form of white pellets, and these suspensions are difficult to separate and remove even by filtration or rectification. Furthermore, when zinc chloride is used in a reaction using acetone as a compound having a carbonyl group, medityl oxide is produced as a by-product, which causes an off-flavor to the product. These drawbacks observed when using zinc chloride are not observed at all when using metallic copper or copper compounds, and this is likely due to the reaction proceeding by completely different reaction mechanisms in both cases. Conceivable.
本発明において使用する塩化硅素化合物として
は例えば次のような物質を挙げることができる
が、これらのみに限られるものではない。無機塩
化硅素化合物としてはテトラクロロシラン、トリ
クロロシラン等。有機塩化硅素化合物において
は、その有機の基はそれが複数の場合は同種また
は異種であることができ、アルキル、シクロアル
キル、アリール、アラルキル、アルコキシ、シク
ロアルコキシ、アリールオキシまたはアラルコキ
シ基等であり、それらは本発明の反応を阻害しな
い置換基を有することができる。例えば有機トリ
クロロシランとしてメチルトリクロロシラン、エ
チルトリクロロシラン、プロピルトリクロロシラ
ン、フエニルトリクロロシラン、ビニルトリクロ
ロシラン等、有機ジクロロシランとしてメチルジ
クロロシラン、ジメチルジクロロシラン、ジエチ
ルジクロロシラン、ジフエニルジクロロシラン、
ジビニルジクロロシラン、メチルフエニルジクロ
ロシラン、メチルビニルジクロロシラン等、有機
モノクロロシランとしてトリメチルクロロシラ
ン、トリエチルクロロシラン、トリビニルクロロ
シラン等、置換基を含有する有機塩化硅素化合物
としてクロルプロピルトリクロロシラン、トリフ
ルオルプロピルトリクロロシラン、メチルトリフ
ルオルプロピルジクロロシラン等である。さらに
上記クロロモノシラン類と同様にクロロジシラン
類、ビス(クロロシリル)アルカン類、クロロシ
ロキサン類も本発明方法の原料として使用するこ
とができる。 Examples of the silicon chloride compound used in the present invention include, but are not limited to, the following substances. Examples of inorganic silicon chloride compounds include tetrachlorosilane and trichlorosilane. In the organosilicon chloride compound, the organic groups can be of the same type or different types when plural, such as alkyl, cycloalkyl, aryl, aralkyl, alkoxy, cycloalkoxy, aryloxy or aralkoxy groups, They can have substituents that do not interfere with the reaction of the invention. For example, organic trichlorosilanes include methyltrichlorosilane, ethyltrichlorosilane, propyltrichlorosilane, phenyltrichlorosilane, vinyltrichlorosilane, etc.; organic dichlorosilanes include methyldichlorosilane, dimethyldichlorosilane, diethyldichlorosilane, diphenyldichlorosilane, etc.
Divinyldichlorosilane, methylphenyldichlorosilane, methylvinyldichlorosilane, etc.; organic monochlorosilanes such as trimethylchlorosilane, triethylchlorosilane, trivinylchlorosilane; organic silicon chloride compounds containing substituents such as chloropropyltrichlorosilane, trifluoropropyl trichlorosilane; These include chlorosilane, methyltrifluoropropyldichlorosilane, and the like. Furthermore, like the above-mentioned chloromonosilanes, chlorodisilanes, bis(chlorosilyl)alkanes, and chlorosiloxanes can also be used as raw materials in the method of the present invention.
エノール化できるアルデヒド類及びケトン類と
しては次のような化合物を用いることができる
が、これらのみに限られるものではない。直鎖脂
肪族アルデヒドとしてアセトアルデヒド、プロピ
オンアルデヒド、ブチルアルデヒド、エナンチル
アルデヒド等、分岐脂肪族アルデヒドとしてイソ
ブチルアルデヒド、イソバレルアルデヒド等、環
式アルデヒドとしてヘキサヒドロベンズアルデヒ
ド、メチルヘキサヒドロベンズアルデヒド等、飽
和脂肪族モノケトンとしてアセトン、メチルエチ
ルケトン、ジエチルケトン、メチルプロピルケト
ン、メチルブチルケトン、メチルノニルケトン
等、脂肪族ポリケトンとしてアセチルアセトン、
アセトニルアセトン等、芳香族基を有するケトン
としてアセトフエノン、プロピオフエノン、ベン
ジルアセトン等、シクラノンとしてシクロペンタ
ノン、メチルシクロペンタノン、シクロヘキサノ
ン、メチルシクロヘキサノン等、ケトンエステル
としてエチルアセトアセテート等、α−エチレン
性アルデヒドとしてクロトンアルデヒド、β−エ
チルアクロレイン、β・β−ジメチルアクロレイ
ン、β−プロピルアクロレイン、β−ブチルアク
ロレイン、ジヒドロ−6・7−シトラール、チグ
リンアルデヒド、α・β−ジメチルアクロレイ
ン、シトラール、ビニルクロトンアルデヒド、フ
アルネサール、ソルビタール等、α−エチレン性
ケトンとしてエチリデンアセトン、プロピリデン
アセトン、ブチリデンアセトン、イソブチリデン
アセトン、メジチルオキシド、ホロン、シクロベ
ント−1−エン−3−オン、シクロヘキシ−1−
エン−3−オン、イソホロン、カルボン、カルボ
ネン、α−ヨノン等である。 The following compounds can be used as aldehydes and ketones that can be enolized, but are not limited to these. Linear aliphatic aldehydes include acetaldehyde, propionaldehyde, butyraldehyde, enantylaldehyde, etc. Branched aliphatic aldehydes include isobutyraldehyde, isovaleraldehyde, etc. Cyclic aldehydes include hexahydrobenzaldehyde, methylhexahydrobenzaldehyde, and saturated aliphatic monoketones As acetone, methyl ethyl ketone, diethyl ketone, methyl propyl ketone, methyl butyl ketone, methyl nonyl ketone, etc., acetylacetone as aliphatic polyketone,
Ketones with aromatic groups such as acetonyl acetone include acetophenone, propiophenone, benzylacetone, etc.; cyclonones include cyclopentanone, methylcyclopentanone, cyclohexanone, and methylcyclohexanone; ketone esters include ethyl acetoacetate, α-ethylene; As the aldehyde, crotonaldehyde, β-ethyl acrolein, β・β-dimethylacrolein, β-propyl acrolein, β-butyl acrolein, dihydro-6,7-citral, tigrinaldehyde, α・β-dimethylacrolein, citral, vinyl Crotonaldehyde, falnesal, sorbital, etc., α-ethylenic ketones such as ethylidene acetone, propylidene acetone, butylidene acetone, isobutylidene acetone, medityl oxide, holon, cyclobent-1-en-3-one, cyclohex-1-
These include en-3-one, isophorone, carvone, carbonene, and α-ionone.
本発明に使用する脱塩化水素剤としては第三級
アミン類などの有機塩基が用いられる。特にトリ
エチルアミンが入手の容易さ特性等から汎用でき
る。中和剤の使用量は中和に必要な量ないしは、
少過剰でよいが、多量用いてもさしつかえない。
中和に必要な量以上に用いる場合は、目的物の沸
点と中和剤との沸点を広げるためにたとえば、低
沸点の目的物の場合より高沸点のジアルキルアニ
リン類の使用が望ましい。また、ピリジン、キノ
リンあるいはそれらの誘導体などのような複素環
第三級アミン類を使用することもできる。 As the dehydrochlorination agent used in the present invention, organic bases such as tertiary amines are used. In particular, triethylamine is widely available due to its ease of availability. The amount of neutralizing agent used is the amount necessary for neutralization or
A small excess may be sufficient, but a large amount may also be used.
When using more than the amount necessary for neutralization, it is desirable to use a dialkylaniline having a higher boiling point than in the case of a low-boiling point target product, for example, in order to widen the boiling point of the target product and the boiling point of the neutralizing agent. It is also possible to use heterocyclic tertiary amines such as pyridine, quinoline or derivatives thereof.
これらの脱塩化水素剤を使用した場合、反応に
よつて生成する大量の塩酸塩の析出によつて反応
系は濃厚な粥状になる。従つてその分散を容易に
するために希釈剤として反応系に不活性の溶剤
(たとえばベンゼン、トルエンなど)を加えても
よい。また原料のアルデヒドまたはケトン類ある
いは脱塩化水素剤のアミン類を過剰に使用して希
釈の目的を達することもできる。 When these dehydrochlorination agents are used, the reaction system becomes thick and gruely due to the precipitation of a large amount of hydrochloride produced by the reaction. Therefore, in order to facilitate the dispersion, an inert solvent (eg benzene, toluene, etc.) may be added to the reaction system as a diluent. The purpose of dilution can also be achieved by using an excess of aldehydes or ketones as raw materials or amines as dehydrochlorination agent.
本発明で使用する金属銅は、銅粉のような表面
積の大なる形状で使用することが好ましい。銅化
合物における銅は1価であつても2価であつても
よい。。銅化合物には銅酸化物例えば亜酸化銅、
銅水酸化物および銅の塩を含む。銅化合物として
は、例えば塩化銅、臭化銅、沃化銅、硫酸銅、硝
酸銅、炭酸銅、塩基性炭酸銅、蟻酸銅、酢酸銅、
酪酸銅等を挙げることができるが、これらに限る
ものではない。これら塩類は結晶水を有していて
もよく、また複塩あるいは鎖塩であつてもよい。
これら金属銅あるいは銅化合物塩の使用量は特に
限定されるものではない。これらの使用量を増せ
ば反応は速くなるので、塩化硅素化合物とアルデ
ヒド類またはケトン類との組合せによる反応進行
の難易に応じてその使用量を適宜選定することが
できる。 The metallic copper used in the present invention is preferably used in the form of a large surface area, such as copper powder. Copper in the copper compound may be monovalent or divalent. . Copper compounds include copper oxides such as cuprous oxide,
Contains copper hydroxide and copper salts. Examples of copper compounds include copper chloride, copper bromide, copper iodide, copper sulfate, copper nitrate, copper carbonate, basic copper carbonate, copper formate, copper acetate,
Examples include, but are not limited to, copper butyrate. These salts may contain water of crystallization and may be double salts or chain salts.
The amount of these metallic copper or copper compound salts used is not particularly limited. As the amount of these compounds used increases, the reaction speeds up, so the amounts used can be appropriately selected depending on the difficulty in proceeding with the reaction due to the combination of the silicon chloride compound and the aldehydes or ketones.
本発明の実施例および公知技術から当業者には
明らかなように、本明細書においてビニルオキシ
基とは、エーテル性ビニル結合含有基すなわちそ
の酸素原子の原子価の一方が置換または未置換ビ
ニル基に結合したエーテル官能基を指称するもの
である。 As is clear to those skilled in the art from the examples of the present invention and the known art, the vinyloxy group as used herein refers to an etheric vinyl bond-containing group, that is, one of the valences of its oxygen atom is a substituted or unsubstituted vinyl group. It refers to the attached ether functionality.
次に本発明の実施例を示す。 Next, examples of the present invention will be shown.
実施例 1
1のフラスコに、かきまぜ機、還流冷却器
(乾燥管付)、温度計および滴下斗を装着する。
アセトン207g、トリエチルアミン222gおよび塩
化第一銅1gをフラスコに仕込み、ビニルトリク
ロロシラン89gを滴下斗より加える。かきまぜ
つつ20時間還流(還流温度60〜63℃)する。反応
混合物を過し、アセトンでトリエチルアミン塩
酸塩を洗浄しそして過する。合わせた液を蒸
留し、溶媒を留去した後、残液を減圧蒸留に付す
る。ビニルトリイソプロペノキシシラン87gを無
色透明の液体として得る。b.p.70〜72℃/10mm
Hg。Example 1 The flask from 1 is equipped with a stirrer, a reflux condenser (with drying tube), a thermometer, and a dropping funnel.
207 g of acetone, 222 g of triethylamine, and 1 g of cuprous chloride are placed in a flask, and 89 g of vinyltrichlorosilane is added from the dropping funnel. Reflux for 20 hours while stirring (reflux temperature 60-63°C). The reaction mixture is filtered, washed with acetone to remove triethylamine hydrochloride, and filtered. After the combined liquid is distilled to remove the solvent, the remaining liquid is subjected to vacuum distillation. 87 g of vinyltriisopropenoxysilane are obtained as a colorless and transparent liquid. bp70~72℃/10mm
Hg.
実施例 2
塩化第一銅を塩化第二銅1gに代える以外は、
実施例1と同様の操作を行なつて同様の結果を得
る。留分の塩素含有量0.019%。Example 2 Except for replacing cuprous chloride with 1 g of cupric chloride,
The same operations as in Example 1 are performed to obtain similar results. Chlorine content of the distillate is 0.019%.
実施例 3
塩化第一銅を硫酸銅1.2gに代える以外は実施
例1と同様の操作を行なう。85gのビニルトリイ
ソプロペノキシシランを得る。Example 3 The same procedure as in Example 1 is carried out except that 1.2 g of copper sulfate is used instead of cuprous chloride. 85 g of vinyltriisopropenoxysilane are obtained.
実施例 4
塩化第一銅を酢酸銅1.35gに代える以外は実施
例1と同様の操作を行なう。無色透明のビニルト
リイソプロペノキシシランを得る。Example 4 The same procedure as in Example 1 is carried out except that 1.35 g of copper acetate is used instead of cuprous chloride. Colorless and transparent vinyltriisopropenoxysilane is obtained.
実施例 5
塩化第一銅を銅粉1gに代える以外は実施例1
と同様の操作を行なう。89gのビニルトリイソプ
ロペノキシシランを得る。Example 5 Example 1 except that cuprous chloride was replaced with 1 g of copper powder
Perform the same operation as . 89 g of vinyltriisopropenoxysilane are obtained.
実施例 6
シクロヘキサノン50g、塩化第二銅0.3gおよ
びトリエチルアミン68gの混合液にトリメチルク
ロロシラン50gを加え、還流する。粥状の反応混
合物にベンゼンを加え、フラスコより取出しそし
て過する。更に塩酸塩をベンゼンで洗浄過
し、合わせた液から溶媒を留去し、1−シクロ
ヘキセニルオキシ−トリメチルシラン45gを得
る。b.p.29〜30℃/1mmHg。Example 6 50 g of trimethylchlorosilane is added to a mixture of 50 g of cyclohexanone, 0.3 g of cupric chloride, and 68 g of triethylamine, and the mixture is refluxed. Benzene is added to the gruel-like reaction mixture, removed from the flask and filtered. Furthermore, the hydrochloride was washed with benzene, and the solvent was distilled off from the combined solution to obtain 45 g of 1-cyclohexenyloxy-trimethylsilane. bp29-30℃/1mmHg.
実施例 7
アセトン207g、トリエチルアミン222gおよび
塩化第二銅3gを1のフラスコに仕込み、ジメ
チルジクロロシラン71gを滴下斗より加える。
13時間還流する。無色透明のジメチルジイソプロ
ペノキシシラン52gを得る。b.p.58℃/6mm
Hg。Example 7 207 g of acetone, 222 g of triethylamine and 3 g of cupric chloride are placed in flask 1, and 71 g of dimethyldichlorosilane is added from a dropping funnel.
Reflux for 13 hours. Obtain 52 g of colorless and transparent dimethyldiisopropenoxysilane. bp58℃/6mm
Hg.
実施例 8
ジメチルジクロロシラン71gをメチルトリクロ
ロシラン82gに代えて20時間還流する以外は実施
例7と同様に操作する。72gのメチルトリイソプ
ロペノキシシランを無色透明の液体として得る。
b.p.83〜84℃/21mmHg。塩素含有量0.020%。Example 8 The procedure of Example 7 was repeated except that 71 g of dimethyldichlorosilane was replaced with 82 g of methyltrichlorosilane and the mixture was refluxed for 20 hours. 72 g of methyltriisopropenoxysilane are obtained as a clear colorless liquid.
bp83-84℃/21mmHg. Chlorine content 0.020%.
実施例 9
アセトン207g、トリエチルアミン222gおよび
塩化第二銅3gの混合液にフエニルトリクロロシ
ラン116.6gを滴下斗より加える。かきまぜな
がら40時間還流する。後処理後、フエニルトリイ
ソプロペノキシシラン92gを得る。b.p.97〜98
℃/2mmHg。Example 9 116.6 g of phenyltrichlorosilane is added from a dropping funnel to a mixed solution of 207 g of acetone, 222 g of triethylamine, and 3 g of cupric chloride. Reflux for 40 hours with stirring. After work-up, 92 g of phenyltriisopropenoxysilane are obtained. bp97~98
℃/2mmHg.
実施例 10
アセトフエノン132g、トリエチルアミン74.5
gおよび塩化第一銅0.5gの混合液にジメチルジ
クロロシラン35.6gを加える。2.5時間還流する
(還流温度66〜68℃)。反応混合物を過し、ベン
ゼンで塩酸塩を洗浄過しそして液から溶媒を
留去する。残液を減圧蒸留に付して透明のジメチ
ル−ビス(1−フエニル−1−エテニルオキシ)
シラン60gを得る。b.p.148〜152℃/2mmHg。Example 10 Acetophenone 132g, triethylamine 74.5g
Add 35.6 g of dimethyldichlorosilane to a mixture of g and 0.5 g of cuprous chloride. Reflux for 2.5 hours (reflux temperature 66-68°C). The reaction mixture is filtered, washing the hydrochloride with benzene, and the liquid is evaporated. The residual liquid was distilled under reduced pressure to obtain transparent dimethyl-bis(1-phenyl-1-ethenyloxy).
Obtain 60 g of silane. bp148-152℃/2mmHg.
実施例 11
アセトン276g、トリエチルアミン296gおよび
塩化第二銅3gの混合液にテトラクロロシラン
93.6gを1時間かけて滴下する。滴下終了後ゆつ
くり昇温し、25時間還流する。反応混合物を過
し、アセトンで塩酸塩を洗浄・過し、液から
溶媒を除去する。残液を減圧蒸留に付し、透明の
テトライソプロペノキシシラン70gを得る。b.
p.59〜60℃/2mmHg。Example 11 Add tetrachlorosilane to a mixed solution of 276 g of acetone, 296 g of triethylamine, and 3 g of cupric chloride.
Drop 93.6g over 1 hour. After the dropwise addition is completed, the temperature is slowly raised and refluxed for 25 hours. The reaction mixture is filtered and the hydrochloride is washed with acetone and the solvent is removed from the solution. The residual liquid was subjected to vacuum distillation to obtain 70 g of transparent tetraisopropenoxysilane. b.
p.59-60℃/2mmHg.
実施例 12
アセトン207g、トリエチルアミン222gおよび
塩化第一銅2gの混合液にクロルプロピルトリク
ロロシラン〔Cl(CH2)3SiCl3〕116.8gを加え
る。28時間還流する。後処理後、無色透明のクロ
ルプロピルトリイソプロペノキシシラン95gを得
る。b.p.110〜113℃/5mmHg。Example 12 116.8 g of chloropropyltrichlorosilane [Cl(CH 2 ) 3 SiCl 3 ] is added to a mixed solution of 207 g of acetone, 222 g of triethylamine, and 2 g of cuprous chloride. Reflux for 28 hours. After the post-treatment, 95 g of transparent and colorless chloropropyltriisopropenoxysilane are obtained. bp110-113℃/5mmHg.
実施例 13
イソブチルアルデヒド256g、塩化第一銅1g
およびトリエチルアミン200gの混合液にメチル
トリクロロシラン82gを1時間かけて滴下する。
還流後、粥状の反応混合物にトルエンを加えて取
り出す。過洗浄し、液から溶媒を留去した
後、減圧蒸留に付す。トリス−(2−メチル−1
−プロペニルオキシ)メチルシラン107gを得
る。b.p.100〜105℃/9mmHg。Example 13 256 g of isobutyraldehyde, 1 g of cuprous chloride
82 g of methyltrichlorosilane was added dropwise to a mixed solution of 200 g of triethylamine over 1 hour.
After refluxing, toluene is added to the gruel-like reaction mixture and taken out. After overwashing and distilling off the solvent from the liquid, it is subjected to vacuum distillation. Tris-(2-methyl-1
107 g of -propenyloxy)methylsilane are obtained. bp100-105℃/9mmHg.
実施例 14
1のオートクレーブに実施例2と同様の仕込
みを行ない、110〜120℃で4時間反応する。無色
透明のビニルトリイソプロペノキシシラン82gを
得る。Example 14 The autoclave of 1 was charged in the same manner as in Example 2, and reacted at 110 to 120°C for 4 hours. 82 g of colorless and transparent vinyltriisopropenoxysilane was obtained.
Claims (1)
ル基を有するアルデヒド類またはケトン類とを脱
塩化水素剤の存在の下に反応させて硅素原子に結
合したビニルオキシ基を有する硅素化合物を製造
するにあたり、金属銅および銅化合物より選ばれ
る1種またはそれ以上の物質を反応系に存在せし
めることを特徴とする、硅素原子に結合したビニ
ルオキシ基を有する硅素化合物の製法。1. In producing a silicon compound having a vinyloxy group bonded to a silicon atom by reacting a silicon chloride compound with an aldehyde or ketone having an enolizable carbonyl group in the presence of a dehydrochlorinating agent, metallic copper and 1. A method for producing a silicon compound having a vinyloxy group bonded to a silicon atom, which comprises causing one or more substances selected from copper compounds to be present in the reaction system.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1905578A JPS54112826A (en) | 1978-02-23 | 1978-02-23 | Manufacture of silicon compounds having vinyloxy group |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1905578A JPS54112826A (en) | 1978-02-23 | 1978-02-23 | Manufacture of silicon compounds having vinyloxy group |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54112826A JPS54112826A (en) | 1979-09-04 |
JPS6126791B2 true JPS6126791B2 (en) | 1986-06-21 |
Family
ID=11988736
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1905578A Granted JPS54112826A (en) | 1978-02-23 | 1978-02-23 | Manufacture of silicon compounds having vinyloxy group |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54112826A (en) |
-
1978
- 1978-02-23 JP JP1905578A patent/JPS54112826A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS54112826A (en) | 1979-09-04 |
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