JPS61263770A - Thermal head - Google Patents

Thermal head

Info

Publication number
JPS61263770A
JPS61263770A JP10612185A JP10612185A JPS61263770A JP S61263770 A JPS61263770 A JP S61263770A JP 10612185 A JP10612185 A JP 10612185A JP 10612185 A JP10612185 A JP 10612185A JP S61263770 A JPS61263770 A JP S61263770A
Authority
JP
Japan
Prior art keywords
layer
metal
conductor
head surface
thermal head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10612185A
Other languages
Japanese (ja)
Inventor
Hisahiro Hiraide
平出 弥博
Noboru Araya
荒屋 昇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP10612185A priority Critical patent/JPS61263770A/en
Publication of JPS61263770A publication Critical patent/JPS61263770A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/335Structure of thermal heads

Landscapes

  • Electronic Switches (AREA)

Abstract

PURPOSE:To reduce the amount of a metal melted, facilitate setting pressing and heating conditions for an FPC and lower the possibility of electrical short- circuit failures, by providing a metallic layer comprising an easily solderable metal or an allow thereof having a melting point higher than that of a material used for a terminal part for external connection, on a conductor layer of a terminal part provided adjacently to a head surface. CONSTITUTION:A glaze layer 2 and a heating resistor layer 3 are provided in predetermined film thicknesses on an insulating substrate 1, and the conductor layer 4 is provided by vapor deposition of aluminum or an aluminum alloy. A conductive pattern of the layer 4 is provided by repeated masking, and an oxidation-resistant layer 6 and an abrasion-resistant layer 7 are provided in desired film thicknesses by sputtering. A conductive pattern of the layer 4 at the terminal part 11 is provided at the time of providing a conductive pattern on the head surface 12. Connection with the FPC for electrical connection with an external circuit is performed by soldering. At the terminal part, the metallic layer of an easily solderable metal or an alloy thereof having a melting point higher than that of the material used for terminal parts of the FPC is provided on the conductor layer.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明はサーマルヘッドに関し、詳しくは複数個の発熱
抵抗体素子を同一基板上に直線的に配置し、外部情報に
従い、この発熱抵抗体素子を通電発熱させて感熱記録紙
に発色記録させ、あるいはインクリボンを介して普通紙
に転写記録させるサーマルヘッドに関する。
[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to a thermal head, and more specifically, a plurality of heat generating resistor elements are linearly arranged on the same substrate, and the heat generating resistor elements are arranged in a straight line on the same substrate, and the heat generating resistor elements are arranged in a straight line on the same substrate. The present invention relates to a thermal head that generates heat by applying electricity to perform color recording on thermosensitive recording paper, or transfers and records onto plain paper via an ink ribbon.

〔従来技術〕[Prior art]

従来のサーマルヘッドは、例えば第7図に示すように、
電気絶縁性のアルミナ基板1の上に薄くグレーズ層2を
設け、その上にTa、Nなどからなり発熱して感熱記録
紙(図示せず)等に発色エネルギーを与える発熱抵抗体
層3と、その発熱抵抗体層3に接続されて情報に応じて
電流を通じる導体層4と、8103などからなり、前記
発熱抵抗体層3を酸化による劣化から保護する耐酸化層
6と、Ta、O,などからなり、感熱記録紙との接触に
よる摩耗から前記発熱抵抗体層3及び導体層4、及び耐
酸化層6を保護するための耐摩耗層7とを順次積層して
形成されている。
A conventional thermal head, for example, as shown in FIG.
A thin glaze layer 2 is provided on an electrically insulating alumina substrate 1, and on top of that a heating resistor layer 3 made of Ta, N, etc., which generates heat and gives coloring energy to a thermal recording paper (not shown) or the like; A conductor layer 4 connected to the heat generating resistor layer 3 and conducting current according to information, an oxidation-resistant layer 6 consisting of 8103 etc. and protecting the heat generating resistor layer 3 from deterioration due to oxidation, It is formed by sequentially laminating the heating resistor layer 3, the conductor layer 4, and the wear-resistant layer 7 for protecting the oxidation-resistant layer 6 from wear caused by contact with the heat-sensitive recording paper.

そして、前記導体層4に電流を通じたとき、導体層4の
一部が取り除かれて一段下って形成された発熱部8が発
熱して感熱記録紙等に発色記録エネルギーを与えるよう
になっている。第8図に示すように、上記サーマルヘッ
ドは発熱部8の両側に、共通電極ライン9とそれぞれの
個別電極ラインlOa〜10gとが設けられている。そ
して、共通及び個別の電極ライン9.10a〜legの
両者は、図中、線Bにより示された下側の端子部11の
範囲域で、外部回路(図示せず)との接続を半田付けに
より行うために導体層4がAIの場合、一般にNiを蒸
着した半田下地層を導体層4上に形成してから半田ディ
ツプによって半田層を被覆形成している。第8図中の1
1Bにより示された下側の端子部11以外の上側のヘッ
ド面12は、耐酸化層6及び耐摩耗層7によって覆われ
保護されている。なお、第7図は第8図のA−A ’線
に沿って切断した拡大断面図である。
When a current is passed through the conductor layer 4, a part of the conductor layer 4 is removed, and a heat generating part 8 formed one step lower generates heat and gives color recording energy to the thermal recording paper or the like. . As shown in FIG. 8, the thermal head is provided with a common electrode line 9 and individual electrode lines lOa to 10g on both sides of the heat generating part 8. Both the common and individual electrode lines 9.10a to 10leg are connected to an external circuit (not shown) by soldering in the area of the lower terminal section 11 indicated by line B in the figure. When the conductor layer 4 is made of AI, a solder base layer in which Ni is vapor-deposited is generally formed on the conductor layer 4, and then the solder layer is covered with a solder dip. 1 in Figure 8
The upper head surface 12 other than the lower terminal portion 11 indicated by 1B is covered and protected by an oxidation-resistant layer 6 and a wear-resistant layer 7. Note that FIG. 7 is an enlarged sectional view taken along line AA' in FIG. 8.

〔従来の問題点〕[Conventional problems]

このような従来のサーマルヘッドにおいて、端子部11
には、前述のように半田層が形成されているが、端子部
11に外部回路(図示せず)との電気接続を行うフレキ
シブル・プリント回路(Fpc>を位置決めし、該FP
C側の半田層と端子部11の半田層を加圧、加熱して、
溶着させた時、両方の融点が同じなため両方が略同時に
溶融して半田量が多くなり溶着条件を厳しく管理しない
と互いの各電極ライン間にブリ゛ンジが生じ電気的ショ
ート不良を発生する。特にサーマルヘッドの端子部11
の半田層を溶融半田のディッピングによって形成した場
合は半田の表面張力により、各端子部11の半田層の厚
みのバラツキが大きくなり、FPCとの接続条件(加圧
力、加熱温度等)を同一で連続作業していると各電極ラ
イン(端子)間にブリッジを多発しやすく製造管理が難
しく、歩留りを低下させている。また製造上の最終工程
における完全不良のため、損失額が大きく、重大欠点と
なっている。
In such a conventional thermal head, the terminal portion 11
As described above, a solder layer is formed on the terminal portion 11, and a flexible printed circuit (FPC) that makes an electrical connection with an external circuit (not shown) is positioned, and the FP
Pressure and heat the solder layer on the C side and the solder layer on the terminal portion 11,
When welding, since both have the same melting point, they will melt almost at the same time, resulting in a large amount of solder.If the welding conditions are not strictly controlled, bridges will occur between each electrode line, causing electrical shorts. . Especially the terminal section 11 of the thermal head.
If the solder layer is formed by dipping molten solder, the surface tension of the solder will increase the variation in the thickness of the solder layer of each terminal part 11. Continuous operation tends to cause frequent bridges between each electrode line (terminal), making manufacturing control difficult and reducing yield. Furthermore, due to complete defects in the final manufacturing process, losses are large, which is a major drawback.

〔発明の目的〕[Purpose of the invention]

本発明は前記従来技術の問題点に鑑みてなされたもので
あり、その目的とするところは、導体層に連接した端子
部の金属組成を調整することにより外部回路接続時に端
子間ブリッジを生じない製造歩留りの高いサーマルヘッ
ドを提供することにある。
The present invention has been made in view of the problems of the prior art described above, and its purpose is to prevent the occurrence of bridges between terminals when connecting an external circuit by adjusting the metal composition of the terminal portion connected to the conductor layer. An object of the present invention is to provide a thermal head with high manufacturing yield.

〔発明の構成〕[Structure of the invention]

かかる目的を達成するため、本発明のサーマルヘッドは
、絶縁性基板上にグレーズ層を設け、その上に発熱抵抗
体層そして導体層を積層して感熱記録紙面に圧接される
ヘッド面を前記導体層の一部を取り除いて耐酸化層及び
耐摩耗層を順に積層することにより構成し、一方前記ヘ
ッド面へ連設する端子部を前記へ一ンド面から延びた前
記導体層上に、外部からの接続端子部に用いられている
材料の融点に比較し高い融点となる易半田付性金属又は
それらの合金から成る金属層を形成して構成したもので
ある。
In order to achieve this object, the thermal head of the present invention provides a glaze layer on an insulating substrate, and laminates a heating resistor layer and a conductor layer thereon, so that the head surface that is pressed against the surface of the thermal recording paper is connected to the conductor. A part of the layer is removed and an oxidation-resistant layer and an abrasion-resistant layer are sequentially laminated, and a terminal portion connected to the head surface is formed on the conductor layer extending from the head surface from the outside. It is constructed by forming a metal layer made of an easily solderable metal or an alloy thereof, which has a melting point higher than that of the material used for the connection terminal portion of the connector.

前記絶縁基板、グレーズ層及び発熱抵抗体層は従来、公
知の材料、例えば絶縁基板にアルミナ。
The insulating substrate, the glaze layer, and the heating resistor layer are conventionally made of known materials, such as alumina for the insulating substrate.

グレーズ層にガラス、発熱抵抗体層にTag N等を使
用し得るが、この他これら材料と同一機能を持つ材料を
用いることができることはいうまでもない、グレーズ層
1発熱抵抗体層を従来法を用いて所定膜厚に形成する。
Although glass can be used for the glaze layer and Tag N can be used for the heating resistor layer, it goes without saying that other materials having the same function as these materials can also be used. The film is formed to a predetermined thickness using

また導体層はアルミニウム又はアルミニウム合金を蒸着
により所定膜厚に形成するが、この他これら材料と同一
機能を持つ材料を用いることができる。
Further, the conductor layer is formed by vapor deposition of aluminum or an aluminum alloy to a predetermined thickness, but other materials having the same functions as these materials can also be used.

ヘッド面における導体層のNLtパターンの形成は、フ
ォトリソ技術で2回の慣用マスキング反復によって形成
する。
The NLt pattern of the conductor layer on the head surface is formed by two conventional masking repetitions using photolithography.

耐酸化層及び耐摩耗層も、従来公知の材料、例えば耐酸
化層に3 i 0@ 、耐摩耗層にはT a 、0゜等
を使用し得るが、この他、これら材料と同一機能を持つ
材料を用いることができること、はいうまでもない。
The oxidation-resistant layer and the wear-resistant layer can also be made of conventionally known materials, such as 3 i 0@ for the oxidation-resistant layer and T a , 0° for the wear-resistant layer. It goes without saying that you can use whatever materials you have.

これらの各層の成膜も、従来法、例えば、スパッタリン
グにより、所望の膜厚に形成して行う。
Each of these layers is also formed to a desired thickness by a conventional method such as sputtering.

端子部におけるアルミニウム又はアルミニウム合金より
成る導体層の導電パターンはヘッド面での導電パターン
形成時に形成される。そして、電解纏着のための下地金
属の鍍着層は例えば第4図に示すように一般にニッケル
を無電解鍍着処理によって形成されており、その厚さは
ビンポール対策上から約2μm以上が好ましく、銅の場
合は電解鍍着処理を行い形成できる。また、これらの下
地処理は、導体としてアルミニウム又はアルミニウム合
金により構成された場合の易半田付性を得る好ましい処
理である。またその下地処理法も蒸着により行うことも
可能である。
The conductive pattern of the conductor layer made of aluminum or aluminum alloy in the terminal portion is formed when the conductive pattern is formed on the head surface. The plating layer of the base metal for electrolytic adhesion is generally formed by electroless plating of nickel, as shown in FIG. In the case of copper, it can be formed by electroplating. Further, these surface treatments are preferred for obtaining easy solderability when the conductor is made of aluminum or aluminum alloy. Further, the base treatment method can also be performed by vapor deposition.

外部回路との電気的接続を行うフレキシブル・プリント
回路(F P C)との接続は半田付けにより行うが、
これを達成するために、端子部は導体層上に、FPCの
端子部に用いられている材料より融点の高い易半田付性
金属又はそれらの合金からなる金属層を形成したことを
特徴とする。この易半田付性金属又はそれらの合金から
なる金属層はFPCの端子部が通常共晶半田(融点18
3℃)を用いていることから、なじみの良いスズ(融点
232℃)を電解鍍着処理によって形成することが最も
適しているが、易半田付性金属材料としてスズの他に、
亜鉛、カドミウム、鉄、鉛、ニッケル、銅、パラジウム
、銀、金あるいはこれらの合金を用いることができ、形
成手段についても電解鍍着、無電解鍍着、蒸着、溶融浸
漬によることが可能である。特にニッケル又は銅は下地
金属として用いられるがそれ自身、易半田付性金属とし
て秀れているのでそのまま外部回路との電気接続を行う
ことができる最も経済的な材料である。
Connections to flexible printed circuits (FPC), which make electrical connections to external circuits, are made by soldering.
In order to achieve this, the terminal section is characterized in that a metal layer made of an easily solderable metal or an alloy thereof having a higher melting point than the material used for the terminal section of the FPC is formed on the conductor layer. . This metal layer made of easily solderable metals or their alloys is usually soldered at the terminals of the FPC using eutectic solder (melting point 18
3°C), it is most suitable to use tin (melting point: 232°C), which has good compatibility, by electrolytic plating.
Zinc, cadmium, iron, lead, nickel, copper, palladium, silver, gold, or an alloy thereof can be used, and the forming method can be electrolytic plating, electroless plating, vapor deposition, or melt dipping. . In particular, nickel or copper is used as a base metal, and since it is excellent as an easily solderable metal, it is the most economical material that can be used for electrical connection with an external circuit as it is.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の一実施例を第1図ないし第6図に従って
説明する。なお、図中、従来例として示した第7図及び
第8図と同一物には、同一符号が付してあり、詳細な説
明は省く。
An embodiment of the present invention will be described below with reference to FIGS. 1 to 6. In the figure, the same parts as in FIGS. 7 and 8 shown as conventional examples are given the same reference numerals, and detailed explanations will be omitted.

第1図に示すように、アルミナ等から成る絶縁基板1の
表面を薄いグレーズ層2で覆った、いわゆるグレーズド
アルミナ基板上にTajcArとN。
As shown in FIG. 1, TajcAr and N are deposited on a so-called glazed alumina substrate, in which the surface of an insulating substrate 1 made of alumina or the like is covered with a thin glaze layer 2.

ガスのりアクテイヴスパッタリング法により0・05〜
0.2μmの厚みでTag Nから成る発熱抵抗体層3
を形成し、次に約2μmの厚みでAIからなる導体層4
を形成する。そして・第3図に示すように図中矢印進行
方向の工程(■〜@)を行イ・フォトリソ技術で2回の
慣用マスキング反復により順にレジストコート(工程■
)、プリベーク(工程■)、アライメント・露光(工程
■)、現象・リンス(工程■)、ポストベーク(工程■
)、Alエツチング(工程■)、TazNエツチング(
工程■)、レジスト剥離(工程■)を行い、再びレジス
トコートく工程■)、プリベーク(工程[相])、アラ
イメント・露光(工程■)、現象・リンス(工程@)、
ポストベーク(工程O)、Alエツチング(工程[相]
)そしてレジスト@[I (工程@)を順に行う、よっ
て、15工程で電極部と発熱部パターンを形成する0次
に、端子部11をメタルマスクで覆った後、約2μmの
厚みのSiOオ膜よりなる耐酸化層6及び約5μmの厚
みのTatOsよりなる耐摩耗N7をスパッタリングに
より形成することにより、ヘッド面12は作製される。
0.05 ~ by gas glue active sputtering method
Heat generating resistor layer 3 made of Tag N with a thickness of 0.2 μm
Then, a conductor layer 4 made of AI with a thickness of about 2 μm is formed.
form. Then, as shown in Figure 3, perform the steps (■ ~ @) in the direction of the arrows in the figure. A. Apply resist coating (step ■) by repeating conventional masking twice using photolithography technology.
), pre-bake (process ■), alignment/exposure (process ■), phenomenon/rinsing (process ■), post-bake (process ■)
), Al etching (process ■), TazN etching (
Process ■), resist stripping (Process ■) and re-coating the resist Process ■), pre-bake (Process [phase]), alignment/exposure (Process ■), phenomenon/rinsing (Process @),
Post-bake (process O), Al etching (process [phase]
) Then, the resist@[I (step@) is performed in order. Therefore, the electrode part and heat generating part pattern are formed in step 15. Next, after covering the terminal part 11 with a metal mask, a SiO film with a thickness of about 2 μm is applied. The head surface 12 is manufactured by forming by sputtering an oxidation-resistant layer 6 made of a film and a wear-resistant layer N7 made of TatOs with a thickness of about 5 μm.

。 次に、第4図に示す工程で端子部11の範囲域でのアル
ミニウム層(第2図、第5図及び第6図参照)に選択的
に無電解鍍着を行い、第5図のように易半田付性金属の
ニッケルーリン合金層14を形成するものである。また
は第6図のように下地となる金属層を端子全面に被面し
、さらに、スズ 層15を電解メッキにより形成して第
1図及び第2図の端子部11を形成した後、外部回路(
図示せず)との接続を行うものである。
. Next, in the process shown in FIG. 4, electroless plating is selectively applied to the aluminum layer in the area of the terminal portion 11 (see FIGS. 2, 5, and 6), and as shown in FIG. A nickel-phosphorous alloy layer 14 of an easily solderable metal is formed on the surface. Alternatively, as shown in Fig. 6, the entire surface of the terminal is covered with a metal layer serving as a base, and then a tin layer 15 is formed by electrolytic plating to form the terminal portion 11 shown in Figs. 1 and 2, and then the external circuit is formed. (
(not shown).

本実施例によれば、端子部11はニッケル又はスズを鍍
着させるため、全面に層厚が均一と被覆でき、また、F
PC端子(図示せず)との半田付けに際しては、FPC
端子の半田層は共晶半田を使用するため、接続時に加熱
温度をニッケル又はスズの融点より低く、共晶半田18
3℃より高い温度に設定することにより、FPC端子の
共晶半田から成る半田層のみが熔融して接続が行われる
ため、ブリッジの発生が極めて少なくなり製造管理が容
易で製造歩留りが著しく高くなる。
According to this embodiment, since the terminal portion 11 is plated with nickel or tin, the entire surface can be coated with a uniform layer thickness, and the F
When soldering to a PC terminal (not shown),
Since the solder layer of the terminal uses eutectic solder, the heating temperature is lower than the melting point of nickel or tin during connection, and the eutectic solder 18
By setting the temperature higher than 3°C, only the solder layer made of eutectic solder of the FPC terminal melts and the connection is made, so the occurrence of bridging is extremely reduced, manufacturing management is easy, and the manufacturing yield is significantly high. .

〔発明の効果〕〔Effect of the invention〕

上述の如く、本発明のサーマルヘッドは、端子部のアル
ミニウム又はアルミニウム合金からなる導体層上にニッ
ケル又は銅若しくはそれらの合金による鍍着された金属
層を形成し、それを単独で用いる場合と、さらに該鍍着
された金属層上に易半田付性金属を電解鍍着させて形成
させるため、FPC端子との半田付けに際しては、FP
C側の共晶半田のみが溶融しブリッジの発生の原因とな
る溶融金属量が少なく、FPC加圧、加熱条件設定が容
易で一度設定すれば中途での設定しなおし等の調整が不
要で電気的ショート不良の発生が著しく低いという効果
を奏する。
As described above, the thermal head of the present invention includes a case in which a metal layer plated with nickel, copper, or an alloy thereof is formed on a conductor layer made of aluminum or an aluminum alloy in the terminal part, and is used alone; Furthermore, since an easily solderable metal is electrolytically plated on the plated metal layer, when soldering with the FPC terminal, the FP
Only the eutectic solder on the C side melts, and the amount of molten metal that causes bridging is small, making it easy to set FPC pressurization and heating conditions. This has the effect of significantly reducing the occurrence of short-circuit defects.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図〜第6図は、本発明に係り、第1図は、第2図の
c−c ’線に沿って切断した本発明のサーマルヘッド
の一実施例を示す拡大断面図、第2図は本発明のサーマ
ルヘッドを示す平面図、第3図は本発明のサーマルヘッ
ドの導電パターンを作るためのフォトプロセスの示す工
程図、第4図は本発明のサーマルヘッドのニッケル層、
低融点金属層を形成するためのメッキ工程を示す図、第
5図及び第6図は本発明のサーマルヘッドの端子部を示
す断面図、第7図及び第8図は従来例に係り、第7図は
第8図のA−A ’線に沿って切った従来のサーマルヘ
ッドを示す拡大断面図、第8図はサーマルヘッドを示す
平面図である。 1・・・・絶縁性基板、2・・・・グレーズ層、3・・
・・発熱抵抗体層、4・・・・導体層、6・・・・耐酸
化層、7・・・・耐摩耗層、11・・・・端子部、12
・・・・ヘッド面、14・・・・ニッケル層(金属層)
、15・・・・スズ層。 f’!1<’ :、’+ 代理人  弁理士   弐  顕次部 (翳。 イノ)、・ 第1図 1I2 第2図 第3図       第48!1m 第5図 第6図 第7図 第8図
1 to 6 relate to the present invention; FIG. 1 is an enlarged sectional view showing one embodiment of the thermal head of the present invention cut along line c-c' in FIG. 2; 3 is a plan view showing the thermal head of the present invention, FIG. 3 is a process diagram showing a photo process for making a conductive pattern of the thermal head of the present invention, and FIG. 4 is a nickel layer of the thermal head of the present invention.
5 and 6 are cross-sectional views showing the terminal portion of the thermal head of the present invention. FIGS. 7 and 8 are related to a conventional example, and FIGS. 7 is an enlarged sectional view showing a conventional thermal head taken along the line AA' in FIG. 8, and FIG. 8 is a plan view showing the thermal head. 1... Insulating substrate, 2... Glaze layer, 3...
... Heat generating resistor layer, 4... Conductor layer, 6... Oxidation resistant layer, 7... Wear resistant layer, 11... Terminal section, 12
...Head surface, 14...Nickel layer (metal layer)
, 15... tin layer. f'! 1<':,'+ Agent Patent Attorney 2 Kenjibe (Shadow. Ino),・Fig. 1 1I2 Fig. 2 Fig. 3 Fig. 48!1m Fig. 5 Fig. 6 Fig. 7 Fig. 8

Claims (2)

【特許請求の範囲】[Claims] (1)絶縁性基板上にグレーズ層を設け、該グレーズ層
上に発熱抵抗層を設け、さらに導体層を積層するととも
に、印字するための紙面に圧接されるヘッド面を前記発
熱抵抗層及び導体層の一部を取り除いて耐酸化層及び耐
摩耗層を順に積層して設けられたヘッド面と該ヘッド面
に連接される端子部であつて前記ヘッド面から延びた前
記導体層上に共晶半田の融点よりも高い融点を有する易
半田付性金属又はそれらの合金からなる金属層が形成さ
れたことを特徴とするサーマルヘッド。
(1) A glaze layer is provided on an insulating substrate, a heating resistance layer is provided on the glaze layer, a conductor layer is further laminated, and the head surface that is pressed against the paper surface for printing is connected to the heating resistance layer and the conductor. A head surface is provided by removing a part of the layer and laminating an oxidation-resistant layer and an abrasion-resistant layer in this order, and a terminal portion connected to the head surface, and a eutectic layer is formed on the conductor layer extending from the head surface. A thermal head comprising a metal layer made of an easily solderable metal or an alloy thereof having a melting point higher than that of solder.
(2)前記サーマルヘッドの導体層がアルミニウム又は
、アルミニウム合金の蒸着によつて形成され、かつ、ヘ
ッド面に連接される端子部をニッケル又は銅若しくはそ
れ等の合金を鍍着によつて下地となる金属層を形成し、
さらに該下地の金属層上に、前記易半田付性金属を電解
鍍着させたことを特徴とする特許請求の範囲第(1)項
記載のサーマルヘッド。
(2) The conductor layer of the thermal head is formed by vapor deposition of aluminum or an aluminum alloy, and the terminal portion connected to the head surface is coated with nickel, copper, or an alloy thereof by plating. Form a metal layer of
The thermal head according to claim 1, further comprising electrolytically depositing the easily solderable metal on the underlying metal layer.
JP10612185A 1985-05-20 1985-05-20 Thermal head Pending JPS61263770A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10612185A JPS61263770A (en) 1985-05-20 1985-05-20 Thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10612185A JPS61263770A (en) 1985-05-20 1985-05-20 Thermal head

Publications (1)

Publication Number Publication Date
JPS61263770A true JPS61263770A (en) 1986-11-21

Family

ID=14425608

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10612185A Pending JPS61263770A (en) 1985-05-20 1985-05-20 Thermal head

Country Status (1)

Country Link
JP (1) JPS61263770A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61182964A (en) * 1985-02-09 1986-08-15 Alps Electric Co Ltd Thermal head

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61182964A (en) * 1985-02-09 1986-08-15 Alps Electric Co Ltd Thermal head

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