JPS6126364Y2 - - Google Patents
Info
- Publication number
- JPS6126364Y2 JPS6126364Y2 JP1982019882U JP1988282U JPS6126364Y2 JP S6126364 Y2 JPS6126364 Y2 JP S6126364Y2 JP 1982019882 U JP1982019882 U JP 1982019882U JP 1988282 U JP1988282 U JP 1988282U JP S6126364 Y2 JPS6126364 Y2 JP S6126364Y2
- Authority
- JP
- Japan
- Prior art keywords
- liquid nitrogen
- shield plate
- evaporation source
- jacket
- electron gun
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 24
- 238000001704 evaporation Methods 0.000 claims description 16
- 230000008020 evaporation Effects 0.000 claims description 16
- 239000007788 liquid Substances 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 7
- 238000007738 vacuum evaporation Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Physical Vapour Deposition (AREA)
Description
【考案の詳細な説明】
（産業上の利用分野）
本考案は主としてパーマロイその他の磁性材料
の蒸着による磁気ヘツドの製造その他に使用され
る真空蒸着装置に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a vacuum evaporation apparatus used mainly for manufacturing magnetic heads by vapor deposition of permalloy or other magnetic materials.
（従来の技術）
従来この種装置として、ベルジヤ内に磁場偏向
型の電子銃と、その出力ビームを作用されるるつ
ぼとから成る蒸発源と、その上側に該蒸発源の蒸
発粒子を作用されるサブストレートとを備えると
共にその外周に該蒸発粒子の方向を揃えるヘルム
ホルツコイルその他の集束コイルを備える式のも
のは知られる。(Prior Art) Conventionally, this type of apparatus includes an evaporation source consisting of a magnetic field deflection type electron gun in a bell gear and a crucible to which the output beam is applied, and an evaporation source to which evaporated particles of the evaporation source are applied to the upper side of the crucible. There are known devices that include a substrate and a Helmholtz coil or other focusing coil on the outer periphery of the substrate to align the direction of the evaporated particles.
（考案が解決しようとする問題点）
しかしながら、上記従来装置によれば、該集束
コイルの磁界が該電子銃の磁界に作用してこれに
乱れを与え勝ちである不都合を伴う。(Problems to be Solved by the Invention) However, the conventional device described above has the disadvantage that the magnetic field of the focusing coil tends to act on the magnetic field of the electron gun and cause disturbance thereto.
（問題点を解決するための手段）
本考案は上記不都合のない装置を得ることをそ
の目的としたもので、ベルジヤ１内に、磁場偏向
型の電子銃２とその出力ビームを作用されるるつ
ぼ３とから成る蒸発源４と、その上側に該蒸発源
４の蒸発粒子を作用されるサブストレート５とを
備えると共にその外周に該蒸発粒子の方向を揃え
るヘルムホルツコイルその他の集束コイル６を備
える式のものにおいて、該ベルジヤ１内に該蒸発
源４を囲繞して磁気シールド板７を備え、該シー
ルド板７はその内周にジヤケツト８を備えると共
にこれに液体窒素９を収容して液体窒素シユラウ
ドを備える型式としたことを特徴とする。(Means for Solving the Problems) The purpose of the present invention is to obtain an apparatus free from the above-mentioned disadvantages.In the bell gear 1, a magnetic field deflection type electron gun 2 and a crucible to which its output beam is applied are provided. 3, and a substrate 5 above which the evaporation particles of the evaporation source 4 are applied, and a Helmholtz coil or other focusing coil 6 around the outer circumference of the substrate 5 to align the direction of the evaporation particles. A magnetic shield plate 7 is provided in the bell gear 1 to surround the evaporation source 4, and the shield plate 7 is provided with a jacket 8 on its inner periphery and contains liquid nitrogen 9 to form a liquid nitrogen shroud. The model is characterized by having:
（作用）
本考案は上記構成によるもので、これによれ
ば、電子銃の磁界は磁気シールド板により集束コ
イルの磁界から遮断されて乱れることがなく、ま
た該シールド板は液体窒素により冷却されてガス
の放出を生ずることがない。(Function) The present invention has the above configuration, whereby the magnetic field of the electron gun is blocked from the magnetic field of the focusing coil by the magnetic shield plate and is not disturbed, and the shield plate is cooled by liquid nitrogen. No gas release occurs.
（実施例）
次に本考案の実施例を図示のものについて説明
する。(Example) Next, an example of the present invention will be described with reference to the drawings.
第１図及び第２図において、１はベルジヤを示
〓〓〓〓〓
し、該ベルジヤ１内には、磁場偏向型の電子銃２
とその出力ビームを作用されるるつぼ３とから成
る蒸発源４と、その上側に位置して該蒸発源４の
蒸発粒子を作用されるサブストレート５とを備
え、該ベルジヤ１の外周には該蒸発粒子の方向を
揃えるヘルムホルツコイルその他の集束コイル６
を備える。上記した構成は前記従来のものと特に
異なるものではないが、本考案では、該ベルジヤ
１内に該蒸発源４を囲繞して磁気シールド板７を
備え、該シールド板７はその内周にジヤケツト８
を備えると共にこれに液体窒素９を収容して液体
窒素シユラウドを備える型式とした。 In Figures 1 and 2, 1 indicates a bell gear.
Inside the bell gear 1, there is a magnetic field deflection type electron gun 2.
and a crucible 3 to which the output beam is applied, and a substrate 5 located above the crucible 3 to which the evaporated particles of the evaporation source 4 are applied. Helmholtz coil and other focusing coils that align the direction of evaporated particles 6
Equipped with. Although the above-mentioned configuration is not particularly different from the conventional one, in the present invention, a magnetic shield plate 7 is provided in the bell gear 1 to surround the evaporation source 4, and the shield plate 7 has a jacket on its inner periphery. 8
It was equipped with a liquid nitrogen shroud by storing liquid nitrogen 9 therein.
前記るつぼ３内の蒸発材料は例えばパーマロイ
から成り、この場合該シールド板７をこれと同材
料で作るようにした。 The evaporation material in the crucible 3 is made of permalloy, for example, and in this case the shield plate 7 is made of the same material.
かくするときは、集束コイル６の磁界が磁気シ
ールド板７により遮られるので電子銃２の磁界は
乱れることがなく、電子銃２の出力ビームがるつ
ぼ３に有効に作用されると共に該シールド板７は
ジヤケツト８内の液体窒素により冷却されてガス
の放出を生ずることがなく、ベルジヤ１内の真空
度を例えば10-5〜10-6トールから10-7トールと良
好になし得る。 In this case, since the magnetic field of the focusing coil 6 is blocked by the magnetic shield plate 7, the magnetic field of the electron gun 2 is not disturbed, and the output beam of the electron gun 2 is effectively applied to the crucible 3, and the shield plate 7 is cooled by the liquid nitrogen in the jacket 8, so that no gas is released, and the degree of vacuum in the bell gear 1 can be maintained at a good level, for example, from 10 -5 to 10 -6 Torr to 10 -7 Torr.
（考案の効果）
このように本考案によるときは、蒸発源４にこ
れを囲繞して磁気シールド板７を備えるもので、
該蒸発源４における電子銃２はその外周の集束コ
イル６の磁界による影響を無くしてその作動を良
好にすることが出来ると共に、該コイル６として
は例えばヘルムホルツ型コイルを使用し得て内部
に均一な磁気密度を簡単且確実に得ることが出来
る等の効果を有し、さらに該シールド板７はその
内周にジヤケツト８を備えると共にこれに液体窒
素９を収容して液体窒素シユラウドを備える型式
としたので、該シールド板７は液体窒素により冷
却されてガスの放出を生ずることがなく、ベルジ
ヤ１内の真空度を良好になし得る効果を有する。(Effect of the invention) As described above, according to the invention, the evaporation source 4 is provided with a magnetic shield plate 7 surrounding it,
The electron gun 2 in the evaporation source 4 can improve its operation by eliminating the influence of the magnetic field of the focusing coil 6 on its outer periphery, and can use, for example, a Helmholtz type coil as the coil 6, so that it can be uniformly distributed inside. In addition, the shield plate 7 has a jacket 8 on its inner periphery and contains liquid nitrogen 9 to provide a liquid nitrogen shroud. Therefore, the shield plate 7 is cooled by liquid nitrogen and does not release gas, and has the effect of improving the degree of vacuum in the bell gear 1.
第１図は本案装置の１例の截断側面図、第２図
はその截断平面図である。
１……ベルジヤ、２……電子銃、３……るつ
ぼ、４……蒸発源、５……サブストレート、６…
…集束コイル、７……磁気シールド板。
〓〓〓〓〓
FIG. 1 is a cutaway side view of an example of the present device, and FIG. 2 is a cutaway plan view thereof. 1... Belgear, 2... Electron gun, 3... Crucible, 4... Evaporation source, 5... Substrate, 6...
...Focusing coil, 7...Magnetic shield plate. 〓〓〓〓〓
Claims (1)
出力ビームを作用されるるつぼ３とから成る蒸発
源４と、その上側に該蒸発源４の蒸発粒子を作用
されるサブストレート５とを備えると共にその外
周に該蒸発粒子の方向を揃えるヘルムホルツコイ
ルその他の集束コイル６を備える式のものにおい
て、該ベルジヤ１内に該蒸発源４を囲繞して磁気
シールド板７を備え、該シールド板７はその内周
にジヤケツト８を備えると共にこれに液体窒素９
を収容して液体窒素シユラウドを備える型式とし
たことを特徴とする真空蒸着装置。 Inside the bell gear 1, there is provided an evaporation source 4 consisting of a magnetic field deflection type electron gun 2 and a crucible 3 to which the output beam of the electron gun is applied, and a substrate 5 above which the evaporated particles of the evaporation source 4 are applied. In addition, a Helmholtz coil or other focusing coil 6 is provided on the outer periphery of the belt gear for aligning the direction of the evaporated particles, and a magnetic shield plate 7 is provided in the bell gear 1 to surround the evaporation source 4, and the shield plate 7 is A jacket 8 is provided on the inner periphery of the jacket 8, and liquid nitrogen 9 is injected into the jacket 8.
A vacuum evaporation apparatus characterized in that it is of a type that accommodates a liquid nitrogen shroud and is equipped with a liquid nitrogen shroud.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988282U JPS58124467U (en) | 1982-02-17 | 1982-02-17 | Vacuum deposition equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988282U JPS58124467U (en) | 1982-02-17 | 1982-02-17 | Vacuum deposition equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58124467U JPS58124467U (en) | 1983-08-24 |
| JPS6126364Y2 true JPS6126364Y2 (en) | 1986-08-07 |
Family
ID=30032070
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988282U Granted JPS58124467U (en) | 1982-02-17 | 1982-02-17 | Vacuum deposition equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58124467U (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6073216U (en) * | 1983-10-25 | 1985-05-23 | 太陽誘電株式会社 | Magnetic film production equipment |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4915356A (en) * | 1972-05-18 | 1974-02-09 | ||
| JPS5540597B2 (en) * | 1975-02-10 | 1980-10-18 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5737473Y2 (en) * | 1978-09-11 | 1982-08-18 |
-
1982
- 1982-02-17 JP JP1988282U patent/JPS58124467U/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4915356A (en) * | 1972-05-18 | 1974-02-09 | ||
| JPS5540597B2 (en) * | 1975-02-10 | 1980-10-18 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58124467U (en) | 1983-08-24 |
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