JPS61254975A - Transparent hologram - Google Patents
Transparent hologramInfo
- Publication number
- JPS61254975A JPS61254975A JP9646985A JP9646985A JPS61254975A JP S61254975 A JPS61254975 A JP S61254975A JP 9646985 A JP9646985 A JP 9646985A JP 9646985 A JP9646985 A JP 9646985A JP S61254975 A JPS61254975 A JP S61254975A
- Authority
- JP
- Japan
- Prior art keywords
- hologram
- thin film
- layer
- transparent
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 claims abstract description 44
- 238000007639 printing Methods 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 47
- 239000000178 monomer Substances 0.000 description 23
- 230000000694 effects Effects 0.000 description 15
- 239000000463 material Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 239000011241 protective layer Substances 0.000 description 10
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- AOBIOSPNXBMOAT-UHFFFAOYSA-N 2-[2-(oxiran-2-ylmethoxy)ethoxymethyl]oxirane Chemical compound C1OC1COCCOCC1CO1 AOBIOSPNXBMOAT-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 239000002202 Polyethylene glycol Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 229920001223 polyethylene glycol Polymers 0.000 description 4
- 229920000877 Melamine resin Polymers 0.000 description 3
- -1 allyl 2-aziridinylpropionate Chemical compound 0.000 description 3
- 125000004069 aziridinyl group Chemical group 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 239000000600 sorbitol Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 125000001174 sulfone group Chemical group 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- VTRHYFDNOLMPHD-UHFFFAOYSA-N (1-prop-2-enoyloxycyclohexyl) prop-2-enoate Chemical compound C=CC(=O)OC1(OC(=O)C=C)CCCCC1 VTRHYFDNOLMPHD-UHFFFAOYSA-N 0.000 description 1
- HHQAGBQXOWLTLL-UHFFFAOYSA-N (2-hydroxy-3-phenoxypropyl) prop-2-enoate Chemical compound C=CC(=O)OCC(O)COC1=CC=CC=C1 HHQAGBQXOWLTLL-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- UWFRVQVNYNPBEF-UHFFFAOYSA-N 1-(2,4-dimethylphenyl)propan-1-one Chemical compound CCC(=O)C1=CC=C(C)C=C1C UWFRVQVNYNPBEF-UHFFFAOYSA-N 0.000 description 1
- DZSVIVLGBJKQAP-UHFFFAOYSA-N 1-(2-methyl-5-propan-2-ylcyclohex-2-en-1-yl)propan-1-one Chemical compound CCC(=O)C1CC(C(C)C)CC=C1C DZSVIVLGBJKQAP-UHFFFAOYSA-N 0.000 description 1
- OGBWMWKMTUSNKE-UHFFFAOYSA-N 1-(2-methylprop-2-enoyloxy)hexyl 2-methylprop-2-enoate Chemical compound CCCCCC(OC(=O)C(C)=C)OC(=O)C(C)=C OGBWMWKMTUSNKE-UHFFFAOYSA-N 0.000 description 1
- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XEZCCHVCBAZAQD-UHFFFAOYSA-N 2-(aziridin-1-yl)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCN1CC1 XEZCCHVCBAZAQD-UHFFFAOYSA-N 0.000 description 1
- SJIXRGNQPBQWMK-UHFFFAOYSA-N 2-(diethylamino)ethyl 2-methylprop-2-enoate Chemical compound CCN(CC)CCOC(=O)C(C)=C SJIXRGNQPBQWMK-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- HDPLHDGYGLENEI-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COC(C)COCC1CO1 HDPLHDGYGLENEI-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- IEVADDDOVGMCSI-UHFFFAOYSA-N 2-hydroxybutyl 2-methylprop-2-enoate Chemical compound CCC(O)COC(=O)C(C)=C IEVADDDOVGMCSI-UHFFFAOYSA-N 0.000 description 1
- NJRHMGPRPPEGQL-UHFFFAOYSA-N 2-hydroxybutyl prop-2-enoate Chemical compound CCC(O)COC(=O)C=C NJRHMGPRPPEGQL-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- ULYIFEQRRINMJQ-UHFFFAOYSA-N 3-methylbutyl 2-methylprop-2-enoate Chemical compound CC(C)CCOC(=O)C(C)=C ULYIFEQRRINMJQ-UHFFFAOYSA-N 0.000 description 1
- ZVYGIPWYVVJFRW-UHFFFAOYSA-N 3-methylbutyl prop-2-enoate Chemical compound CC(C)CCOC(=O)C=C ZVYGIPWYVVJFRW-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- UZDMJPAQQFSMMV-UHFFFAOYSA-N 4-oxo-4-(2-prop-2-enoyloxyethoxy)butanoic acid Chemical compound OC(=O)CCC(=O)OCCOC(=O)C=C UZDMJPAQQFSMMV-UHFFFAOYSA-N 0.000 description 1
- JTHZUSWLNCPZLX-UHFFFAOYSA-N 6-fluoro-3-methyl-2h-indazole Chemical compound FC1=CC=C2C(C)=NNC2=C1 JTHZUSWLNCPZLX-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- XTNAQYPNHOEHCW-UHFFFAOYSA-N [1-(2-methylprop-2-enoyloxy)cyclohexyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1(OC(=O)C(C)=C)CCCCC1 XTNAQYPNHOEHCW-UHFFFAOYSA-N 0.000 description 1
- GCNKJQRMNYNDBI-UHFFFAOYSA-N [2-(hydroxymethyl)-2-(2-methylprop-2-enoyloxymethyl)butyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(CC)COC(=O)C(C)=C GCNKJQRMNYNDBI-UHFFFAOYSA-N 0.000 description 1
- TUOBEAZXHLTYLF-UHFFFAOYSA-N [2-(hydroxymethyl)-2-(prop-2-enoyloxymethyl)butyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CC)COC(=O)C=C TUOBEAZXHLTYLF-UHFFFAOYSA-N 0.000 description 1
- JUDXBRVLWDGRBC-UHFFFAOYSA-N [2-(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)-2-(2-methylprop-2-enoyloxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(COC(=O)C(C)=C)COC(=O)C(C)=C JUDXBRVLWDGRBC-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- ZZSKMNCIAKKVRB-UHFFFAOYSA-N morpholin-4-yl-(2-nitrophenyl)methanone Chemical compound [O-][N+](=O)C1=CC=CC=C1C(=O)N1CCOCC1 ZZSKMNCIAKKVRB-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- YZLDWOUBPARRAL-UHFFFAOYSA-N prop-2-enoic acid;triazine Chemical compound OC(=O)C=C.C1=CN=NN=C1 YZLDWOUBPARRAL-UHFFFAOYSA-N 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/40—Manufacture
- B42D25/405—Marking
- B42D25/415—Marking using chemicals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/328—Diffraction gratings; Holograms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/40—Manufacture
- B42D25/405—Marking
- B42D25/415—Marking using chemicals
- B42D25/42—Marking using chemicals by photographic processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/40—Manufacture
- B42D25/405—Marking
- B42D25/425—Marking by deformation, e.g. embossing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
- G06K19/00—Record carriers for use with machines and with at least a part designed to carry digital markings
- G06K19/06—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
- G06K19/08—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code using markings of different kinds or more than one marking of the same kind in the same record carrier, e.g. one marking being sensed by optical and the other by magnetic means
- G06K19/10—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code using markings of different kinds or more than one marking of the same kind in the same record carrier, e.g. one marking being sensed by optical and the other by magnetic means at least one kind of marking being used for authentication, e.g. of credit or identity cards
- G06K19/16—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code using markings of different kinds or more than one marking of the same kind in the same record carrier, e.g. one marking being sensed by optical and the other by magnetic means at least one kind of marking being used for authentication, e.g. of credit or identity cards the marking being a hologram or diffraction grating
-
- B42D2033/04—
-
- B42D2033/10—
-
- B42D2033/20—
-
- B42D2033/30—
-
- B42D2033/32—
-
- B42D2035/06—
-
- B42D2035/08—
-
- B42D2035/16—
-
- B42D2035/34—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/324—Reliefs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/40—Manufacture
- B42D25/45—Associating two or more layers
- B42D25/465—Associating two or more layers using chemicals or adhesives
- B42D25/47—Associating two or more layers using chemicals or adhesives using adhesives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/024—Hologram nature or properties
- G03H1/0244—Surface relief holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2250/00—Laminate comprising a hologram layer
- G03H2250/10—Laminate comprising a hologram layer arranged to be transferred onto a carrier body
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2250/00—Laminate comprising a hologram layer
- G03H2250/12—Special arrangement of layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2250/00—Laminate comprising a hologram layer
- G03H2250/36—Conform enhancement layer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2250/00—Laminate comprising a hologram layer
- G03H2250/40—Printed information overlapped with the hologram
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2270/00—Substrate bearing the hologram
- G03H2270/52—Integrated surface relief hologram without forming layer
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はレリーフホログラムの改良に係り、更に詳しく
は自身は透明でありながら反射型ホログラムとしての特
徴をも兼ね備えた透明型ホログラムに係る。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to improvements in relief holograms, and more particularly to transparent holograms that are transparent themselves but also have the characteristics of reflection holograms.
ホログラムの記録の一方法として、物体からの光の波面
に相当する干渉縞を材料表面の凹凸模様で記録する方法
があり、この方法により得られたレリーフホログラムは
プレス技術により大量複製を容易に行うことができる利
点がある。One method for recording holograms is to record interference fringes, which correspond to the wavefront of light from an object, using an uneven pattern on the surface of the material.The relief holograms obtained by this method can be easily reproduced in large quantities using press technology. There is an advantage that it can be done.
今日において、レリーフホログラムをクレジットカード
、キャッシュカード、本の表紙、レコードジャケットな
どの基材に形成する試みが種々行われており、このよう
にレリーフホログラムを転写、貼付、直接形成等の方法
で基材に一体化した場合、反射光強度が重要な問題とな
る。一般にレリーフホログラムは合成樹脂で構成される
ためレリーフ形成面、即ち樹脂と空気との屈折率差を有
する界面での反射光強度が小さく、従ってホログラム効
果が小さい。Today, various attempts are being made to form relief holograms on base materials such as credit cards, cash cards, book covers, record jackets, etc., and these relief holograms can be used as base materials by methods such as transfer, pasting, and direct formation. When integrated into materials, reflected light intensity becomes an important issue. Generally, since relief holograms are made of synthetic resin, the intensity of reflected light at the relief forming surface, that is, the interface between the resin and air having a difference in refractive index, is small, and therefore the hologram effect is small.
例えば屈折率:n=1.5の樹脂でレリーフホログラム
を形成した場合、レリーフ形成面での反射率:Rはフレ
ネルの公式によりR=4%と非常に低(なり、ホログラ
ム効果は不充分である。For example, when a relief hologram is formed using a resin with a refractive index of n=1.5, the reflectance R on the relief forming surface is very low (R=4%) according to Fresnel's formula, and the hologram effect is insufficient. be.
そこで従来は、反射率が90%以上ある反射性金属薄M
(例えばアルミニウム薄膜)を蒸着等によりレリーフ形
成面に形成して反射光強度を大きくし、以て充分なホロ
グラム効果を発現させる工夫がなされており、反射型ホ
ログラムと称されるものはほとんどこのような構造を採
用している。Therefore, in the past, reflective metal thin M with a reflectance of 90% or more was used.
Efforts have been made to increase the intensity of reflected light by forming a thin film of aluminum (for example, an aluminum thin film) on the relief forming surface by vapor deposition, thereby creating a sufficient hologram effect, and most of the so-called reflection holograms are of this type. The structure is adopted.
しかしながら、レリーフ形成面に反射性金属薄膜を形成
してなる従来のホログラムにおいては、上記金属薄膜の
裏面に絵柄層を印刷形成したとしても、金属薄膜中を伝
播する光波は進行方向に減衰してしまうため絵柄層が見
えず、ホログラム形成面におけるデザイン面からの外観
向上を図ることはできなかった。However, in conventional holograms in which a reflective metal thin film is formed on the relief forming surface, even if a pattern layer is printed on the back side of the metal thin film, the light waves propagating through the metal thin film are attenuated in the traveling direction. Because the hologram was folded away, the pattern layer could not be seen, and it was not possible to improve the appearance of the hologram forming surface from a design perspective.
また金属薄膜は通常、銀白色で且つ輝度も高いため、カ
ード類、本の表紙等各種の基材にホログラムを設けたと
きの異和感が大きいという問題があり、デザイン上の要
請から、その改善が望まれていた。In addition, metal thin films are usually silvery white and have high brightness, so there is a problem that it looks strange when holograms are placed on various substrates such as cards and book covers. Improvement was desired.
本発明は上記の点に鑑みなされたもので、透明で且つ反
射光強度の大きい、即ち充分なホログラム効果を発現で
きる透明型ホログラムを堤供することを目的とする。The present invention has been made in view of the above points, and an object of the present invention is to provide a transparent hologram that is transparent and has a large reflected light intensity, that is, can exhibit a sufficient hologram effect.
本発明の透明型ホログラムは表面に物体からの光の波面
に相当する干渉縞が凹凸の模様として形成されているホ
ログラム層を有するレリーフホログラムであって、上記
ホログラム層のレリーフ形成面にホログラム層の屈折率
よりも大きい屈折率を有する透明連続薄膜を形成してな
ることを特徴とする。The transparent hologram of the present invention is a relief hologram having a hologram layer on the surface of which interference fringes corresponding to the wavefront of light from an object are formed as an uneven pattern, and the hologram layer is formed on the relief forming surface of the hologram layer. It is characterized by forming a transparent continuous thin film having a refractive index larger than the refractive index.
以下、本発明の実施例を図面に基き説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第1図においてlは本発明の透明型ホログラムを示し、
該ホログラム1はレリーフホログラムとして構成され、
表面に物体からの光の波面に相当する干渉縞が凹凸の模
様として形成されているホログラム層2を有する。In FIG. 1, l indicates a transparent hologram of the present invention,
The hologram 1 is configured as a relief hologram,
It has a hologram layer 2 on the surface of which interference fringes corresponding to the wavefront of light from an object are formed in an uneven pattern.
このようにホログラム層2は干渉縞が凹凸の模様として
形成された凹凸模様面即ちレリーフ形成面3を有し、更
に該レリーフ形成面3には、ホログラム層2の屈折率よ
りも大きい屈折率を有する透明連続薄膜4が凹凸模様の
形に沿って形成されている。In this way, the hologram layer 2 has an uneven pattern surface on which interference fringes are formed as an uneven pattern, that is, a relief forming surface 3, and the relief forming surface 3 has a refractive index larger than that of the hologram layer 2. A transparent continuous thin film 4 is formed along the shape of the uneven pattern.
本発明において、ホログラム層2の材質として、ポリ塩
化ビニル、アクリル(例、MMA)、ポリスチレン、ポ
リカーボネート等の熱可塑性樹脂、不飽和ポリエステル
、メラミン、エポキシ、ポリエステル(メタ)アクリレ
ート、ウレタン(メタ)アクリレート、エポキシ(メタ
)アクリレート、ポリエーテル(メタ)アクリレート、
ポリオール(メタ)アクリレート、メラミン(メタ)ア
クリレート、トリアジン系アクリレート等の熱硬化性樹
脂を硬化させたもの、或いは、上記熱可塑性樹脂と熱硬
化性樹脂の混合物が使用可能である。In the present invention, the material of the hologram layer 2 is polyvinyl chloride, acrylic (e.g. MMA), polystyrene, thermoplastic resin such as polycarbonate, unsaturated polyester, melamine, epoxy, polyester (meth)acrylate, urethane (meth)acrylate. , epoxy (meth)acrylate, polyether (meth)acrylate,
Cured thermosetting resins such as polyol (meth)acrylate, melamine (meth)acrylate, and triazine acrylate, or mixtures of the above-mentioned thermoplastic resins and thermosetting resins can be used.
更に本発明のホログラム層2の材質として、ラジカル重
合性不飽和基を有する熱成形性Thffが使用可能であ
り、これには次の2種類のものがある。Furthermore, as the material for the hologram layer 2 of the present invention, thermoformable Thff having a radically polymerizable unsaturated group can be used, and there are two types of this: Thff.
(1)ガラス転移点が0〜250℃のポリマー中にラジ
カル重合性不飽和基を有するもの。さらに具体的には、
ポリマーとしては以下の化合物■〜■を重合もしくは共
重合させたものに対し後述する方法(イ)〜(ニ)によ
りラジカル重合性不飽和基を導入したものを用いること
ができる。(1) A polymer having a glass transition point of 0 to 250°C and having a radically polymerizable unsaturated group. More specifically,
As the polymer, a product obtained by polymerizing or copolymerizing the following compounds (1) to (2) and introducing a radically polymerizable unsaturated group by methods (a) to (d) described below can be used.
■水酸基を有する単量体二N−メチロールアクリルアミ
ド、2−ヒドロキシエチルアクリレート、2−ヒドロキ
シエチルメタクリレート、2−ヒドロキシプロピルアク
リレート、2−ヒドロキシプロピルメタクリレート、2
−ヒドロキシブチルアクリレート、2−ヒドロキシブチ
ルメタクリレート、2−ヒドロキシ−3−フェノキシプ
ロビルメタクリレート、2−ヒドロキシ−3−フェノキ
シプロピルアクリレートなど。■ Monomers having hydroxyl groups 2N-methylolacrylamide, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 2
-Hydroxybutyl acrylate, 2-hydroxybutyl methacrylate, 2-hydroxy-3-phenoxypropyl methacrylate, 2-hydroxy-3-phenoxypropyl acrylate, etc.
■カルボキシル基を有する単量体ニアクリル酸、メタク
リル酸、アクリロイルオキシエチルモノサクシネートな
ど。■ Monomers with carboxyl groups such as nialic acid, methacrylic acid, acryloyloxyethyl monosuccinate, etc.
■エポキシ基を有する単量体ニゲリシジルメタクリレー
トなど。■ Monomer nigericidyl methacrylate, etc. having an epoxy group.
■アジリジニル基を有する単量体:2−アジリジニルエ
チルメタクリレート、2−アジリジニルプロピオン酸ア
リルなど。(2) Monomers having an aziridinyl group: 2-aziridinylethyl methacrylate, allyl 2-aziridinylpropionate, etc.
■アミノ基を有する単量体ニアクリルアミド、メタクリ
ルアミド、ダイア七トンアクリルアミド、ジメチルアミ
ノエチルメタクリレート、ジエチルアミノエチルメタク
リレートなど。■ Monomers containing amino groups such as niacrylamide, methacrylamide, diaseptone acrylamide, dimethylaminoethyl methacrylate, diethylaminoethyl methacrylate, etc.
■スルフォン基を有する単量体:2−アクリルアミド−
2−メチルプロパンスルフォン酸など。■ Monomer with sulfone group: 2-acrylamide-
2-methylpropanesulfonic acid, etc.
■イソシアネート基を有する単量体72.4−トルエン
ジイソシアネートと2−ヒドロキシエチルアクリレート
の1モル対1モル付加物などのジイソシアネートと活性
水素を有するラジカル重合性単量体の付加物など。(2) Monomers Having Isocyanate Groups 72. Adducts of diisocyanates and radically polymerizable monomers having active hydrogen, such as 1 mol to 1 mol adducts of 4-toluene diisocyanate and 2-hydroxyethyl acrylate.
■さらに、上記の共重合体のガラス転移点を調節したり
、硬化膜の物性を調節したりするために、上記の化合物
と、この化合物と共重合可能な以下のような単量体と共
重合させることもできる。このような共重合可能な単量
体としては、例えばメチルメタクリレート、メチルアク
リレート、エチルアクリレート、エチルメタクリレート
、プロピルアクリレート、プロピルメタクリレート、ブ
チルアクリレート、ブチルメタクリレート、イソブチル
アクリレート、イソブチルメタクリレート、t−ブチル
アクリレート、t−ブチルメタクリレート、イソアミル
アクリレート、イソアミルメタクリレート、シクロへキ
シルアクリレート、シクロへキシルメタクリレート、2
−エチルへキシルアクリレート、2−エチルへキシルメ
タクリレートなどが挙げられる。■Furthermore, in order to adjust the glass transition point of the above copolymer and the physical properties of the cured film, the above compound can be copolymerized with the following monomers that can be copolymerized with this compound. It can also be polymerized. Examples of such copolymerizable monomers include methyl methacrylate, methyl acrylate, ethyl acrylate, ethyl methacrylate, propyl acrylate, propyl methacrylate, butyl acrylate, butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, t-butyl acrylate, and t-butyl acrylate. -Butyl methacrylate, isoamyl acrylate, isoamyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, 2
-Ethylhexyl acrylate, 2-ethylhexyl methacrylate, and the like.
次に上述のようにして得られた重合体を以下に述べる方
法(イ)〜(ニ)により反応させ、ラジカル重合性不飽
和基を導入することによって、本発明に係る材料を得る
ことができる。Next, the material according to the present invention can be obtained by reacting the polymer obtained as described above by methods (a) to (d) described below to introduce a radically polymerizable unsaturated group. .
(イ)水酸基を有する単量体の重合体または共重合体の
場合にはアクリル酸、メタクリル酸などのカルボキシル
基を有する単量体などを縮合反応させる。(a) In the case of a polymer or copolymer of a monomer having a hydroxyl group, a monomer having a carboxyl group such as acrylic acid or methacrylic acid is subjected to a condensation reaction.
(ロ)カルボキシル基、スルフォン基を有する単量体の
重合体または共重合体の場合には前述の水酸基を有する
単量体を縮合反応させる。(b) In the case of a polymer or copolymer of monomers having carboxyl groups or sulfone groups, the aforementioned monomers having hydroxyl groups are subjected to a condensation reaction.
(ハ)エポキシ基、イソシアネート基あるいはアジリジ
ニル基を有する単量体の重合体または共重合体の場合に
は前述の水酸基を有する単量体もしくはカルボキシル基
を有する単量体を付加反応させる。(c) In the case of a polymer or copolymer of a monomer having an epoxy group, an isocyanate group, or an aziridinyl group, the above-mentioned monomer having a hydroxyl group or monomer having a carboxyl group is subjected to an addition reaction.
(ニ)水酸基あるいはカルボキシル基を有する単量体の
重合体または共重合体の場合にはエポキシ基を有するs
量体あるいはアジリジニル基を有する単量体あるいはジ
イソシアネート化合物と水酸基含有アクリル酸エステル
単量体の1対1モルの付加物を付加反応させる。(d) In the case of a polymer or copolymer of monomers having a hydroxyl group or a carboxyl group, s having an epoxy group
A 1:1 mole adduct of a monomer having an aziridinyl group or a diisocyanate compound and a hydroxyl group-containing acrylic acid ester monomer is subjected to an addition reaction.
上記の反応を行うには、微量のハイドロキノンなどの重
合禁止剤を加え乾燥空気を送りながら行うことが好まし
い。In order to carry out the above reaction, it is preferable to add a trace amount of a polymerization inhibitor such as hydroquinone and carry out the reaction while blowing dry air.
(2)融点が0〜250℃でありラジカル重合性不飽和
基を有する化合物。具体的にはステアリルアクリレート
、ステアリルメタクリレート、トリアクリルイソシアヌ
レート、シクロヘキサンジオールジアクリレート、シク
ロヘキサンジオールジメタクリレート、スピログリコー
ルジアクリレート、スピログリコールジメタクリレート
などが挙げられる。(2) A compound having a melting point of 0 to 250°C and having a radically polymerizable unsaturated group. Specific examples include stearyl acrylate, stearyl methacrylate, triacryl isocyanurate, cyclohexanediol diacrylate, cyclohexanediol dimethacrylate, spiroglycol diacrylate, and spiroglycol dimethacrylate.
また、本発明においては、前記+11、(2)を混合し
て用いることもでき、さらに、それらに対してラジカル
重合性不飽和単量体を加えることもできる。Moreover, in the present invention, the above +11 and (2) can be used in combination, and a radically polymerizable unsaturated monomer can also be added to them.
このラジカル重合性不飽和単量体は、電離放射線照射の
際、架橋密度を向上させ耐熱性を向上させるものであっ
て、前述の単量体の他にエチレングリコールジアクリレ
ート、エチレングリコールジメタクリレート、ポリエチ
レングリコールジアクリレート、ポリエチレングリコー
ルジメタクリレート、ヘキサンジオールジアクリレート
、ヘキサンジオールジメタクリレート、トリメチロール
プロパントリアクリレート、トリメチロールプロパント
リメタクリレート、トリメチロールプロパンジアクリレ
ート、トリメチロールプロパンジメタクリレート、ペン
タエリスリトールテトラアクリレート、ペンタエリスリ
トールテトラメタクリレート、ペンタエリスリトールト
リアクリレート、ペンタエリスリトールトリメタクリレ
ート、ジペンタエリスリトールへキサアクリレート、ジ
ペンタエリスリトールへキサメタクリレート、エチレン
グリコールジグリシジルエーテルジアクリレート、エチ
レングリコールジグリシジルエーテルジメタクリレート
、ポリエチレングリコールジグリシジルエーテルジアク
リレート、ポリエチレングリコールジグリシジルエーテ
ルジメタクリレート、プロピレングリコールジグリシジ
ルエーテルジアクリレート、プロピレングリコールジグ
リシジルエーテルジメタクリレート、ポリプロピレング
リコールジグリシジルエーテルジアクリレート、ポリプ
ロピレングリコールジグリシジルエーテルジメタクリレ
ート、ソルビトールテトラグリシジルエーテルテトラア
クリレート、ソルビトールテトラグリシジルエーテルテ
トラメタクリレートなどを用いることができ、前記した
共重合体混合物の固型分100重量部に対して、O,1
〜100重量部で用いることが好ましい。また、上記の
ものは電子線により充分に硬化可能であるが、紫外線照
射で硬化させる場合には、増感剤としてベンゾキノン、
ベンゾイン、ベンゾインメチルエーテルなどのベンゾイ
ンエーテル類、ハロゲン化アセトフェノン類、ビアチル
類などの紫外線照射によりラジカルを発生するものも用
いることができる。This radically polymerizable unsaturated monomer improves crosslinking density and heat resistance when irradiated with ionizing radiation, and in addition to the above-mentioned monomers, ethylene glycol diacrylate, ethylene glycol dimethacrylate, Polyethylene glycol diacrylate, polyethylene glycol dimethacrylate, hexanediol diacrylate, hexanediol dimethacrylate, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, trimethylolpropane diacrylate, trimethylolpropane dimethacrylate, pentaerythritol tetraacrylate, penta Erythritol tetramethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate, ethylene glycol diglycidyl ether diacrylate, ethylene glycol diglycidyl ether dimethacrylate, polyethylene glycol diglycidyl ether dimethacrylate Acrylate, polyethylene glycol diglycidyl ether dimethacrylate, propylene glycol diglycidyl ether diacrylate, propylene glycol diglycidyl ether dimethacrylate, polypropylene glycol diglycidyl ether diacrylate, polypropylene glycol diglycidyl ether dimethacrylate, sorbitol tetraglycidyl ether tetraacrylate, sorbitol Tetraglycidyl ether tetramethacrylate or the like can be used, and O,1
It is preferable to use it in an amount of 100 parts by weight. In addition, although the above materials can be sufficiently cured by electron beams, when curing by ultraviolet irradiation, benzoquinone is used as a sensitizer.
It is also possible to use benzoin ethers such as benzoin and benzoin methyl ether, halogenated acetophenones, and biacyl which generate radicals when irradiated with ultraviolet rays.
ホログラム層2は従来既知の方法によって得ることがで
きる。例えば干渉縞が凹凸の形で記録されたホログラム
原版をプレス型として用い、このホログラム原版上にホ
ログラム形成用樹脂シートを置き、加熱ロールなどの手
段によって両者を加熱圧接し、ホログラム形成用樹脂シ
ート表面にホログラム原版の凹凸模様を複製する方法に
よってホログラム層2を得ることができる。Hologram layer 2 can be obtained by conventionally known methods. For example, a hologram master plate on which interference fringes are recorded in the form of unevenness is used as a press mold, a hologram-forming resin sheet is placed on the hologram master plate, and the two are heated and pressure-bonded by means such as a heating roll, so that the hologram-forming resin sheet surface The hologram layer 2 can be obtained by a method of duplicating the uneven pattern of the hologram original plate.
またホログラム層2は表面の凹凸によりホログラムの情
報を記録できるタイプのもので、具体的には上記ホログ
ラム層2としてリップマンホログラムを除く、フレネル
ホログラム、フーリエ変換ホログラム、フランホーファ
ーホログラムなどの原理のものに及び、それらの原理を
利用したイメージホログラム、レインボーホログラム、
ホログラフィックステレオグラム、ホログラフィック回
折格子などが用いられる。The hologram layer 2 is of a type that can record hologram information through surface irregularities, and specifically, the hologram layer 2 may be one based on the principle of Fresnel hologram, Fourier transform hologram, Fraunhofer hologram, etc., excluding Lippmann hologram. And image holograms, rainbow holograms, etc. that utilize these principles.
Holographic stereograms, holographic diffraction gratings, etc. are used.
透明連続薄膜4はホログラムN2の屈折率(通常、屈折
率:n=1.3〜1.6である)よりも大きい屈折率を
有するもので、従来の反射性金属薄膜を設けるのと同様
な位置に形成でき、このような薄膜4.の材質としては
(以下、材質名の右にカッコ書きで屈折率:nを付記す
る) 、5btsx(n=3.0)、Few(1+(n
=2.7)、Ti1t(n=2.6) 、Cd5(n=
2.6)、Ce0z(n=2.3) 、Zn5(n=2
.3)、PbCIz(n112.3)、Cd0(n=2
゜2)、5bzOs (n=2.0)、ii (n=2
.0)、5iO(n=2.0)、BizOs(n−2,
5)、InzOs(n□2.o)、Pb0(n=2.6
)、Ta、05(n=2.4) 、ZnO(n=2.1
) 、Zr0t(n=2.0) 、CdzO*(n=1
.8) 、Alx0s(n=1.6)、CaO1iOt
(n=1.8)などが挙げられる。The transparent continuous thin film 4 has a refractive index larger than the refractive index of the hologram N2 (usually refractive index: n=1.3 to 1.6), and is similar to providing a conventional reflective metal thin film. 4. Such a thin film can be formed at a location. (Hereinafter, the refractive index: n will be added in parentheses to the right of the material name), 5btsx (n = 3.0), Few (1 + (n
= 2.7), Tilt (n = 2.6), Cd5 (n =
2.6), Ce0z (n=2.3), Zn5 (n=2
.. 3), PbCIz (n112.3), Cd0 (n=2
゜2), 5bzOs (n=2.0), ii (n=2
.. 0), 5iO (n=2.0), BizOs (n-2,
5), InzOs (n□2.o), Pb0 (n=2.6
), Ta,05 (n=2.4), ZnO (n=2.1
), Zr0t (n=2.0), CdzO*(n=1
.. 8) , Alx0s (n=1.6), CaO1iOt
(n=1.8), etc.
上記薄膜4はその屈折率がホログラム層2の屈折率より
も0.3以上大きいことが好ましく、より好ましくは0
.5以上大きいことである。本発明者等の実験によれば
1.0以上大きいことが最適であるという結果がもたら
されている。The refractive index of the thin film 4 is preferably 0.3 or more larger than the refractive index of the hologram layer 2, and more preferably 0.3 or more.
.. It must be greater than 5. According to experiments conducted by the present inventors, the result is that a value larger than 1.0 is optimal.
上記薄膜4の膜厚は薄膜を形成する材料の透明領域であ
ればよいが通常は100〜10.000人が好ましい。The thickness of the thin film 4 may be within the transparent range of the material forming the thin film, but is usually preferably from 100 to 10,000.
上記薄膜4をホログラム層のレリーフ形成面3に形成す
る方法として、真空蒸着法、スパッタリング法、反応性
スパッタリング法、イオンブレーティング法などの一般
的薄膜形成手段が保用できる。As a method for forming the thin film 4 on the relief forming surface 3 of the hologram layer, general thin film forming methods such as vacuum evaporation, sputtering, reactive sputtering, and ion blating can be used.
このように屈折率の大きい透明連)iFi膜を設けると
、ホログラムの特徴である再生の角度依存性により、ホ
ログラムの再生可能な角度範囲外では単なる透明体とし
てしか見えず、ホログラムの再生可能な角度範囲内では
光の反射率が最大になり、反射型ホログラムとしての効
果が出てくる。When a transparent iFi film with a high refractive index is provided in this way, due to the angular dependence of reproduction, which is a characteristic of holograms, outside the angular range in which the hologram can be reproduced, it appears only as a transparent body, and the hologram's reproduction is difficult. Within the angular range, the light reflectance is at its maximum, producing the effect of a reflective hologram.
本発明ホログラムは第2図に示すように絵柄層5を備え
ていてもよい。絵柄層5が任意の位置に設けることがで
き、例えば上記薄膜4の表面に設けることも或いはホロ
グラム層2の表面に設けることも更には薄膜4、ホログ
ラム層2の両表面に設けることもできる。絵柄層5は通
常、印刷によって形成され、絵柄層5を構成するインキ
も通常用いられているインキを使用でき、任意の模様及
び色彩を施すことができる。The hologram of the present invention may include a pattern layer 5 as shown in FIG. The pattern layer 5 can be provided at any position, for example, on the surface of the thin film 4, on the surface of the hologram layer 2, or even on both surfaces of the thin film 4 and the hologram layer 2. The pattern layer 5 is usually formed by printing, and the ink constituting the pattern layer 5 can be any commonly used ink, and any pattern and color can be applied.
また絵柄層5に限らず、上記薄膜4の表面には任意色相
のベタ印刷により連続印刷層を設けてもよい。In addition to the pattern layer 5, a continuous printed layer may be provided on the surface of the thin film 4 by solid printing in any hue.
上記薄膜4は透明であり且つホログラム層2の屈折率よ
りも大きな屈折率を有しているため、必要にして充分な
透明度と反射光強度を得ることができ、その結果、薄膜
4の表面に設けられた絵柄層5 (本実施例においては
薄膜4側が下面となるため薄膜4の下面に絵柄N5が設
けられている態様となっている)を外部から見ることが
できると共にホログラム効果も大きい。Since the thin film 4 is transparent and has a refractive index larger than that of the hologram layer 2, it is possible to obtain necessary and sufficient transparency and reflected light intensity, and as a result, the surface of the thin film 4 The provided pattern layer 5 (in this embodiment, the thin film 4 side is the bottom surface, so the pattern N5 is provided on the bottom surface of the thin film 4) can be seen from the outside, and the hologram effect is also large.
例えば、ホログラム層の樹脂の屈折率:n=1.4とし
透明連続薄膜の屈折率n、=3.0とすると、垂直入射
光に対する反射率:RはP、S両偏光波に対し、R=5
0%となり(但し、入射光の波長:λ々4 、000人
、透明連続薄膜の膜厚:d々1 、000人とする)、
その結果、充分なホログラム効果が得られる。For example, if the refractive index of the resin of the hologram layer is n = 1.4 and the refractive index of the transparent continuous thin film is n = 3.0, then the reflectance R for vertically incident light is R for both P and S polarized waves. =5
0% (however, wavelength of incident light: λ4,000, thickness of transparent continuous thin film: d1,000),
As a result, a sufficient hologram effect can be obtained.
本発明はホログラム層2の上面にレリーフ形成面3を形
成してもよく、この場合、透明連続薄膜4はホログラム
層2の下面に形成される。また上記薄膜4はレリーフ形
成面3の凹凸に沿った形状に形成することに限定されず
、その下面は平坦であってもよい。In the present invention, a relief forming surface 3 may be formed on the upper surface of the hologram layer 2, and in this case, a transparent continuous thin film 4 is formed on the lower surface of the hologram layer 2. Further, the thin film 4 is not limited to being formed in a shape that follows the irregularities of the relief forming surface 3, and the lower surface thereof may be flat.
更に本発明は第2図に示すように薄膜4及び絵柄層5の
下面に保護層6を設けることができる。Further, in the present invention, a protective layer 6 can be provided on the lower surface of the thin film 4 and the pattern layer 5, as shown in FIG.
保護層6の材質としては通常用いられる合成樹脂を使用
することができる。このように保護層6を設けることに
よってレリーフ形成面及び透明連続薄膜を保護できる他
、レリーフを型取りすることによって行われる偽造を防
止できる利点がある。As the material for the protective layer 6, commonly used synthetic resins can be used. Providing the protective layer 6 in this manner not only protects the surface on which the relief is formed and the transparent continuous thin film, but also has the advantage of preventing counterfeiting caused by molding the relief.
このように透明連続薄膜4の下面に保護層を設けること
は、本発明のように透明連続薄膜4があってはじめて可
能になることで、従来、透明連続薄膜4なしに保護層を
設けると、保護層の屈折率と近いためホログラムの凹凸
が単に埋まってホログラムが再生されなかったのである
。Providing a protective layer on the lower surface of the transparent continuous thin film 4 in this way is only possible if there is a transparent continuous thin film 4 as in the present invention. Conventionally, when a protective layer is provided without the transparent continuous thin film 4, Since the refractive index is close to that of the protective layer, the unevenness of the hologram was simply filled in and the hologram could not be reproduced.
更に本発明においてはホログラム層及び透明連VtTi
1膜は透明であるため、ホログラム層や透明連Vt3膜
に絵柄を設けるかわりに、紙やプラス千ツク等の別体の
支持体7の表面上に絵柄層5を設けておき、接着剤8を
介する等の任意の積層手段によって積層しても同様な効
果を示す(第3図)。Furthermore, in the present invention, the hologram layer and the transparent layer VtTi
Since the 1 film is transparent, instead of providing a pattern on the hologram layer or the transparent Vt3 film, the pattern layer 5 is provided on the surface of a separate support 7 such as paper or plastic, and the adhesive 8 A similar effect can be obtained even if the layers are laminated by any laminating means such as via a wafer (FIG. 3).
本発明のホログラムは種々の用途に用いることができ、
例えばクレジットカード、キャッシエカードなどのカー
ド類に本発明ホログラムを設ければ、外観上の美しさ、
目新しさに加え、カード自体の偽造、変造の困難なカー
ド類が得られる。また本の表紙、レコードジャケットな
どに設ければデザインバラエティ−に冨んだものとなり
、商品価値の向上に寄与できる。The hologram of the present invention can be used for various purposes,
For example, if the hologram of the present invention is provided on cards such as credit cards and cashier cards, the appearance of the cards can be improved.
In addition to novelty, cards that are difficult to counterfeit or alter can be obtained. Also, if it is placed on the cover of a book, record jacket, etc., it will have a rich variety of designs and contribute to improving the value of the product.
更に本発明のホログラムは特定の再生角度範囲内でのみ
再生されるので、他の通常の角度ではホログラムが認識
されず、別体の支持体と積層するときはその支持体及び
支持体表面のデザイン、絵柄の視覚的特徴を妨げない利
点があり、従来の反射性金属薄膜を有する反射型ホログ
ラムを各種の基材上に設けたときの異和感が解消する。Furthermore, since the hologram of the present invention is reproduced only within a specific reproduction angle range, the hologram is not recognized at other normal angles, and when laminated with a separate support, the design of the support and the surface of the support This has the advantage of not interfering with the visual characteristics of the pattern, and eliminates the discomfort that occurs when a conventional reflective hologram having a reflective metal thin film is provided on various substrates.
又、ホログラムの再生可能な角度範囲近傍においては観
察位置を多少変えるだけでホログラムと絵柄の両方を見
ることができ、デザインの2面性が発揮される。Further, in the vicinity of the angular range where the hologram can be reproduced, both the hologram and the pattern can be seen by slightly changing the observation position, demonstrating the dual nature of the design.
次に、本発明の具体的な実施例を挙げる。Next, specific examples of the present invention will be given.
実 施 例
アクリル樹脂とメラミン樹脂とを重量比で4:1の割合
で混合してなる混合樹脂を用いてホログラム層(屈折率
: n =、1.4 )を形成し、該ホログラム層のレ
リーフ袷成面に真空蒸着法にてZnS薄膜(屈折率n+
=2.3 )を形成した。蒸着条件は真空度: 10
−”torrsタンタルボート抵抗加熱方式でZnSを
昇華させ、水晶振動子法で厚さを測定しながらレリーフ
形成面に蒸着させた。Example A hologram layer (refractive index: n = 1.4) was formed using a mixed resin made by mixing an acrylic resin and a melamine resin at a weight ratio of 4:1, and the relief of the hologram layer was A ZnS thin film (refractive index n+
=2.3) was formed. Vapor deposition conditions are vacuum degree: 10
ZnS was sublimated using a tantalum boat resistance heating method and deposited on the relief forming surface while measuring the thickness using a quartz crystal resonator method.
ZnSの密度:p=4.1で、Δf =2,400Hg
まで蒸着したところZnS薄膜の厚さ:dタ1 、20
0 人であった(厚さ:d=2Δ「/ρ)。このZnS
面に絵柄印刷を行った上、保護層(屈折率:nz、1.
4の樹脂を用いた)を設けた。その結果、充分なホログ
ラム効果があることが認められた。また外部から絵柄層
を見ることができ、透明性にも優れていることが認めら
れた。ZnS density: p = 4.1, Δf = 2,400Hg
Thickness of ZnS thin film after evaporation: dta 1, 20
(thickness: d=2Δ"/ρ). This ZnS
After printing a pattern on the surface, a protective layer (refractive index: nz, 1.
No. 4 resin was used). As a result, it was confirmed that there was a sufficient hologram effect. It was also recognized that the pattern layer was visible from the outside and had excellent transparency.
本発明は、ホログラム層のレリーフ形成面にホログラム
層の屈折率よりも大きい屈折率を有する透明連続薄膜を
形成したので、必要にして充分な透明度と反射光強度を
得ることができ、その結果、絵柄層を設けた場合でも該
絵柄層を外部から見ることができると共に充分なホログ
ラム効果を発現することができる。In the present invention, since a transparent continuous thin film having a refractive index larger than that of the hologram layer is formed on the relief forming surface of the hologram layer, it is possible to obtain necessary and sufficient transparency and reflected light intensity, and as a result, Even when a pattern layer is provided, the pattern layer can be seen from the outside and a sufficient hologram effect can be produced.
従って本発jjljによれば絵柄層などに種々の模様や
着色を施すことにより、外観的に優れたホログラムを提
供できる効果がある。Therefore, according to the present invention, a hologram with excellent appearance can be provided by applying various patterns and colors to the picture layer.
また従来においては、レリーフ形成面に保護層を設けよ
うとすると、ホログラム層と保護層との屈折率差がほと
んどなくなるため、界面での反射、屈折、従って回折も
起こらず、ホログラム効果が失われてしまうという難点
があったが、本発明によれば透明連Vt薄膜表面に保護
層を設けてもホログラム効果の劣化、消失もない。又絵
柄層の印刷形成によるホログラム効果の劣化、消失もな
く充分なホログラム効果が発現される。Conventionally, when trying to provide a protective layer on the relief forming surface, the difference in refractive index between the hologram layer and the protective layer is almost eliminated, so no reflection, no refraction, and therefore no diffraction occur at the interface, and the hologram effect is lost. However, according to the present invention, the hologram effect does not deteriorate or disappear even if a protective layer is provided on the surface of the transparent Vt thin film. Further, a sufficient hologram effect is exhibited without deterioration or disappearance of the hologram effect due to printing of the pattern layer.
第1図は本発明ホログラムの実施例を示す縦断面図、第
2図は本発明の他の実施例を示す縦断面図、第3図は透
明連続薄膜の表面に絵柄層を介して支持体を積層してな
る他の実施例を示す縦断面図である。
2・・・ホログラム層 3・・・レリーフ形成面4・・
・透明連続薄膜FIG. 1 is a longitudinal sectional view showing an embodiment of the hologram of the present invention, FIG. 2 is a longitudinal sectional view showing another embodiment of the invention, and FIG. 3 is a support with a pattern layer interposed on the surface of a transparent continuous thin film. It is a longitudinal cross-sectional view showing another example formed by laminating. 2... Hologram layer 3... Relief forming surface 4...
・Transparent continuous thin film
Claims (4)
凸の模様として形成されているホログラム層を有するレ
リーフホログラムであつて、上記ホログラム層のレリー
フ形成面にホログラム層の屈折率よりも大きい屈折率を
有する透明連続薄膜を形成してなることを特徴とする透
明型ホログラム。(1) A relief hologram having a hologram layer in which interference fringes corresponding to the wavefront of light from an object are formed as an uneven pattern on the surface, the relief hologram having a refractive index higher than that of the hologram layer. A transparent hologram characterized by forming a transparent continuous thin film having a large refractive index.
特許請求の範囲第1項記載の透明型ホログラム。(2) A transparent hologram according to claim 1, which is formed by printing a pattern layer on the surface of a transparent continuous thin film.
特許請求の範囲第1項又は第2項記載の透明型ホログラ
ム。(3) The transparent hologram according to claim 1 or 2, wherein a pattern layer is printed and formed on the surface of the hologram layer.
層されている特許請求の範囲第1項〜第3項のいずれか
に記載の透明型ホログラム。(4) The transparent hologram according to any one of claims 1 to 3, wherein a support is laminated on the surface of the transparent continuous thin film via a pattern layer.
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9646985A JPH0762784B2 (en) | 1985-05-07 | 1985-05-07 | Transparent hologram |
KR1019860003552A KR860009325A (en) | 1985-05-07 | 1986-05-07 | Transparent Hologram |
EP86303459A EP0201323B1 (en) | 1985-05-07 | 1986-05-07 | Article incorporating a transparent hologramm |
DE3650027T DE3650027T2 (en) | 1985-05-07 | 1986-05-07 | Item with transparent hologram. |
EP94100494A EP0609683A1 (en) | 1985-05-07 | 1986-05-07 | Relief hologram and process for producing a relief hologram |
US07/249,194 US4856857A (en) | 1985-05-07 | 1988-09-26 | Transparent reflection-type |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9646985A JPH0762784B2 (en) | 1985-05-07 | 1985-05-07 | Transparent hologram |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2487294A Division JPH075798A (en) | 1994-01-27 | 1994-01-27 | Transparent type hologram |
JP6221166A Division JP2871476B2 (en) | 1994-08-23 | 1994-08-23 | Transparent hologram |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61254975A true JPS61254975A (en) | 1986-11-12 |
JPH0762784B2 JPH0762784B2 (en) | 1995-07-05 |
Family
ID=14165895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9646985A Expired - Fee Related JPH0762784B2 (en) | 1985-05-07 | 1985-05-07 | Transparent hologram |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0762784B2 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02187389A (en) * | 1989-01-17 | 1990-07-23 | Tomoegawa Paper Co Ltd | Heat transfer sheet with reversible heat-sensitive recording layer |
JPH03185485A (en) * | 1989-09-28 | 1991-08-13 | Gao Ges Autom Org Mbh | Data carrier with optical variable element and manufacture thereof |
JPH0444666U (en) * | 1990-08-22 | 1992-04-15 | ||
JPH075798A (en) * | 1994-01-27 | 1995-01-10 | Dainippon Printing Co Ltd | Transparent type hologram |
JP2003515182A (en) * | 1999-11-19 | 2003-04-22 | ホログラム インダストリーズ ソシエテ アノニム | Security of documents or products by attaching optically active elements for authenticity verification |
JP2011510339A (en) * | 2008-01-17 | 2011-03-31 | オーファウデー キネグラム アーゲー | Film element |
JP2013527938A (en) * | 2010-05-07 | 2013-07-04 | ホログラム.インダストリーズ | Optical authentication component and method of manufacturing the component |
JP2014124829A (en) * | 2012-12-26 | 2014-07-07 | Dainippon Printing Co Ltd | Colored sheet, colored label and colored transfer sheet |
JP2015102555A (en) * | 2013-11-20 | 2015-06-04 | 大阪シーリング印刷株式会社 | Information recording laminate, label, and packaging film |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4315665A (en) | 1979-09-07 | 1982-02-16 | Eidetic Images, Inc. | Composite optical element having controllable light transmission and reflection characteristics |
-
1985
- 1985-05-07 JP JP9646985A patent/JPH0762784B2/en not_active Expired - Fee Related
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0455876B2 (en) * | 1989-01-17 | 1992-09-04 | Tomoegawa Paper Co Ltd | |
JPH02187389A (en) * | 1989-01-17 | 1990-07-23 | Tomoegawa Paper Co Ltd | Heat transfer sheet with reversible heat-sensitive recording layer |
JP2003121625A (en) * | 1989-09-28 | 2003-04-23 | Gao Ges Fuer Automation & Organisation Mbh | Data carrier having optically variable element and method for producing the same |
JPH03185485A (en) * | 1989-09-28 | 1991-08-13 | Gao Ges Autom Org Mbh | Data carrier with optical variable element and manufacture thereof |
US6337752B1 (en) | 1989-09-28 | 2002-01-08 | GAO Gesellschaft für Automation und Organisation mbH | Data carrier having an optically variable element and methods for producing it |
US6954293B2 (en) | 1989-09-28 | 2005-10-11 | GAO Gesellschaft für Automation und Organisation mbH | Data carrier having an optically variable element and methods for producing it |
JPH0444666U (en) * | 1990-08-22 | 1992-04-15 | ||
JPH075798A (en) * | 1994-01-27 | 1995-01-10 | Dainippon Printing Co Ltd | Transparent type hologram |
JP2003515182A (en) * | 1999-11-19 | 2003-04-22 | ホログラム インダストリーズ ソシエテ アノニム | Security of documents or products by attaching optically active elements for authenticity verification |
JP2011510339A (en) * | 2008-01-17 | 2011-03-31 | オーファウデー キネグラム アーゲー | Film element |
US8928978B2 (en) | 2008-01-17 | 2015-01-06 | Ovd Kinegram Ag | Film element |
US9983335B2 (en) | 2008-01-17 | 2018-05-29 | Ovd Kinegram Ag | Film element |
JP2013527938A (en) * | 2010-05-07 | 2013-07-04 | ホログラム.インダストリーズ | Optical authentication component and method of manufacturing the component |
US9134468B2 (en) | 2010-05-07 | 2015-09-15 | Hologram.Industries | Optical authentication component and method of fabricating said component |
JP2014124829A (en) * | 2012-12-26 | 2014-07-07 | Dainippon Printing Co Ltd | Colored sheet, colored label and colored transfer sheet |
JP2015102555A (en) * | 2013-11-20 | 2015-06-04 | 大阪シーリング印刷株式会社 | Information recording laminate, label, and packaging film |
Also Published As
Publication number | Publication date |
---|---|
JPH0762784B2 (en) | 1995-07-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |