JPS61253881A - Distributed feedback semiconductor laser - Google Patents

Distributed feedback semiconductor laser

Info

Publication number
JPS61253881A
JPS61253881A JP60095433A JP9543385A JPS61253881A JP S61253881 A JPS61253881 A JP S61253881A JP 60095433 A JP60095433 A JP 60095433A JP 9543385 A JP9543385 A JP 9543385A JP S61253881 A JPS61253881 A JP S61253881A
Authority
JP
Japan
Prior art keywords
light
projecting
laser
face
semiconductor laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60095433A
Other languages
Japanese (ja)
Inventor
Miyo Kanai
金井 実代
Naoki Kayane
茅根 直樹
Akio Oishi
大石 昭夫
Shinji Tsuji
伸二 辻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60095433A priority Critical patent/JPS61253881A/en
Publication of JPS61253881A publication Critical patent/JPS61253881A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1082Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region with a special facet structure, e.g. structured, non planar, oblique
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/026Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To enable to regulate the projecting angle of laser projection light, by making the shape of at least one of light projecting end faces a paraboloid or circle including an ellipse. CONSTITUTION:After a mesa is formed, a P-type InP buried layer 7, N-type InP buried layer 8 and P-type InGaAsP cap layer 9 are sequentially grown by liquid phase growing. After a Cr-Au electrode 10 and AuGeNi-Cr-Au electrode 11 are deposited, the section of the end face projection laser light is made curved 12. In this way, by making the shape of the light projecting end face a paraboloid or circle including an ellipse, a lens effect for the laser projecting light at this section can be utilized to reduce the projecting angle. Moreover, by varying the form such as the curvature of the curved section of the light projecting face, the projecting angle can be regulated.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は分布帰還型半導体レーザに係り、特に出射ビー
ム形状の良好な素子に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a distributed feedback semiconductor laser, and more particularly to an element with a good output beam shape.

〔発明の背景〕[Background of the invention]

半導体レーザの出射ビームは、活性層の面積が小さいた
めに大きく拡がっているので、光ファイバとの結合のた
めにはレンズを用いる必要がある。
Since the emitted beam of a semiconductor laser is widely spread due to the small area of the active layer, it is necessary to use a lens for coupling with an optical fiber.

このため半導体レーザとレンズとファイバとの光軸合わ
せが必要となるが、特にコア径の小さな単一モードファ
イバでは精密な位置合わせが要求され、半導体レーザの
大きな欠点となっていた。
For this reason, it is necessary to align the optical axes of the semiconductor laser, lens, and fiber, but single mode fibers with small core diameters require precise alignment, which has been a major drawback of semiconductor lasers.

(米津著「光通信素子工学」第266〜280頁。(Yonezu, "Optical Communication Device Engineering", pp. 266-280.

昭59.2.15.工学図書株式会社、参照)〔発明の
目的〕 本発明の目的は1.ビーム広がり角が小さな分布帰還型
半導体レーザを提供することにある。
1982.2.15. Kogaku Tosho Co., Ltd.) [Object of the Invention] The object of the present invention is 1. The object of the present invention is to provide a distributed feedback semiconductor laser with a small beam divergence angle.

〔発明の概要〕[Summary of the invention]

分布帰還型レーザでは、素子内部の回折格子によってレ
ーザ発振に必要な光帰還が生ずる。このため光出射端面
をミラー状にする必然性がなく、少なくとも一方の形状
を楕円を均む円形状又は放物面とすることができる。こ
の形状を保持することにより、レーザの出射光の出射角
を自由に調節することが可能となる。尚、この場合、活
性層は円形出射端面の中心軸上に設定する。
In a distributed feedback laser, a diffraction grating inside the device generates the optical feedback necessary for laser oscillation. Therefore, it is not necessary to make the light emitting end face mirror-like, and at least one of the light-emitting end surfaces can be made into a circular shape or a paraboloid that equalizes an ellipse. By maintaining this shape, it becomes possible to freely adjust the emission angle of the laser light. In this case, the active layer is set on the central axis of the circular output end face.

[発明の実施例] 以下1本発明の一実施例を第1図により説明する。n型
InP基板1に干渉露光法によってピッチ230nmの
グレイテングを形成する1次に液相成長法により、n型
InGaAsP光ガイド層2(厚み0 、1 p m 
) 、 InGaAsP活性層3(0,1pm)P型I
nGaAsPアンチメルトバック層4 (0,1pm)
P型InPグラツド層5(0,1μm)、P型InGa
AsPキャップ層6(0,5μm)を順次成長させる。
[Embodiment of the Invention] An embodiment of the present invention will be described below with reference to FIG. An n-type InGaAsP light guide layer 2 (thickness: 0, 1 pm) is formed by a primary liquid phase growth method, in which gratings with a pitch of 230 nm are formed on an n-type InP substrate 1 by an interference exposure method.
), InGaAsP active layer 3 (0,1 pm) P type I
nGaAsP anti-meltback layer 4 (0.1pm)
P-type InP gradient layer 5 (0.1 μm), P-type InGa
An AsP cap layer 6 (0.5 μm) is sequentially grown.

この後化学食刻によりメサ部分を残しエツチングを行な
う。メサ形成後、液相成長法によりP型InP埋め込み
層7(1μm)、n型InP埋め込み層8 (3μm)
、P型丁nGaAsPキャップJl19  (0,5μ
m)を順次成長させる1次に、Cr−Au電極10 、
 AuGeN1−Cr−A u電極11を蒸着した後。
After this, etching is performed by chemical etching, leaving a mesa portion. After mesa formation, P-type InP buried layer 7 (1 μm) and n-type InP buried layer 8 (3 μm) were formed by liquid phase growth method.
, P type nGaAsP cap Jl19 (0,5μ
Cr-Au electrode 10,
After depositing the AuGeN1-Cr-Au electrode 11.

レーザの光出射端面の部分を湾曲した形状12にする。The light emitting end face of the laser has a curved shape 12.

この手段として、以下の方法を用いた。まず、フォトレ
ジ作業とエツチングで第1図、上面図の様な円形を形成
した後、端面近傍の基板のみを選択エッチし除却する6
次に端面の除去されなかった画部分を研磨により湾曲し
た形状12とする。この様に光出射端面の形状を楕円を
含む円形状又は放物面とすることによりその部分のレー
ザの出射光に対するレンズ効果を利用し、出射角を小さ
くすることができる。又、光出射端面の湾曲部の曲率な
と、その形状を変えることにより、出射角を調整するこ
とが可能となり、たとえば出射光を平行光としたり、あ
る焦点に収束したりすることができる。本実施例によれ
ば、従来30’″〜40°であった遠視野像の半値幅が
5°程度であった。
As a means for this, the following method was used. First, after forming a circular shape as shown in the top view in Figure 1 by photoregistration and etching, selectively etch only the substrate near the end face and remove it.
Next, the portion of the image whose end face has not been removed is polished into a curved shape 12. In this way, by making the shape of the light emitting end face into a circular shape including an ellipse or a paraboloid, it is possible to make use of the lens effect on the emitted light of the laser in that part and to reduce the emitting angle. Furthermore, by changing the curvature and shape of the curved portion of the light-emitting end face, it is possible to adjust the output angle, and for example, the output light can be made into parallel light or converged to a certain focal point. According to this embodiment, the half-value width of the far-field pattern was about 5 degrees, which was conventionally 30''' to 40 degrees.

尚、以上の説明でグレーティングを2と3の境堺に設け
たが、4と5の境堺としても良い。また、一端面だけで
はなく、両端面を放物面としても良い。
Incidentally, in the above explanation, the grating is provided at the boundary between 2 and 3, but it may also be provided at the boundary between 4 and 5. Moreover, not only one end surface but both end surfaces may be made into paraboloids.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、レーザ本体によってレーザの出射光の
出射角を自由に調節することができるので、光ファイバ
ーとの接合の際、従来の様なレンズを用いることなしに
十分な接合効率を得ることができる。
According to the present invention, since the output angle of the laser beam can be freely adjusted by the laser body, sufficient splicing efficiency can be obtained without using a conventional lens when splicing an optical fiber. I can do it.

以上、分布帰還型半導体レーザを例に挙げ説明したが、
これに限らず、たとえば、ブラック反射型半導体レーザ
の場合も同様である。又、材質についても、InGaA
sP/ I n P以外に、 GaAlAs/GaAs
としても良い。
The above explanation was given using a distributed feedback semiconductor laser as an example.
The present invention is not limited to this, and the same applies to, for example, a black reflective semiconductor laser. Also, regarding the material, InGaA
In addition to sP/I n P, GaAlAs/GaAs
It's good as well.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、素子の後面図、上面図、側面図である。 FIG. 1 is a rear view, a top view, and a side view of the element.

Claims (1)

【特許請求の範囲】[Claims] 1、周期的凹凸によりレーザ発振のための光帰還が生ず
る構造の半導体レーザにおいて、光出射端面のうち少な
くとも一方の形状が楕円を含む円形状又は放物面になつ
ていることを特徴とする分布帰還型半導体レーザ。
1. In a semiconductor laser having a structure in which optical feedback for laser oscillation occurs due to periodic unevenness, a distribution characterized in that at least one of the light emitting end faces has a circular shape including an ellipse or a paraboloid. Feedback semiconductor laser.
JP60095433A 1985-05-07 1985-05-07 Distributed feedback semiconductor laser Pending JPS61253881A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60095433A JPS61253881A (en) 1985-05-07 1985-05-07 Distributed feedback semiconductor laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60095433A JPS61253881A (en) 1985-05-07 1985-05-07 Distributed feedback semiconductor laser

Publications (1)

Publication Number Publication Date
JPS61253881A true JPS61253881A (en) 1986-11-11

Family

ID=14137558

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60095433A Pending JPS61253881A (en) 1985-05-07 1985-05-07 Distributed feedback semiconductor laser

Country Status (1)

Country Link
JP (1) JPS61253881A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63170985A (en) * 1987-01-09 1988-07-14 Hitachi Ltd Semiconductor laser element and its device
EP0613222A1 (en) * 1993-02-22 1994-08-31 Koninklijke Philips Electronics N.V. Semiconductor diode laser and method of manufacturing such a diode
US7520062B2 (en) 2005-12-06 2009-04-21 Robert Bosch Tool Corporation Light-plane projecting apparatus and lens
US10855054B2 (en) * 2017-01-19 2020-12-01 Mitsubishi Electric Corporation Semiconductor laser device and method for manufacturing semiconductor laser device
JP2021077670A (en) * 2019-11-05 2021-05-20 住友電気工業株式会社 Quantum cascade laser

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63170985A (en) * 1987-01-09 1988-07-14 Hitachi Ltd Semiconductor laser element and its device
EP0613222A1 (en) * 1993-02-22 1994-08-31 Koninklijke Philips Electronics N.V. Semiconductor diode laser and method of manufacturing such a diode
US7520062B2 (en) 2005-12-06 2009-04-21 Robert Bosch Tool Corporation Light-plane projecting apparatus and lens
US10855054B2 (en) * 2017-01-19 2020-12-01 Mitsubishi Electric Corporation Semiconductor laser device and method for manufacturing semiconductor laser device
JP2021077670A (en) * 2019-11-05 2021-05-20 住友電気工業株式会社 Quantum cascade laser

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