JPS61253399A - Device for cleaning up plating liquid - Google Patents
Device for cleaning up plating liquidInfo
- Publication number
- JPS61253399A JPS61253399A JP9646785A JP9646785A JPS61253399A JP S61253399 A JPS61253399 A JP S61253399A JP 9646785 A JP9646785 A JP 9646785A JP 9646785 A JP9646785 A JP 9646785A JP S61253399 A JPS61253399 A JP S61253399A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- plating solution
- lead electrode
- liquid
- liquid flow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は鋼板の電気メツキ液の浄化装置に関する。さら
に詳細には本発明は、鋼板の電気メツキ槽のメッキ液か
ら酸化鉛等の不純物を除去し、メッキ液を常に清浄に保
持する浄化装置に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an apparatus for purifying electroplating liquid for steel plates. More specifically, the present invention relates to a purification device that removes impurities such as lead oxide from a plating solution in a steel plate electroplating tank and keeps the plating solution clean at all times.
従来技術
鉛電極を用いたメッキ装置を添付の第4図及び第5図を
参照して説明する。A plating apparatus using a conventional lead electrode will be explained with reference to the attached FIGS. 4 and 5.
第4図は従来技術による縦型メッキ槽の模式図であり、
メッキ装置は、メッキ槽1内に対向した2組の鉛電極板
2a、 2bを縦に配置し、該メッキ槽lの上方の鋼板
3の入側に通電ロール4、メッキ槽1の内部の鉛電極板
2a、 2bの下部にジンクロール5、さらにメッキ槽
1の上方の鋼板3の出側に通電ロール6をそれぞれ配置
することにより構成される。鋼板3は通電ロール4を介
してメッキ液に入り、鉛電極2aの間を通り、該ジンク
ロール5を介して鉛電極板2b間を通過してメッキ液面
を出て、通電ロール6を介し次の工程に移送される。Figure 4 is a schematic diagram of a vertical plating tank according to the prior art.
The plating apparatus has two pairs of lead electrode plates 2a and 2b arranged vertically in a plating tank 1 facing each other, an energizing roll 4 on the entrance side of the steel plate 3 above the plating tank 1, and a lead electrode plate inside the plating tank 1. It is constructed by arranging a zinc roll 5 below the electrode plates 2a and 2b, and an energizing roll 6 on the exit side of the steel plate 3 above the plating bath 1, respectively. The steel plate 3 enters the plating solution via the current-carrying roll 4, passes between the lead electrodes 2a, passes through the zinc roll 5, passes between the lead electrode plates 2b, exits the plating liquid surface, and passes through the current-carrying roll 6. Transferred to the next process.
鋼板3は通電ロール4により陰極となり、陽極である鉛
電極2a、2b間を通過することにことによりメッキ液
内の金属イオンが電着され、メッキが行われる。The steel plate 3 becomes a cathode by the current-carrying roll 4, and metal ions in the plating solution are electrodeposited by passing between the lead electrodes 2a and 2b, which are anodes, to perform plating.
第5図は従来技術の横型メッキ槽の模式図であり、メッ
キ装置は、メッキ槽内に、1組の対向した鉛電極2と、
鋼板入側に通電ロール4、鋼板出側に通電ロール6を配
置することにより構成される。鋼板の進路、メッキの機
構については第4図に示した縦型メッキ槽を用いた場合
と同様である。FIG. 5 is a schematic diagram of a conventional horizontal plating tank, and the plating apparatus includes a pair of opposing lead electrodes 2 in the plating tank,
It is constructed by arranging an energizing roll 4 on the steel plate input side and an energizing roll 6 on the steel plate exit side. The course of the steel plate and the plating mechanism are the same as in the case of using the vertical plating tank shown in FIG. 4.
上記のメッキ装置を用いた場合、鉛電極2は、例えば、
Pb + H20→Pb O+ 2 H” + 2 e
−のように酸化され鉛酸化物の被膜を形成するが、長時
間の通電により、該鉛酸化物の被膜はしだいに厚くカサ
ブタ状となる。するとこの鉛酸化物が剥離し鋼板3とジ
ンクロール5及び通電ロール6との間にまきこまれメッ
キ層表面に押込状の疵をつくる。When using the above plating apparatus, the lead electrode 2 is, for example,
Pb + H20→Pb O+ 2 H” + 2 e
- It is oxidized to form a lead oxide film, but with long-term energization, the lead oxide film gradually becomes thick and scab-like. Then, this lead oxide peels off and gets mixed in between the steel plate 3, the zinc roll 5, and the current-carrying roll 6, creating indentation-like flaws on the surface of the plating layer.
また該カサブタ状鉛酸化物の被膜が厚くなりすぎると電
極の表面形状の変形によるメッキ効率の低下や機械的強
度の低下、鋼板と鉛電極の間に鉛酸化物がつまることに
よる短絡などがおこり、鉛電極の交換を余儀なくされる
。Furthermore, if the scab-like lead oxide film becomes too thick, the plating efficiency and mechanical strength will decrease due to deformation of the surface shape of the electrode, and short circuits will occur due to lead oxide getting stuck between the steel plate and the lead electrode. , the lead electrode had to be replaced.
以上述べたように、アノード現象により鉛電極板に発生
する鉛酸化物は、製品としてのメッキ鋼板の品質を低下
させ、鉛電極板の交換時期を早めるという2つの問題を
ひき起こす。As described above, lead oxides generated on the lead electrode plate due to the anode phenomenon cause two problems: they deteriorate the quality of the plated steel sheet as a product, and the lead electrode plate has to be replaced sooner.
発明の解決すべき問題点
本発明の目的は上記した従来技術の問題を解決すること
にあり、より詳細には電気メツキ液内の酸化鉛等の不純
物を効果的に除去し、それによる弊害のない鋼板の電気
メツキ方法を実現し、メッキ効率を向上するとともに高
品質のメッキ鋼板を提供することにある。Problems to be Solved by the Invention The purpose of the present invention is to solve the above-mentioned problems of the prior art, and more specifically, to effectively remove impurities such as lead oxide in the electroplating solution and to eliminate the harmful effects caused by the impurities. The purpose of this invention is to realize a method for electroplating steel sheets that is not available, improve plating efficiency, and provide high-quality plated steel sheets.
問題点を解決するための手段
本発明者等は、上記したような従来装置の現状に鑑みて
、酸化鉛等の不純物をメッキ液から除去し、メッキ槽内
を清浄化することが上記の問題を解決する上で極めて有
利であることを見出し、本発明を完成した。Means for Solving the Problems In view of the current state of conventional equipment as described above, the inventors of the present invention have proposed to remove impurities such as lead oxide from the plating solution and to clean the inside of the plating tank to solve the above problems. The present invention was completed based on the discovery that the present invention is extremely advantageous in solving the problem.
すなわち、本発明に従うと、メッキ槽内に鉛電極板を対
向して配置し、該鉛電極板間に鋼板を通過せしめて電気
メッキする装置において、該鉛電極板間の鋼板出側に設
けられた液流発生ノズルと、該鉛電極板間の鋼板入側に
設けられたメッキ液回収口と、一端が該メッキ液回収口
と接続され且つ他端が、前記該メッキ槽内に終端し、系
内に液送ポンプと回収したメッキ液を浄化するフィルタ
とを有する配管系と、を備えることを特徴とするメッキ
液浄化装置が提供される。That is, according to the present invention, in an apparatus for electroplating by arranging lead electrode plates facing each other in a plating tank and passing a steel plate between the lead electrode plates, the plate is provided on the exit side of the steel plate between the lead electrode plates. a plating solution recovery port provided on the inlet side of the steel plate between the lead electrode plates, one end connected to the plating solution recovery port and the other end terminating in the plating tank, A plating solution purification apparatus is provided, which includes a piping system having a liquid feed pump and a filter for purifying recovered plating solution.
上記液流発生ノズルは独自の駆動手段を備えてもよく、
或いは上記配管系のフィルタの下流部分が、該液流発生
ノズルに接続して液流が該鉛電極板間の鋼板出側から入
側に発生するように構成してもよい。The liquid flow generating nozzle may be provided with its own driving means,
Alternatively, the downstream portion of the filter in the piping system may be connected to the liquid flow generating nozzle so that the liquid flow is generated from the outlet side of the steel plate between the lead electrode plates to the inlet side.
さらに本発明の好ましい態様に従うと、上記のメッキ液
回収口と液流発生ノズルは強化プラスチックであり、上
記配管系は樹脂製配管または内面が樹脂で被覆された配
管である。Further, according to a preferred embodiment of the present invention, the plating liquid recovery port and the liquid flow generating nozzle are made of reinforced plastic, and the piping system is a resin piping or a piping whose inner surface is coated with resin.
作用 次に本発明の装置の作用を説明する。action Next, the operation of the device of the present invention will be explained.
本発明による浄化装置を備えた電気メツキ槽においては
、液流発生ノズルによって鋼板の出側から入側に向けて
液流が発生する。一方、該鉛電極板表面上に形成された
鉛酸化物はこのような液流によって剥離し易くなり、剥
離した鉛酸化物は、上記液流により電極板間の鋼板入側
に設けたメッキ液回収口へと運ばれ、メッキ液とともに
該メッキ液回収口へ吸入される。吸入された鉛酸化物を
含むメッキ液は、メッキ液回収口に連結した配管系内の
フィルタにより鉛酸化物等の不純物を除去され、かくし
て浄化されたメッキ液は液送ポンプによりメッキ槽へと
もどされる。In an electroplating tank equipped with a purification device according to the present invention, a liquid flow is generated from the outlet side of the steel plate toward the input side by the liquid flow generating nozzle. On the other hand, the lead oxide formed on the surface of the lead electrode plate is easily peeled off by this liquid flow, and the peeled lead oxide is removed by the plating liquid provided on the entrance side of the steel plate between the electrode plates. It is carried to the recovery port and sucked into the plating solution recovery port along with the plating solution. Impurities such as lead oxide are removed from the inhaled plating solution containing lead oxide by a filter in the piping system connected to the plating solution recovery port, and the thus purified plating solution is sent to the plating tank by a solution pump. It will be returned.
このようなメッキ液の清浄化が電気メツキ中に継続して
或いは断続して行われるので、メッキ液から酸化鉛等の
不純物が除去されるとともに、液流発生ノズルによって
電極板表面上に形成された鉛酸化物の層が剥離され、メ
ッキ液のみならず電極板も清浄に保持される。Since such cleaning of the plating solution is performed continuously or intermittently during electroplating, impurities such as lead oxide are removed from the plating solution, and impurities formed on the surface of the electrode plate by the liquid flow generating nozzle are removed. The lead oxide layer is peeled off, keeping not only the plating solution but also the electrode plate clean.
実施例
以下に、本発明を添付の図面を参照して実施例により説
明する。なお、これらの実施例は本発明の単なる例示で
あり、本発明の技術的範囲をなんら制限するものではな
い。EXAMPLES The invention will now be explained by way of examples with reference to the accompanying drawings. Note that these Examples are merely illustrative of the present invention, and do not limit the technical scope of the present invention in any way.
第1図は縦型メッキ槽に本発明の浄化装置を適用した1
例を示している。Figure 1 shows a case in which the purification device of the present invention is applied to a vertical plating tank.
An example is shown.
すなわち、この縦型メッキ槽は、メッキ槽1内に対向し
た2組の鉛電極板2a、2bを縦に配置し、該メッキ槽
1の上方の鋼板入側に通電ロール4、メッキ槽1内の鉛
電極板2a、 2bの下部にジンクロール5、該メッキ
槽の上方の鋼板の出側に通電ロール6、鉛電極板2a、
2bの間の鋼板の出側に液流発生ノズル7、鉛電極板
2a、 2bの間の鋼板の入側にメッキ液回収口8とを
備える。該メッキ液回収口8は、一端がメッキ槽1内に
終端し、系内に液送ポツプ9とフィルタ11を有する配
管系10の他端に接続している。一方、本実施例では、
液流発生ノズル7は独自の液流発生手段を備えている。That is, in this vertical plating tank, two sets of lead electrode plates 2a and 2b facing each other are arranged vertically in the plating tank 1, and a current-carrying roll 4 is placed on the steel plate entry side above the plating tank 1, and A zinc roll 5 is placed at the bottom of the lead electrode plates 2a and 2b, an energizing roll 6 is placed on the exit side of the steel plate above the plating bath, and a lead electrode plate 2a,
A liquid flow generating nozzle 7 is provided on the outlet side of the steel plate between the lead electrode plates 2a and 2b, and a plating liquid recovery port 8 is provided on the inlet side of the steel plate between the lead electrode plates 2a and 2b. One end of the plating solution recovery port 8 terminates in the plating tank 1 and is connected to the other end of a piping system 10 having a solution feed pop 9 and a filter 11 in the system. On the other hand, in this example,
The liquid flow generation nozzle 7 is equipped with its own liquid flow generation means.
第2図(a)は液流発生ノズル7の1例の詳細図である
。液流ノズル7は平型の開口部12を備え、開口部12
は配管13から送給されるメッキ液を吐出して液流を発
生する。FIG. 2(a) is a detailed view of one example of the liquid flow generating nozzle 7. The liquid flow nozzle 7 has a flat opening 12 .
discharges the plating liquid fed from the pipe 13 to generate a liquid flow.
第2図(ハ)はメッキ液回収口8の1例の詳細図である
。図示の如く、メッキ液回収口は半円筒形をなし、配管
系10に接続している。吸引口は、図示例では下面であ
り、図示されていない。この吸引口よりメッキ液が吸引
され、配管系10に回収される。FIG. 2(c) is a detailed view of one example of the plating solution recovery port 8. As shown in the figure, the plating solution recovery port has a semi-cylindrical shape and is connected to the piping system 10. The suction port is on the bottom surface in the illustrated example and is not shown. The plating solution is sucked through this suction port and collected into the piping system 10.
第1図に示すメッキ液浄化装置の作用を説明すると、2
組の液流発生ノズル7はそれぞれ鉛電極板2a、2bの
間にメッキ液流を鋼板3の移動と対向する方向で発生す
る。このメッキ液流に剥離した鉛酸化物が帯同され、或
いはメッキ液流によって鉛電極板2a、2b上の鉛酸化
物が剥離され、メッキ液回収口8により回収される。回
収されたメッキ液は、液送ポンプ9により配管系10内
を移動し、フィルタ11によりメッキ液から鉛酸化物等
の不純物が除去される。このようにして浄化されたメッ
キ液は配管系10によりメッキ槽1内に戻される。To explain the operation of the plating solution purification device shown in FIG.
Each of the sets of liquid flow generating nozzles 7 generates a plating liquid flow between the lead electrode plates 2a and 2b in a direction opposite to the movement of the steel plate 3. The peeled lead oxide is entrained in this plating liquid flow, or the lead oxide on the lead electrode plates 2a, 2b is peeled off by the plating liquid flow and is recovered through the plating liquid recovery port 8. The recovered plating solution is moved through a piping system 10 by a liquid feed pump 9, and impurities such as lead oxides are removed from the plating solution by a filter 11. The plating solution thus purified is returned into the plating tank 1 through the piping system 10.
従って、メッキ槽1内のメッキ液は鉛電極板2a。Therefore, the plating solution in the plating bath 1 is the lead electrode plate 2a.
2bの極板間で常に回収、浄化され、鉛酸化物が発生し
ても直ちにメッキ液或いは鉛電極板表面上から除去され
る。It is constantly collected and purified between the electrode plates 2b, and even if lead oxide is generated, it is immediately removed from the plating solution or from the surface of the lead electrode plate.
第3図は、横型メッキ槽に適用した本発明の別の態様を
示している。この横型メッキ槽は、メッキ槽内に対向し
た鉛電極板2を設け、該鉛電極板間の鋼板3の入側に通
電ロール4、該鉛電極板間の該鋼板3の出側に通電ロー
ル6をそれぞれ設けた従来型の横型メッキ装置である。FIG. 3 shows another embodiment of the present invention applied to a horizontal plating tank. This horizontal plating tank has lead electrode plates 2 facing each other in the plating tank, an energizing roll 4 on the inlet side of the steel plate 3 between the lead electrode plates, and an energizing roll on the outlet side of the steel plate 3 between the lead electrode plates. This is a conventional horizontal plating device equipped with 6.
このメッキ装置に、本発明に従い、鉛電極板2の鋼板3
の出側に液流発生ノズル7と、鉛電極板2の鋼板3の入
側にメッキ液回収口8とを設ける。該メッキ液回収口8
は配管系10と接続される。In this plating apparatus, according to the present invention, a steel plate 3 of a lead electrode plate 2 is provided.
A liquid flow generating nozzle 7 is provided on the outlet side of the lead electrode plate 2, and a plating liquid recovery port 8 is provided on the inlet side of the steel plate 3 of the lead electrode plate 2. The plating solution recovery port 8
is connected to the piping system 10.
配管系10には、フィルタ11と液送ポンプ9とが設け
られ、液流発生ノズル7に終端している。従って、液流
発生ノズル7は独自の駆動手段をもたず、配管系10内
の液送ポンプ9により、その開口部から浄化されたメッ
キ液を吐出し、液流を発生する。このようにして、液流
発生ノズル7からの液流は、液送ポンプ9によって発生
されたものでメッキ液は液送ポンプ9、液流発生ノズル
7、メッキ液回収口8、フィルタ11、液送ポンプ9の
ように循環し、清浄化される。、
発明の詳細
な説明したように、本発明のメッキ液浄化装置によって
、常時メッキ液および鉛電極板表面の清浄化が達成され
る。このため本発明のメッキ液浄化装置を備えた電気メ
ツキ装置では高品質のメッキ鋼板が得られ、さらに鉛電
極板の耐用期間を長くすることができる。The piping system 10 is provided with a filter 11 and a liquid feed pump 9, and terminates at the liquid flow generating nozzle 7. Therefore, the liquid flow generating nozzle 7 does not have its own driving means, and the liquid feed pump 9 in the piping system 10 discharges purified plating liquid from its opening to generate a liquid flow. In this way, the liquid flow from the liquid flow generation nozzle 7 is generated by the liquid feed pump 9, and the plating liquid is transferred to the liquid feed pump 9, the liquid flow generation nozzle 7, the plating liquid recovery port 8, the filter 11, and the plating liquid. It is circulated and cleaned like the feed pump 9. As described in detail, the plating solution purifying apparatus of the present invention can constantly clean the plating solution and the surface of the lead electrode plate. Therefore, in the electroplating apparatus equipped with the plating solution purification apparatus of the present invention, high-quality plated steel sheets can be obtained, and the service life of the lead electrode plates can be extended.
第1図は、縦型メッキ装置に本発明のメッキ液浄化装置
を適用した1例を示し、
第2図(a)は液流発生ノズルの詳細図であり、第2図
(ハ)はメッキ液回収口の詳細図であり、第3図は、横
型メッキ装置に本発明のメッキ液浄化装置を適用した1
例を示し、
第4図、第5図は、それぞれ従来の縦型メッキ槽を持つ
メッキ装置、横型メッキ槽を持つメッキ装置を示す。
(主な参照番号)Fig. 1 shows an example of applying the plating liquid purification device of the present invention to a vertical plating apparatus, Fig. 2(a) is a detailed view of the liquid flow generating nozzle, and Fig. 2(c) is a plating solution purifying device of the present invention. FIG. 3 is a detailed view of the liquid recovery port, and FIG.
As an example, FIGS. 4 and 5 show a conventional plating apparatus having a vertical plating tank and a plating apparatus having a horizontal plating tank, respectively. (main reference number)
Claims (5)
極板間に鋼板を通過せしめて電気メッキする装置におい
て、該鉛電極板間の鋼板出側に設けられた液流発生ノズ
ルと、該鉛電極板間の鋼板入側に設けられたメッキ液回
収口と、一端が該メッキ液回収口に接続され且つ他端が
、前記メッキ槽内に終端し、系内に液送ポンプと回収し
たメッキ液を浄化するフィルタとを有する配管系と、を
備えることを特徴とするメッキ液浄化装置。(1) In an apparatus for electroplating by arranging lead electrode plates facing each other in a plating tank and passing a steel plate between the lead electrode plates, a liquid flow generator is provided on the outlet side of the steel plate between the lead electrode plates. A nozzle, a plating solution recovery port provided on the steel plate inlet side between the lead electrode plates, one end connected to the plating solution recovery port, and the other end terminated in the plating tank and supplying the solution into the system. A plating solution purification device comprising: a pump and a piping system having a filter for purifying recovered plating solution.
を特徴とする特許請求の範囲第1項記載のメッキ液浄化
装置。(2) The plating liquid purifying device according to claim 1, wherein the liquid flow generating nozzle is provided with its own driving means.
続することを特徴とする特許請求の範囲第1項記載のメ
ッキ液浄化装置。(3) The plating liquid purification device according to claim 1, wherein the liquid discharge portion of the piping system is connected to the liquid flow generating nozzle.
スチックであることを特徴とする特許請求の範囲第1項
乃至第3項のいずれかに記載のメッキ液浄化装置。(4) The plating solution purification device according to any one of claims 1 to 3, wherein the plating solution recovery port and the solution flow generating nozzle are made of reinforced plastic.
された配管であることを特徴とする特許請求の範囲第1
項乃至第4項のいずれかに記載のメッキ液浄化装置。(5) Claim 1, wherein the piping system is a resin piping or a piping whose inner surface is coated with resin.
The plating solution purification device according to any one of items 1 to 4.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9646785A JPS61253399A (en) | 1985-05-07 | 1985-05-07 | Device for cleaning up plating liquid |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9646785A JPS61253399A (en) | 1985-05-07 | 1985-05-07 | Device for cleaning up plating liquid |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61253399A true JPS61253399A (en) | 1986-11-11 |
Family
ID=14165836
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9646785A Pending JPS61253399A (en) | 1985-05-07 | 1985-05-07 | Device for cleaning up plating liquid |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61253399A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01129990A (en) * | 1987-11-13 | 1989-05-23 | Fujitsu Ltd | Apparatus for plating gold for fine pattern |
JPH0314157U (en) * | 1989-06-22 | 1991-02-13 | ||
JPH0476051U (en) * | 1990-11-16 | 1992-07-02 |
-
1985
- 1985-05-07 JP JP9646785A patent/JPS61253399A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01129990A (en) * | 1987-11-13 | 1989-05-23 | Fujitsu Ltd | Apparatus for plating gold for fine pattern |
JPH0314157U (en) * | 1989-06-22 | 1991-02-13 | ||
JPH0476051U (en) * | 1990-11-16 | 1992-07-02 |
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