JPS61251025A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPS61251025A
JPS61251025A JP60090892A JP9089285A JPS61251025A JP S61251025 A JPS61251025 A JP S61251025A JP 60090892 A JP60090892 A JP 60090892A JP 9089285 A JP9089285 A JP 9089285A JP S61251025 A JPS61251025 A JP S61251025A
Authority
JP
Japan
Prior art keywords
stage
mask
substrate
scanning
original plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60090892A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0515054B2 (enrdf_load_stackoverflow
Inventor
Junji Isohata
磯端　純二
Koichi Matsushita
松下　光一
Sekinori Yamamoto
山本　碩徳
Makoto Miyazaki
真 宮崎
Kunitaka Ozawa
小沢　邦貴
Hideki Yoshinari
吉成　秀樹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60090892A priority Critical patent/JPS61251025A/ja
Publication of JPS61251025A publication Critical patent/JPS61251025A/ja
Publication of JPH0515054B2 publication Critical patent/JPH0515054B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60090892A 1985-04-30 1985-04-30 投影露光装置 Granted JPS61251025A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60090892A JPS61251025A (ja) 1985-04-30 1985-04-30 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60090892A JPS61251025A (ja) 1985-04-30 1985-04-30 投影露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP6309424A Division JP2670984B2 (ja) 1994-11-21 1994-11-21 デバイス製造方法

Publications (2)

Publication Number Publication Date
JPS61251025A true JPS61251025A (ja) 1986-11-08
JPH0515054B2 JPH0515054B2 (enrdf_load_stackoverflow) 1993-02-26

Family

ID=14011059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60090892A Granted JPS61251025A (ja) 1985-04-30 1985-04-30 投影露光装置

Country Status (1)

Country Link
JP (1) JPS61251025A (enrdf_load_stackoverflow)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63128713A (ja) * 1986-11-19 1988-06-01 Matsushita Electric Ind Co Ltd 走査型露光装置のデイスト−シヨン補正方法
JPH03179723A (ja) * 1989-12-07 1991-08-05 Matsushita Electric Ind Co Ltd 投影露光装置
US5581605A (en) * 1993-02-10 1996-12-03 Nikon Corporation Optical element, production method of optical element, optical system, and optical apparatus
US5640284A (en) * 1992-09-11 1997-06-17 Nikon Corporation Optical reflector, illumination optical system, light source system and illumination optical apparatus
US5796469A (en) * 1993-06-30 1998-08-18 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method using the same
USRE37391E1 (en) 1991-03-06 2001-09-25 Nikon Corporation Exposure method and projection exposure apparatus
KR100492278B1 (ko) * 1996-07-05 2005-08-31 가부시키가이샤 니콘 투영노광장치
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
WO2019184992A1 (zh) * 2018-03-30 2019-10-03 上海微电子装备（集团）股份有限公司 运动控制装置、运动控制方法、掩模台系统和光刻机

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5021232A (enrdf_load_stackoverflow) * 1973-06-28 1975-03-06
JPS53124417A (en) * 1977-03-26 1978-10-30 Hitachi Shipbuilding Eng Co Method of scanning models and its system
JPS56111218A (en) * 1980-01-07 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Projection and exposuring device
JPS5835547A (ja) * 1981-08-27 1983-03-02 Canon Inc 像形成装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5021232A (enrdf_load_stackoverflow) * 1973-06-28 1975-03-06
JPS53124417A (en) * 1977-03-26 1978-10-30 Hitachi Shipbuilding Eng Co Method of scanning models and its system
JPS56111218A (en) * 1980-01-07 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Projection and exposuring device
JPS5835547A (ja) * 1981-08-27 1983-03-02 Canon Inc 像形成装置

Cited By (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63128713A (ja) * 1986-11-19 1988-06-01 Matsushita Electric Ind Co Ltd 走査型露光装置のデイスト−シヨン補正方法
JPH03179723A (ja) * 1989-12-07 1991-08-05 Matsushita Electric Ind Co Ltd 投影露光装置
USRE37391E1 (en) 1991-03-06 2001-09-25 Nikon Corporation Exposure method and projection exposure apparatus
USRE37913E1 (en) 1991-03-06 2002-11-26 Nikon Corporation Exposure method and projection exposure apparatus
USRE37946E1 (en) 1991-03-06 2002-12-31 Nikon Corporation Exposure method and projection exposure apparatus
USRE38038E1 (en) 1991-03-06 2003-03-18 Nikon Corporation Exposure method and projection exposure apparatus
USRE38085E1 (en) 1991-03-06 2003-04-22 Nikon Corporation Exposure method and projection exposure apparatus
US5640284A (en) * 1992-09-11 1997-06-17 Nikon Corporation Optical reflector, illumination optical system, light source system and illumination optical apparatus
US5581605A (en) * 1993-02-10 1996-12-03 Nikon Corporation Optical element, production method of optical element, optical system, and optical apparatus
US5796469A (en) * 1993-06-30 1998-08-18 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method using the same
KR100492278B1 (ko) * 1996-07-05 2005-08-31 가부시키가이샤 니콘 투영노광장치
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9429851B2 (en) 2005-05-12 2016-08-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9360763B2 (en) 2005-05-12 2016-06-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
WO2019184992A1 (zh) * 2018-03-30 2019-10-03 上海微电子装备（集团）股份有限公司 运动控制装置、运动控制方法、掩模台系统和光刻机

Also Published As

Publication number Publication date
JPH0515054B2 (enrdf_load_stackoverflow) 1993-02-26

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term