JPS61250198A - Production of chrome plated steel sheet having excellent adhesiveness to paint - Google Patents

Production of chrome plated steel sheet having excellent adhesiveness to paint

Info

Publication number
JPS61250198A
JPS61250198A JP9146585A JP9146585A JPS61250198A JP S61250198 A JPS61250198 A JP S61250198A JP 9146585 A JP9146585 A JP 9146585A JP 9146585 A JP9146585 A JP 9146585A JP S61250198 A JPS61250198 A JP S61250198A
Authority
JP
Japan
Prior art keywords
oxide film
treatment
chromium oxide
steel sheet
chromium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9146585A
Other languages
Japanese (ja)
Inventor
Kousuke Kashiwada
柏田 耿介
Toshio Matsushita
松下 登志雄
Shigeru Naito
茂 内藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP9146585A priority Critical patent/JPS61250198A/en
Publication of JPS61250198A publication Critical patent/JPS61250198A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To produce a chrome plated steel sheet having excellent adhesiveness to a paint by executing an anodic treatment in succession of a cathodic treatment under specific conditions in a dip washing stage which is an intermediate stage between a plater part and a chemical part. CONSTITUTION:The steel sheet is subjected to the cathodic electrolytic treatment in an aq. soln. (plater part) consisting essentially of a chromic anhydride to deposit mainly metallic chromium. The steel sheet is then subjected to the cathodic treatment at 5-20A/dm<2> current density and >=1C/dm<2> current conduction rate to make uniform the ununiform chromium oxide film on the surface of the steel sheet in the dip washing stage (drag out) in which 20-100g/l chromic anhydride is made to exist. The steel sheet is further subjected to the anodic treatment at 2-10A/dm<2> current density and 0.2-5C/dm<2> current conduction rate in the same bath to uniformly dissolve away the chromium oxide film. The chromium oxide film is thereafter deposited thereon by the cathodic electrolytic treatment in an electrolyte (chemical part) in which 20-200g/l chromic anhydride and 0.05-3g/l material such as ammonium fluoride and sodium fluoride for forming F<-> ions in terms of fluorine are made to exist.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はクロムめっき鋼板、特に接着缶用素材として耐
レトルト性に優れたクロムめっき鋼板の製造法に関する
ものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for producing a chromium-plated steel sheet, particularly a chromium-plated steel sheet with excellent retort resistance as a material for adhesive cans.

〔従来の技術と問題点〕[Conventional technology and problems]

ブリキに替る新しい缶用素材として開発されにクロムめ
っき鋼板は、表面が金属クロムとクロム酸化膜からなる
ことから溶接性、半田性に問題があシ、開発当初は天地
板、雑缶に使用されたに過ぎなかった。その後接着法の
進歩に伴ない樹脂による製胴技術が確立し、ビール、炭
酸飲料などのコール?/Rツクに、ついで果汁などのホ
ラトノぐツク、さらに近時にはコーヒーなどの高温殺菌
を必要とする所謂レトルト缶にも使用されるようになっ
てきた。しかるにホットパック、レトルトに使用される
に至シ接着缶の製胴部が破網するというトラブルが生じ
るようになった。
Developed as a new material for cans to replace tinplate, chromium-plated steel sheets had problems with weldability and solderability because the surface was made of metallic chromium and a chromium oxide film, and when they were first developed, they were used for top and bottom plates and miscellaneous cans. It was just a matter of time. Later, with the advancement of adhesive methods, resin body making technology was established, and beer, carbonated drinks, etc. /R-tsuku, then it has come to be used for so-called retort cans, which require high-temperature sterilization of coffee and other products. However, when the cans were used for hot packs and retorts, problems began to occur in which the bodies of adhesive cans broke.

クロムめっき鋼板は上述した様に下層が金属りロム、上
層がクロム酸化膜の二層構造から成っておシ製胴の場合
の接着界面はクロム酸化膜と樹脂である。
As mentioned above, the chromium-plated steel plate has a two-layer structure with the lower layer being metal (Rom) and the upper layer being a chromium oxide film, and in the case of a steel body, the bonding interface is between the chromium oxide film and the resin.

破網はこのクロム酸化膜と樹脂との界面で生じておりク
ロム酸化膜の特性がホラトノにツク拳レトルトの破網性
C耐レトルトa)に影響を及ぼしている。このクロム酸
化膜の耐レトルト性に対しては、既に知られているよう
に、 (1)  クロム酸化膜中に共析する硫酸根が少な−こ
と。
The network breakage occurs at the interface between this chromium oxide film and the resin, and the characteristics of the chromium oxide film have a significant effect on the network breakability C retort resistance a) of the Tsukken retort. As is already known, the retort resistance of this chromium oxide film is due to: (1) Fewer sulfate groups eutectoid in the chromium oxide film.

(2)クロム酸化膜のオキフ化度(りaム酸化膜中の0
r−0−Or結合に対するOr −0−Or結合の割合
)が高いこと。
(2) Degree of oxidation of chromium oxide film (0 in chromium oxide film)
The ratio of Or -0-Or bonds to r-0-Or bonds) is high.

(3)  クロム酸化膜の量がある程度確保されさらに
均一であること。
(3) The amount of chromium oxide film must be maintained to a certain extent and be uniform.

以上3点を確実に満足することにある。The goal is to ensure that the above three points are satisfied.

クロム酸化膜中に共析する硫酸根を低減する丸めに1例
えば、特開昭57−35699号公報に記載された如く
、ケミカル部(クロム酸化膜を析出させる工程)におい
て硫酸11度を0.3P/#以下に規制することが提案
されている。この発明は、耐しトル1.の改善に有効で
あるが以下の点に問題がある。通常プレーター部(金属
クロムを主として析出させる工程)においてプレーター
浴は金属クロムの析出効率の関係上硫酸添加浴であり。
To reduce the amount of sulfuric acid radicals eutectoid in the chromium oxide film, for example, as described in Japanese Patent Application Laid-Open No. 57-35699, 11% sulfuric acid is added to 0.0% in the chemical part (step of depositing the chromium oxide film). It has been proposed to regulate it to 3P/# or less. This invention has the following features: 1. Although it is effective in improving the situation, it has the following problems. Usually, the plater bath in the plater section (a step in which metallic chromium is mainly deposited) is a sulfuric acid-added bath due to the efficiency of metallic chromium precipitation.

シレータ一部で析出しtクロム酸化膜は硫酸イオンを含
有しておシ、2ラツグアウト(浸漬水洗工程)での水洗
だけではこのシレータ一部で析出するクロム酸化膜を充
分に除去しえない。従ってケミカル部で硫酸濃度を規制
しても既に硫酸根を含有したクロム酸化膜が存在してお
り硫酸根の低減化には不充分である。
The chromium oxide film precipitated on a portion of the silator contains sulfate ions, and the chromium oxide film precipitated on a portion of the silator cannot be sufficiently removed by washing with water in the second lug-out (immersion water washing process). Therefore, even if the sulfuric acid concentration is controlled in the chemical part, a chromium oxide film containing sulfate radicals already exists, and it is insufficient to reduce the sulfuric acid radicals.

この問題の解決の九め例えば、特開昭57−17799
8号公報、特開昭58−177491号公報、特開昭5
9−74297号公報に記載されたごとく、プレーター
部最終で逆電解を施す方法や%また特開昭56−169
796号公報、特開昭57−194295号公報に記載
されたごとぐ、ツレ−タ一部とケミカル部の中間におい
て特定の溶液中で陽極処理単独或いは陰極処理単独など
を行う方法が提案されている。
The ninth solution to this problem, for example,
No. 8, JP-A-58-177491, JP-A-Sho 5
As described in Japanese Patent Application Laid-open No. 9-74297, a method of applying reverse electrolysis at the final portion of the plater,
As described in Japanese Patent Laid-open No. 796 and Japanese Patent Application Laid-open No. 57-194295, a method has been proposed in which anodic treatment alone or cathode treatment alone is performed in a specific solution between a part of the collector and a chemical part. There is.

上記提案は、プレーター部にて析出したクロム酸化膜の
除去、つまシ、クロム酸化膜中の硫酸根の低減化には効
果があり耐レトルト性の改参において極めて有効fある
が、上記3条件を確実に満足するには不充分であること
がわかった。
The above proposal is effective in removing the chromium oxide film deposited on the plater portion, reducing the sulfuric acid radicals in the chromium oxide film, and is extremely effective in improving retort resistance, but under the above three conditions. It was found that this was insufficient to reliably satisfy the requirements.

例えば、特開昭57−177998号公報#特開昭58
−177491号公報に記載された如く、プレーター部
最終での逆電解(陽極処理)方法は以下の点に問題があ
る。つまり、プレークー浴は高濃度のクロム酸及びアニ
オンを含むためクロム酸化膜に対する化学溶解性が高い
。このためプレーター部で析出するクロム酸化膜はその
残存付着量が必ずしも均一ではない、この状態のまま同
シレータ一部で逆電解処理を施すと、電解条件が強すぎ
る場合は、クロム酸化膜は確実に除去しえるがクロム酸
化膜の薄い箇所は金属クロムの溶出まで至り、金属クロ
ムの表面不均一化を生じる。金属クロムの不均一化を防
ぐため電解条件を弱くするとクロム酸化膜の厚い箇所は
りaム酸化膜の溶解除去が確実にできずプレーター部で
析出するクロム酸化膜の残存及びクロム酸化膜の不均一
化を生じる。前者の場合次工程のケばカル部における処
理においてクロム酸化膜の不拘−化、オキサイPムラの
発生を生じることがあシ%ま友後者では、シレータ一部
で析出するクロム酸化膜が充分除去しえずクロム酸化膜
中の硫酸根の低減化が困難である。
For example, JP-A-57-177998 #JP-A-58
As described in Japanese Patent No. 177491, the reverse electrolysis (anodic treatment) method at the end of the plater section has the following problems. In other words, since the pre-cooling bath contains high concentrations of chromic acid and anions, it has high chemical solubility for the chromium oxide film. For this reason, the remaining amount of the chromium oxide film deposited on the plater part is not necessarily uniform.If reverse electrolysis treatment is performed on a part of the same silator in this state, if the electrolytic conditions are too strong, the chromium oxide film will definitely be removed. Although the chromium oxide film can be removed quickly, the thin parts of the chromium oxide film reach the point where metallic chromium is leached out, causing the surface of the metallic chromium to become non-uniform. If the electrolytic conditions are weakened to prevent unevenness of metal chromium, the thick chromium oxide film cannot be reliably dissolved and removed, resulting in residual chromium oxide film precipitated at plater parts and non-uniformity of the chromium oxide film. cause In the former case, the chromium oxide film may become unrestrained in the treatment of the keratinized part in the next process, causing unevenness of oxide P. In the latter case, the chromium oxide film precipitated on a part of the silator is sufficiently removed. However, it is difficult to reduce the sulfate radicals in the chromium oxide film.

この対策として2例えば特開昭59−74296号公報
に記載されたごとく、プレーター部最終での逆電解の電
流密度、電気量を規制する提案がなされているが、いず
れにしてもプレーター部で析出したクロム酸化膜は不均
一な状態のままであり、陽極処理後の表面の不均一化は
まぬがれず充分でない。
As a countermeasure against this, 2 proposals have been made to regulate the current density and quantity of electricity of the reverse electrolysis at the end of the plater part, as described in JP-A No. 59-74296, but in any case, precipitation occurs in the plater part. The resulting chromium oxide film remains in a non-uniform state, and the surface becomes non-uniform after anodizing.

tた、例えば特開昭56−169796号公報特開昭5
7−194295号公報に記載された如(1プレ一タ一
部とケミカル部の中間工程の特定浴〈おいて陽極処理単
独或いは陰極処理単独などを行なう提案も、上記と同様
の理由により不充分である。
For example, JP-A-56-169796;
7-194295 (proposal of carrying out only anodic treatment or only cathodic treatment in a specific bath in the intermediate process between one part of one pre-unit and the chemical part) is also insufficient for the same reason as above. It is.

〔発明の目的〕[Purpose of the invention]

本発明は、繭記の課題解決を計ってなされ友もので、ホ
ラトノぞツクおよびレトルト処理下でも塗料缶7iF性
に優れたクロムめっき鋼板の製造方法を提供することを
目的とする。
The present invention was made with the aim of solving the above problems, and an object of the present invention is to provide a method for producing a chromium-plated steel sheet that exhibits excellent paint can 7iF properties even under hollow and retort treatments.

〔問題点を解艇するための手段〕[Means for solving problems]

上記目的を達成するための本発明の要旨は、無水クロム
酸を主とじt水溶液中(プレーター部)で鋼板を陰極電
解処理にLカ主に金属クロムを析出せしめ、 次いで、無水クロム酸20〜100 ?/Zを存在せし
めた浸漬水洗の工程(Pラッグアウト)t/cおいて電
流密度5〜20 k/dW?、通電t1クーロン/dt
r? 以上の陰極処理を行ない引続き同浴中で電流密度
2〜10 k/dtr? 、通電量0.2〜5クーロン
/ dm”の陽極処理を行ない、 次いで、無水クロム酸20〜200 F//l及び弗化
アンモニ9ム、弗化ナトリウムなどF−イオンを生成す
る物質を弗素量として0.05〜3 ’t/I。
The gist of the present invention to achieve the above object is to precipitate mainly metallic chromium by cathodic electrolyzing a steel plate in an aqueous solution (plater part) with chromic anhydride, and then precipitate mainly metallic chromium with chromic anhydride. 100? Is the current density 5 to 20 k/dW at t/c of the immersion washing process (P lug out) with /Z present? , energizing t1 coulomb/dt
r? After performing the above cathodic treatment, the current density is 2 to 10 k/dtr in the same bath. , conduct anodization with a current flow of 0.2 to 5 coulombs/dm", and then chromic anhydride 20 to 200 F//l and a substance that generates F- ions, such as ammonium fluoride and sodium fluoride, to fluorine. 0.05-3't/I as an amount.

存在せしめ友電解液中(ケミカル部)で陰極電解処理に
19クロム酸化膜を析出せしめることを特徴とする塗料
缶N性に優れ次クロムめっき鋼板の製造法である。
This is a method for producing a chromium-plated steel sheet with excellent N properties for paints, which is characterized by depositing a 19-chromium oxide film in a cathodic electrolytic treatment in an electrolytic solution (chemical part).

〔間I[1に解決する次めの苧段〕 本発明者らは、上記問題点を鑑み種々検討を重ねた結果
、上記3条件を生産性を損なうことなく解決し、耐レト
ルト性に優れたクロムめっき鋼板の製造方法を見出すに
至つ九ものである。
[Interval I [Next stage to be solved in 1] As a result of various studies in view of the above problems, the present inventors have solved the above three conditions without impairing productivity and have excellent retort resistance. These nine methods led to the discovery of a method for manufacturing chromium-plated steel sheets.

以下に本発明をさらに・詳細に説明する。The present invention will be explained in further detail below.

まず、本発明の最大の骨子とするところは、シレータ一
部とケミカル部の中間工程の浸漬水洗工程(Pラッグア
クト)において陰極処理引続き陽極処理を行なうことに
ある。この浸漬水洗でまず陰極処理を行なう理由は、引
続き行なう陽極処理においてクロム酸化膜を均一に溶解
除去させる九めに、プレーグ−浴で析出している表面不
均一なりロム酸化膜を修復し、均一なりロム酸化!l!
lt−得ることにある。先に述べ皮様にプレーター浴は
高クロム酸濃度でアニオンを多く含むためクロム酸化膜
の溶解性がある。このためプレーター部後のクロム酸化
膜は不均一でありクロム酸化膜が不均一な状態で陽極処
理を施すと、クロム酸化膜の不均一性を助長することが
あるし、又、金属クロム表面の均一性に影響を及ぼすこ
とがあり、次工程のケミカルでクロム酸化膜の不均一は
析出ひいては耐レトルト性の劣化を生じることがある。
First, the main point of the present invention is to perform cathodic treatment followed by anodic treatment in the immersion water washing step (P rag act) which is an intermediate step between the silator part and the chemical part. The reason why cathodic treatment is performed first in this immersion water washing is that in order to uniformly dissolve and remove the chromium oxide film in the subsequent anodic treatment, the surface unevenness or chromium oxide film deposited in the plague bath can be repaired and the chromium oxide film can be uniformly removed. Nari ROM oxidation! l!
lt- to obtain. As mentioned earlier, the Plater bath has a high chromic acid concentration and contains many anions, so the chromium oxide film is soluble. For this reason, the chromium oxide film after the plater part is non-uniform, and if anodization is performed when the chromium oxide film is non-uniform, the non-uniformity of the chromium oxide film may be promoted. Uniformity may be affected, and non-uniformity of the chromium oxide film may be precipitated by chemicals in the next process, resulting in deterioration of retort resistance.

Pラックアウトはプレーター部に比ベクロム酸の濃度は
低いしまた含有アニオン量も少なくクロム酸化膜への化
学溶解性は小さい。そこでとのρラックアウトにおいて
まず陰極処理t−施しクロム酸化膜の修復を図る。次い
で陽極処理を行う理由は、硫酸根含有のクロム酸化膜を
溶解除去せしめることにある。上記浸漬水洗工程におい
て陰極処理引続き陽極処理を行うことにより、均一にプ
レーター部で析出するクロム酸化膜を除去することが可
能となる。
In P rackout, the concentration of bechromic acid is lower than that in the plater part, and the amount of anions contained is also small, so the chemical solubility in the chromium oxide film is low. Then, in the ρ rack-out, cathodic treatment is first performed to repair the chromium oxide film. The reason for performing the anodization next is to dissolve and remove the chromium oxide film containing sulfate radicals. By performing cathodic treatment followed by anodic treatment in the immersion washing step, it becomes possible to uniformly remove the chromium oxide film deposited on the plater portion.

水洗浸漬に用いる無水クロム酸溶液の濃度は20〜10
0 g/lが適当である。すなわち20P / 7未満
では、溶液の電気抵抗が大きく電解処理時に浴電圧が大
になり電力の浪費となる。またi o o t7t>超
では、クロム酸化膜に対する溶解性が大になり陰極処理
時でのクロム酸化膜の不均一化を生じることがある。
The concentration of the anhydrous chromic acid solution used for water washing and dipping is 20 to 10
0 g/l is suitable. That is, if it is less than 20P/7, the electrical resistance of the solution is large, and the bath voltage becomes large during electrolytic treatment, resulting in wasted power. Moreover, when i o o t7t>exceeds, the solubility of the chromium oxide film increases, which may cause non-uniformity of the chromium oxide film during cathodic treatment.

さらに陰極電解の処理条件は、電流密度5〜20kld
& 、通電量10/d−以上が適当である。電流密度5
A/d−未満ではプレーター部で析出するクロム酸化膜
の修復がはかれない友めであり、20A / d m”
超ではそれ以上の電流密度では効果が飽和する友めであ
る。ま九通電量10/dm”未満ではクロム酸化膜の修
復の効果が認められない。通電量の上限は、経済性との
関連で判断されるべきもので特に規定されないが、本発
明の目的を考慮すると10クーロン/dn?あたシが適
当である。
Furthermore, the treatment conditions for cathode electrolysis are a current density of 5 to 20 kld.
& , a current flow amount of 10/d- or more is appropriate. Current density 5
If it is less than A/d-, the chromium oxide film deposited on the plater part cannot be repaired, and 20A/d m"
If the current density is higher than that, the effect will be saturated. If the amount of current applied is less than 10/dm", the effect of repairing the chromium oxide film will not be recognized.The upper limit of the amount of current applied should be determined in relation to economic efficiency and is not particularly specified, but it Taking this into consideration, 10 coulombs/dn?atrium is appropriate.

さらに陽極電解の処理条件は電流密度2〜10A / 
di−通電to、2〜5クーロン/d−が適当である。
Furthermore, the treatment conditions for anodic electrolysis are a current density of 2 to 10 A/
di- energization to, 2 to 5 coulombs/d- is appropriate.

電流密度2A/drI?未満ではクロム酸化膜溶解除去
の効果がない友めであり、電流密度10A/d−以上で
は、これ以上電流密度を高(してもりロム酸化膜の溶解
に対し効果が飽和するからであり、また表層の金属クロ
ムを溶解する可能性があるからである。また通電量も王
妃と同様の理由で0.2〜5クーロン/d?が適当であ
る。
Current density 2A/drI? If the current density is less than 10 A/d-, the effect on dissolving the chromium oxide film will be saturated; This is because there is a possibility of dissolving the metal chromium on the surface layer.Also, for the same reason as the queen, the appropriate amount of current is 0.2 to 5 coulombs/d?

さらにケミカル処理に用いる無水クロム酸溶液の!1度
は20 g/l〜200 g/lが適当である。
Furthermore, chromic anhydride solution used for chemical treatment! 20 g/l to 200 g/l is suitable for one degree.

20971未満では処理液の電気抵抗が大き(電解処理
時に浴電圧が大になり電力の浪費となる。
If it is less than 20971, the electrical resistance of the treatment liquid is high (the bath voltage becomes high during electrolytic treatment, resulting in wasted power).

ま7c200 ?/Z超ではそれ以上無水クロム酸を添
加しても向上がはかれないからである。
7c200? This is because when the temperature exceeds /Z, no improvement can be achieved even if chromic anhydride is added any further.

まt弗素量としては0,059/#〜3 f/l、が適
当である。ケミカル浴において弗素イオンを添加する理
由は、F−イオンを添加することにより高電流密度、高
通電量でクロム酸化膜を均一に析出しうることが可能と
なり、オキフ化度の高いクロム酸化膜を均一に得ること
ができるからであり。
A suitable amount of fluorine is 0,059/# to 3 f/l. The reason for adding fluorine ions in a chemical bath is that by adding F- ions, it is possible to uniformly deposit a chromium oxide film with high current density and high current flow, and it is possible to uniformly deposit a chromium oxide film with a high degree of oxidation. Because you can get it.

0.05P/J未満ではこの効果は生じないし、また、
3 ?/j超ではそれ以上添加しても著しい効果がはか
れないからである。
This effect does not occur below 0.05P/J, and
3? This is because if the amount exceeds /j, no significant effect can be achieved even if more is added.

以下に本発明に係る方法の実施例を示す。Examples of the method according to the present invention are shown below.

(実施例1) 板厚0.22 mの冷延鋼板を用い常法に従い電解脱脂
後浸漬酸洗しfc、vkに下記の条件にて本処理を行つ
几。
(Example 1) A cold-rolled steel plate with a thickness of 0.22 m was electrolytically degreased according to a conventional method, and then immersed in acid pickling, and the main treatment was performed on fc and vk under the following conditions.

シレータ一部おけるめっき浴(クロムめっき処理)浴組
Tic  0rbs  1809/#+H*SOa  
O,59/Ik+Nm1SiF6 5.4?/Z 浴@45c 電解密度 100A/dm”Xo、5秒(陰極処理)こ
の後浸漬水洗し、直ちに同水洗浴中で以下の条件で陰極
処理を行い引続き陽極処理を行った。
Plating bath (chromium plating treatment) bath set for part of the silator Tic 0rbs 1809/#+H*SOa
O, 59/Ik+Nm1SiF6 5.4? /Z bath @ 45c Electrolytic density 100 A/dm"Xo, 5 seconds (cathode treatment) After that, it was immersed in water and washed, and immediately subjected to cathode treatment in the same washing bath under the following conditions, followed by anode treatment.

浴  温  40℃ 陰極処理 5 A/dm’X 1秒 陽極処理  5A/dm”X1秒 引続き下記条件でりロム酸化膜を析出し友。Bath temperature 40℃ Cathode treatment 5 A/dm'X 1 second Anodization 5A/dm"X1 second Next, a ROM oxide film was deposited under the following conditions.

ケミカル部における処理 浴組成 0rbs 100 r/ #+NH4F Z5
 ? / Z+NaOHO,07mol/1 浴  温  40℃ 電解条件  4−OA/dy/XQ、7秒(実施例2) 実施例1と同様の条件でクロムめっきを析出後水洗浴中
において以下の条件で陰極処理を行い引続き陽極処理を
行つt6 浴  温  4θ℃ 陰極処理 10 A/dm”X 1秒 陽極処理  10 A/dm’X 1秒引き続き実施例
1と同様のケミカル部における処理を行なった。
Processing bath composition in chemical section 0rbs 100 r/ #+NH4F Z5
? / Z+NaOHO, 07 mol/1 Bath temperature 40°C Electrolytic conditions 4-OA/dy/XQ, 7 seconds (Example 2) After depositing chromium plating under the same conditions as Example 1, cathode treatment was performed in a water washing bath under the following conditions. t6 Bath temperature 4θ°C Cathode treatment 10 A/dm'X 1 second Anodization 10 A/dm'X 1 second Subsequently, the same treatment in the chemical section as in Example 1 was performed.

(実施例3) 実施例1と同様の条件でクロムめっきを析出後、水洗浴
中において実施例1と同じ条件で陰極処理。
(Example 3) After depositing chromium plating under the same conditions as in Example 1, cathode treatment was performed under the same conditions as in Example 1 in a water washing bath.

陽極処理を行ない下記条件でクロム酸化膜を析出し友。Perform anodization and deposit a chromium oxide film under the following conditions.

ケミカル部における処理 浴組成 Orb富75 ?/ #+NH4F 1.2 
f/ Z+NaOHO,l Orno l/1 浴  温  40℃ 電解条件 35ム/dn?X0.7秒 (比較例11 実施例1と同様の条件で浸漬水洗後間浴中で陰極処理単
独を行ない、実施例1と同様のケミカル部における処理
を行なった。
Processing bath composition in chemical department Orb Tofu 75? / #+NH4F 1.2
f/Z+NaOHO,l Orno l/1 Bath temperature 40℃ Electrolysis conditions 35mu/dn? X0.7 seconds (Comparative Example 11 Under the same conditions as in Example 1, cathodic treatment alone was performed in an interbath after immersion and washing with water, and the same chemical treatment as in Example 1 was performed.

(比較例2) 実施例1と同様の条件で浸漬水洗後間浴中で陽極処理単
独を行ない、実施例1と同様のケミカル部における処理
を行なつ九。
(Comparative Example 2) Under the same conditions as in Example 1, anodization alone was performed in an interbath after immersion and washing, and the same treatment in the chemical part as in Example 1 was performed.

(比較例3) 実施例1と同様の条件で浸漬水洗後直ちに実施例1と同
様のケミカル部における処理を行なった。
(Comparative Example 3) Immediately after immersion and washing under the same conditions as in Example 1, the same chemical treatment as in Example 1 was performed.

(比較例4) 実施例1と同様の条件のプレーター浴で電解後直ちに同
浴中で下記の条件にて陽極処理を行つt。
(Comparative Example 4) Immediately after electrolysis in a plater bath under the same conditions as in Example 1, anodization was performed in the same bath under the following conditions.

陽極処理  5 A/dm”X 1秒 浴  温  40 c この謄実施例1と同様のケミカル部Vcbける処理を行
なつ友。
Anodic treatment 5 A/dm"X 1 second bath temperature 40 c A friend who performs the same chemical treatment as in Example 1.

上記実施例1〜3.比較例1〜5で製造したクロムめっ
き鋼板について光学顕微鏡にLクロム酸化膜のムラの観
察、螢光X線法によるクロム酸化膜量の分析及びクロム
酸化膜層中のS量分析。
Examples 1 to 3 above. Regarding the chromium-plated steel sheets manufactured in Comparative Examples 1 to 5, the unevenness of the L chromium oxide film was observed using an optical microscope, the amount of chromium oxide film was analyzed using a fluorescent X-ray method, and the amount of S in the chromium oxide film layer was analyzed.

さらにはレトルト耐硬銅性評価試験を行なった。Furthermore, a retort hard copper resistance evaluation test was conducted.

ここでレトルト破Ni4a評価試験はクロムめっき鋼板
に塗装焼付を外面185℃x 10’ #内面210℃
×10分の条件で行ない、ナイロンテーゾを仮付は後円
筒成形し、高周波a導加熱に工り接着して缶胴形成し、
エンP巻締めをする。次にクエン酸水溶液(3に)を常
温で充填し、天板全巻締める。上記サンプルを各条件ご
とに10コずつ作成し、125℃X30分→20C冷却
を繰り返し、半分の缶が破網するまでのサイクル数を測
定する試験である。
Here, in the retort fracture Ni4a evaluation test, paint baking was performed on a chrome-plated steel plate at an outer surface of 185°C x 10'#inner surface of 210°C.
x 10 minutes, nylon Teso was temporarily attached, then cylindrical molded, and bonded using high frequency A-conduction heating to form the can body.
Tighten the en-P. Next, fill the citric acid aqueous solution (Step 3) at room temperature and tighten the entire top plate. In this test, 10 of the above samples were prepared for each condition, and cooling was repeated from 125° C. for 30 minutes to 20° C., and the number of cycles until half of the cans broke was measured.

結果を表1に示す。The results are shown in Table 1.

表1の中のクロム酸化膜中のムラ及び耐レトルト性は以
下の内容を示す・ 〔発明の効果〕 以上説明した様に、本発明により、クロムめっき後の浸
漬水洗の工程において、陰極−陽極処理を実施し、さら
にF−イオン添加浴で陰極電解処理することにニジ酎レ
トルト性に優れたクロム酸化膜を均一に析出させること
ができ、耐レトルト性等を飛躍的に向上させることがで
きる等の効果が得られる。本発明は塗料密NV!Eに優
れ次クロムめっき鋼板の製造を可能としたものであって
、産業上、工業上にもたらす効果は大きい。
The unevenness and retort resistance in the chromium oxide film in Table 1 are as follows. [Effects of the Invention] As explained above, according to the present invention, in the immersion washing process after chromium plating, the cathode-anode By carrying out the treatment and further cathodic electrolytic treatment in an F-ion added bath, it is possible to uniformly deposit a chromium oxide film with excellent retortability, and the retort resistance etc. can be dramatically improved. Effects such as this can be obtained. The present invention is paint dense NV! This makes it possible to manufacture sub-chromium-plated steel sheets with excellent E, and has great industrial effects.

代理人 弁理士  秋 沢 政 光 他2名Agent Patent Attorney Masaaki Aki Sawa 2 others

Claims (1)

【特許請求の範囲】 無水クロム酸を主とした水溶液中(プレーター部)で鋼
板を陰極電解処理により主に金属クロムを析出せしめ、 次いで、無水クロム酸20〜100g/lを存在せしめ
た浸漬水洗の工程(ドラッグアウト)において電流密度
5〜20A/dm^2、通電量1クーロン/dm^2以
上の陰極処理を行ない引続き同浴中で電流密度2〜10
A/dm^2、通電量0.2〜5クーロン/dm^2の
陽極処理を行ない、 次いで、無水クロム酸20〜200g/l及び弗化アン
モニウム、弗化ナトリウムなどF^−イオンを生成する
物質を弗素量として0.05〜3g/l存在せしめた電
解液中(ケミカル部)で陰極電解処理によりクロム酸化
膜を析出せしめることを特徴とする塗料密着性にすぐれ
たクロムめっき鋼板の製造法。
[Scope of Claims] A steel plate is subjected to cathodic electrolysis treatment in an aqueous solution containing mainly chromic anhydride (plater part) to deposit mainly metallic chromium, and then immersion washing in the presence of 20 to 100 g/l of chromic anhydride. In the step (drag out), cathode treatment is performed at a current density of 5 to 20 A/dm^2 and a current flow of 1 coulomb/dm^2 or more, and then the current density is 2 to 10 A/dm^2 in the same bath.
A/dm^2, anodization is performed at a current flow rate of 0.2 to 5 coulombs/dm^2, and then chromic anhydride of 20 to 200 g/l and F^- ions such as ammonium fluoride and sodium fluoride are generated. A method for producing a chromium-plated steel sheet with excellent paint adhesion, characterized by depositing a chromium oxide film by cathodic electrolysis treatment in an electrolytic solution (chemical part) in which a substance is present in an amount of 0.05 to 3 g/l as fluorine. .
JP9146585A 1985-04-27 1985-04-27 Production of chrome plated steel sheet having excellent adhesiveness to paint Pending JPS61250198A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9146585A JPS61250198A (en) 1985-04-27 1985-04-27 Production of chrome plated steel sheet having excellent adhesiveness to paint

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9146585A JPS61250198A (en) 1985-04-27 1985-04-27 Production of chrome plated steel sheet having excellent adhesiveness to paint

Publications (1)

Publication Number Publication Date
JPS61250198A true JPS61250198A (en) 1986-11-07

Family

ID=14027126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9146585A Pending JPS61250198A (en) 1985-04-27 1985-04-27 Production of chrome plated steel sheet having excellent adhesiveness to paint

Country Status (1)

Country Link
JP (1) JPS61250198A (en)

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