JPS61249058A - Developing process of photosensitive lithographic printing plate - Google Patents

Abstract

PURPOSE:To permit the immediate start of an operation without the need for the time to adjust the temp. of a developing soln. and to execute processing with the decreased electric power consumption by adjusting the developing soln. to a prescribed temp. in the process for transferring the developing soln. from a storage tank thereof to the developing process in the stage of subjecting a photosensitive lithographic printing plate to the developing process. CONSTITUTION:The PS plate to be developed is fed toward an arrow direction by conveying rollers 1 and squeeze rollers 2 as shown by a chain line PL. The developing soln. from the developing soln. storage tank 3 is supplied via a temp. adjusting part 7 and through a temp. sensor 9 to rotary brushes 4, 4'. The brushes 4, 4' rotate while moving forward and backward over the entire width of the PS plate and moving forward and backward in the advancing direction. The waste developing soln. is recovered into a waste soln. tank 11. The detection signal of the sensor 9 is fed to a control part 5. signal from the part 5 controls the power source voltage which a heater power source part 8 feeds to the part 7. The control part 5 receives the identification signal by the kind of the PS plate from an identification sensor 6 and controls the developing soln. so as to supply the developing soln. of the temp. suitable for the kind.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for developing a photosensitive lithographic printing plate, and more specifically to a photosensitive lithographic printing plate that has been improved so that printing plates of consistently stable quality can be obtained. The present invention relates to a development processing method.

[Conventional technology]

When developing a photosensitive lithographic printing plate (usually called 28th plate, hereinafter also referred to as 28th plate in this specification) using an automatic developing machine, the temperature must be kept constant to ensure that the development progresses appropriately and stably. A developing process is carried out by supplying a liquid to a developing section.

In conventional automatic developing machines, the developer is heated by circulating between the Tsutomi developer storage tank and the warming device, and after the developer in the developer storage tank reaches a predetermined temperature, it is transferred to the development processing section. It is supplied to and used repeatedly.

[Problem that the invention seeks to solve]

The disadvantage of the above-mentioned method of raising the temperature of the entire amount of developer in the developer storage tank to a predetermined temperature is that it takes a considerable amount of time to raise the temperature of the developer storage tank that stores a relatively large amount of developer. , and development cannot be performed during this time, which reduces work efficiency and the operating rate of the automatic developing machine.Even if you try to continuously process 28 different types of plates with different optimum developer temperatures, each The problems include that it is not possible to process each 28th plate under optimal conditions, and that the power consumption for adjusting the temperature of the developer is large. Also, if the developer is an alkaline solution,
Regardless of whether or not the 28th plate is developed, it absorbs carbon dioxide gas from the air and the activity of the developer decreases. The higher the developer temperature, the greater this tendency becomes. Therefore, if the developer in the developer storage tank is maintained at a predetermined temperature higher than room temperature, the activity of the developer will decrease accordingly.

Furthermore, in recent years, increasing the temperature of the developer has been used to speed up the developability. In this case, there is a problem that the developer is more likely to absorb carbon dioxide gas from the air, and the activity of the developer is further reduced.

The purpose of the present invention is to provide a 28-plate developing method that has high work efficiency and allows work to be started immediately without requiring time for adjusting the developer temperature, and that consumes less power to keep the developer warm. Another object of the present invention is to provide a development processing method that can continuously process 28 different types of plates at optimal temperatures. Still another object is to provide a developing method in which the performance of the developing solution is less degraded due to the absorption of carbon dioxide gas in the air.

[Means for solving the problem] The above-mentioned problem is solved in a method for developing a photosensitive lithographic printing plate using an automatic developing machine having a developer storage tank and a development processing section. The above object is achieved by a method for developing a photosensitive lithographic printing plate, which is characterized in that the developing solution is transferred from a liquid storage tank to a developing section, and the temperature of the developing solution is adjusted to a predetermined temperature during the transfer process. I was able to achieve this. The present invention adjusts the temperature of the developer that is transferred from the developer storage tank to the development processing section each time it is transferred during development processing, and because the amount of solution that is subject to temperature adjustment is small, it is possible to rapidly adjust the temperature to a predetermined temperature. Furthermore, since the set temperature can be changed for each processing, it is extremely easy to develop each of 28 different types of plates at the optimum temperature. The developer in the storage tank is not heated and is stably stored.

In the method of the present invention, the developer is supplied from a developer storage tank,
The liquid is sent to the development processing section of the developing machine by a transfer means that combines a pump, a pipe, etc., and is supplied onto the 28 plates to be processed by a developer supplying member, which will be described later. The developer to be transferred is heated or cooled by the temperature adjustment means provided in the above-mentioned transfer process (including the developer supply means), and then supplied onto the 28th plate. In addition, when using a method of diluting a high-concentration undiluted developer solution before use, a mixing means for mixing the undiluted developer solution and dilution water can be provided in the process of transferring the developer solution, but in this case, the temperature It is desirable that the adjusting means be provided after the mixing means.

Various methods can be used to adjust the temperature of the developer, such as a method that is carried out while the solution is being transferred, and a method that is carried out by temporarily storing the developer by providing a liquid reservoir in the middle of the transfer. The liquid temperature adjustment means is not particularly limited, but may include, for example, a heating element such as an electric heater, a cooling pipe using a coolant such as cold water attached to a pipe for transferring the developer, or a liquid storage part for temperature adjustment. Or, a method such as providing it in the surrounding area may be mentioned.

It is preferable to install a temperature sensor inside or at the outlet of the temperature control unit to control heating or cooling so that the liquid temperature reaches the set temperature. Temperature adjustment may be controlled based on the difference between the set temperature and the set temperature.

The temperature of the developer supplied to the print varies depending on the type of plate being processed, the structure of the automatic developing machine, the structure of the development accelerator described below, etc., and is not particularly limited, but generally the temperature is set at the temperature at the time of supply. The temperature of the developer is 5°C to 60°C, preferably 10°C to 45°C, more preferably 20°C to 3°C.
It is in the range of 5°C.

The developer temperature may be set optimally depending on the 28 plates to be processed (K), and the optimum developer temperature for each of the 28 plates can be determined through experiments.

Therefore, the developer temperature for several types of 28 plates processed in parallel may be the same or may be different.

In order to cope with the latter case, it is inserted into the developing machine 28
It is preferable to provide means for identifying the type of plate and switching the developer temperature each time.

There are two methods for identifying the type of Pa plate to be developed: an artificial method and an automatic method. Examples of the artificial method include a method in which a person identifies and sets the setting by operating a button.

Automatic methods include, for example, a method of optically measuring and identifying the photosensitive layer area, a method of measuring the spectral g & total density of the photosensitive layer, or a method of electrically measuring the impedance of the photosensitive layer. There is a method of reading a signal stored in a memory element such as a magnetic card, or a method of reading a signal stored in a bar code.

In the method of the present invention, the developer is supplied to the plate surface of the 28th plate, but methods for supplying the developer include, for example, a method of spraying, spraying, or dropping the liquid onto the plate surface using a shower pipe or nozzle, or a method of spraying or dropping the liquid onto the plate surface. There is a method in which a developer is supplied from a developer supplying member placed in a position that is in contact with or in a non-contact position and coats the plate surface with the developer. The method of bringing the developer supplying member into contact with the 28th plate and supplying the developer onto the photosensitive planographic printing plate includes:
For example, the material may be supplied by rubbing the plate surface with a water-absorbing material such as a sponge or cloth, or a non-water-absorbing material such as rubber, or a water-absorbing material such as the sponge or cloth. First, make these members into a p-lar shape,
For example, a method of supplying the 28 plates while synchronizing the rotation of the roller with the 28 plates being conveyed may be mentioned.

Methods for supplying the developer onto the 28 plate without contact between the developer supply member and the 28 plate include, for example, a method in which the developer is stored in a narrow gap and the developer is supplied by passing the 28 plate through the gap; A method of supplying the 28 plate by contacting the developer that hangs down due to surface tension in a developer supply member, or storing the developer in a cylindrical object and creating a narrow gap on the side of the cylindrical object.

Examples include a method of supplying by passing a Pa plate through the gap.

Furthermore, in these developer supply methods, the developer can be supplied onto the 28 plate not only in liquid form but also in foam form.

Moreover, you may use these supply methods in combination.

The amount of developer supplied by these methods may be a constant amount per photosensitive lithographic printing plate, an amount proportional to the area of the printing plate, or an amount proportional to the length or width of the printing plate being processed. It can be determined according to the criteria of *m, *m, etc., and can also be changed depending on the deafness, type, non-image area, etc. of the 28th edition to be processed. It may be selected as appropriate depending on the structure of the automatic developing machine, the size and type of the 28 plates to be processed, the properties of the printing plate, the developer, etc., but it should be between 1011J and 2000J per plate in view of the spread of the liquid on the plate surface, etc. is preferable, and 50 to 1000 m is particularly preferable. Furthermore, in the method of using the developer in the present invention, the developer is circulated and supplied from the developer storage tank to the development processing tank, and the developer is supplied within a certain usage limit. In addition to the cyclic reuse method, or the same cyclic reuse method as above, [to prevent developer fatigue,
A method of reusing the developing replenisher while replenishing it in an amount commensurate with fatigue, or a method of supplying a predetermined amount of new unused developing solution every time 28 plates are processed without circulating and reusing the developer. Examples include. Among these methods, a method in which a predetermined amount of new, unused developer is supplied every time 28 plates are processed without circulating and reusing the developer is particularly preferred.

The developing solution can be stored in a storage tank after it is finished as a working solution and supplied onto the 28 plate during processing (or it can be stored divided into a stock solution and a diluted solution, or multiple solutions with different compositions). It is possible to store the liquids in a tank and supply each liquid onto the printing plate, or to mix them automatically at the time of supply to finish the liquid and supply it, but it is preferable to mix it automatically and supply it to the printing plate in a uniform state. .

Further, in the 28-plate processing method of the present invention, it is preferable to add a development accelerating operation during development.

For the development promotion operation, all physical, chemical, electrical, mechanical, and other means for promoting development can be used.

Mechanical acceleration means include a method of rubbing the surface of the plate, for example, a method of rubbing using a rotating roller-like rubbing member, a method of rubbing by rotating a flat-shaped rubbing member, or a method of rubbing by rotating a flat-shaped rubbing member, or a method of rubbing the plate-like rubbing member back and forth and/or Examples include a method of rubbing by moving left and right, and a method of rubbing by moving a roller-shaped rubbing member or a flat plate-shaped rubbing member back and forth and/or left and right while rotating. Note that a plurality of these rubbing members may be used in combination. These rubbing members can be created using, for example, brushes, sponges, cloth, or the like.

Other development accelerating means include, for example, a method of blowing high-pressure air, a method of irradiating ultrasonic waves, a method of applying vibration to a photosensitive planographic printing plate, or a method described in JP-A No. 58-42042.
A method of electrochemical development as described in the above publication, a method of instantaneously heating the developer on the KPS plate by microwave irradiation, or a method of impregnating solid particles in the developer and applying high pressure from a nozzle. The above-mentioned development accelerating operation may be added before, during, or after supplying the developer, but it is possible to add the honing method in which the developer is injected with the developer. It is desirable to do this after supply. Further, the developer supplying means and the development promoting means may be integrated. For example, when the development promoting means is a disk-shaped rotating brush, a developer supplying nozzle may be provided on the rotating shaft of the brush. can.

The automatic developing machine used to carry out the method of the present invention is one that automatically transports and processes printing plates. There are no particular limitations on its shape, configuration, structure, etc., as long as it is equipped with a means to adjust the temperature to a predetermined temperature.
It is preferable that the conveyance method be a horizontal conveyor using a conveyor p-roller, an endless belt, or the like. In addition to the above-mentioned development process, the automatic developing machine used in the method of the present invention may perform a development stop process (the stop process solution includes a disposable method or a recirculating method), an insensitive resin, etc., if necessary. Each individual treatment step of the chemical treatment step, a development stop treatment step and a subsequent desensitization treatment step, a treatment step that combines a development treatment step and a desensitization treatment, or a development stop treatment step and a desensitization treatment step and -, for example, JP-A-54-800
It may also include the treatment steps described in Publication No. 2. Also,
There may be a plurality of development processing steps and other steps, and for example, the development processing step may be divided into a first development processing step and a second development processing step.

FIG. 1 is a schematic cross-sectional view showing an example of an automatic processor suitable for carrying out the method of the present invention. In the figure, 1 is a pair of conveying rollers, and 2 is a pair of squeeze rollers, and the 28 plates to be processed are conveyed along a path indicated by a chain line PL by these roller pairs. The developer stored in the developer tank 3 is transferred by a fixed amount by a metering pump P that is started every time the 28th plate is inserted, and is supplied onto the 28th plate through the rotation of the rotary brushes 4 and 4'. .

The rotary brushes 4 and 41 rotate themselves and in a direction perpendicular to the traveling direction of the 28th plate, that is, the width direction KP of the 28th plate.
A reciprocating movement is performed over all 48 IVC of the S plate, and the plate surface being developed is rubbed to complete the development. Reference numeral 5 denotes a developer temperature control unit which stores the developer temperature input in advance for each of the 28 types of plates to be processed, and controls the temperature to be adjusted based on a signal from the psi identification sensor 6 that reads the optical density of the 13 plate surfaces. Set automatically.

Reference numeral 7 denotes a temperature adjustment section provided with a heater around the developer transfer pipe, and 8 indicates a temperature adjustment section 7 based on a signal from the control section 5.
This is a heater power supply unit that controls the power supply voltage sent to the heater. A temperature sensor 9 detects the temperature of the developer after temperature adjustment, and a detection signal is sent to the control section 5. The control unit 5 compares the set temperature with the temperature signal from the temperature sensor 9, and controls the heater power supply unit 8.
1IC signal is sent to control the heating by the heater and keep the developer temperature constant. The developing solution supplied onto the No. 28 plate falls onto the tray 10 after the development is completed, and is further collected into the waste solution tank 11. If the next 28th edition inserted is of a different type,
The 28th plate identification sensor 6 outputs a signal different from that of the preceding 28th plate, the set temperature of the control unit 5 changes, and a developer having a concentration suitable for the 28th plate is supplied to the plate surface.

Figure 2 shows a temporary storage section for the developer installed in the middle of the developer transport system.
Here, the temperature of the first stage (lower required developer temperature) is adjusted, and heating is performed by the heater 7 of the next stage only when processing 28 plates that require a higher temperature solution. There are two temporary storage parts 21A and 21B, each having heaters 22A and 22B and temperature sensors 23A and 23B, and adjusts the temperature of the liquid stored therein to a constant temperature. The two reservoirs are switched by a three-way valve 24 to alternately use the liquid inside. Since the liquid remains in the reservoir and its temperature is adjusted while at least one sheet of 28 plates is being processed, it is possible to stably adjust the temperature. Further, even when a high temperature liquid is used, the temperature of the liquid supplied to the heater 7 is kept constant, so there is an advantage that the temperature after heating by the heater 7 is also extremely stable. The heater 7 only needs to be turned on and off based on the judgment of the 28-plate identification sensor 6, and its control is relatively simple.

It should be noted that although FIGS. 1 and 2 show a developing machine having only a developing section, it is possible to have additional sections for gumming, washing, etc., as described above.

The photosensitive lithographic printing plate used in the method of the present invention is
A photosensitive layer whose solubility changes upon irradiation with light is coated on the support, or a soluble layer is provided on the support to form a photomask-like resist layer by electrophotography, etc. be.

The support used in the photosensitive lithographic printing plate is as follows:
Paper, plastics (e.g. polyethylene, polypropylene, polystyrene, etc.), laminated paper, plates of metals such as aluminum (including aluminum alloys), zinc, copper, etc., cellulose diacetate, cellulose triacetate, cellulose propionate, polyethylene terephthalate. , films of plastics such as polyethylene, polybupylene, polycarbonate, polyvinyl acetal, etc., paper or plastic films laminated or vapor-deposited with the metals listed above, steel plates plated with aluminum or aluminum plating, etc. Among these, aluminum and aluminum-coated composite supports are particularly preferred.

Further, the surface of the aluminum material is preferably roughened for the purpose of increasing water retention and improving adhesion with the photosensitive layer.

Examples of the surface roughening method include generally known methods such as brush polishing, ball polishing, electrolytic etching, chemical etching, liquid honing, sandblasting, etc., and combinations thereof, and preferably brush polishing, electrolytic etching, and chemical etching. Target etching and liquid honing are mentioned, of which roughening methods involving the use of vfK electrolytic etching are preferred. The electrolytic bath used in electrolytic etching is an aqueous solution containing an acid, an alkali, or a salt thereof, or an aqueous solution containing an organic solvent. Electrolytes are preferred. Further, the roughened aluminum plate is desmutted with an acid or alkali aqueous solution, if necessary.

The aluminum plate thus obtained is preferably anodized, and particularly preferably, the aluminum plate is treated in a bath containing sulfuric acid or phosphoric acid.

Furthermore, if necessary, surface treatment with K such as pore sealing treatment and immersion in an aqueous potassium zirconate solution can be performed.

The photosensitive composition of the photosensitive lithographic printing plate used in the present invention contains a photosensitive substance as an essential component, and as a photosensitive substance, its physical property,
Chemical properties change, such as those whose solubility in developing solutions changes due to exposure to light, those whose adhesion between molecules differs before and after exposure, and those whose chemical properties change due to exposure or subsequent development processing. It is possible to use materials that have different compatibility, and materials that can be formed into fine areas using electrophotography.

Typical photosensitive substances include, for example, photosensitive diazo compounds, photosensitive 7dide compounds, compounds with ethylenically unsaturated double bonds, epoxy compounds that polymerize with acid catalysts, and C-0 compounds that decompose with acids. Examples include compounds having a -C- group. Examples of photosensitive diazo compounds include 0-quinone diazide compounds which change to alkali solubility upon exposure to light, and aromatic diazonium salts which are negative type compounds whose solubility decreases upon exposure.

Specific examples of 0-quinonediazide compounds include, for example, JP-A-47-5303, JP-A-48-63802, and JP-A-48.
-63803, 49-38701, 56-10
No. 44, No. 56-1045, Special Publication No. 41-11222
No. 43-28403, No. 45-9610, No. 4
Publications No. 9-17481, U.S. Patent No. 2,797,2
No. 13, No. 3,046,120, No. 3.188,
No. 210, No. 3,454,400, No. 3,544
, No. 323, No. 3,573,917, No. 3,67
No. 495, No. 3,785,825, British Patent No. 1
, 227,602, 1,251,345, 1,267.005, 1,329,888, 1,330,932, German Patent No. 854,890
The present invention can be preferably applied at least to photosensitive lithographic printing plates using these compounds alone or in combination as photosensitive components. can. These photosensitive components include O-quinone diazide sulfonic acid ester or O-quinone diazide carboxylic acid ester of an aromatic hydroxy compound, and O-quinone di7dido sulfonic acid or O-quinone di7dide carboxylic acid 7mide of an aromatic amino compound. Also included are those in which these 0-quinone di7dide compounds are used alone, and those in which they are mixed with an alkali-soluble resin and this mixture is provided as a photosensitive layer. Alkali-soluble resins include novolac-based phenolic resins, specifically phenol-formaldehyde resins,
Includes cresol/formaldehyde resin, phenol/cresol mixed formaldehyde resin, cresol/xylenol mixed formaldehyde resin, etc. Furthermore, as described in JP-A No. 50-125806, in addition to the above-mentioned 7 ether resin, phenol substituted with a furkyl group having 3 to 8 carbon atoms such as t-butylphenol formaldehyde resin Alternatively, a combination of a condensate of cresol and formaldehyde can also be used. If necessary, additives such as dyes, plasticizers, and components imparting printout performance can be added to the photosensitive layer containing an O-quinonediazide compound as a photosensitive component.

The present invention can be applied to a photosensitive layer containing an 0-quinone di7dide compound as a photosensitive component in an amount per unit area of at least about 0.5 to 7 I/-.

There is no particular need to change the image exposure of the positive PS plate to which the method of the present invention is applied, and a conventional method may be used.

Typical photosensitive components of the negative photosensitive layer are diazo compounds, such as diazo resins which are condensates of diazonium salts and/or p-diazophenylamine and formaldehyde, as described in Japanese Patent Publication No. 52-7364. Phenol salts or fluorocapric acid salts of p-diazodiphenylamine, etc., which are described in Japanese Patent Publication No. 49-48001, 3-methoxydiphenylamine-4-diazonium chloride, 4-ditopiphenylamine, and formaldehyde, etc. Diazo resin consisting of an organic solvent soluble salt of a copolycondensate, 2-methoxy-4-hydroxy-5-benzoylbenzene sulfonate of a condensate of p-diazodiphenylamine and formaldehyde, condensation of p-diazodiphenylamine and formaldehyde Examples include tetrafluoroborate and hexafluorophosphate. The present invention can be preferably applied at least to negative planographic printing plates containing these as photosensitive components.

In addition to those in which these diazo compounds are used alone, the present invention can also be applied to those in which they are used in combination with various resins in order to improve the physical properties of the photosensitive layer. Examples of such resins include shellac, derivatives of polyvinyl alcohol, copolymers having an alcoholic hydroxyl group in the side chain described in JP-A-50-118802, and copolymers having an alcoholic hydroxyl group in the side chain described in JP-A-55-155355. Examples include copolymers having a phenolic hydroxyl group in a side chain.

These resins include copolymers containing at least 50% by weight of structural units represented by the following general formula; ethyl group or chloromethyl' group, n is an integer of 1 to 10), and 1 to 80 mol% of monomer units having an aromatic hydroxyl group, and acrylic ester and/or methacrylic ester monomers. Included are polymer compounds having 5 to 90 mol% of mer units and an acid value of 10 to 200.

The photosensitive layer of the negative photosensitive lithographic printing plate to which the developing method of the present invention is applied can further contain additives such as dyes, plasticizers, components that provide printout performance, and the like.

The amount per unit area of the photosensitive layer is at least 0.1 to 7
The present invention can be applied to the range of 9/d.

There is no need to change the exposure in particular, and a conventional method may be used.

As the developer used in the present invention, an aqueous alkaline developer is preferable. Among the aqueous alkaline developers, for a negative PS plate using a photosensitive substance such as a diazo compound, an alkaline agent, an organic solvent, an anionic interface, etc. Preferably used is one containing an activator, sulfite, etc. in water as a solvent.

Examples of alkaline agents include sodium silicate, potassium silicate, sodium hydroxide, lithium hydroxide, tribasic sodium phosphate, dibasic sodium phosphate, tribasic potassium phosphate, dibasic potassium phosphate, tribasic ammonium phosphate, and dibasic sodium phosphate. Inorganic alkaline agents such as ammonium diphosphate, sodium metasilicate, sodium bicarbonate, sodium carbonate, potassium carbonate, ammonium carbonate, etc.; and organic ammonium silicate are useful. The content of the fulling agent in the developer composition is preferably in the range of 0.05 to 20 weight percent, more preferably 0.1 to 10 weight percent.

Ethylene glycol monophenyl ether, benzyl alcohol, n-7' lobil alcohol and the like are useful as organic agents. The content of the organic solvent in the developer composition is preferably 0.5 to 15 weight percent, and more preferably 1 to 5 weight percent.

7Nionya surfactants include higher alcohols (Cs
-C22) Sulfuric ester salts [e.g., sodium salt of lauryl alcohol sulfate, sodium salt of octyl alcohol sulfate, ammonium salt of lauryl furfur sulfate, "T-Pole B-81J
(trade name: Shell Chemical Exhibition), disodium furkyl sulfate, etc.], aliphatic alcohol phosphate ester salts (e.g., sodium salt of cetyl alcohol phosphate, etc.), furkyl 7-lylsulfonate a (e.g., dodecyl Sodium salt of benzenesulfonic acid Sodium salt of isobutylnaphthalene sulfonic acid, sodium salt of sinaphthalene disulfonic acid, sodium salt of C-benzenesulfonic acid, sulfonic acid salts of alkylamides (e.g. C17H33CONCH2
CH2So 3Na, etc.), dibasic fatty acid esthetics
There are sulfonic acid salts of CH3 chill (eg, sodium sulfosuccinate dioctyl ester, sodium sulfosuccinate dihexyl ester, etc.). Among these, sulfonates are particularly preferably used.0 Sulfites have the function of dissolving water-insoluble diazo resins in aqueous solutions, and are particularly useful in the development of lithographic printing plates consisting of a photosensitive layer combined with a hydrophobic resin. , it is possible to produce printing plates without stains even if the plate material has been used for a long time after being manufactured. Useful sulfites include alkali metal salts such as sodium, potassium, and lithium, and alkaline earth metal salts such as magnesium.

On the other hand, for a positive PS plate having a photosensitive layer containing an 0-quinone di7dide compound, the alkali agent is added at a concentration of 0.1 to 3
0 weight percent is suitable, preferably 0.5 to 2
An aqueous solution containing 0% by weight is used and usually has a pH of 9.
It is used in the range of ~13.

The following additives can be added to such a developer to further improve development performance.

For example, NaCl described in JP-A-58-75152
, K (J, neutral salt such as KBr, JP-A wB5g-190
Chelating agents such as EDTA%NTA described in Publication No. 952,
(Co(NH3
)a) (Complexes such as Ja, COCl2.6H20, 7-ion or amphoteric compounds such as sodium flukylnaphthalenesulfonate described in JP-A No. 50-51324, N-tetradecyl-N, N-dihydroxyethylpetaine, etc.) Surfactants, nonionic surfactants such as tetramethyldecynediol described in U.S. Pat. No. 4,374,920, JP-A-55-
Cationic polymers such as methyl chloride quaternized product of p-dimethyl 7-minomethyl polystyrene described in JP-A No. 95946, copolymers of vinylbenzyltrimethylammonium chloride and sodium acrylate described in JP-A-56-142528, etc. ampholytic polymer electrolyte, JP-A-5
Reducing inorganic salts such as sodium sulfite described in Publication No. 7-192951, inorganic lithium compounds such as lithium chloride described in JP-A No. 58-59444, Japanese Patent Publication No. 58-34442
Organolithium compounds such as lithium benzoate described in JP-A No. 59-75255, organometallic external image activators containing Si, T1, etc. described in JP-A-59-75255, organoboron compounds described in JP-A-59-84241, Yop Tsuba Patent No. 10101
Examples include organic solvents such as quaternary ammonium salts such as tetraalkyl 7-enyl oxide described in the specification of No. 0, benzyl alfur, and ethylene glyfur mono-7 enyl ether.

In addition, 1. Alcohols such as methanol, ethanol, benzyl alcohol, diethylene glycol, triethylene glycol, f') polyhydric alcohols such as serine, ketones such as methyl ethyl getone, methyl isobutyl ketone, cyclic tau-tils such as dioxane, acetic acid Esters such as ethyl and phtyl acetate, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monophenyl ether, ethylene glycol motsubutyl ether, 2
- Ethylene glycol ethers such as propoxyethanol, glycol ether esters such as ethylene glycol ethyl ether acetate.

Lactones such as r-7'tip lactone, lactams such as N-methylpyrrolidone, methylamine, ethylamine,
The main components are organic solvents such as amines such as jetanol humin, ammoniums such as detraflukylammonium hydroxide, and heptamides such as formamide, alone or in mixtures, and in addition to the above-mentioned surfactants, alkali salts, water, etc. Alternatively, it includes those to which acids such as mineral acids and organic acids are added.

〔Example〕

EXAMPLES The present invention will be specifically explained below with reference to Examples.

Example 1 Esterified product of naphthoquinone 1,2-diazido-5-sulfonyl chloride and resorcinol-benzaldehyde resin (described in Example-IK of JP-A-56-1044) 3 parts by weight, cresol novolac resin, 9 A photosensitive solution was prepared by dissolving 0.12 parts by weight of Victoria Pure Blue BOH (dye manufactured by Hodogaya Chemical Industry Co., Ltd.) in 100 parts by weight of methylcellosolve. Thickness 0.
A grained aluminum plate of 3fi was anodized in sulfuric acid to form an oxide film of about 2.511/m, washed thoroughly and dried, and the above photosensitive solution was applied and dried to form an oxide film of about Z8
A positive type 28 plate with a photosensitive layer of g/rrl was obtained.

copolymer of methacrylate, parahydroxyphenylmethacrylamide, acryl-nitrile, ethyl acrylate, and methacrylic acid (molar ratio is as above, 8.5:2
4:60.5:7) 5.0 parts by weight, 0.5 parts by weight of hexafluorophosphate of a condensate of p-diazodiphenylaminmint haloformaldehyde, Victoria Pure Blue BOH (0.5 parts by weight, manufactured by Hodogaya Chemical Co., Ltd.). A photosensitive solution was prepared by dissolving 1 part by weight in 100 parts by weight of methylcellosolve.Next, a grained aluminum plate with a thickness of 0.24 m was anodized in sulfuric acid to give a thickness of about 21/rr.
A photosensitive solution having the above composition was applied and dried on the support obtained by forming an oxide film of 1, thoroughly washed, immersed in an aqueous sodium silicate solution, thoroughly washed with water, and dried. A negative PS plate having a photosensitive layer of rl was obtained.

A large number of positive type 28 plates and negative reduced PS plates thus obtained were cut into a size of 1003 x 800 tm. Next, the positive type 28 plate was exposed through a transparency for 60 seconds using a 2KW metal halide lamp from a distance of 80 (m).The negative PS plate was exposed through a transparency for 30 seconds under the same conditions.

On the other hand, potassium silicate aqueous solution (5i (h content 26% by weight)
, K20 content 13% by weight), potassium hydroxide aqueous solution (4
8wt% aqueous solution) and pure water.
Molar ratio with 0 ([SiO2] / (K2O:l)
is 1,78 and the molar concentration of 20 is 3.90 mol/l,
A developing solution containing 0.5% by weight of sodium sulfite was prepared.

Next, using the automatic developing machine shown in FIG. 1, the 28 exposed positive plates and 25 negative WPa plates were continuously processed in the same order. The transport speed of the 28 plates in the automatic developing machine is 600w/Im, and the developer supply amount is 120m/Im.
It was set to 1m.

The developer temperature was set to 25° C. during positive PS plate processing and 30° C. during negative PS plate processing. Each of the 50 developed negative and positive samples was properly developed, and the results of the printing test were also very good. Furthermore, at the start of work, there was no need to wait for the 28-plate positive negative type to be changed, and the work could be carried out efficiently.

Example 2 Using the apparatus shown in FIG. 2, the temporary developer storage section 21A.

The hot liquid at 21B was set to 25°C, and when processing a positive plate, it was left as is, and when processing a negative plate, the heater 7 was turned on.
The developer was supplied at 0.degree. C., and the other conditions were the same as in the examples, and the same tests as described above were conducted.The results obtained were very good as in Example 1.

[Comparison example]

Although the developer storage tank has a solution temperature adjustment device with a heater and a temperature sensor, the developer transfer system does not have a temperature control function.
In other respects, an automatic developing machine similar to the apparatus shown in FIG. 1 was used, and the test was started by adjusting the liquid temperature of the developer storage tank to 25°C. As in Example 1, 28 negative plates and 25 positive plates each were processed in an undefined order and continuously, and the temperature of the developer storage tank was adjusted to 25°C for positive plate processing and 25°C for negative plate processing. At that time, I performed processing while switching to 30" 0, but I continued the work without waiting for the liquid temperature to reach the specified value.The development results of the plate obtained were a lot of variation, with some being overdeveloped and underdeveloped. In particular, when changing the 28th edition, there were many editions with extremely unfavorable finishes.

It is possible to wait until the developer temperature reaches a predetermined value each time the 28-plate deafness is changed, and then process the process, but this requires more than 5 minutes of waiting time each time, reducing work efficiency and making it difficult to tolerate in practical use. It was a no-win situation.

Example 3 A positive developer solution obtained by removing sodium sulfite from the developer solution used in Example 1 was put into the automatic developing machine shown in Fig. 1, the developer temperature was set at 30°CVC, and the conveyance speed was 800B/1H.
50 positive PS plates were continuously processed with 1il. Waiting time at the start of processing is completely unnecessary, and highly efficient work can be performed, and the resulting plate has an extremely good finish. It was confirmed that it is effective on the surface.

〔Effect of the invention〕

The present invention eliminates the need for time for adjusting the developer when developing 28 plates, and makes it possible to continuously process a wide variety of 28 plates at the optimum developer temperature. Furthermore, it has become possible to maintain the developer solution in the storage tank stably.

[Brief explanation of drawings]

FIGS. 1 and 2 are schematic sectional views of an automatic PS plate developing machine suitable for carrying out the present invention. 1...Transport roller 2...Squeeze roller 3...Developer storage tank 4, 41...Rotating brush 5...Control unit 6... 28
Plate identification sensor 7...Temperature adjustment section 8...
... Heater power supply section 21A, 21B ... Temporary storage section 22A, 22B ... Heater 9.23A, 23B ... Temperature sensor 24 ... 3-way valve P ... Metering pump application Person Konishi Roku Photo Industry Co., Ltd. Figure 1 1 -----1 Laughing, -9 Hata -・--1・ ↑S morning 1st hour 4〉suz -=--Sph 4th゛υ-77- -1 AE Kenmachi Sekanfu Procedural Amendment 5゜7818/1981 Commissioner of the Patent Office
6゜Patent Application No. 91818 of 1985 2, Title of the invention: Method for developing photosensitive lithographic printing plates 3, Relationship with the case of the person making the amendment Patent applicant address: 1-26-2 Nishi-Shinjuku, Shinjuku-ku, Tokyo Konishiroku Photo Industry Co., Ltd., 1 Sakura-cho, Hino-shi, Tokyo 191 Japan (Tel: 0425-83-152)
1) “Detailed Description of the Invention” of the specification subject to amendment Contents of amendment as per attached sheet

Claims (1)

[Claims] In a method for developing a photosensitive lithographic printing plate using an automatic developing machine having a developer storage tank and a development processing section, the developer is transferred from the developer storage tank to the development processing section during the development processing,
A method for developing a photosensitive lithographic printing plate, further comprising adjusting the temperature of the developer to a predetermined temperature during the transfer process.