JPS61245528A - Photosensitive material applicator - Google Patents

Photosensitive material applicator

Info

Publication number
JPS61245528A
JPS61245528A JP8715185A JP8715185A JPS61245528A JP S61245528 A JPS61245528 A JP S61245528A JP 8715185 A JP8715185 A JP 8715185A JP 8715185 A JP8715185 A JP 8715185A JP S61245528 A JPS61245528 A JP S61245528A
Authority
JP
Japan
Prior art keywords
photosensitive material
photosensitive agent
air reservoir
air
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8715185A
Other languages
Japanese (ja)
Inventor
Yoshiaki Tada
多田　嘉明
Terumasa Tokura
戸倉　輝正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Machine Co Ltd
Original Assignee
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Machine Co Ltd filed Critical Toshiba Machine Co Ltd
Priority to JP8715185A priority Critical patent/JPS61245528A/en
Publication of JPS61245528A publication Critical patent/JPS61245528A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Abstract

PURPOSE:To drop a photosensitive material that contains no bubble on a material to which the photosensitive material is to be applied to improve an application by constituting an applicator by a photosensitive material supply source, a supply route for supplying the photosensitive material to a material to which the photosensitive material is applied and an air reservoir for reserving the bubbles generated in the route. CONSTITUTION:A photosensitive material to be applied within a container 19 containing the material, that is, a photosensitive material supply is fed to an inlet 20a provided in the ceiling of an air reservoir 20 via a filter 22 and a vinyl pipe (c), taken out from an outlet 20b formed in the lower portion of the side wall of the air reservoir 20, and fed to a volume discharge pump 12 driven by a driving cylinder 11 via a valve 23 and another vinyl pipe (b). Then, the photosensitive material is fed to a nozzle 15 from the pump via a still another vinyl pipe (a) and another valve 13 and the drop of the photosensitive material is dropped from the nozzle 15 onto a material 16 to which the photosensitive material is to be applied and which is located on a turn table 18 rotated by a motor 17. In this construction, the valves 23 and 13 are alternately opened and closed in synchronism with the cylinder 11 and the bubbles contained in the photosensitive material are, meantime, let out through an air-escape valve 24 on the upper surface of the reservoir 20.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明はたとえば回転される被塗布材の表面に一様に感
光剤を塗布する感光剤塗布装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a photosensitive agent coating device that uniformly applies a photosensitive agent to the surface of a rotating material to be coated, for example.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

感光剤塗布装置としては、従来たとえば、第２図に示す
ようなものが知られている。すなわち、図中１は駆動シ
リンダーで、この駆動シリンダー１にはポンプ２、バル
ブ３を介してノズル４が接続されている。そして、前記
ノズル４には被塗布材５が対向され、この被塗布材５は
モータ６によって回転される真空吸着式のターンテーブ
ル７上に載置されている。また、上記ポンプ２にはバル
ブ８、フィルター９を介して感光剤１０ａを収容する感
光剤容器１０が接続されている。As a photosensitive agent coating device, for example, the one shown in FIG. 2 is known. That is, 1 in the figure is a drive cylinder, and a nozzle 4 is connected to this drive cylinder 1 via a pump 2 and a valve 3. A material to be coated 5 is opposed to the nozzle 4, and the material to be coated 5 is placed on a vacuum suction type turntable 7 rotated by a motor 6. Further, a photosensitive agent container 10 containing a photosensitive agent 10a is connected to the pump 2 via a valve 8 and a filter 9.

しかして、被塗布材５に感光剤１０ａを塗布する場合に
は、駆動シリンダー１が駆動され、これにより、ポンプ
２が作動されて、感光剤容器１０から、フィルター９お
よびバルブ８を介して感光剤１０ａが吸引される。そし
て、この吸引された感光剤１０ａはポンプ２から吐出さ
れ、バルブ３を介して、ノズル４から、被塗布材５上に
滴下される。この被塗布材５はモータ６の駆動により回
転され、その表面に一様に感 先刻１０ａが塗布されることになる。When applying the photosensitive agent 10a to the material 5 to be coated, the drive cylinder 1 is driven, thereby the pump 2 is operated, and the photosensitive agent 10a is transferred from the photosensitive agent container 10 through the filter 9 and the valve 8. The agent 10a is sucked. The sucked photosensitive agent 10a is then discharged from the pump 2, and dripped onto the material 5 to be coated from the nozzle 4 via the valve 3. The material 5 to be coated is rotated by the drive of the motor 6, and the coating tip 10a is uniformly coated on the surface thereof.

しかしながら、従来においては、感光剤供給ルートＲの
リークおよび特に高分子の感光剤を用いた場合にはフィ
ルター９の繊維状エレメントを通過する際に発生するガ
スなどにより、感光剤１０ａ中に気泡が混入され、この
気泡が混入された感光剤１０ａが被塗布材５に滴下され
、塗布膜厚が前記気泡の径よりも薄くなった場合には、
気泡が破裂して塗布不良（塗布むら）を誘発する欠点が
あった。However, in the past, air bubbles were formed in the photosensitive agent 10a due to leakage in the photosensitive agent supply route R and gas generated when passing through the fibrous element of the filter 9, especially when a polymeric photosensitive agent was used. When the photosensitive agent 10a mixed with the air bubbles is dropped onto the material 5 to be coated and the coating film thickness becomes thinner than the diameter of the air bubbles,
There was a drawback that bubbles burst, causing poor coating (uneven coating).

〔発明の目的〕[Purpose of the invention]

本発明は上記事情に着目してなされたもので、材塗布装
置を提供しようとするものである。The present invention has been made in view of the above circumstances and aims to provide a material coating device.

〔発明の概要〕 本発明は上記目的を達成するため、供給ルートにエアー
溜め部を設け、このエアー溜め部に気泡を溜めることに
より、感光剤から気泡を除去できるようにしたものであ
る。[Summary of the Invention] In order to achieve the above object, the present invention provides an air reservoir in the supply route, and by storing air bubbles in the air reservoir, the air bubbles can be removed from the photosensitive agent.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明を第１図に示す一実施例を参照して説明す
る。図中１１は駆動シリンダーで、この駆動シリンダー
１１によって定量吐出ポンプ１２が駆動されるようにな
っている。前記定量吐出ポンプ１２には供給ルートとし
ての配管系を構成するビニールパイプａを介して、バル
ブ１３、およびノズル１５が接続されている。そして、
前記ノズル１５には被塗布材１６が対向されている。こ
の被塗布材１６はモーター７によって回転されるターン
テーブル１８上に載置されている。また、上記定邑吐出
ポンプ１２には供給ルートとしてのビニールパイプｂを
介してバルブ２３、エアー溜メ め部２０．されにビニールパイプＣを介してフィルタ２
２および供給源としての感光剤容器１９が順次接続され
ている。前記バルブ１３．２３は上記駆動シリンダー１
１と連動して交互に開閉するようになっている。The present invention will be explained below with reference to an embodiment shown in FIG. In the figure, reference numeral 11 denotes a drive cylinder, and the drive cylinder 11 drives a metering discharge pump 12. A valve 13 and a nozzle 15 are connected to the quantitative discharge pump 12 via a vinyl pipe a constituting a piping system as a supply route. and,
A material to be coated 16 is opposed to the nozzle 15 . The material to be coated 16 is placed on a turntable 18 rotated by a motor 7. Further, the fixed discharge pump 12 is connected to a valve 23, an air reservoir 20. Filter 2 through vinyl pipe C
2 and a photosensitive agent container 19 as a supply source are connected in sequence. The valve 13.23 is connected to the drive cylinder 1
It is designed to open and close alternately in conjunction with 1.

一方、上記エアー溜め部２０は気密構造を有し、その上
面部に感光剤の流入部２０ａ、側面下部側に流出部２０
ｂをそれぞれ有している。また、エアー溜め部２０には
エアー抜き用のバルブ２４が接続されている。また、前
記エアー溜め部２０にはエアー抜き時に上記感光剤容器
１９もしくは図示しない別の感光剤補給ラインによって
感光剤１９ａが供給されるようになっている。On the other hand, the air reservoir section 20 has an airtight structure, with an inflow section 20a for the photosensitive agent on the upper surface thereof and an outflow section 20a on the lower side surface thereof.
b. Further, an air vent valve 24 is connected to the air reservoir 20. Moreover, the photosensitive agent 19a is supplied to the air reservoir 20 from the photosensitive agent container 19 or another photosensitive agent supply line (not shown) when air is removed.

しかして、被塗布材１６に感光剤１９ａを塗布する場合
には、駆動シリンダー１１により、定量吐出ポンプ１２
が作動される。これにより、感光剤容器１９からフィル
ター２２、エアー溜め部２０１バルブ２３を介してポン
プ１２内に感光剤１９ａが吸引されて吐出され、バルブ
１３を介してノズル１５から、被塗布材１６上に滴下さ
れる。Therefore, when applying the photosensitive agent 19a to the material 16 to be applied, the drive cylinder 11 drives the metering discharge pump 12.
is activated. As a result, the photosensitive agent 19a is sucked into the pump 12 from the photosensitive agent container 19 through the filter 22, the air reservoir 201, and the valve 23, and is discharged, and is dripped onto the material to be coated 16 from the nozzle 15 via the valve 13. be done.

被塗布材１６はモータ１７の作動により、ターンテーブ
ル１８とともに回転されその表面に一様に感光剤１９ａ
が塗布されることになる。The material 16 to be coated is rotated together with the turntable 18 by the operation of the motor 17, and the photosensitive agent 19a is uniformly applied to the surface of the material 16.
will be applied.

ところで、この感光剤１９ａの塗布時において、ビニー
ルパイプＣと感光剤容器１９との間のリークおよびフィ
ルター９にて発生するガスなどにより、感光剤１９ａ中
に気泡が混入されるが、この気泡が混入された感光剤１
９ａはエアー溜め部２０内に流入されることにより、そ
の気泡がエアー溜め部２０内の上部側に上昇し感光剤１
９ａから除去される。By the way, when applying the photosensitive agent 19a, air bubbles are mixed into the photosensitive agent 19a due to leakage between the vinyl pipe C and the photosensitive agent container 19 and gas generated in the filter 9. Mixed photosensitizer 1
When the air bubbles 9a flow into the air reservoir 20, the air bubbles rise to the upper side of the air reservoir 20, and the photosensitive agent 1
Removed from 9a.

このように、感光剤１９ａ中の気泡をエアー溜め部２０
内で除去するため、ノズル１５は気泡を混入しない感光
剤１９ａを吐出し被塗布材１６に塗布されることになる
。In this way, air bubbles in the photosensitive agent 19a are removed from the air reservoir 20.
Since the photosensitive agent 19a is removed internally, the nozzle 15 discharges the photosensitive agent 19a that does not contain air bubbles, and the photosensitive agent 19a is applied to the material 16 to be coated.

また、エアー溜め部２０に：溜められたエアーは、排気
バルブ２４を開放するとともに、エアー溜め部２０に感
光剤容器１つから、感光剤１９ａを供給したり、あるい
は、別の感光剤補給ラインによって感光剤をエアー溜め
部２０に供給することにより、　排気バルブ２４から抜
くことができる。In addition, the air stored in the air reservoir 20 is released by opening the exhaust valve 24 and supplying the photosensitive agent 19a to the air reservoir 20 from one photosensitive agent container, or from another photosensitive agent supply line. By supplying the photosensitive agent to the air reservoir 20, it can be discharged from the exhaust valve 24.

なお、エアー溜め部２０の設置位置は上記一実施例に限
られることなく、フィルター２２の流出側であればどこ
でもよく、たとえば、ノズル１５の直前であってもよい
。Note that the installation position of the air reservoir 20 is not limited to the above embodiment, and may be placed anywhere as long as it is on the outflow side of the filter 22, for example, it may be placed immediately before the nozzle 15.

その他、本発明はその要旨の範囲内で種々変形実施可能
なことは勿論である。In addition, it goes without saying that the present invention can be modified in various ways within the scope of its gist.

〔発明の効果〕〔Effect of the invention〕

本発明は以上説明したように、供給ルートにエアー溜め
部を設け、このエアー溜め部により、感光剤中の気泡を
溜めるようにしたから、気泡を混入しない感光剤を被塗
布材上に滴下させることができ、良好に塗布させること
ができるという効果を奏する。As explained above, in the present invention, an air reservoir is provided in the supply route, and the air reservoir is used to collect air bubbles in the photosensitive agent, so that the photosensitive agent that does not contain air bubbles can be dripped onto the material to be coated. It has the effect that it can be applied well.

【図面の簡単な説明】[Brief explanation of drawings]

第１図は本発明の一実施例である感光剤塗布装置を示す
概略的構成図、第２図は従来の感光剤塗布装置を示す概
略的構成図である。 １９ａ・・・感光剤、１９・・・感光材容器（供給ｗＡ
）、１６・・・被塗布材、ａ、ｂ、ｃ・・・ビニールパ
イプ（供給ルート）、２０・・・エアー溜め部。FIG. 1 is a schematic configuration diagram showing a photosensitive agent coating device according to an embodiment of the present invention, and FIG. 2 is a schematic configuration diagram showing a conventional photosensitive agent coating device. 19a...Photosensitive agent, 19...Photosensitive material container (supply wA
), 16... material to be coated, a, b, c... vinyl pipe (supply route), 20... air reservoir.

Claims (4)

【特許請求の範囲】[Claims] （１）感光剤を供給する供給源と、この供給源から供給
された感光剤を被塗布材に供給する供給ルートと、この
供給ルートに設けられその内部に発生する気泡を溜める
エアー溜め部とを具備したことを特徴とする感光剤塗布
装置。(1) A supply source that supplies a photosensitizer, a supply route that supplies the photosensitizer supplied from this supply source to the material to be coated, and an air reservoir provided in this supply route that collects air bubbles generated inside the supply route. A photosensitive agent coating device characterized by comprising: （２）エアー溜め部は密閉構造を有し、その感光剤流入
側が流出側よりも高い位置にあることを特徴とする特許
請求の範囲の第１項記載の感光材塗布装置。(2) The photosensitive material coating device according to claim 1, wherein the air reservoir has a sealed structure, and the photosensitive agent inflow side is located at a higher position than the outflow side. （３）エアー溜め部にエアー排気弁を設けたことを特徴
とする特許請求の範囲第１項または第２項記載の感光材
塗布装置(3) The photosensitive material coating device according to claim 1 or 2, characterized in that an air exhaust valve is provided in the air reservoir. （４）エアー溜め部にエアーを押し出すための感光剤供
給管を接続したことを特徴とする特許請求の範囲第１項
ないし第３項のいずれか１項に記載の感光剤塗布装置。(4) The photosensitive agent coating device according to any one of claims 1 to 3, characterized in that a photosensitive agent supply pipe for pushing out air is connected to the air reservoir.
JP8715185A 1985-04-23 1985-04-23 Photosensitive material applicator Pending JPS61245528A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8715185A JPS61245528A (en) 1985-04-23 1985-04-23 Photosensitive material applicator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8715185A JPS61245528A (en) 1985-04-23 1985-04-23 Photosensitive material applicator

Publications (1)

Publication Number Publication Date
JPS61245528A true JPS61245528A (en) 1986-10-31

Family

ID=13906977

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8715185A Pending JPS61245528A (en) 1985-04-23 1985-04-23 Photosensitive material applicator

Country Status (1)

Country Link
JP (1) JPS61245528A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6488542A (en) * 1987-09-30 1989-04-03 Hitachi Electr Eng Apparatus for coating film forming substance
JPH0418958A (en) * 1990-05-14 1992-01-23 Tokyo Electron Ltd Coating apparatus
WO2006068050A1 (en) * 2004-12-22 2006-06-29 Origin Electric Company, Limited Optical disc manufacturing apparatus
JP2006205107A (en) * 2005-01-31 2006-08-10 Global Mach Kk Liquid discharging device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6488542A (en) * 1987-09-30 1989-04-03 Hitachi Electr Eng Apparatus for coating film forming substance
JPH0418958A (en) * 1990-05-14 1992-01-23 Tokyo Electron Ltd Coating apparatus
WO2006068050A1 (en) * 2004-12-22 2006-06-29 Origin Electric Company, Limited Optical disc manufacturing apparatus
JP2008052762A (en) * 2004-12-22 2008-03-06 Origin Electric Co Ltd Optical disk manufacturing apparatus
JP4616637B2 (en) * 2004-12-22 2011-01-19 オリジン電気株式会社 Optical disc manufacturing equipment
JP2006205107A (en) * 2005-01-31 2006-08-10 Global Mach Kk Liquid discharging device

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