JPS61236634A - Production of transparent electrode for display device - Google Patents
Production of transparent electrode for display deviceInfo
- Publication number
- JPS61236634A JPS61236634A JP7569785A JP7569785A JPS61236634A JP S61236634 A JPS61236634 A JP S61236634A JP 7569785 A JP7569785 A JP 7569785A JP 7569785 A JP7569785 A JP 7569785A JP S61236634 A JPS61236634 A JP S61236634A
- Authority
- JP
- Japan
- Prior art keywords
- film
- photosensitive resin
- substrate
- conductive
- electrically
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Glass (AREA)
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
表示装置用素子として硝子基板」二に透明導電画像膜を
吹付法により形成する従来の方法は、次の如くである。DETAILED DESCRIPTION OF THE INVENTION A conventional method for forming a transparent conductive image film on a glass substrate as a display element by spraying is as follows.
第1図に示すように400℃〜600℃に加熱した硝子
基板f1.l 1に金属塩溶液(例えば塩化第二錫を主
成分とするメタノール溶液)を噴霧して基板の一側全面
に透明な導電皮膜(3)を例えば05〜07μmの厚み
に形成する。As shown in FIG. 1, the glass substrate f1. heated to 400°C to 600°C. A metal salt solution (for example, a methanol solution containing stannic chloride as a main component) is sprayed onto L1 to form a transparent conductive film (3) with a thickness of, for example, 05 to 07 μm over the entire surface of one side of the substrate.
次に第2図に示すように、この導電性皮膜(3)上に感
光性樹脂(2)を全面に塗布しこの感光性樹脂(2)上
に電極画像の原板を密着して露光させた後非露光部を水
洗いで除去し、第3図に示すような感光樹脂画像膜(2
)を形成する。Next, as shown in Fig. 2, a photosensitive resin (2) was applied to the entire surface of this conductive film (3), and the original plate of the electrode image was brought into close contact with the photosensitive resin (2) and exposed. After that, the unexposed areas were removed by washing with water, and a photosensitive resin image film (2
) to form.
次にこの感光樹脂画像膜(2)をマスクとして露出して
いる導電性皮膜(3)を例えば亜鉛−塩酸の還元法にて
エツチングして除き第4図に示すような導電性画像皮膜
(コ)を形成する。Next, using this photosensitive resin image film (2) as a mask, the exposed conductive film (3) is etched away by, for example, a zinc-hydrochloric acid reduction method, leaving a conductive image film (coating) as shown in FIG. ) to form.
最後に感光性樹脂画像膜ぼ)を剥離液で処理して除き、
第5図に示すように透明な導電性画像皮膜(顔をガラス
基板(1)」−に形成させるものである。Finally, remove the photosensitive resin image film by treating it with a stripping solution.
As shown in FIG. 5, a transparent conductive image film is formed on a glass substrate (1).
この様な従来の方法は、次の点で欠点がある。Such conventional methods have the following drawbacks.
1)エツチング処理の際、導電性画像皮膜のサイドエツ
チング現象は避けられず、微細、精密な画像の作成を妨
げる。1) During the etching process, the side etching phenomenon of the conductive image film is unavoidable, which hinders the creation of fine and precise images.
2)エツチング液の保守、廃液の処理等に公害防止の設
備や心くばりが必要で、工程も増える為コスト高になる
。2) Etching solution maintenance, waste solution treatment, etc. require pollution prevention equipment and care, which increases the number of steps and increases costs.
本発明は、前記の如き従来の欠点を除去した透明電柘の
製造方法で、第6図に示すように硝子基板fi) J:
に感光性樹脂膜(2)を−側全面に形成し、その」二に
導電性画像の原板(4)(原板のパターンは所望の導電
性画像膜のパターンとは逆になる)を重ねて露光、現像
を行い、第7図に示すように導電性画像皮膜を形成した
い部分の基板面を露出させる。The present invention is a method of manufacturing a transparent glass which eliminates the above-mentioned drawbacks of the conventional glass substrate, as shown in FIG.
A photosensitive resin film (2) is formed on the entire negative side, and a conductive image original plate (4) (the pattern of the original plate is opposite to the desired pattern of the conductive image film) is superimposed on the second. Exposure and development are performed to expose the portion of the substrate surface on which a conductive image film is to be formed, as shown in FIG.
次に基板(1)を加熱しながらアルコール溶液や低級エ
ステル溶液に混合した金属塩の溶液を吹付け、第8図に
示すような導電性皮膜(3)を−側全面に形成する。Next, while heating the substrate (1), a solution of a metal salt mixed with an alcohol solution or a lower ester solution is sprayed to form a conductive film (3) as shown in FIG. 8 on the entire negative side.
その後基板(1)を冷却させて感光性樹脂の角画像膜(
))をその」二に形成されている導電性皮膜(3)と−
緒に水洗或はその他の簡便な方法(研磨等)で除去すれ
ば第9図に示す所望の導電性皮膜の正画像(3′)が基
板(1)上に形成されて残るものである。Thereafter, the substrate (1) is cooled and the photosensitive resin corneal image film (
)) with the conductive film (3) formed on its second part.
If it is removed by washing with water or other convenient methods (polishing, etc.), a desired positive image (3') of the conductive film shown in FIG. 9 will remain on the substrate (1).
この方法では、従来法に較べてエツチング処理が不要に
なり、感光性樹脂をエツチングマスクとして利用するこ
ともなくなり、先に挙げた従来法の欠点が全て解消され
微細、精密な導電性画像皮膜の形成に有効であり、製造
工程も簡単になる。Compared to the conventional method, this method eliminates the need for etching treatment, eliminates the use of photosensitive resin as an etching mask, and eliminates all of the drawbacks of the conventional method mentioned above, allowing the creation of fine and precise conductive image films. It is effective in forming the material and also simplifies the manufacturing process.
以下本発明の実施例を詳述する。Examples of the present invention will be described in detail below.
A)感光性樹脂
1日本感光紙工業株式会社製 M−6
B)金属塩溶液
塩化第二錫 ・・・・・・ 13重量%三塩化アン
チモン・・・・・ 2×10 重量%メチルアルコール
・・・ 86重量%
前記A、Bの2溶液を使用して第6図〜第9図に示す作
業を行った。A) Photosensitive resin
1 M-6 manufactured by Nihon Kankoshi Kogyo Co., Ltd. B) Metal salt solution Stannic chloride 13% by weight Antimony trichloride 2×10% by weight Methyl alcohol 86% by weight The operations shown in FIGS. 6 to 9 were performed using the two solutions A and B.
ソーダライム系硝子基板(1)」−にA液をメイヤバー
コートの方法で2μmの厚さに全面塗布し、50℃、1
0分間の乾燥を行なって第6図に示すような感光性樹脂
層(2)を形成した。Solution A was applied to the entire surface of the soda lime glass substrate (1) to a thickness of 2 μm using the Mayer bar coating method, and then heated at 50°C for 1 hour.
Drying was carried out for 0 minutes to form a photosensitive resin layer (2) as shown in FIG.
この感光樹脂層(2)上に画像原板(4)を当て8秒間
の密着露光を行い未露光部を水で現像して洗い流し、エ
アーナイフで乾燥させ第7図に示すような感光樹脂画像
(2′)を形成した。The image original plate (4) is placed on top of this photosensitive resin layer (2), contact exposure is carried out for 8 seconds, the unexposed area is developed with water, washed away, and dried with an air knife to form a photosensitive resin image as shown in FIG. 2') was formed.
この基板を吹付装置中に入れ500℃に加熱し、B液を
30秒間噴霧して酸化錫の透明な導電性皮膜(3)を形
成した。(第8図)
次にこの基板を吹付装置から取出し冷却した後、感光樹
脂膜())とその上の酸化錫皮膜(3)を水洗いのみで
除去し導電性画像皮膜(3′lを得た。This substrate was placed in a spraying device and heated to 500° C., and liquid B was sprayed for 30 seconds to form a transparent conductive film (3) of tin oxide. (Fig. 8) Next, this substrate was taken out from the spraying device and cooled, and the photosensitive resin film ( ) and the tin oxide film (3) on it were removed by only washing with water to obtain a conductive image film (3'l). Ta.
この場合感光樹脂膜(2)は05μm位迄減少したが灰
化像としての損傷はなく、形成された画像皮膜の形部れ
はなかった。In this case, the photosensitive resin film (2) was reduced to about 0.5 μm, but there was no damage as an ashed image, and there was no deformation of the formed image film.
Claims (1)
現像することにより、導電性膜を付着させたい部分だけ
硝子面を露出させ、この硝子基板を450℃以上の高温
に加熱し、例えば、塩化第二錫を主成分とするメタノー
ル溶液を吹きつけ、その後基板を冷却させた後感光性樹
脂の残存部分を除去することを特徴とする表示素子用透
明電極の製造法。By applying a photosensitive resin on a glass substrate, exposing it after drying, and then developing it, the glass surface is exposed only in the area where the conductive film is to be attached, and this glass substrate is heated to a high temperature of 450°C or higher, For example, a method for manufacturing a transparent electrode for a display element, which comprises spraying a methanol solution containing tinnic chloride as a main component, cooling the substrate, and then removing the remaining portion of the photosensitive resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7569785A JPS61236634A (en) | 1985-04-09 | 1985-04-09 | Production of transparent electrode for display device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7569785A JPS61236634A (en) | 1985-04-09 | 1985-04-09 | Production of transparent electrode for display device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61236634A true JPS61236634A (en) | 1986-10-21 |
Family
ID=13583662
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7569785A Pending JPS61236634A (en) | 1985-04-09 | 1985-04-09 | Production of transparent electrode for display device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61236634A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6425986A (en) * | 1987-07-21 | 1989-01-27 | Nippon Sheet Glass Co Ltd | Selective formation of silicon dioxide film |
EP0697377A2 (en) * | 1994-08-18 | 1996-02-21 | Honjo Sorex Co. Ltd. | Process for production of glass substrate coated with finely patterned Nesa glass membrane |
-
1985
- 1985-04-09 JP JP7569785A patent/JPS61236634A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6425986A (en) * | 1987-07-21 | 1989-01-27 | Nippon Sheet Glass Co Ltd | Selective formation of silicon dioxide film |
EP0697377A2 (en) * | 1994-08-18 | 1996-02-21 | Honjo Sorex Co. Ltd. | Process for production of glass substrate coated with finely patterned Nesa glass membrane |
EP0697377A3 (en) * | 1994-08-18 | 1996-09-18 | Honjo Sorex Co Ltd | Process for production of glass substrate coated with finely patterned Nesa glass membrane |
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