JPS61219037A - パタ−ン形成方法 - Google Patents

パタ−ン形成方法

Info

Publication number
JPS61219037A
JPS61219037A JP60059458A JP5945885A JPS61219037A JP S61219037 A JPS61219037 A JP S61219037A JP 60059458 A JP60059458 A JP 60059458A JP 5945885 A JP5945885 A JP 5945885A JP S61219037 A JPS61219037 A JP S61219037A
Authority
JP
Japan
Prior art keywords
salt
photosensitive
diazonium salt
group
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60059458A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0564335B2 (enExample
Inventor
Hiroichi Niki
仁木　博一
Akitoshi Kumagai
熊谷　明敏
Kunihiro Isori
五十里　邦弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP60059458A priority Critical patent/JPS61219037A/ja
Publication of JPS61219037A publication Critical patent/JPS61219037A/ja
Publication of JPH0564335B2 publication Critical patent/JPH0564335B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60059458A 1985-03-26 1985-03-26 パタ−ン形成方法 Granted JPS61219037A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60059458A JPS61219037A (ja) 1985-03-26 1985-03-26 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60059458A JPS61219037A (ja) 1985-03-26 1985-03-26 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS61219037A true JPS61219037A (ja) 1986-09-29
JPH0564335B2 JPH0564335B2 (enExample) 1993-09-14

Family

ID=13113881

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60059458A Granted JPS61219037A (ja) 1985-03-26 1985-03-26 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS61219037A (enExample)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6370245A (ja) * 1986-09-12 1988-03-30 Tosoh Corp 感光性樹脂組成物およびそれを用いた微細パタ−ン形成法
JPS63106743A (ja) * 1986-10-24 1988-05-11 Tokyo Ohka Kogyo Co Ltd コントラスト増強剤
JPS63108334A (ja) * 1986-10-27 1988-05-13 Tokyo Ohka Kogyo Co Ltd コントラスト向上用組成物
JPS63167346A (ja) * 1986-12-27 1988-07-11 Japan Synthetic Rubber Co Ltd 放射線感応性組成物
JPH021857A (ja) * 1987-12-18 1990-01-08 Ucb Sa 感光性組成物
JPH03291665A (ja) * 1990-04-10 1991-12-20 Fuji Photo Film Co Ltd 感光性平版印刷版
US5240807A (en) * 1987-08-20 1993-08-31 Hoechst Celanese Corporation Photoresist article having a portable, conformable, built-on mask
US5756256A (en) * 1992-06-05 1998-05-26 Sharp Microelectronics Technology, Inc. Silylated photo-resist layer and planarizing method

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6370245A (ja) * 1986-09-12 1988-03-30 Tosoh Corp 感光性樹脂組成物およびそれを用いた微細パタ−ン形成法
JPS63106743A (ja) * 1986-10-24 1988-05-11 Tokyo Ohka Kogyo Co Ltd コントラスト増強剤
JPS63108334A (ja) * 1986-10-27 1988-05-13 Tokyo Ohka Kogyo Co Ltd コントラスト向上用組成物
JPS63167346A (ja) * 1986-12-27 1988-07-11 Japan Synthetic Rubber Co Ltd 放射線感応性組成物
US5240807A (en) * 1987-08-20 1993-08-31 Hoechst Celanese Corporation Photoresist article having a portable, conformable, built-on mask
JPH021857A (ja) * 1987-12-18 1990-01-08 Ucb Sa 感光性組成物
JPH03291665A (ja) * 1990-04-10 1991-12-20 Fuji Photo Film Co Ltd 感光性平版印刷版
US5756256A (en) * 1992-06-05 1998-05-26 Sharp Microelectronics Technology, Inc. Silylated photo-resist layer and planarizing method

Also Published As

Publication number Publication date
JPH0564335B2 (enExample) 1993-09-14

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term