JPS61214937A - Attractive holder - Google Patents

Attractive holder

Info

Publication number
JPS61214937A
JPS61214937A JP5060585A JP5060585A JPS61214937A JP S61214937 A JPS61214937 A JP S61214937A JP 5060585 A JP5060585 A JP 5060585A JP 5060585 A JP5060585 A JP 5060585A JP S61214937 A JPS61214937 A JP S61214937A
Authority
JP
Japan
Prior art keywords
suction
pin
attracting
wafer
valve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5060585A
Other languages
Japanese (ja)
Other versions
JPH0232092B2 (en
Inventor
Yoshinori Shimamura
島村 吉則
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP5060585A priority Critical patent/JPS61214937A/en
Publication of JPS61214937A publication Critical patent/JPS61214937A/en
Publication of JPH0232092B2 publication Critical patent/JPH0232092B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25BTOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
    • B25B11/00Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
    • B25B11/005Vacuum work holders

Abstract

PURPOSE:To enable a holder to hold a thin plate in every size, by closing a valve, which controls air from a suction part to an exhaust port, communicating with an attracting groove, not brought into contact with a material to be attracted, of the plural attracting grooves, having a predetermined distance from the center of an attracting surface, and preventing a decrease of negative pressure. CONSTITUTION:If a wafer 2 is placed on a wafer chuck 1 by an automatic hand, a holder, bringing no wafer onto a pin 4a in the outermost attracting groove 5a, leaves the pin 4a as lifted by a spring 7 and cuts off communication with an exhaust hole 3. While the holder, depressing pins 4b, 4c due to downward pressing of the automatic hand and connecting attracting grooves 5b, 5c with the exhaust hole 3, holds the wafer to an attracting surface by applying a negative pressure to the wafer. While a protrusive distance of the pin from the attracting surface is decreased to a fine value, and if setting tension of the spring 7 is increased larger than weight of the pin by several grams, the holder, depressing the pin by dead weight of the wafer 2 and attracting force of an attracting groove 6, also enables the exhaust hole to communicate with the attracting groove.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は半導体ウェハのような薄い板状物品に負圧を加
えて吸着保持する吸着保持装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a suction and holding device for suctioning and holding a thin plate-shaped article such as a semiconductor wafer by applying negative pressure thereto.

[従来の技術1 従来の吸着保持装置では、吸着面の中心から被吸着物体
の半径に相当する所定の距離内に複数の吸着溝を設け、
各吸着溝に連通ずる吸着面上の吸入口を介して吸着面上
の被吸着物体に負圧を加えて被吸着物体を吸着面に吸着
保持していた。
[Prior art 1] In a conventional suction holding device, a plurality of suction grooves are provided within a predetermined distance corresponding to the radius of the object to be suctioned from the center of the suction surface,
Negative pressure was applied to the object on the suction surface through suction ports on the suction surface that communicated with the suction grooves, thereby suctioning and holding the object on the suction surface.

このため被吸着物体の寸法が異なるとその被吸着物体を
吸着保持するに適当な吸着溝を設けた吸着保持装置を選
択使用しなければならないという不都合があった。
For this reason, if the size of the object to be attracted differs, there is an inconvenience that a suction and holding device having suction grooves suitable for suctioning and holding the object must be selectively used.

[発明が解決しようとする問題点] 本発明の目的は、被吸着物体の寸法が異なっても単一の
吸着保持装置によって吸着保持することができる吸着保
持装置を提供することにある。
[Problems to be Solved by the Invention] An object of the present invention is to provide a suction and holding device that can suction and hold an object to be suctioned even if the size of the object differs by a single suction and holding device.

[問題点を解決するための手段と作用]この目的は本発
明に従って、吸着面の中心から所定距離だけ離れている
複数の吸着溝と、各吸着溝に連通ずる吸着面上の吸入口
と、吸入口と連通ずる排気孔と、吸入口から排気孔への
空気の流入を制御する弁と、被吸着物体の寸法に応じて
選択された弁のみを作動させる弁選択制御手段とを備え
ている吸着保持装置により達成される。
[Means and effects for solving the problem] This object is, according to the present invention, to provide a plurality of suction grooves spaced a predetermined distance from the center of the suction surface, a suction port on the suction surface communicating with each suction groove, It includes an exhaust hole that communicates with the suction port, a valve that controls the inflow of air from the suction port to the exhaust hole, and a valve selection control means that operates only the valve selected according to the size of the object to be attracted. This is achieved by an adsorption holding device.

弁は閉位置にあるときは吸入口から排気孔への空気の流
入を阻止してその吸入口と連通している吸着溝を介して
被吸着物体に負圧を加えることはないが、開位置にある
ときは吸入口から排気孔への空気の流入を許してその吸
入口と連通している吸着溝を介して被吸着物体に負圧を
加えてこれを吸着面上に吸着保持する。弁選択制御手段
は自動的に被吸着物体の寸法に応じて選択した弁を同状
態に保持し、その他の弁を閉状態に保持してその被吸着
物体に負圧を作用させて吸着面に吸着保持する。または
、弁制御手段は手動調整により被吸着物体の寸法に応じ
て選択した弁を閉状態に保持し、その他の弁を開状態に
保持して被吸着物体を吸着保持する。
When the valve is in the closed position, it prevents air from flowing into the exhaust port from the suction port and does not apply negative pressure to the object to be sucked through the suction groove communicating with the suction port, but when the valve is in the open position, it prevents air from flowing into the exhaust hole. When the air is in the suction port, air is allowed to flow from the suction port into the exhaust hole, and negative pressure is applied to the suction object through the suction groove communicating with the suction port, thereby suctioning and holding the object on the suction surface. The valve selection control means automatically maintains the valve selected according to the size of the adsorbed object in the same state, holds the other valves in the closed state, and applies negative pressure to the adsorbed object to apply negative pressure to the adsorbed surface. Holds by adsorption. Alternatively, the valve control means manually adjusts the valves selected according to the dimensions of the object to be attracted and holds them in a closed state, and holds the other valves in an open state to attract and hold the object to be attracted.

この第1の実施例の構造では、弁を構成しているのは、
吸入口に滑動自在に挿入される柄部と、吸入口よりも大
きなつば部とを有するピンであり、そして弁選択制御手
段はピンのつば部に当接して常時これを吸入口に押し当
てて弁を閉状態に保持するスプリングである。
In the structure of this first embodiment, the valve is composed of:
The pin has a handle that is slidably inserted into the suction port and a flange larger than the suction port, and the valve selection control means is in contact with the flange of the pin and constantly presses it against the suction port. A spring that holds the valve closed.

動作に当って、ウェハ2をオートハンド9によりプリア
ライメントステーション11からウェハチャック1へ転
送すると、最外周のウェハ吸着溝5aはピン4a上にウ
ェハ2がこないためピン4aはスプリング7により押し
上げられたままの状態で排気孔3との連通を遮断されて
いる。他方、内側の吸@@Sb、 5cはオートハンド
9の押圧によりピン4b。
During operation, when the wafer 2 is transferred from the pre-alignment station 11 to the wafer chuck 1 by the automatic hand 9, the pin 4a is pushed up by the spring 7 because the wafer 2 does not come on top of the pin 4a in the outermost wafer suction groove 5a. In this state, communication with the exhaust hole 3 is cut off. On the other hand, the inner suction @@Sb, 5c is pressed by the auto hand 9 to become the pin 4b.

4Cが押し下げられて吸入口を介して排気孔3と連通し
、その結果ウェハ2に負圧が作用してウェハ2は吸着面
に吸着保持される。
4C is pushed down and communicates with the exhaust hole 3 through the suction port, and as a result, negative pressure acts on the wafer 2, and the wafer 2 is held by suction on the suction surface.

[実施例] 第1図は本発明の吸着保持装置の第1の実施例の縦断面
図であり、第2図はそれの平面図である。
[Embodiment] FIG. 1 is a longitudinal sectional view of a first embodiment of the suction holding device of the present invention, and FIG. 2 is a plan view thereof.

第3図は本発明の吸着保持装置による被吸着物体の吸着
転送動作を説明する図である。
FIG. 3 is a diagram illustrating the suction and transfer operation of the suction target object by the suction holding device of the present invention.

第1.2図において、1はウェハチャック、2はウェハ
、3は排気孔、4a、 4b、 4cはウェハチャック
の吸着面の吸着溝と連通ずる吸入口を開閉するためのピ
ン、5a、 5b、 5cはウェハ2を吸着するための
吸着溝、6は常に負圧がかかつている中心吸着溝、7は
ウェハ2が吸着面にのぜられていない状態でピンを押上
げ吸着溝からの空気の流入通路を密閉するスプリング、
8は吸入ポンプ(図示せず)に接続するための継手であ
る。
In Figure 1.2, 1 is a wafer chuck, 2 is a wafer, 3 is an exhaust hole, 4a, 4b, 4c are pins for opening and closing the suction port communicating with the suction groove on the suction surface of the wafer chuck, 5a, 5b , 5c is a suction groove for suctioning the wafer 2, 6 is a central suction groove where negative pressure is always applied, and 7 is a pin that is pushed up when the wafer 2 is not placed on the suction surface to remove air from the suction groove. a spring sealing the inflow passage of the
8 is a joint for connecting to a suction pump (not shown).

第3図において9はプリアライメントステーション11
からウェハ2をウェハチャック1上へ転送するためのオ
ートハンド、10はこのオートハンド9を上下するため
のシリンダー、11はウェハ2をウェハチャック1へ供
給する前に位置決めするためのプリアライメントステー
ション、12は位置決めピンをそれぞれ示す。
In FIG. 3, 9 is the pre-alignment station 11.
10 is a cylinder for raising and lowering this automatic hand 9; 11 is a pre-alignment station for positioning the wafer 2 before supplying it to the wafer chuck 1; 12 indicates positioning pins, respectively.

ピン4b、 4cの押し下げはオートハンド9によらな
くてもよい。例えばピン4a、 4b、 4cのウェハ
チャックの吸着面からの突出量を微少(0,11111
程度)にして、スプリング7の設定力もピン4a、 4
b、 4cの型口より数りだけ多くしておけば、ウェハ
2の自重と中心部吸着溝6による吸着力によってピン4
a、 4b、 4cを押し下げ、排気孔3と吸着溝5a
、 5b。
The automatic hand 9 does not have to be used to push down the pins 4b and 4c. For example, the amount of protrusion of the pins 4a, 4b, and 4c from the suction surface of the wafer chuck is set to a very small amount (0, 11111
degree), and the setting force of spring 7 is also set by pins 4a, 4.
If the number of holes is the same as that of mold openings b and 4c, the pins 4 will be held together by the weight of the wafer 2 and the suction force of the center suction groove 6.
Push down a, 4b, and 4c, and connect exhaust hole 3 and suction groove 5a.
, 5b.

5Cを連通させることもできる。5C can also be communicated.

第4図は本発明の吸着保持装置の第2の実施例の縦断面
図である。この実施例では弁は吸入口に滑動自在に挿入
され、頂部にドライバー受けみぞを形成した上方柄部と
、この上方柄部に一体となっていて吸入口よりも大きい
つば部と、このつば部と一体となっていて上方柄部と反
対側にのびる下方柄部とを有するピンから成り、弁選択
制御手段は下方柄部に形成されたねじとこれと螺合して
ピンを固定保持するねじつき孔とから成る。
FIG. 4 is a longitudinal sectional view of a second embodiment of the suction holding device of the present invention. In this embodiment, the valve is slidably inserted into the suction port, and includes an upper handle portion having a screwdriver receiving groove formed at the top, a collar portion that is integral with the upper handle portion and larger than the intake port, and a collar portion that is larger than the intake port. The valve selection control means consists of a pin that is integral with the upper handle and has a lower handle that extends to the opposite side, and the valve selection control means includes a screw formed in the lower handle and a screw that is screwed into this and holds the pin fixedly. Consists of a perforated hole.

第4図は本発明の吸着保持装置の第2の実施例を示す。FIG. 4 shows a second embodiment of the suction holding device of the present invention.

第1の実施例との相違は、吸入口に滑動自在に挿入され
、頂部にドライバー受け溝18を形成した上方柄部14
と、この上方柄部に一体となっていて吸入口よりも大き
いつば部15と、このつば部と一体となっていて上方柄
部と反対側にのびるF方柄部16とを有するピンから弁
が構成されており、そしてピンの下方柄部16に形成さ
れたねじとこれと螺合してピンを閉位置に固定保持する
ウェハチャックの盲ねじ孔17とから弁選択制御手段が
構成されていることである。
The difference from the first embodiment is that the upper handle part 14 is slidably inserted into the suction port and has a driver receiving groove 18 at the top.
A valve is formed from a pin having a collar portion 15 that is integral with the upper handle portion and is larger than the inlet, and an F-square handle portion 16 that is integral with the collar portion and extends to the opposite side of the upper handle portion. A valve selection control means is constituted by a screw formed in the lower handle part 16 of the pin and a blind screw hole 17 of the wafer chuck which is screwed into the screw and holds the pin in the closed position. It is that you are.

この実施例では吸着しようとするウェハ2の外周より外
側に位置する吸入口を弁によりあらかじめ閉じ、そして
ウェハ2の外周より内側に位置する吸入口をあらかじめ
開いて使用するのであるが、。
In this embodiment, the suction port located outside the outer circumference of the wafer 2 to be sucked is closed in advance by a valve, and the suction port located inside the outer circumference of the wafer 2 is opened in advance.

その場合ドライバーの先端をピンの上方柄部14の溝1
8に挿入し、ピンの下方柄部16が盲ねじ孔17から抜
は出る方向にピンを、つば部15が吸入口を閉じるまで
、回動する。ウェハ2の外周より内側に位置する吸入口
のピンはピンの下方柄部16が富ねじ孔17に入り込む
方向に、つば部15が吸入口から離れてこれを開くまで
、回動する。
In that case, insert the tip of the screwdriver into the groove 1 of the upper handle part 14 of the pin.
8, and rotate the pin in the direction in which the lower handle 16 of the pin is pulled out from the blind screw hole 17 until the collar 15 closes the suction port. The pin of the suction port located inside the outer circumference of the wafer 2 is rotated in the direction in which the lower handle 16 of the pin enters the fully threaded hole 17 until the collar 15 separates from the suction port and opens it.

吸着動作は第1の実施例と同様であるので説明は省略す
る。
The suction operation is the same as that in the first embodiment, so a description thereof will be omitted.

本発明の実施例を半導体ウェハを吸着するものとして説
明したが、他の薄い板状物の吸着保持に当然使用できる
。また、吸着溝は同心円状に形成されるものとして説明
したが、方形であってもまたその他のループ状の溝であ
ってもよい。
Although the embodiment of the present invention has been described as a device for suctioning a semiconductor wafer, it can of course be used for suctioning and holding other thin plate-like objects. Further, although the suction grooves have been described as being formed in concentric circles, they may be rectangular or other loop-shaped grooves.

なお、ループは部分的に切断されるもの、すなわち完全
にはつながらないものであってもよい。
Note that the loop may be partially cut, that is, the loop may not be completely connected.

[発明の効果] 本発明により簡単な構成の単一の吸着保持装置によって
種々の寸法の薄板の吸着保持が可能となり、従来の寸法
毎に異なる吸着保持装置の選択使用という不都合は解消
されたのである。
[Effects of the Invention] The present invention makes it possible to suction and hold thin plates of various sizes using a single suction and holding device with a simple configuration, and eliminates the conventional inconvenience of selectively using different suction and holding devices for each size. be.

【図面の簡単な説明】 第1図は本発明の第1の実施例の縦断面図である。 第2図は第1の実施例の平面図である。 第3図は吸着保持装置の使用状態を説明する斜視図であ
る。 第4図は本発明の第2の実施例の縦断面図である。 図中: 1:ウェハチャック、2:ウェハ、3:排気孔、4a;
4b;4c:ピン、5a:5b:5c:吸着溝、6:中
心部吸着溝、9:オートハンド、10ニジリンダ、 11ニブリアライメントスチージヨン、12:位置決め
ピン、14:上方柄部、15:つば部、16:下方柄部
、17:Nねじ孔、 18二上方柄部の溝。 第1図 第2図
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a longitudinal sectional view of a first embodiment of the present invention. FIG. 2 is a plan view of the first embodiment. FIG. 3 is a perspective view illustrating how the suction holding device is used. FIG. 4 is a longitudinal sectional view of a second embodiment of the invention. In the figure: 1: Wafer chuck, 2: Wafer, 3: Exhaust hole, 4a;
4b; 4c: Pin, 5a: 5b: 5c: Suction groove, 6: Center suction groove, 9: Auto hand, 10 Niji cylinder, 11 Niburi alignment station, 12: Positioning pin, 14: Upper handle, 15: collar, 16: lower handle, 17: N screw hole, 18 groove on upper handle. Figure 1 Figure 2

Claims (1)

【特許請求の範囲】 1、吸着面の中心から所定距離だけ離れている複数の吸
着溝と、 各吸着溝に連通する吸着面上の吸入口と、 吸入口と連通する排気孔と、 吸入口から排気孔への空気の流入を制御する弁と、 被吸着物体の寸法に応じて選択された弁のみを作動させ
る弁選択制御手段とを備えていることを特徴とする吸着
保持装置。 2、前記の吸着溝が吸着面の中心から所定距離だけ離れ
ている複数のループとなっており、前記の弁が前記の吸
入口に滑動自在に挿入される柄部と、吸入口よりも大き
なつば部とを有するピンであり、そして前記の弁選択制
御手段がピンのつば部を当接して常時これを吸入口に押
し当てて弁を閉状態に保持するスプリングである特許請
求の範囲第1項に記載の吸着保持装置。 3、前記の吸着溝が吸着面の中心から所定距離だけ離れ
ている複数のループとなっており、前記の弁が前記の吸
入口に滑動自在に挿入され、頂部にドライバー受け溝を
形成した上方柄部と、この上方柄部に一体となっていて
吸入口よりも大きなつば部と、このつば部と一体となっ
ていて前記の上方柄部と反対側にのびる下方柄部とを有
するピンから成り、前記の弁選択制御手段が前記の下方
柄部に形成されたねじとこれと螺合してピンを固定保持
するねじつき孔とから成る特許請求の範囲第1項に記載
の吸着保持装置。
[Claims] 1. A plurality of suction grooves spaced a predetermined distance from the center of the suction surface, an inlet on the suction surface that communicates with each suction groove, an exhaust hole that communicates with the inlet, and an inlet. What is claimed is: 1. An adsorption/holding device comprising: a valve for controlling the inflow of air from the air into an exhaust hole; and a valve selection control means for operating only the valve selected according to the size of an object to be adsorbed. 2. The suction grooves are formed into a plurality of loops separated by a predetermined distance from the center of the suction surface, and the valve has a handle portion that is slidably inserted into the suction port, and a handle portion that is larger than the suction port. and the valve selection control means is a spring that abuts the collar of the pin and constantly presses it against the suction port to hold the valve in a closed state. The suction holding device described in Section. 3. The suction grooves are formed into a plurality of loops separated by a predetermined distance from the center of the suction surface, and the valve is slidably inserted into the suction port, and the upper part has a screwdriver receiving groove formed at the top. From a pin having a handle, a collar that is integral with the upper handle and is larger than the suction port, and a lower handle that is integral with the collar and extends to the opposite side of the upper handle. The suction holding device according to claim 1, wherein the valve selection control means comprises a screw formed in the lower handle and a threaded hole that is screwed into the screw and holds the pin fixedly. .
JP5060585A 1985-03-15 1985-03-15 Attractive holder Granted JPS61214937A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5060585A JPS61214937A (en) 1985-03-15 1985-03-15 Attractive holder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5060585A JPS61214937A (en) 1985-03-15 1985-03-15 Attractive holder

Publications (2)

Publication Number Publication Date
JPS61214937A true JPS61214937A (en) 1986-09-24
JPH0232092B2 JPH0232092B2 (en) 1990-07-18

Family

ID=12863596

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5060585A Granted JPS61214937A (en) 1985-03-15 1985-03-15 Attractive holder

Country Status (1)

Country Link
JP (1) JPS61214937A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01206643A (en) * 1988-02-13 1989-08-18 Shinkawa Ltd Substrate attracting structure
US20150357217A1 (en) * 2012-12-28 2015-12-10 Shanghai Micro Electronics Equipment Co,, Ltd Warped silicon-chip adsorption device and adsorption method thereof
WO2016054397A1 (en) * 2014-10-03 2016-04-07 Applied Materials, Inc. Spring-loaded pins for susceptor assembly and processing methods using same
CN106252791A (en) * 2015-06-12 2016-12-21 睿励科学仪器(上海)有限公司 Silicon wafer sucking disc
USD980884S1 (en) 2021-03-02 2023-03-14 Applied Materials, Inc. Lift pin

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS432692Y1 (en) * 1964-12-23 1968-02-03
JPS50125895U (en) * 1974-03-29 1975-10-15
JPS5646529A (en) * 1979-09-21 1981-04-27 Citizen Watch Co Ltd Wafer chuck

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS432692Y1 (en) * 1964-12-23 1968-02-03
JPS50125895U (en) * 1974-03-29 1975-10-15
JPS5646529A (en) * 1979-09-21 1981-04-27 Citizen Watch Co Ltd Wafer chuck

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01206643A (en) * 1988-02-13 1989-08-18 Shinkawa Ltd Substrate attracting structure
US20150357217A1 (en) * 2012-12-28 2015-12-10 Shanghai Micro Electronics Equipment Co,, Ltd Warped silicon-chip adsorption device and adsorption method thereof
WO2016054397A1 (en) * 2014-10-03 2016-04-07 Applied Materials, Inc. Spring-loaded pins for susceptor assembly and processing methods using same
US10192770B2 (en) 2014-10-03 2019-01-29 Applied Materials, Inc. Spring-loaded pins for susceptor assembly and processing methods using same
CN106252791A (en) * 2015-06-12 2016-12-21 睿励科学仪器(上海)有限公司 Silicon wafer sucking disc
CN106252791B (en) * 2015-06-12 2019-02-19 睿励科学仪器(上海)有限公司 Silicon wafer sucking disc
USD980884S1 (en) 2021-03-02 2023-03-14 Applied Materials, Inc. Lift pin

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