JPS6120759Y2 - - Google Patents
Info
- Publication number
- JPS6120759Y2 JPS6120759Y2 JP1980079008U JP7900880U JPS6120759Y2 JP S6120759 Y2 JPS6120759 Y2 JP S6120759Y2 JP 1980079008 U JP1980079008 U JP 1980079008U JP 7900880 U JP7900880 U JP 7900880U JP S6120759 Y2 JPS6120759 Y2 JP S6120759Y2
- Authority
- JP
- Japan
- Prior art keywords
- press
- contact
- heat sink
- recess
- pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 6
- 238000003466 welding Methods 0.000 claims description 5
- 239000011888 foil Substances 0.000 claims description 4
- 239000012212 insulator Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 3
- 238000005219 brazing Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 1
- 238000005493 welding type Methods 0.000 description 1
Landscapes
- Die Bonding (AREA)
- Wire Bonding (AREA)
Description
【考案の詳細な説明】
本考案は圧接型半導体装置の改良に関するもの
である。[Detailed Description of the Invention] The present invention relates to an improvement of a press-contact type semiconductor device.
従来の圧接型半導体装置は、半導体素子基板に
ろう材を介して半導体素子基板と熱膨張係数をほ
ぼ同じくする円板状の下部電極をろう付けし、そ
れと内部連結線を絶縁板を介して圧接部品にて弾
性加圧し、放熱体側面の凹部にて止輪を使つて固
定する構造が用いられている。 In a conventional press-contact type semiconductor device, a disk-shaped lower electrode having almost the same thermal expansion coefficient as the semiconductor element substrate is brazed to the semiconductor element substrate through a brazing material, and an internal connection wire is press-connected to the lower electrode through an insulating plate. A structure is used in which parts are elastically pressurized and fixed using a retaining ring in a recess on the side of the heat sink.
しかしながら、このような圧接構造において
は、圧接部品と放熱体とが電気的に接続されてお
らず、高電圧印加時に放電を起こす。 However, in such a press-contact structure, the press-contact component and the heat sink are not electrically connected, and discharge occurs when a high voltage is applied.
そこで本考案の目的は、圧接部品と放熱体とを
電気的に接続し、もつて同電位とすることによつ
て放電を防止することにある。 Therefore, an object of the present invention is to prevent electrical discharge by electrically connecting a pressure-welded component and a heat sink and making them at the same potential.
次に図面を参照して本考案を説明する。 Next, the present invention will be explained with reference to the drawings.
第1図は従来の圧接型半導体装置の断面図であ
る。1は半導体素子でろう材を介して下部電極2
にろう付けされている。3はPN接合周辺を保護
する表面保護膜である。4の連結線及び5の半導
体素子を絶縁板8を介した圧接部品6及び7で弾
性加圧し、9の環状金属体により、放熱体10の
側面の凹部に固定されている。このような圧接型
構造では、圧接部品6及び7と放熱体10が絶縁
板8を介して、絶縁されており、高電圧を印加す
ると圧接部品6及び7と放熱体10との間で、放
電が起きてしまい、高耐圧半導体素子をこのよう
な圧接構造にすることはできない。 FIG. 1 is a sectional view of a conventional pressure contact type semiconductor device. 1 is a semiconductor element and a lower electrode 2 is connected to it through a brazing material.
It is soldered to. 3 is a surface protection film that protects the periphery of the PN junction. The connecting wire 4 and the semiconductor element 5 are elastically pressurized by press-contact parts 6 and 7 with an insulating plate 8 interposed therebetween, and are fixed in a recess on the side surface of the heat sink 10 by an annular metal body 9. In such a pressure-welding type structure, the pressure-welding parts 6 and 7 and the heat sink 10 are insulated via the insulating plate 8, and when a high voltage is applied, a discharge occurs between the pressure-welding parts 6 and 7 and the heat sink 10. Therefore, it is impossible to form a high-voltage semiconductor element into such a press-contact structure.
第2図は本考案の実施例を示す。 FIG. 2 shows an embodiment of the invention.
第1図と異なる点は絶縁板と圧接部品7の間に
第3図,第4図のような金属はく11を入れて、
圧接部品と放熱体10を電気的に接続したことで
ある。こうすることによつて、圧接部品と放熱体
とが、電気的に接続され、同電位になり、放電を
防ぐことができる。 The difference from FIG. 1 is that a metal foil 11 as shown in FIGS. 3 and 4 is inserted between the insulating plate and the pressure welding part 7.
This means that the pressure-welded parts and the heat sink 10 are electrically connected. By doing so, the press-contact component and the heat sink are electrically connected and have the same potential, thereby preventing discharge.
上記実施例からも明らかなように、本考案によ
れば高電圧印加時における圧接部品と放熱体間の
放電を防止することができ、高耐圧素子の圧接化
を可能にするものである。 As is clear from the above embodiments, according to the present invention, it is possible to prevent discharge between the press-contact parts and the heat sink when high voltage is applied, and it is possible to press-contact high-voltage elements.
第1図は従来の圧接型半導体装置の断面図、第
2図は本考案の実施例の断面図で、第3図は第2
図の金属はくの平面図、第4図は第3図の断面図
である。
図において、1……半導体素子基板、2……下
部電極板、3……表面保護膜、4……内部連結
線、5……半導体素子、6……サラバネ、7……
ワツシヤー、8……絶縁板、9……止め輪、10
……放熱体、11……金属はく。
FIG. 1 is a cross-sectional view of a conventional pressure contact type semiconductor device, FIG. 2 is a cross-sectional view of an embodiment of the present invention, and FIG.
FIG. 4 is a plan view of the metal foil in the figure, and FIG. 4 is a sectional view of FIG. 3. In the figure, 1...Semiconductor element substrate, 2...Lower electrode plate, 3...Surface protective film, 4...Internal connection line, 5...Semiconductor element, 6...Set spring, 7...
Washer, 8...Insulating plate, 9...Retaining ring, 10
...Heat sink, 11...Metal foil.
Claims (1)
体を介して圧接部品で加圧接触され、前記放熱体
側面の凹部に挿入された環状金属体と圧接部品と
の間に絶縁板が設けられた圧接型半導体装置にお
いて、前記圧接部品と前記絶縁板との間に外縁部
が前記放熱体のくぼみの内側面に接する金属はく
を有することを特徴とする圧接型半導体装置。 A semiconductor element placed in a recess of a heat radiator is brought into pressure contact with a pressure welding part via an insulator, and an insulating plate is provided between the annular metal body inserted into the recess on the side surface of the heat radiator and the pressure welding part. A press-contact type semiconductor device, characterized in that the press-contact type semiconductor device has a metal foil between the press-contact component and the insulating plate, the outer edge of which is in contact with the inner surface of the recess of the heat sink.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1980079008U JPS6120759Y2 (en) | 1980-06-06 | 1980-06-06 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1980079008U JPS6120759Y2 (en) | 1980-06-06 | 1980-06-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS574244U JPS574244U (en) | 1982-01-09 |
JPS6120759Y2 true JPS6120759Y2 (en) | 1986-06-21 |
Family
ID=29441508
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1980079008U Expired JPS6120759Y2 (en) | 1980-06-06 | 1980-06-06 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6120759Y2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51149778A (en) * | 1975-06-17 | 1976-12-22 | Toshiba Corp | Pressure contact type semiconductor device |
-
1980
- 1980-06-06 JP JP1980079008U patent/JPS6120759Y2/ja not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51149778A (en) * | 1975-06-17 | 1976-12-22 | Toshiba Corp | Pressure contact type semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS574244U (en) | 1982-01-09 |
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