JPS61204834A - 磁気デイスク - Google Patents
磁気デイスクInfo
- Publication number
- JPS61204834A JPS61204834A JP4554485A JP4554485A JPS61204834A JP S61204834 A JPS61204834 A JP S61204834A JP 4554485 A JP4554485 A JP 4554485A JP 4554485 A JP4554485 A JP 4554485A JP S61204834 A JPS61204834 A JP S61204834A
- Authority
- JP
- Japan
- Prior art keywords
- film
- protective film
- magnetic
- magnetic disk
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 59
- 230000001681 protective effect Effects 0.000 claims abstract description 40
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 29
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 19
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 12
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 12
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 12
- 239000010408 film Substances 0.000 claims description 43
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 239000010409 thin film Substances 0.000 claims description 14
- 230000007797 corrosion Effects 0.000 abstract description 6
- 238000005260 corrosion Methods 0.000 abstract description 6
- 230000002195 synergetic effect Effects 0.000 abstract description 2
- 238000010276 construction Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 18
- 238000004544 sputter deposition Methods 0.000 description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 9
- 239000000956 alloy Substances 0.000 description 9
- 230000005294 ferromagnetic effect Effects 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 7
- 150000001721 carbon Chemical class 0.000 description 6
- 238000007747 plating Methods 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 5
- 239000007769 metal material Substances 0.000 description 5
- 229910052814 silicon oxide Inorganic materials 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000001771 vacuum deposition Methods 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- 229910000521 B alloy Inorganic materials 0.000 description 2
- 229910020630 Co Ni Inorganic materials 0.000 description 2
- 229910002440 Co–Ni Inorganic materials 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- 229910017061 Fe Co Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 238000001241 arc-discharge method Methods 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000003353 gold alloy Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910001234 light alloy Inorganic materials 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4554485A JPS61204834A (ja) | 1985-03-07 | 1985-03-07 | 磁気デイスク |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4554485A JPS61204834A (ja) | 1985-03-07 | 1985-03-07 | 磁気デイスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61204834A true JPS61204834A (ja) | 1986-09-10 |
| JPH0533457B2 JPH0533457B2 (enrdf_load_stackoverflow) | 1993-05-19 |
Family
ID=12722305
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4554485A Granted JPS61204834A (ja) | 1985-03-07 | 1985-03-07 | 磁気デイスク |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61204834A (enrdf_load_stackoverflow) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5140902A (ja) * | 1974-10-04 | 1976-04-06 | Fujitsu Ltd | Jikikirokubaitainohogomaku |
| JPS5156203A (ja) * | 1974-11-12 | 1976-05-17 | Hitachi Maxell | Jikikirokutai |
| JPS5730124A (en) * | 1980-07-29 | 1982-02-18 | Nippon Telegr & Teleph Corp <Ntt> | Protective film for magnetic recording medium |
-
1985
- 1985-03-07 JP JP4554485A patent/JPS61204834A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5140902A (ja) * | 1974-10-04 | 1976-04-06 | Fujitsu Ltd | Jikikirokubaitainohogomaku |
| JPS5156203A (ja) * | 1974-11-12 | 1976-05-17 | Hitachi Maxell | Jikikirokutai |
| JPS5730124A (en) * | 1980-07-29 | 1982-02-18 | Nippon Telegr & Teleph Corp <Ntt> | Protective film for magnetic recording medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0533457B2 (enrdf_load_stackoverflow) | 1993-05-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5714044A (en) | Method for forming a thin carbon overcoat in a magnetic recording medium | |
| JPS62103823A (ja) | 磁気デイスク | |
| JPS61210521A (ja) | 磁気デイスクの製造方法 | |
| JPS62114124A (ja) | 磁気デイスクの製造方法 | |
| JPS61222024A (ja) | 磁気デイスク | |
| JPH0622052B2 (ja) | 磁気デイスク | |
| JPH0647722B2 (ja) | 磁気記録媒体の製造方法 | |
| JPS61204834A (ja) | 磁気デイスク | |
| JPS61224140A (ja) | 磁気デイスクの製造方法 | |
| JPS61206919A (ja) | 磁気デイスク | |
| JPS61208620A (ja) | 磁気デイスク | |
| JPH0533459B2 (enrdf_load_stackoverflow) | ||
| JPH0268716A (ja) | 磁気ディスク媒体の製造方法 | |
| JPS62236116A (ja) | 磁気記録媒体 | |
| JPH0628088B2 (ja) | 磁気記録媒体 | |
| JPS63276707A (ja) | 磁気記録媒体 | |
| JPS59157828A (ja) | 磁気記録媒体 | |
| JPS61208621A (ja) | 磁気デイスク | |
| JPS6356609B2 (enrdf_load_stackoverflow) | ||
| JPH02101616A (ja) | 薄膜磁気記録媒体 | |
| JPS6315654B2 (enrdf_load_stackoverflow) | ||
| JPS61115244A (ja) | 磁気記録媒体製造法 | |
| JPH0512765B2 (enrdf_load_stackoverflow) | ||
| JPS6280826A (ja) | 磁気デイスク | |
| JPH0268712A (ja) | 薄膜型磁気記録媒体 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |