JPS61200851A - 微粒子製造装置 - Google Patents

微粒子製造装置

Info

Publication number
JPS61200851A
JPS61200851A JP60041214A JP4121485A JPS61200851A JP S61200851 A JPS61200851 A JP S61200851A JP 60041214 A JP60041214 A JP 60041214A JP 4121485 A JP4121485 A JP 4121485A JP S61200851 A JPS61200851 A JP S61200851A
Authority
JP
Japan
Prior art keywords
raw material
fine particles
plasma
tubular passage
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60041214A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0226538B2 (fr
Inventor
Akinobu Yoshizawa
吉澤　昭宣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HATSUKOUSHIYA KK
Original Assignee
HATSUKOUSHIYA KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HATSUKOUSHIYA KK filed Critical HATSUKOUSHIYA KK
Priority to JP60041214A priority Critical patent/JPS61200851A/ja
Publication of JPS61200851A publication Critical patent/JPS61200851A/ja
Publication of JPH0226538B2 publication Critical patent/JPH0226538B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/121—Coherent waves, e.g. laser beams

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
JP60041214A 1985-03-04 1985-03-04 微粒子製造装置 Granted JPS61200851A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60041214A JPS61200851A (ja) 1985-03-04 1985-03-04 微粒子製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60041214A JPS61200851A (ja) 1985-03-04 1985-03-04 微粒子製造装置

Publications (2)

Publication Number Publication Date
JPS61200851A true JPS61200851A (ja) 1986-09-05
JPH0226538B2 JPH0226538B2 (fr) 1990-06-11

Family

ID=12602150

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60041214A Granted JPS61200851A (ja) 1985-03-04 1985-03-04 微粒子製造装置

Country Status (1)

Country Link
JP (1) JPS61200851A (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6411916A (en) * 1987-07-06 1989-01-17 Idemitsu Kosan Co Production of metal fine particles
JPH02194110A (ja) * 1989-01-23 1990-07-31 Rikagaku Kenkyusho モリブデン微粒子製造方法
JPH04253200A (ja) * 1991-01-28 1992-09-08 Kansai Electric Power Co Inc:The プラズマチャンネル発生装置
JP2002529224A (ja) * 1998-11-09 2002-09-10 ナノグラム・コーポレーション 反応剤供給装置
US7214349B2 (en) 1996-12-31 2007-05-08 Applied Materials, Inc. Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
JP2021508287A (ja) * 2018-07-23 2021-03-04 エルジー・ケム・リミテッド ナノ粒子合成装置およびこれを用いたナノ粒子の合成方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60255611A (ja) * 1984-05-14 1985-12-17 アライド・コーポレーシヨン 金属ケイ化物粉末から成る超微細粉末の光誘導製造

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60255611A (ja) * 1984-05-14 1985-12-17 アライド・コーポレーシヨン 金属ケイ化物粉末から成る超微細粉末の光誘導製造

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6411916A (en) * 1987-07-06 1989-01-17 Idemitsu Kosan Co Production of metal fine particles
JPH02194110A (ja) * 1989-01-23 1990-07-31 Rikagaku Kenkyusho モリブデン微粒子製造方法
JPH04253200A (ja) * 1991-01-28 1992-09-08 Kansai Electric Power Co Inc:The プラズマチャンネル発生装置
US7214349B2 (en) 1996-12-31 2007-05-08 Applied Materials, Inc. Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
US7695700B2 (en) 1996-12-31 2010-04-13 Applied Materials, Inc. Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
JP2002529224A (ja) * 1998-11-09 2002-09-10 ナノグラム・コーポレーション 反応剤供給装置
JP2021508287A (ja) * 2018-07-23 2021-03-04 エルジー・ケム・リミテッド ナノ粒子合成装置およびこれを用いたナノ粒子の合成方法

Also Published As

Publication number Publication date
JPH0226538B2 (fr) 1990-06-11

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