JPS6120031Y2 - - Google Patents
Info
- Publication number
- JPS6120031Y2 JPS6120031Y2 JP1981135273U JP13527381U JPS6120031Y2 JP S6120031 Y2 JPS6120031 Y2 JP S6120031Y2 JP 1981135273 U JP1981135273 U JP 1981135273U JP 13527381 U JP13527381 U JP 13527381U JP S6120031 Y2 JPS6120031 Y2 JP S6120031Y2
- Authority
- JP
- Japan
- Prior art keywords
- holder
- mask
- ring
- source
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13527381U JPS5842157U (ja) | 1981-09-11 | 1981-09-11 | 真空蒸着装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13527381U JPS5842157U (ja) | 1981-09-11 | 1981-09-11 | 真空蒸着装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5842157U JPS5842157U (ja) | 1983-03-19 |
JPS6120031Y2 true JPS6120031Y2 (enrdf_load_html_response) | 1986-06-17 |
Family
ID=29928647
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13527381U Granted JPS5842157U (ja) | 1981-09-11 | 1981-09-11 | 真空蒸着装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5842157U (enrdf_load_html_response) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS609241U (ja) * | 1983-06-28 | 1985-01-22 | 株式会社東芝 | 太陽光発電設備 |
-
1981
- 1981-09-11 JP JP13527381U patent/JPS5842157U/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5842157U (ja) | 1983-03-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS6120031Y2 (enrdf_load_html_response) | ||
JPS6136168B2 (enrdf_load_html_response) | ||
CN210620923U (zh) | 一种移动式蒸镀装置 | |
JPH0338237B2 (enrdf_load_html_response) | ||
JPS62191862U (enrdf_load_html_response) | ||
JPS5940359U (ja) | 蒸着物質収容器 | |
JPS61200642A (ja) | 電子管用球面状グリツドの製造方法 | |
JPH0527489Y2 (enrdf_load_html_response) | ||
JPS6150758U (enrdf_load_html_response) | ||
JPH0238921Y2 (enrdf_load_html_response) | ||
JPH06163413A (ja) | 成膜時の基板加熱方法および成膜装置の基板加熱機構 | |
JPS60211064A (ja) | 蒸着マスクおよびそれを用いた蒸着膜の製造方法 | |
JPS61147275U (enrdf_load_html_response) | ||
JPH01129259U (enrdf_load_html_response) | ||
JPS62141061U (enrdf_load_html_response) | ||
JPS5831885Y2 (ja) | 真空蒸着装置 | |
SU370463A1 (ru) | Способ термодинамического контроля | |
JPS642076U (enrdf_load_html_response) | ||
JPH0437257U (enrdf_load_html_response) | ||
JPS637156U (enrdf_load_html_response) | ||
JPS6389229U (enrdf_load_html_response) | ||
JPS61202048U (enrdf_load_html_response) | ||
JPH02136326U (enrdf_load_html_response) | ||
JPS55110775A (en) | Vapor depositing apparatus | |
JPH0233257U (enrdf_load_html_response) |