JPS61197500A - 基板の冷却装置 - Google Patents
基板の冷却装置Info
- Publication number
- JPS61197500A JPS61197500A JP3656385A JP3656385A JPS61197500A JP S61197500 A JPS61197500 A JP S61197500A JP 3656385 A JP3656385 A JP 3656385A JP 3656385 A JP3656385 A JP 3656385A JP S61197500 A JPS61197500 A JP S61197500A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cooling plate
- protrusions
- cooling
- front surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 61
- 238000001816 cooling Methods 0.000 claims abstract description 48
- 239000000498 cooling water Substances 0.000 claims abstract description 5
- 238000005468 ion implantation Methods 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052710 silicon Inorganic materials 0.000 abstract description 6
- 239000010703 silicon Substances 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 3
- 238000002347 injection Methods 0.000 abstract description 3
- 239000007924 injection Substances 0.000 abstract description 3
- 239000003507 refrigerant Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 238000010030 laminating Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- -1 polytetrafluoroethylene Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3656385A JPS61197500A (ja) | 1985-02-27 | 1985-02-27 | 基板の冷却装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3656385A JPS61197500A (ja) | 1985-02-27 | 1985-02-27 | 基板の冷却装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61197500A true JPS61197500A (ja) | 1986-09-01 |
| JPH0417920B2 JPH0417920B2 (enExample) | 1992-03-26 |
Family
ID=12473225
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3656385A Granted JPS61197500A (ja) | 1985-02-27 | 1985-02-27 | 基板の冷却装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61197500A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10177964A (ja) * | 1996-12-18 | 1998-06-30 | Shin Etsu Chem Co Ltd | イオン注入機用プラテン |
| JP2003511856A (ja) * | 1999-10-01 | 2003-03-25 | バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド | 表面構造およびその製造方法，ならびに表面構造を組み込む，静電ウエハクランプ |
| JP2019504442A (ja) * | 2015-12-22 | 2019-02-14 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | 温度制御されるイオン源 |
-
1985
- 1985-02-27 JP JP3656385A patent/JPS61197500A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10177964A (ja) * | 1996-12-18 | 1998-06-30 | Shin Etsu Chem Co Ltd | イオン注入機用プラテン |
| JP2003511856A (ja) * | 1999-10-01 | 2003-03-25 | バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド | 表面構造およびその製造方法，ならびに表面構造を組み込む，静電ウエハクランプ |
| JP2019504442A (ja) * | 2015-12-22 | 2019-02-14 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | 温度制御されるイオン源 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0417920B2 (enExample) | 1992-03-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |