JPS6118924B2 - - Google Patents
Info
- Publication number
- JPS6118924B2 JPS6118924B2 JP2845779A JP2845779A JPS6118924B2 JP S6118924 B2 JPS6118924 B2 JP S6118924B2 JP 2845779 A JP2845779 A JP 2845779A JP 2845779 A JP2845779 A JP 2845779A JP S6118924 B2 JPS6118924 B2 JP S6118924B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- weight
- parts
- formula
- hydrocarbon group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920001296 polysiloxane Polymers 0.000 claims description 25
- 239000000203 mixture Substances 0.000 claims description 24
- -1 acryloyloxy group Chemical group 0.000 claims description 20
- 150000002430 hydrocarbons Chemical group 0.000 claims description 16
- 125000003700 epoxy group Chemical group 0.000 claims description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 239000003504 photosensitizing agent Substances 0.000 claims description 6
- 239000004215 Carbon black (E152) Substances 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 229930195733 hydrocarbon Natural products 0.000 claims description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 3
- 229910000077 silane Inorganic materials 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 3
- 239000011248 coating agent Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- 239000000758 substrate Substances 0.000 description 12
- 239000011342 resin composition Substances 0.000 description 9
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 8
- 239000008096 xylene Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 125000003277 amino group Chemical group 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 238000009835 boiling Methods 0.000 description 6
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000002390 adhesive tape Substances 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 3
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000007259 addition reaction Methods 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910001507 metal halide Inorganic materials 0.000 description 3
- 150000005309 metal halides Chemical class 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 239000005051 trimethylchlorosilane Substances 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- SWFHGTMLYIBPPA-UHFFFAOYSA-N (4-methoxyphenyl)-phenylmethanone Chemical compound C1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 SWFHGTMLYIBPPA-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- 229940044192 2-hydroxyethyl methacrylate Drugs 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical group FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical class OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- GUUVPOWQJOLRAS-UHFFFAOYSA-N Diphenyl disulfide Chemical compound C=1C=CC=CC=1SSC1=CC=CC=C1 GUUVPOWQJOLRAS-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical group CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000005909 Kieselgur Substances 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 238000011067 equilibration Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Chemical group CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 238000000016 photochemical curing Methods 0.000 description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 235000011056 potassium acetate Nutrition 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 241000894007 species Species 0.000 description 2
- 239000013008 thixotropic agent Substances 0.000 description 2
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical class CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical group CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- ZDZYGYFHTPFREM-UHFFFAOYSA-N 3-[3-aminopropyl(dimethoxy)silyl]oxypropan-1-amine Chemical compound NCCC[Si](OC)(OC)OCCCN ZDZYGYFHTPFREM-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical group CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000002344 aminooxy group Chemical group [H]N([H])O[*] 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- SGLXWMAOOWXVAM-UHFFFAOYSA-L manganese(2+);octanoate Chemical compound [Mn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O SGLXWMAOOWXVAM-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229960003505 mequinol Drugs 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- DOIRQSBPFJWKBE-UHFFFAOYSA-N phthalic acid di-n-butyl ester Natural products CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Description
本発明は、光照射によりきわめて短時間で硬化
し、しかも耐湿接着性にすぐれた光硬化性オルガ
ノポリシロキサン組成物に関するものである。
従来、光(紫外線)照射により硬化するオルガ
ノポリシロキサンとしては種々のものが知られて
いるが、それらはいずれも光硬化後の耐湿性およ
び接着性において難点を有し、基板に密着しにく
いという欠点をもつていた。たとえば、金属やセ
ラミツク材料の基板表面に塗布し光硬化させたも
のについて、これを沸騰水中に約1時間浸漬する
と、基板への固着性が大幅に弱くなつてしまい、
接着テープをはりつけてこれを引きはがすと塗膜
がほとんど基板からはく離してしまうという問題
点があつた。
本発明は、このような従来の欠点を改良した新
規なオルガノポリシロキサン組成物を提供しよう
とするもので、これは
(イ) 平均組成式
〔式中、R1は二価炭化水素基を、R2は置換もし
くは非置換の一価炭化水素基を、Xのうちの少
なくとも1個は式
(ここにR3は水素原子または炭素原子数1〜4
のアルキル基を、R4は二価炭化水素基を表わ
す)で示される一価の基を、残余は水素原子を
それぞれ表わす。nは0または4以下の正の整
数、0<a≦3,0≦b<3、ただし0<a+
b≦3である。〕で示されるアクリロイルオキ
シ基含有オルガノポリシロキサン
100重量部、
(ロ) 一般式
R5 cSiZ4-c ……()
(式中、R2はエポキシ基を少なくとも1個
含む一価炭化水素基を、Zはハロゲン原子もし
くは加水分解可能な基をそれぞれ表わし、cは
1,2または3である。)で示されるエポキシ
基含有シランまたはその部分加水分解縮合物
0.01〜50重量部、
(ハ) 光増感剤
からなる組成物に関するものである。
本発明の組成物は、光照射によりたとえば30秒
間のようなきわめて短時間で硬化し、アルミナ基
板とかその他銅、鉄、亜鉛、すず、銀、パラジウ
ムなどの各種金属に対して顕著な接着性を示すと
共に耐湿接着性にすぐれているという特徴と有す
る。
これを説明すると、本発明に使用されるアクリ
ロイルオキシ基含有オルガノポリシロキサンは、
前記平均組成式()で示されるもので、式中の
R1で表わされる二価炭化水素基としては、メチ
レン基、エチレン基、プロピレン基等が例示さ
れ、R2で表わされる置換もしくは非置換の一価
炭化水素基としては、メチル基、エチル基、プロ
ピル基、ブチル基、ビニル基、アリル基、フエニ
ル基あるいはこれらの炭化水素基の水素原子の一
部もしくは全部がハロゲン原子等で置換された基
が例示される。Xは水素原子または前記式()
で示される一価の基であり、式中、R3は水素原
子または炭素原子数1〜4のアルキル基を表わ
し、このアルキル基としては、メチル基、エチル
基、プロピル基およびブチル基が例示され、また
R4は二価炭化水素基を表わし、これには上記R1
と同様のものが例示される。
該平均組成式()中nは0または4以下の正
の整数であり、aおよびbはそれぞれ0<a≦
3,0≦b<3であり、0<a+b≦3である。
本発明においては、該平均組成式()中にお
けるXのうちの少くとも1個が式()で示され
る一価の基であることが本発明に係るオルガノポ
リシロキサン組成物の光照射による硬化を確実に
行わせる上で必要とされる。
本発明においては、上記平均組成式()で示
されるアクリロイルオキシ基含有オルガノポリシ
ロキサンとしては該()式中のR1がプロピレ
ン基で、R2がメチル基、ビニル基またはフエニ
ル基であり、Xが式
で示される一価の基である化合物がとくに好まし
い。
このような平均組成式()で示されるアクリ
ロイルオキシ基含有オルガノポリシロキサンは、
二つの方法によつて製造することができ、この第
1の方法は
平均組成式
(式中、R1は二価炭化水素基を、R2は置換も
しくは非置換の一価炭化水素基をそれぞれ表わ
し、nは0または4以下の正の整数、0<a≦
3,0≦b<3、ただし0<a+b≦3である)
で示されるオルガノポリシロキサンと一般式
(式中、R3は水素原子または炭素原子数1〜
4のアルキル基を、R4は二価炭化水素基をそれ
ぞれ表わす)で示されるアクリル酸誘導体とを付
加反応させる方法により得ることができ、また第
2の方法は1分子中にけい素原子に結合する水酸
基またはアルコキシ基を有するオルガノポリシロ
キサンと一般式
〔式中、R1は二価炭化水素基を、R2は置換も
しくは非置換の一価炭化水素基を、R6は水素原
子または炭素原子数1〜4のアルキル基を、Xの
うち少くとも1個は式
(ここにR3は水素原子または炭素原子数1〜
4のアルキル基を、R4は二価炭化水素基を表わ
す)で示される基を、残余は水素原子をそれぞれ
表わし、nは0または4以下の正の整数、dは0
または2以下の正の整数、fは3以下の正の整
数、ただしd+fは3以下の正で整数である〕で
示される有機けい素化合物とを反応させる方法に
より得ることができる。
つぎに、本発明に使用される(ロ)成分としてのエ
ポキシ基含有シランは、前記一般式()で示さ
れるもので、式中のR5はエポキシ基を少くとも
1個含む一価炭化水素基で、これにはエポキシ基
をもつ直鎖状または脂環式のいずれも包含され
る。また式中のZはハロゲン原子もしくは加水分
解可能な基で、この加水分解可能な基としてはア
ルコキシ基、アシロキシ基、アミノ基、アヨド
基、アミノオキシ基、ケトオキシム基、ビニロキ
シ基が例示される。
このエポキシ基含有シランは、その式中のcが
1,2または3であるような各種組合せ(R5と
Zとの各種組合せ)のものが存在し、いずれも使
用されるが、本発明においてはそれら各種のエポ
キシ基含有シランの1種または2種以上の混合物
の部分加水分解縮合も有効に使用することができ
る。
なお、R5とZの各種組合せからなるエポキシ
基含有シランのうちでも特には、γ−グリシジル
オキシプロピルトリメトキシシラン、β−(3,
4−エポキシ・シクロヘキシル)エチルトリメト
キシシランなど、あるいはそれらの部分加水分解
縮合物(重合度おおむね10以下)を使用すること
が望ましい。
(ロ)成分の配合割合は前記した(イ)成分100重量部
あたり、0.01〜50重量部とすることが必要とされ
る。これは0.01重量部以下のような少量では耐湿
接着性の効果が出ず、一方50重量%以上では光感
基の相対量が減り、光硬化性に劣るようになるか
らである。
(ハ)成分としての光増感剤はベンゾインとその誘
導体、ベンゾインメチルエーテルなどのベンゾイ
ンエーテル類、ベンジルとその誘導体、アリール
ジアゾニウム塩、アントラキノンとその誘導体、
アセトフエノンとその誘導体、ジフエニルジスル
フイドなどのイオウ化合物、ベンゾフエノンとそ
の誘導体などがあげられ、これらの光増感剤の1
種または2種以上の混合物が用いられる。これら
の光増感剤は(イ)成分100重量部に対して0.01〜30
重量部の範囲で使用されることが効果的である。
0.01重量部より少ない場合には光重合性樹脂組成
物の光硬化速度が遅いうえに、樹脂硬化物の電気
的性質や機械的性質のすぐれた硬化塗膜が得られ
ず好ましくなく、30重量部より多い場合にはかえ
つて高分子量の樹脂硬化物が得られないうえに電
気的性質が著しく低下し好ましくなく、いずれの
場合も実用に供し難い。なお、光増感剤の添加量
はとくに0.1〜5重量部とすることが望ましい。
本発明にかかわる樹脂組成物は以上述べた(イ),
(ロ)および(ハ)成分を混合することにより得られるが
この場合に(イ)成分をあらかじめトルエン、キシレ
ン等の芳香族炭化水素、さらにはケトンやアルコ
ール系の溶剤に溶解し、これに(ロ)成分および(ハ)成
分を均一に混合後、溶剤を除去する方法を採用し
てもよい。
また、(イ)成分と(ロ)成分とを有機溶剤と共に混合
し、この混合物を加熱処理した後(この加熱処理
により部分的に両者の付加反応が進行すると思わ
れる)、(ハ)成分を均一に混合し、溶剤を除去する
という方法によつてもよい。
本発明の組成物を目的の基材に塗布したり、ま
た含浸したりする場合に粘度調節剤を使用すると
よいことがあり、このような目的で使用される粘
度調節剤としては1分子中に少なくとも1個の
The present invention relates to a photocurable organopolysiloxane composition that cures in an extremely short time when exposed to light and has excellent moisture-resistant adhesive properties. Various organopolysiloxanes that can be cured by light (ultraviolet) irradiation have been known, but all of them have problems with moisture resistance and adhesion after photocuring, and are difficult to adhere to substrates. It had its drawbacks. For example, if a metal or ceramic material that has been applied to the surface of a substrate and photocured is immersed in boiling water for about an hour, its adhesion to the substrate will be significantly weakened.
There was a problem in that when adhesive tape was applied and then removed, most of the paint film was peeled off from the substrate. The present invention aims to provide a novel organopolysiloxane composition that improves such conventional drawbacks, and which has (a) an average compositional formula of [In the formula, R 1 is a divalent hydrocarbon group, R 2 is a substituted or unsubstituted monovalent hydrocarbon group, and at least one of X is a (Here, R 3 is a hydrogen atom or a carbon atom number of 1 to 4
R4 represents a divalent hydrocarbon group), and the remainder represents a hydrogen atom. n is 0 or a positive integer of 4 or less, 0<a≦3, 0≦b<3, but 0<a+
b≦3. ] 100 parts by weight of an acryloyloxy group-containing organopolysiloxane, (b) General formula R 5 c SiZ 4-c ... () (wherein R 2 is a monovalent hydrocarbon group containing at least one epoxy group , Z represents a halogen atom or a hydrolyzable group, and c is 1, 2 or 3) or a partially hydrolyzed condensate thereof
This relates to a composition comprising 0.01 to 50 parts by weight of (c) a photosensitizer. The composition of the present invention cures in a very short time, for example, 30 seconds, when irradiated with light, and exhibits remarkable adhesion to alumina substrates and various other metals such as copper, iron, zinc, tin, silver, and palladium. It also has the characteristics of excellent moisture-resistant adhesion. To explain this, the acryloyloxy group-containing organopolysiloxane used in the present invention is
It is represented by the above average compositional formula (), in which:
Examples of the divalent hydrocarbon group represented by R 1 include a methylene group, ethylene group, and propylene group, and examples of the substituted or unsubstituted monovalent hydrocarbon group represented by R 2 include a methyl group, an ethyl group, Examples include a propyl group, a butyl group, a vinyl group, an allyl group, a phenyl group, or a group in which some or all of the hydrogen atoms of these hydrocarbon groups are substituted with a halogen atom or the like. X is a hydrogen atom or the above formula ()
In the formula, R 3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and examples of the alkyl group include a methyl group, an ethyl group, a propyl group, and a butyl group. and also
R 4 represents a divalent hydrocarbon group, which includes the above R 1
An example similar to this is given. In the average composition formula (), n is 0 or a positive integer of 4 or less, and a and b are each 0<a≦
3, 0≦b<3, and 0<a+b≦3. In the present invention, at least one of X in the average compositional formula () is a monovalent group represented by the formula (), and the organopolysiloxane composition according to the present invention is cured by light irradiation. This is necessary to ensure that this is carried out reliably. In the present invention, the acryloyloxy group-containing organopolysiloxane represented by the above average composition formula () in which R 1 is a propylene group, R 2 is a methyl group, a vinyl group, or a phenyl group, X is a formula Particularly preferred are compounds which are monovalent groups represented by: The acryloyloxy group-containing organopolysiloxane represented by the average composition formula () is
It can be produced by two methods, the first of which is the average composition formula (In the formula, R 1 represents a divalent hydrocarbon group, R 2 represents a substituted or unsubstituted monovalent hydrocarbon group, n is 0 or a positive integer of 4 or less, 0<a≦
3, 0≦b<3, but 0<a+b≦3)
Organopolysiloxane and general formula shown by (In the formula, R 3 is a hydrogen atom or has 1 to 1 carbon atoms.
The alkyl group of 4 can be obtained by addition reaction with an acrylic acid derivative represented by (R 4 represents a divalent hydrocarbon group, respectively), and the second method is a method in which silicon atoms are added to each molecule in one molecule. Organopolysiloxane with bonded hydroxyl or alkoxy groups and general formula [In the formula, R 1 is a divalent hydrocarbon group, R 2 is a substituted or unsubstituted monovalent hydrocarbon group, R 6 is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and Both are expressions (Here, R 3 is a hydrogen atom or a carbon atom number of 1 to
4 represents an alkyl group, R 4 represents a divalent hydrocarbon group), the remainder represents a hydrogen atom, n is 0 or a positive integer of 4 or less, d is 0
or a positive integer of 2 or less, f is a positive integer of 3 or less, where d+f is a positive integer of 3 or less]. Next, the epoxy group-containing silane as component (b) used in the present invention is represented by the above general formula (), where R 5 is a monovalent hydrocarbon containing at least one epoxy group. A group, which includes either a linear or alicyclic group having an epoxy group. Z in the formula is a halogen atom or a hydrolyzable group, and examples of the hydrolyzable group include an alkoxy group, an acyloxy group, an amino group, an ayodo group, an aminooxy group, a ketoxime group, and a vinyloxy group. This epoxy group-containing silane has various combinations (various combinations of R 5 and Z) in which c in the formula is 1, 2, or 3, and any of them can be used, but in the present invention, Partial hydrolytic condensation of one type or a mixture of two or more of these various epoxy group-containing silanes can also be effectively used. Note that among the epoxy group-containing silanes consisting of various combinations of R5 and Z, γ-glycidyloxypropyltrimethoxysilane, β-(3,
It is desirable to use 4-epoxycyclohexyl)ethyltrimethoxysilane or a partially hydrolyzed condensate thereof (degree of polymerization of approximately 10 or less). The blending ratio of component (b) is required to be 0.01 to 50 parts by weight per 100 parts by weight of component (a). This is because if the amount is as small as 0.01 part by weight or less, no moisture-resistant adhesive effect will be obtained, while if it is more than 50% by weight, the relative amount of photosensitive groups will decrease and the photocurability will be poor. Photosensitizers as the component (c) include benzoin and its derivatives, benzoin ethers such as benzoin methyl ether, benzyl and its derivatives, aryl diazonium salts, anthraquinone and its derivatives,
Examples of these photosensitizers include acetophenone and its derivatives, sulfur compounds such as diphenyl disulfide, and benzophenone and its derivatives.
Species or mixtures of two or more species may be used. These photosensitizers are used in amounts of 0.01 to 30 parts by weight per 100 parts by weight of component (a).
It is effective to use within the range of parts by weight.
If the amount is less than 0.01 part by weight, the photocuring speed of the photopolymerizable resin composition is slow and a cured coating film with excellent electrical and mechanical properties cannot be obtained from the cured resin, which is undesirable. If the amount is larger than this, a cured resin product with a high molecular weight cannot be obtained, and the electrical properties are significantly deteriorated, which is undesirable, and in either case, it is difficult to put it into practical use. The amount of photosensitizer added is preferably 0.1 to 5 parts by weight. The resin composition according to the present invention is as described above (a).
It can be obtained by mixing components (b) and (c), but in this case, component (a) is dissolved in advance in an aromatic hydrocarbon such as toluene or xylene, or even in a ketone or alcohol-based solvent, and then the ( A method may be adopted in which the solvent is removed after uniformly mixing component (b) and component (c). In addition, after mixing component (a) and component (b) with an organic solvent and heat-treating this mixture (this heat treatment seems to partially progress the addition reaction between the two), component (c) is mixed. A method of uniformly mixing and removing the solvent may also be used. When applying or impregnating a target substrate with the composition of the present invention, it may be advantageous to use a viscosity modifier. at least one
【式】(式中のR7は水素原子また
は炭素原子数1〜4のアルキル基を表わす)で示
される基を有し、かつ常圧における沸点が100℃
以上であるように付加重合性単量体が好ましく、
これにはスチレン、ビニルトルエンなどのスチレ
ン誘導体、アクリル酸、アクリル酸ブチルなどの
アクリル酸系化合物、メタクリル酸、メタクリル
酸エチルなどのメタクリル酸系化合物、1,6−
ヘキサンジオールジアクリレート、エチレングリ
コールジメタクリレート、トリメチロールプロパ
ントリメタクリレートなどの2個以上の不飽和基
を有する多官能アクリル酸エステル系化合物ある
いは多官能メタクリル酸エステル系化合物、2−
ヒドロキシエチルメタクリレート、2−ヒドロキ
シメタクリレート、アロニツクスM−5700,M−
6300,M−7100+M−8060(東亜合成化学工業
製、商品名)などのアクリロイルオキシ基あるい
はメタクリロイルオキシ基を持つポリエステル系
オリゴマー、その他ジビニルベンゼン、ジアリル
フタレートなどの多官能ビニル単量体などがあげ
られ、これらの単量体の1種または2種以上の混
合物が用いられる。これらの単量体は本発明組成
物100重量部に対して500重量部以下の量で使用さ
れることが効果的である。500重量部よりも多い
量使用すると、硬化膜の電気的性質、機械的性質
および耐熱性が低下するために好ましくなくいず
れの場合にも実用に供し難い。
なお、本発明の組成物には必要に応じ、充填
剤、揺変剤、顔料(着色剤)、酸化防止剤、接着
付与剤および表面硬化促進剤、ラジカル重合開始
剤などを配合することは差支えない。
充填剤としては酸化アルミニウム、二酸化ケイ
素、炭酸カルシウム、二酸化チタン、硫酸バリウ
ム、雲母粉などが使用可能であり、揺変剤として
は比表面積100〜450m2/gなる二酸化ケイ素微粉
末などがよい。また、着色剤としてはフタロシア
ニングリーン、フタロシアニンブルーをはじめ通
常の顔料および染料が使用可能である。
酸化防止剤としてはハイドロキノン、ハイドロ
キノンメチルエーテル、カテコール、2,6−ジ
−t−ブチル−4−メチルフエノールなどの通常
の熱重合禁止剤が有効であり、接着性付与剤とし
てはγ−メタクリロシプロピルトリメトキシシラ
ン、ビニルトリス(β−メトキシエトキシ)シラ
ン、N−β(アミノエチル)−γ−アミノプロピ
ルトリメトキシシラン、γ−アミノプロピルトリ
エトキシシラン、N−β(アミノエチル)−γ−
アミノプロピルメチルジメトキシシランなどのシ
ランカツプリング剤などがよく、とくにはN−β
(アミノエチル)−γ−アミノプロピルトリメトキ
シシラン、γ−アミノプロピルトリエトキシシラ
ンが望ましい。
表面硬化促進剤としてはナフテン酸コバルト、
オクチル酸マンガンなどの有機酸金属塩などがよ
い。
これによつて得られた樹脂硬化物は電気特性と
くに誘導率および誘電正接の周波数特性、温度特
性がきわめて優れているうえに耐熱性があり、連
続使用温度が150℃以上であり、かつまた耐湿性
がよい。
本発明にかかわる樹脂組成物は、充填剤の配合
は必須とされないが、これが配合される場合の樹
脂組成物の粘度は、スクリーン印刷法、あるいは
スプレー法など塗布方法により異なるが、常温に
おいて100〜250000センチポイズであることが望
ましい。
本発明の組成物の硬化は光照射により行われる
が、この光線の供給源たる光源としては高圧水銀
灯、超高圧水銀灯、メタルハライドランプ、カー
ボンアーク灯、キセノン灯などがある。
以下、参考例ならびに実施例をあげて説明す
る。
参考例 1
水酸基含有オルガノポリシロキサン(水酸基含
有量5重量%、メチル基/フエニル基=1.6、25
℃における粘度52センチポイズ)を70%含有する
キシレン溶液860g、N−(2−アミノエチル)−
3−アミノプロピルトリメトキシシラン150g、
キシレン870gおよび平衡化触媒として水酸化カ
リウム0.5gからなる混合物を、90℃で3時間還
流下に加熱したのち、ここで生成したメタノール
45gを除去し、アミノ基含有オルガノポリシロキ
サンを得た。
つぎに、上記で得たアミノ基含有オルガノポリ
シロキサンに、グリシジルメタクリレート260g
を加え、70℃で3時間反応させ、アミノ基とエポ
キシ基との付加反応によりアクリロイルオキシ基
含有オルガノポリシロキサン組成溶液を得た。
ついで、中和の目的でトリメチルクロロシラン
2g、キシレン2gおよび酢酸カリウム15gを添
加し、60℃で1時間かくはんしたのち、ろ過助剤
としてけいそう土30gを加え常圧ろ過を行い、さ
らにキシレン、トリメチルクロロシランおよびそ
の他未反応物を除去したところ、淡黄色透明で粘
度が126000センチポイズの反応生成物が得られ
た。
このものは赤外吸収スペクトル分析の結果アク
リロイルオキシ基を含有するオルガノポリシロキ
サンであることが確認された。
参考例 2
水酸基含有オルガノポリシロキサン(水酸基含
有量5重量部、メチル基/フエニル基=1.6)を
70%含有するキシレン溶液860g、N−(2−アミ
ノエチル)−3−アミノプロピルトリメトキシシ
ラン150g、キシレン870gおよび平衡化触媒とし
て水酸化カリウム0.2gからなる混合物を88℃で
8時間加熱還流した後、1時間要して126℃まで
昇温し、生成したメタノールを45g除去してアミ
ノ基含有オルガノポリシロキサンを得た。
つぎに、こうして得たアミノ基含有オルガノポ
リシロキサンに、グリシジルメタクリレート200
gとγ−グリシドキシプロピルトリメトキシシラ
ンの部分加水分解縮合物25gとの混合液を60℃に
保持しながら1時間かけて滴下し、その後3時間
熟成し、アミノ基とエポキシ基との付加反応によ
りアクリロイルオキシ基含有オルガノポリシロキ
サン組成溶液を得た。ついで中和の目的でトリメ
チルクロロシラン2g、キシレン4g、および酢
酸カリウム15gを添加し、50℃で2時間かくはん
した後、3時間室温で放置し、中和沈でんを完全
にさせた後、ろ過助剤としてけいそう土30gを加
え、常圧ろ過を行い、さらに60℃、2mmHgの減
圧下で6時間蒸留してキシレン、トリメチルクロ
ロシラン、その他の低沸点未反応物を除去したと
ころ、淡黄色透明で粘度が75000センチポイズの
反応生成物を得た。
このものは赤外線吸収スペクトル分析の結果、
アクリロイルオキシ基およびエポキシ基を含有す
るオルガノポリシロキサンであることが確認され
た。
実施例 1
上記の参考例1で得たアクリロイルオキシ基含
有オルガノポリシロキサン100重量部、2−ヒド
ロキシエチルメタクリレート40重量部、4−メト
キシベンゾフエノン0.5重量部、γ−グリシドキ
シプロピルトリメトキシシラン3重量部、KBM
−603(N−β(アミノエチル)−γ−アミノプロ
ピルトリメトキシシラン、信越化学社製商品名〕
5重量部を均一に混合して樹脂組成物とし、これ
をアルミナ基板上に塗布し高圧水銀灯
(3.2KW)を12cm離れたところから約1分間照射
して約100μmの膜厚の硬化塗膜を得た。この塗
膜を有するアルミナ基板を沸騰水中に1時間浸漬
し、乾燥後その塗膜について諸試験を行つたとこ
ろ、下記のとおりであつた。
(イ) 塗膜硬度(鉛筆硬度):3H
(ロ) ごばん目テスト:100/100
(ハ) クロスカツトはく離テスト:カミソリの刃で
約30゜の角度をもつクロスカツトをし、粘着テ
ープはく離を見たが、完全接着のままではく離
は見られなかつた。
(ニ) 耐溶剤性:室温で1,1,1−トリクロロエ
タンとn−ブチルカルビトールとの混合液
(1:1)中に10分間浸漬したがはく離などは
起こらず、また固液中に超音波浸漬を10分間行
つたがやはり変化はなく完全接着したままであ
つた。
(ホ) 耐熱性:230℃のハンダ液に2分間浸漬した
が塗膜に変化は生じなかつた。
(ヘ) 誘電率(周波数0.1〜10KHz、温度20〜150
℃):2.8〜3.8
(ト) 誘電正接(周波数0.1〜10KHz、温度20〜150
℃):0.7〜1.9%
(チ) 耐熱劣化テスト:200℃で1000時間加熱した
が、誘電率、誘電正接の物性にほとんど変化は
生じなかつた。
実施例 2
上記の参考例2で得たアクリロイルオキシ基含
有オルガノポリシロキサン100重量部、エチレン
グリコールジメタクリレート20重量部、アロニツ
クスM−5700(東亜合成化学工業製商品名)20重
量部、ベンゾフエノン0.5重量部からなる樹脂組
成物を基板に塗布し、つづいてメタルハライドラ
ンプ(3KW)を15cm離れたところから約20秒間
照射し硬化塗膜を得た。このものを沸騰水中に1
時間浸漬し、これを乾燥させてから粘着テープに
よる引きはがしテストを行つたところ、塗膜がは
がれたりめくれたりすることなく、外観異常は全
く認められなかつた。
実施例 3
上記の参考例2で得たアクリロイルオキシ基含
有オルガノポリシロキサン100重量部、2−ヒド
ロキシプロピルメタクリレート30重量部、アロニ
ツクスM−6300(東亜合成化学工業製商品名)30
重量部、γ−グリシドオキシプロピルトリメトキ
シシラン5重量部、KBE−903(γ−アミノプロ
ピルトリエトキシシラン、信越化学社製商品名)
5重量部、4−メトキシベンゾフエノン0.5重量
部、2−メチルアントラキノン0.5重量部、平均
粒径1μmのα−アルミナ粉末50重量部、比表面
積380m2/gの二酸化けい素微粉末7重量部、フ
タロシアニングリーン2重量部、γ−メタクリロ
キシプロピルトリメトキシシラン3重量部を混合
後、三本ロール混練により均一にした樹脂組成物
を基板上に通常のスクリーン印刷機により約20μ
m厚に印刷し、メタルハライドランプ(3KW)
を10cm離れたところから約20秒間照射して平滑な
硬化塗膜を得た。この硬化塗膜はピンホールがな
いうえに、はんだリフロー(230℃/20秒)後に
おいても基板の密着性の低下もなく良好であり、
硬化塗膜は鉛筆硬度で5H以上である。また、は
んだフラツクスの洗浄に使用される1,1,1−
トリクロロエチレンに常温30分間浸漬あるいは超
音波浸漬5分後も変化は認められず、耐溶剤性を
すぐれていた。また、沸騰水中に1時間浸漬した
後粘着テープによる引きはがしテストを行つた
が、塗膜は基板に密着したままであつた。
実施例 4
寸法20mm×20mm×1mmtの96%アルミナ基板の
片面にPd−Ag系電極材料(エレクトロ−サイエ
ンス−ラボラトリーズ社製、商品名ESL9630)を
スクリーン印刷し、950℃で10分間焼成して下部
電極(膜厚10μm)を作成し、その上にBaTiO3
を主成分とする誘電体材料(デユポン社製、商品
名Dp8289)を印刷し、130℃で20分間乾燥し誘電
体(膜厚50μm)を作成し、さらにこその上に前
記したPd−Ag系電極材料を印刷し、950℃で10分
間焼成し上部電極(膜厚10μm)を作成し、厚膜
コンデンサを得た。
上記厚膜コンデンサに実施例2で得た樹脂組成
物をはけ塗りで塗布し、高圧水銀灯(3.2KW)
を15cm離れたところから60秒間照射し硬化させ
た。この樹脂被覆厚膜コンデンサを高湿負荷試験
(150℃ふん囲気中DC75V印加)および恒湿負荷
試験(60℃/95%RHふん囲気中、DC75V印加)
を1500時間行つても絶縁破壊電圧の低下もなく、
耐熱性および耐湿密着性のすぐれた樹脂被覆厚膜
コンデンサが得られた。
以上述べたごとく本発明による樹脂組成物は常
温で短時間に硬化するうえに誘電率、誘電正接が
周波数および温度により変動せず、しかも耐熱性
および接着性がきわめて優れており、かつまた硬
化塗膜にピンホールがないので耐湿性がよい。It has a group represented by the following formula (R 7 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms), and has a boiling point of 100°C at normal pressure.
As mentioned above, addition polymerizable monomers are preferable,
These include styrene, styrene derivatives such as vinyltoluene, acrylic acid compounds such as acrylic acid and butyl acrylate, methacrylic acid compounds such as methacrylic acid and ethyl methacrylate, and 1,6-
Polyfunctional acrylic ester compounds or polyfunctional methacrylic ester compounds having two or more unsaturated groups such as hexanediol diacrylate, ethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, 2-
Hydroxyethyl methacrylate, 2-hydroxy methacrylate, Aronix M-5700, M-
Examples include polyester oligomers with acryloyloxy or methacryloyloxy groups such as 6300, M-7100+M-8060 (manufactured by Toagosei Kagaku Kogyo Co., Ltd., trade name), and other polyfunctional vinyl monomers such as divinylbenzene and diallyl phthalate. , one or a mixture of two or more of these monomers may be used. It is effective to use these monomers in an amount of 500 parts by weight or less based on 100 parts by weight of the composition of the present invention. If more than 500 parts by weight is used, the electrical properties, mechanical properties and heat resistance of the cured film will deteriorate, which is undesirable and difficult to put to practical use in any case. It should be noted that fillers, thixotropic agents, pigments (coloring agents), antioxidants, adhesion promoters, surface hardening accelerators, radical polymerization initiators, etc. may be added to the composition of the present invention as necessary. do not have. As the filler, aluminum oxide, silicon dioxide, calcium carbonate, titanium dioxide, barium sulfate, mica powder, etc. can be used, and as the thixotropic agent, fine silicon dioxide powder having a specific surface area of 100 to 450 m 2 /g is preferable. Further, as the coloring agent, ordinary pigments and dyes such as phthalocyanine green and phthalocyanine blue can be used. Usual thermal polymerization inhibitors such as hydroquinone, hydroquinone methyl ether, catechol, and 2,6-di-t-butyl-4-methylphenol are effective as antioxidants, and γ-methacrylosiloxane is effective as an adhesive agent. Propyltrimethoxysilane, Vinyltris(β-methoxyethoxy)silane, N-β(aminoethyl)-γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, N-β(aminoethyl)-γ-
Silane coupling agents such as aminopropylmethyldimethoxysilane are good, especially N-β
(Aminoethyl)-γ-aminopropyltrimethoxysilane and γ-aminopropyltriethoxysilane are preferred. As a surface hardening accelerator, cobalt naphthenate,
Organic acid metal salts such as manganese octylate are preferable. The cured resin material obtained by this method has excellent electrical properties, especially frequency characteristics of dielectric constant and dielectric loss tangent, and temperature characteristics. It is also heat resistant, can be used continuously at temperatures of 150°C or higher, and is moisture resistant. Good sex. The resin composition according to the present invention does not necessarily include a filler, but when it is blended, the viscosity of the resin composition varies depending on the application method such as screen printing or spraying, but at room temperature the viscosity is 100~ Preferably 250,000 centipoise. The composition of the present invention is cured by light irradiation, and examples of the light source that supplies this light include high-pressure mercury lamps, ultra-high-pressure mercury lamps, metal halide lamps, carbon arc lamps, and xenon lamps. Hereinafter, reference examples and examples will be given and explained. Reference example 1 Hydroxyl group-containing organopolysiloxane (hydroxyl group content 5% by weight, methyl group/phenyl group = 1.6, 25
860 g of a xylene solution containing 70% N-(2-aminoethyl)-
150g of 3-aminopropyltrimethoxysilane,
After heating a mixture of 870 g of xylene and 0.5 g of potassium hydroxide as an equilibration catalyst under reflux at 90°C for 3 hours, the methanol produced here
45 g was removed to obtain an amino group-containing organopolysiloxane. Next, 260 g of glycidyl methacrylate was added to the amino group-containing organopolysiloxane obtained above.
was added and reacted at 70°C for 3 hours to obtain an acryloyloxy group-containing organopolysiloxane composition solution by addition reaction between the amino group and the epoxy group. Next, 2 g of trimethylchlorosilane, 2 g of xylene, and 15 g of potassium acetate were added for the purpose of neutralization, and after stirring at 60°C for 1 hour, 30 g of diatomaceous earth was added as a filter aid and filtered under normal pressure. When chlorosilane and other unreacted substances were removed, a pale yellow, transparent reaction product with a viscosity of 126,000 centipoise was obtained. As a result of infrared absorption spectrum analysis, this product was confirmed to be an organopolysiloxane containing an acryloyloxy group. Reference Example 2 Hydroxyl group-containing organopolysiloxane (hydroxyl group content: 5 parts by weight, methyl group/phenyl group = 1.6)
A mixture consisting of 860 g of a 70% xylene solution, 150 g of N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, 870 g of xylene, and 0.2 g of potassium hydroxide as an equilibration catalyst was heated under reflux at 88° C. for 8 hours. Thereafter, the temperature was raised to 126° C. over a period of 1 hour, and 45 g of generated methanol was removed to obtain an amino group-containing organopolysiloxane. Next, glycidyl methacrylate 200 was added to the amino group-containing organopolysiloxane thus obtained.
A mixture of g and 25 g of a partially hydrolyzed condensate of γ-glycidoxypropyltrimethoxysilane was added dropwise over 1 hour while being maintained at 60°C, and then aged for 3 hours to form an amino group and an epoxy group. Through the reaction, an acryloyloxy group-containing organopolysiloxane composition solution was obtained. Next, for the purpose of neutralization, 2 g of trimethylchlorosilane, 4 g of xylene, and 15 g of potassium acetate were added, stirred at 50°C for 2 hours, and left at room temperature for 3 hours to completely neutralize the sediment. 30g of diatomaceous earth was added, filtered under normal pressure, and further distilled for 6 hours at 60°C under a reduced pressure of 2mmHg to remove xylene, trimethylchlorosilane, and other low-boiling unreacted substances.As a result, the product was pale yellow, transparent, and viscous. A reaction product of 75,000 centipoise was obtained. This is the result of infrared absorption spectrum analysis.
It was confirmed that it was an organopolysiloxane containing an acryloyloxy group and an epoxy group. Example 1 100 parts by weight of the acryloyloxy group-containing organopolysiloxane obtained in Reference Example 1 above, 40 parts by weight of 2-hydroxyethyl methacrylate, 0.5 parts by weight of 4-methoxybenzophenone, γ-glycidoxypropyltrimethoxysilane 3 parts by weight, KBM
-603 (N-β(aminoethyl)-γ-aminopropyltrimethoxysilane, trade name manufactured by Shin-Etsu Chemical Co., Ltd.)
5 parts by weight were mixed uniformly to form a resin composition, which was applied onto an alumina substrate and irradiated with a high-pressure mercury lamp (3.2 KW) from a distance of 12 cm for about 1 minute to form a cured coating film with a thickness of about 100 μm. Obtained. The alumina substrate having this coating film was immersed in boiling water for 1 hour, and after drying, the coating film was subjected to various tests, and the results were as follows. (a) Paint film hardness (pencil hardness): 3H (b) Vertical test: 100/100 (c) Cross cut peeling test: Make a cross cut at an angle of about 30° with a razor blade and check for peeling of the adhesive tape. However, the adhesive remained completely adhered and no peeling was observed. (d) Solvent resistance: No peeling occurred when immersed in a mixture of 1,1,1-trichloroethane and n-butylcarbitol (1:1) at room temperature for 10 minutes, and there was no Even though sonic immersion was performed for 10 minutes, there was no change and the bond remained completely adhered. (e) Heat resistance: No change occurred in the coating film even though it was immersed in solder solution at 230°C for 2 minutes. (f) Dielectric constant (frequency 0.1~10KHz, temperature 20~150
℃): 2.8~3.8 (g) Dielectric loss tangent (frequency 0.1~10KHz, temperature 20~150
°C): 0.7 to 1.9% (h) Heat resistance deterioration test: Although heated at 200 °C for 1000 hours, there was almost no change in the physical properties such as dielectric constant and dielectric loss tangent. Example 2 100 parts by weight of the acryloyloxy group-containing organopolysiloxane obtained in Reference Example 2 above, 20 parts by weight of ethylene glycol dimethacrylate, 20 parts by weight of Aronix M-5700 (trade name manufactured by Toagosei Chemical Industry Co., Ltd.), 0.5 parts by weight of benzophenone. A resin composition consisting of 30% was applied to a substrate, and then irradiated with a metal halide lamp (3KW) from a distance of 15cm for about 20 seconds to obtain a cured coating. 1 of this stuff in boiling water
When the coating was immersed for a period of time, dried, and then peeled off using adhesive tape, the coating did not peel off or peel off, and no abnormalities in appearance were observed. Example 3 100 parts by weight of the acryloyloxy group-containing organopolysiloxane obtained in Reference Example 2 above, 30 parts by weight of 2-hydroxypropyl methacrylate, Aronix M-6300 (trade name manufactured by Toagosei Chemical Industry Co., Ltd.) 30
Parts by weight, 5 parts by weight of γ-glycidoxypropyltrimethoxysilane, KBE-903 (γ-aminopropyltriethoxysilane, trade name manufactured by Shin-Etsu Chemical Co., Ltd.)
5 parts by weight, 0.5 parts by weight of 4-methoxybenzophenone, 0.5 parts by weight of 2-methylanthraquinone, 50 parts by weight of α-alumina powder with an average particle size of 1 μm, and 7 parts by weight of silicon dioxide fine powder with a specific surface area of 380 m 2 /g. , 2 parts by weight of phthalocyanine green, and 3 parts by weight of γ-methacryloxypropyltrimethoxysilane, and the resin composition made uniform by three-roll kneading is printed on a substrate by an ordinary screen printing machine to about 20 μm.
Printed to m thickness, metal halide lamp (3KW)
was irradiated for about 20 seconds from a distance of 10 cm to obtain a smooth cured coating. This cured coating has no pinholes and maintains good adhesion to the board even after solder reflow (230°C/20 seconds).
The cured coating film has a pencil hardness of 5H or higher. Also, 1,1,1- used for cleaning solder flux.
No change was observed even after 30 minutes of immersion in trichlorethylene at room temperature or 5 minutes of ultrasonic immersion, indicating excellent solvent resistance. Further, a peel test using an adhesive tape was performed after immersion in boiling water for 1 hour, but the coating remained in close contact with the substrate. Example 4 Pd-Ag based electrode material (manufactured by Electro Science Laboratories, trade name: ESL9630) was screen printed on one side of a 96% alumina substrate with dimensions of 20 mm x 20 mm x 1 mm, and baked at 950°C for 10 minutes to remove the lower part. Create an electrode (film thickness 10 μm) and deposit BaTiO 3 on top of it.
A dielectric material (manufactured by Dupont, trade name: Dp8289) containing Pd-Ag as the main component was printed and dried at 130°C for 20 minutes to create a dielectric material (film thickness 50 μm). The electrode material was printed and baked at 950°C for 10 minutes to create an upper electrode (film thickness: 10 μm), and a thick film capacitor was obtained. The resin composition obtained in Example 2 was applied with a brush to the above thick film capacitor, and a high-pressure mercury lamp (3.2KW) was applied.
was irradiated for 60 seconds from a distance of 15 cm to cure it. This resin-coated thick film capacitor was subjected to high-humidity load tests (DC75V applied in a 150℃ atmosphere) and constant humidity load tests (DC75V applied in a 60℃/95%RH atmosphere).
There was no drop in dielectric breakdown voltage even after 1500 hours of
A resin-coated thick film capacitor with excellent heat resistance and moisture-resistant adhesion was obtained. As described above, the resin composition according to the present invention cures in a short time at room temperature, has a dielectric constant and a dielectric loss tangent that do not vary depending on frequency and temperature, has extremely excellent heat resistance and adhesive properties, and has a cured coating. There are no pinholes in the film, so it has good moisture resistance.
Claims (1)
くは非置換の一価炭化水素を、Xのうちの少な
くとも1個は式 (ここにR3は水素原子または炭素原子数1
〜4のアルキル基を、R4は二価炭化水素基を
表わす)で示される一価の基を、残余は水素原
子をそれぞれ表わす。nは0または4以下の正
の整数、0<a≦3,0≦b<3、ただし0<
a+b≦3である。〕で示されるアクリロイル
オキシ基含有オルガノポリシロキサン 100重
量部、 (ロ) 一般式 R5 cSiZ4-c (式中、R2はエポキシ基を少なくとも1個
含む一価炭化水素基を、Zはハロゲン原子もし
くは加水分解可能な基をそれぞれ表わし、cは
1,2または3である。)で示されるエポキシ
基含有シランまたはその部分加水分解縮合物
0.01〜50重量部、 (ハ) 光増感剤 からなる光硬化性オルガノポリシロキサン組成
物。[Claims] 1 (a) Average compositional formula [In the formula, R 1 is a divalent hydrocarbon group, R 2 is a substituted or unsubstituted monovalent hydrocarbon group, and at least one of X is a (Here, R 3 is a hydrogen atom or 1 carbon atom
4 represents an alkyl group, R 4 represents a divalent hydrocarbon group), and the remainder represents a hydrogen atom. n is 0 or a positive integer of 4 or less, 0<a≦3, 0≦b<3, but 0<
a+b≦3. ] 100 parts by weight of an acryloyloxy group-containing organopolysiloxane, (b) General formula R 5 c SiZ 4-c (wherein R 2 is a monovalent hydrocarbon group containing at least one epoxy group, Z is Each represents a halogen atom or a hydrolyzable group, and c is 1, 2 or 3.) Epoxy group-containing silane or its partially hydrolyzed condensate
A photocurable organopolysiloxane composition comprising 0.01 to 50 parts by weight of (iii) a photosensitizer.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2845779A JPS55120619A (en) | 1979-03-12 | 1979-03-12 | Photosetting organopolysiloxane composition |
DE19792944817 DE2944817A1 (en) | 1978-11-06 | 1979-11-06 | Light hardenable polysiloxane compsn. - comprises acryl:oxy gp. contg. polysiloxane, epoxy cpd. and light sensitiser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2845779A JPS55120619A (en) | 1979-03-12 | 1979-03-12 | Photosetting organopolysiloxane composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55120619A JPS55120619A (en) | 1980-09-17 |
JPS6118924B2 true JPS6118924B2 (en) | 1986-05-15 |
Family
ID=12249186
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2845779A Granted JPS55120619A (en) | 1978-11-06 | 1979-03-12 | Photosetting organopolysiloxane composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55120619A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5643352A (en) * | 1979-09-17 | 1981-04-22 | Shin Etsu Chem Co Ltd | Photocurable organopolysiloxane composition |
JPS5819367A (en) * | 1981-07-27 | 1983-02-04 | Kanegafuchi Chem Ind Co Ltd | Coating method |
JPS5869217A (en) * | 1981-10-22 | 1983-04-25 | Japan Synthetic Rubber Co Ltd | Photosensitive silicone resin composition |
KR100963111B1 (en) * | 2006-01-24 | 2010-06-15 | 아사히 가세이 일렉트로닉스 가부시끼가이샤 | Photosensitive resin composition |
-
1979
- 1979-03-12 JP JP2845779A patent/JPS55120619A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS55120619A (en) | 1980-09-17 |
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