JPH08134376A - Photosetting moistureproof insulation coating and production of moistureproof insulated electronic part - Google Patents

Photosetting moistureproof insulation coating and production of moistureproof insulated electronic part

Info

Publication number
JPH08134376A
JPH08134376A JP27009494A JP27009494A JPH08134376A JP H08134376 A JPH08134376 A JP H08134376A JP 27009494 A JP27009494 A JP 27009494A JP 27009494 A JP27009494 A JP 27009494A JP H08134376 A JPH08134376 A JP H08134376A
Authority
JP
Japan
Prior art keywords
pts
moistureproof
coating material
moisture
groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27009494A
Other languages
Japanese (ja)
Inventor
Tatsushi Goto
達士 後藤
Toshiichi Okawara
敏一 大川原
Masakatsu Obara
正且 小原
Eiji Omori
英二 大森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP27009494A priority Critical patent/JPH08134376A/en
Publication of JPH08134376A publication Critical patent/JPH08134376A/en
Pending legal-status Critical Current

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  • Macromonomer-Based Addition Polymer (AREA)

Abstract

PURPOSE: To provide a photosetting coating material containing a photo-setting polybutadiene, a cross-linkable monomer and a photopolymerization initiator, having excellent curability and moisture resistance, exhibiting high heat- resistance to substantially keep the flexibility even after thermal deterioration and capable of providing an electronic part having high reliability. CONSTITUTION: This coating material is produced by compounding (A) 100 pts.wt. of a photo-setting polybutadiene having a number-average molecular weight of 300-10,000 (preferably 500-5,000) and a hydrogenation ratio of >=90% (preferably >=95%) and containing 1-5% (preferably 2-3%) isocyanate groups in the terminal functional groups and the remaining part of (meth)acryloyloxy groups with (B) preferably 10-200 pts.wt. (especially 50-100 pts.wt.) of a cross- linkable monomer consisting of a mono to trifunctional (meth)acrylic acid ester, etc., and (C) preferably 0.01-10 pts.wt. (especially 0.1-5 pts.wt.) of a photopolymerization initiator such as benzyl dimethyl ketal, benzoin (thio)ethers and benzophenone.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、電子部品の防湿、絶縁
等に適した光硬化性防湿絶縁塗料およびこれを用いて処
理された電子部品の製造法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photocurable moisture-proof insulating coating suitable for moisture-proofing and insulating electronic parts and a method for producing electronic parts treated with the same.

【0002】[0002]

【従来の技術】従来、実装回路板およびハイブリッドI
C(integrated circuit)等の電子部品には、ガラスエ
ポキシ、紙フェノール、アルミナセラミック等の基板に
配線図が印刷されてマイコン、抵抗体、コンデンサなど
の各種部品が搭載されており、それらを湿気、ほこりな
どから保護する目的で絶縁処理が行われている。この絶
縁処理方法には、アクリル樹脂、シリコーン樹脂、フェ
ノール樹脂、エポキシ樹脂などの塗料による保護コーテ
ィング処理が広く採用されている。このような実装回路
板およびハイブリッドICは、過酷な環境下、特に高湿
度下で使用され、例えば自動車、洗濯機などの機器に搭
載されて使用されている。
2. Description of the Related Art Conventionally, a mounting circuit board and a hybrid I
Electronic components such as C (integrated circuit) are printed with a wiring diagram on a substrate such as glass epoxy, paper phenol, and alumina ceramic, and various components such as a microcomputer, a resistor, and a capacitor are mounted. Insulation is performed to protect it from dust. For this insulation treatment method, a protective coating treatment using a paint such as acrylic resin, silicone resin, phenol resin, or epoxy resin is widely adopted. Such a mounting circuit board and a hybrid IC are used in a harsh environment, particularly under high humidity, and are mounted and used in equipment such as an automobile and a washing machine.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、前記塗
料は加熱硬化性であるため、塗料を完全に硬化させて絶
縁効果を得るためには高温度処理、また長時間処理が必
要であった。一方、短時間処理、例えば数秒〜数分での
硬化が可能な紫外線硬化性樹脂塗料が開発されている
が、まだ充分な可とう性および耐湿性を有するものが得
られていない。また、搭載部品の下部など紫外線が照射
されない所は液状で未硬化の状態となり、電子部品の信
頼性が低下するおそれがあった。本発明は、このような
従来技術の問題点を解決し、短時間処理が可能で、可と
う性および耐湿性に優れた塗膜を生成する光硬化性防湿
絶縁塗料およびこれを塗布、硬化する防湿絶縁された電
子部品の製造法を提供することにある。
However, since the coating material is heat-curable, high temperature treatment and long-time treatment are required to completely cure the coating material and obtain an insulating effect. On the other hand, an ultraviolet curable resin coating composition that can be cured in a short time, for example, in a few seconds to a few minutes has been developed, but a coating material having sufficient flexibility and moisture resistance has not yet been obtained. In addition, a portion such as a lower portion of the mounted component which is not irradiated with ultraviolet rays is in a liquid state and is in an uncured state, and there is a possibility that reliability of the electronic component is deteriorated. The present invention solves the above-mentioned problems of the prior art, can be treated for a short time, and produces a coating film excellent in flexibility and moisture resistance. It is an object of the present invention to provide a method of manufacturing a moisture-proof insulated electronic component.

【0004】[0004]

【課題を解決するための手段】本発明は、(A)数平均
分子量が300〜10,000で、水素添加率が90%
以上であり、末端官能基のうち1〜5%がイソシアネー
ト基で、残りがアクリロキシ基またはメタクリロキシ基
である光硬化性ポリブタジエン、(B)架橋性単量体お
よび(C)光重合開始剤を含有してなる光硬化性防湿絶
縁塗料およびこの塗料を電子部品に塗布、硬化する防湿
絶縁された電子部品の製造法に関する。
The present invention provides (A) a number average molecular weight of 300 to 10,000 and a hydrogenation rate of 90%.
It is the above and contains 1-5% of the terminal functional groups is an isocyanate group and the rest is a photocurable polybutadiene having an acryloxy group or a methacryloxy group, (B) a crosslinkable monomer and (C) a photopolymerization initiator. The present invention relates to a photo-curable moisture-proof insulating coating material and a method for producing a moisture-proof insulated electronic component in which the coating material is applied to an electronic component and cured.

【0005】本発明に用いられる光硬化性ポリブタジエ
ン(A)は、水素添加率が90%以上の末端ヒドロキシ
ポリブタジエンを、ポリイソシアネートと反応させ、そ
の後にヒドロキシエチルアクリレートまたはヒドロキシ
エチルメタクリレートを反応させて得られる数平均分子
量が300〜10,000のアクリル変性水素添加ポリ
ブタジエン樹脂である。末端官能基のうち1〜5%をイ
ソシアネート基とするには、上記の末端ヒドロキシポリ
ブタジエンとポリイソシアネートとを全ての水酸基にイ
ソシアネート基を反応させる量で反応させ、ついでイソ
シアネート基が1〜5%の量で残る量としてヒドロキシ
エチルアクリレートまたはヒドロキシエチルメタクリレ
ートを反応させる。この樹脂の数平均分子量は300〜
10,000、好ましくは500〜5,000、水素添
加率は90%以上、好ましくは95%以上とされる。末
端官能基のうちのイソシアネート基の割合は1〜5%、
好ましくは2〜3%とされる。数平均分子量が300未
満では造膜性が悪くなり、10,000を超えると粘度
が高く、作業性に劣る。また水素添加率が90%未満で
は得られる塗膜の加熱劣化後の可とう性が低下し、耐熱
性が劣る。さらに、末端官能基のうちのイソシアネート
基の割合が1%未満では紫外線の照射されない部分が硬
化せず耐湿性が劣り、5%を超えると樹脂自身の熱安定
性が悪くなる。
The photocurable polybutadiene (A) used in the present invention is obtained by reacting terminal hydroxypolybutadiene having a hydrogenation rate of 90% or more with polyisocyanate, and then reacting with hydroxyethyl acrylate or hydroxyethyl methacrylate. It is an acrylic modified hydrogenated polybutadiene resin having a number average molecular weight of 300 to 10,000. In order to make 1 to 5% of the terminal functional groups an isocyanate group, the above-mentioned terminal hydroxypolybutadiene and polyisocyanate are reacted in an amount to react all hydroxyl groups with an isocyanate group, and then the isocyanate group is 1 to 5%. Hydroxyethyl acrylate or hydroxyethyl methacrylate is reacted as the remaining amount. The number average molecular weight of this resin is 300-
The hydrogenation rate is 10,000, preferably 500 to 5,000, and the hydrogenation rate is 90% or more, preferably 95% or more. The proportion of isocyanate groups in the terminal functional groups is 1 to 5%,
Preferably it is 2-3%. When the number average molecular weight is less than 300, the film-forming property is poor, and when it exceeds 10,000, the viscosity is high and the workability is poor. On the other hand, if the hydrogenation rate is less than 90%, the flexibility of the obtained coating film after heat deterioration is lowered and the heat resistance is deteriorated. Further, if the proportion of isocyanate groups in the terminal functional groups is less than 1%, the portion not irradiated with ultraviolet rays will not be cured and the moisture resistance will be poor, and if it exceeds 5%, the thermal stability of the resin itself will be poor.

【0006】本発明に用いられる架橋性単量体(B)と
しては、スチレン、ビニルトルエン、α−メチルスチレ
ン、p−ターシャリーブチルスチレン、クロルスチレ
ン、ジビニルベンゼン、ジアリルフタレート、2−ヒド
ロオキシエチルメタクリレート、2−ヒドロオキシプロ
ピルメタクリレート、メチルメタクリレート、エチルメ
タクリレート、ラウリルメタクリレート、メタクリル酸
とカージュラE−10(シェル化学社製、高級脂肪酸の
グリシジルエステルの商品名)の反応物などの1官能性
のメタクリル酸エステル、エチレングリコールジメタク
リレート、ジエチレングリコールジメタクリレート、
1,6−ヘキサンジオールジメタクリレートなどの2官
能性のメタクリル酸エステル、トリメチロールプロパン
トリメタクリレートなどの3官能性のメタクリル酸エス
テル、メチルアクリレート、エチルアクリレート、ラウ
リルアクリレート、2−ヒドロオキシエチルアクリレー
ト、2−ヒドロオキシプロピルアクリレート、アクリル
酸とカージュラE−10の反応物などの1官能性のアク
リル酸エステル、エチレングリコールジアクリレート、
ジエチレングリコールジアクリレート、1,6−ヘキサ
ンジオールジアクリレートなどの2官能のアクリル酸エ
ステル、トリメチロールプロパントリアクリレートなど
の3官能性のアクリル酸エステルなどが用いられ、これ
らは単独でまたは2種以上を組み合わせて使用できる。
これら単量体(B)の配合割合は、硬化速度と塗料の粘
度の点から前記の(A)成分100重量部に対して10
〜200重量部の範囲が好ましく、50〜100重量部
の範囲がより好ましい。
Examples of the crosslinkable monomer (B) used in the present invention include styrene, vinyltoluene, α-methylstyrene, p-tert-butylstyrene, chlorostyrene, divinylbenzene, diallylphthalate and 2-hydroxyethyl. Monofunctional methacryl such as methacrylate, 2-hydroxypropylmethacrylate, methylmethacrylate, ethylmethacrylate, laurylmethacrylate, methacrylic acid and a reaction product of Cardura E-10 (trade name of glycidyl ester of higher fatty acid, manufactured by Shell Chemical Co.). Acid ester, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate,
Bifunctional methacrylic acid ester such as 1,6-hexanediol dimethacrylate, trifunctional methacrylic acid ester such as trimethylolpropane trimethacrylate, methyl acrylate, ethyl acrylate, lauryl acrylate, 2-hydroxyethyl acrylate, 2 -Hydroxypropyl acrylate, monofunctional acrylic acid esters such as the reaction product of acrylic acid and Cardura E-10, ethylene glycol diacrylate,
Bifunctional acrylic acid esters such as diethylene glycol diacrylate and 1,6-hexanediol diacrylate, and trifunctional acrylic acid esters such as trimethylolpropane triacrylate are used, and these are used alone or in combination of two or more kinds. Can be used.
The mixing ratio of these monomers (B) is 10 with respect to 100 parts by weight of the above-mentioned component (A) from the viewpoint of the curing speed and the viscosity of the coating composition.
To 200 parts by weight is preferable, and 50 to 100 parts by weight is more preferable.

【0007】本発明に用いられる光重合開始剤(C)と
しては、ベンジルジメチルケタール、ベンゾイン、ベン
ゾインエチルエーテル、ベンゾインプロピルエーテル、
ベンゾインフェニルエーテルなどのベンゾインエーテル
類、ベンゾインチオエーテル類、ベンゾフェノン、アセ
トフェノン、2−エチルアントラキノンフロイン、ベン
ゾインエーテルミヒラーケトン系、塩化デシルノチオキ
サントン類などが挙げられ、これらは単独でまたは2種
以上を組み合わせて使用できる。これら光重合開始剤
(C)の配合割合は、硬化速度と造膜性の点から前記の
(A)成分100重量部に対して0.01〜10重量部
の範囲が好ましく、0.1〜5重量部の範囲がより好ま
しい。
The photopolymerization initiator (C) used in the present invention includes benzyl dimethyl ketal, benzoin, benzoin ethyl ether, benzoin propyl ether,
Examples include benzoin ethers such as benzoin phenyl ether, benzoin thioethers, benzophenone, acetophenone, 2-ethylanthraquinone furoine, benzoin ether Michler's ketone, decylnothioxanthone chloride, etc. These may be used alone or in combination of two or more. Can be used. The mixing ratio of these photopolymerization initiators (C) is preferably in the range of 0.01 to 10 parts by weight with respect to 100 parts by weight of the above-mentioned component (A), from the viewpoint of curing rate and film-forming property, A range of 5 parts by weight is more preferable.

【0008】本発明の光硬化性防湿絶縁塗料は、前記の
(A)、(B)および(C)成分を配合し、加熱溶解す
ることによって得られる。また、本発明になる光硬化性
防湿絶縁塗料には、必要に応じてシランカップリング
剤、重合禁止剤などを添加することができる。
The photocurable moisture-proof insulating coating material of the present invention is obtained by blending the above-mentioned components (A), (B) and (C) and heating and dissolving them. A silane coupling agent, a polymerization inhibitor, etc. can be added to the photocurable moisture-proof insulating coating material of the present invention, if necessary.

【0009】シランカップリング剤としては、γ−メタ
アクリロキシプロピルトリメトキシシラン、γ−メタア
クリロキシプロピルトリエトキシシラン、γ−アクリロ
キシプロピルトリメトキシシラン、ビニルトリメトキシ
シラン、ビニルトリエトキシシランなどが挙げられ、こ
れらは単独でまたは2種以上を組み合わせて使用でき
る。
Examples of the silane coupling agent include γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-acryloxypropyltrimethoxysilane, vinyltrimethoxysilane and vinyltriethoxysilane. These may be used alone or in combination of two or more.

【0010】重合禁止剤としては、ハイドロキノン、パ
ラターシャリーブチルカテコール、ピロガロール等のキ
ノン類、その他一般に使用されているものが用いられ
る。
As the polymerization inhibitor, quinones such as hydroquinone, paratertiary butyl catechol and pyrogallol, and other commonly used ones can be used.

【0011】本発明になる光硬化性防湿絶縁塗料を用い
て防湿絶縁された実装回路板、ハイブリッドIC等の電
子部品が製造されるが、その製法としては、一般に知ら
れているハケ塗り法、浸漬法(ディップ法)、スプレー
法などによってこの塗料を電子部品に塗布、硬化すれば
よい。塗布後の塗膜の硬化は紫外線照射によって行われ
る。
Electronic components such as mounted circuit boards and hybrid ICs that are moisture-proof insulated using the photo-curable moisture-proof insulating coating material according to the present invention are manufactured by a generally known brush coating method. The coating material may be applied to the electronic component and cured by a dipping method (dip method), a spray method, or the like. Curing of the coating film after coating is performed by ultraviolet irradiation.

【0012】[0012]

【実施例】次に本発明を実施例および比較例により説明
するが、本発明は以下の実施例に限定されるものではな
い。「部」として表わしたものは重量部を示す。 実施例1 GI−1000(日本曹達株式会社製、水素添加ポリブ
タジエン樹脂、数平均分子量:約1500、水素添加
率:97%)100部、トリレンジイソシアネート40
0部、酢酸ブチル500部を四つ口フラスコに入れ、窒
素ガス雰囲気下で撹拌し、80℃で2時間反応させた。
次いで2−ヒドロキシエチルメタクリレート670部を
加え、80℃で2時間反応させてワニスA(イソシアー
ト基2.3%)を得た。金属ビーカー内でこのワニスA
60部、1,6−ヘキサンジオールジメタクリレート4
0部およびベンジルジメチルケタール5部を室温で混合
溶解して塗料Aを得た。
EXAMPLES The present invention will now be described with reference to Examples and Comparative Examples, but the present invention is not limited to the following Examples. Those expressed as "parts" indicate parts by weight. Example 1 GI-1000 (manufactured by Nippon Soda Co., Ltd., hydrogenated polybutadiene resin, number average molecular weight: about 1500, hydrogenation rate: 97%) 100 parts, tolylene diisocyanate 40
0 part and 500 parts of butyl acetate were placed in a four-necked flask, stirred under a nitrogen gas atmosphere, and reacted at 80 ° C. for 2 hours.
Then, 670 parts of 2-hydroxyethyl methacrylate was added and reacted at 80 ° C. for 2 hours to obtain a varnish A (isocyate group 2.3%). This varnish A in a metal beaker
60 parts, 1,6-hexanediol dimethacrylate 4
Paint A was obtained by mixing and dissolving 0 part and 5 parts of benzyl dimethyl ketal at room temperature.

【0013】実施例2 金属ビーカー内で、実施例1で得たワニスA80部、ト
リメチロールプロパントリアクリレート20部およびベ
ンゾフェノン5部を室温で混合溶解して塗料Bを得た。
Example 2 A coating material B was obtained by mixing and dissolving 80 parts of the varnish A obtained in Example 1, 20 parts of trimethylolpropane triacrylate and 5 parts of benzophenone in a metal beaker at room temperature.

【0014】比較例1 金属ビーカー内でTE−2000(日本曹達株式会社
製、末端メタクリロイル基ポリブタジエン樹脂、数平均
分子量:約2,000)100部、ベンジルジメチルケ
タール5部およびトルエン100部を温度50℃の条件
で混合撹拌して塗料Cを得た。
Comparative Example 1 100 parts of TE-2000 (manufactured by Nippon Soda Co., Ltd., terminal methacryloyl group polybutadiene resin, number average molecular weight: about 2,000), 5 parts of benzyl dimethyl ketal and 100 parts of toluene in a metal beaker at a temperature of 50. Coating C was obtained by mixing and stirring under the condition of ° C.

【0015】比較例2 金属ビーカー内でTEAI−1000(日本曹達株式会
社製、アクリル変性水素添加ポリブタジエン樹脂、数平
均分子量:約1,000、水素添加率:97%)100
部およびベンジルジメチルケタール5部を温度100℃
の条件で混合撹拌して塗料Dを得た。
Comparative Example 2 TEAI-1000 (Nippon Soda Co., Ltd., acrylic modified hydrogenated polybutadiene resin, number average molecular weight: about 1,000, hydrogenation rate: 97%) in a metal beaker 100
Parts and 5 parts of benzyl dimethyl ketal at a temperature of 100 ° C.
Coating D was obtained by mixing and stirring under the conditions of.

【0016】以上で得た塗料A〜Dをガラスエポキシ銅
張積層板に配線が印刷され、ICおよび抵抗が搭載され
た実装回路板に、浸漬法により塗布し、ウシオ電機株式
会社製の照射出力が50W/cmの水銀ランプで照射距離1
0cmから120秒間紫外線照射を行い、硬化性評価用試
験片を作製し硬化性を試験した。またこれらの塗料をガ
ラスエポキシ銅張積層板製のくし型電極(電極間隔0.
3mm、電極AgPd製)に、浸漬法により塗布し、前記
の硬化条件で硬化させ、耐湿性試験用試験片を作製し、
耐湿性を試験した。さらにこれらの試験片について、J
IS C 2103に準じて屈曲性試験用の試験片を作
製して前記の硬化条件で硬化させ、80℃で100時間
放置し、屈曲性を試験した。その結果を表1に示す。な
お、塗料A、BおよびDを浸漬法で塗布する際、塗料
A、BおよびDを80℃に加熱して用いた。また、耐湿
性は耐湿性試験用試験片にDC14Vを印加しながら8
5℃、85%RHの恒温恒湿槽に放置し、表1に示す放
置時間ごとに恒温恒湿槽から取り出し、2時間後23℃
でDC500Vを印加して絶縁抵抗を測定して評価し
た。
The paints A to D obtained above are applied by dipping onto a mounting circuit board on which wiring is printed on a glass epoxy copper clad laminate and ICs and resistors are mounted. Irradiation output manufactured by Ushio Inc. With a mercury lamp of 50 W / cm for an irradiation distance of 1
Ultraviolet irradiation from 0 cm for 120 seconds was performed to prepare a test piece for evaluation of curability, and the curability was tested. In addition, these paints were used as comb-shaped electrodes made of glass epoxy copper clad laminate (electrode spacing: 0.
3 mm, made of AgPd electrode) by a dipping method and cured under the above curing conditions to prepare a test piece for a moisture resistance test,
Moisture resistance was tested. Furthermore, regarding these test pieces, J
A test piece for bending test was prepared according to IS C 2103, cured under the above curing conditions, and allowed to stand at 80 ° C. for 100 hours to test the flexibility. Table 1 shows the results. When the coating materials A, B and D were applied by the dipping method, the coating materials A, B and D were heated to 80 ° C. before use. In addition, the humidity resistance is 8 while applying DC14V to the humidity resistance test piece.
It is left in a thermo-hygrostat at 5 ° C and 85% RH, and taken out from the thermo-hygrostat at the time shown in Table 1 after 2 hours at 23 ℃.
Then, DC500V was applied and the insulation resistance was measured and evaluated.

【0017】[0017]

【表1】 [Table 1]

【0018】[0018]

【発明の効果】表1にも示されるように、本発明になる
光硬化性防湿絶縁塗料は、硬化性、耐湿性に優れ、加熱
劣化しても可とう性がほとんど損われない耐熱性に優れ
た塗料であり、この塗料によって信頼性の向上された電
子部品を製造することができる。
As shown in Table 1, the photocurable moisture-proof insulating coating material according to the present invention is excellent in curability and moisture resistance, and has heat resistance that hardly deteriorates flexibility even when deteriorated by heating. It is an excellent paint, and it is possible to manufacture electronic parts with improved reliability.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 大森 英二 茨城県日立市東町四丁目13番1号 日立化 成工業株式会社山崎工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Eiji Omori 4-13-1, Higashimachi, Hitachi City, Ibaraki Prefecture Hitachi Chemical Co., Ltd. Yamazaki Factory

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 (A)数平均分子量が300〜10,0
00で、水素添加率が90%以上であり、末端官能基の
うち1〜5%がイソシアネート基で、残りがアクリロキ
シ基またはメタクリロキシ基である光硬化性ポリブタジ
エン、(B)架橋性単量体および(C)光重合開始剤を
含有してなる光硬化性防湿絶縁塗料。
1. (A) Number average molecular weight of 300 to 10,0
00, the hydrogenation rate is 90% or more, 1 to 5% of the terminal functional groups are isocyanate groups, and the rest are acryloxy groups or methacryloxy groups, photocurable polybutadiene, (B) a crosslinkable monomer and (C) A photocurable moisture-proof insulating coating material containing a photopolymerization initiator.
【請求項2】 請求項1記載の光硬化性防湿絶縁塗料を
電子部品に塗布、硬化する防湿絶縁された電子部品の製
造法。
2. A method for producing a moisture-proof insulated electronic component, which comprises applying the photocurable moisture-proof insulating coating composition according to claim 1 to an electronic component and curing it.
JP27009494A 1994-11-04 1994-11-04 Photosetting moistureproof insulation coating and production of moistureproof insulated electronic part Pending JPH08134376A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27009494A JPH08134376A (en) 1994-11-04 1994-11-04 Photosetting moistureproof insulation coating and production of moistureproof insulated electronic part

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27009494A JPH08134376A (en) 1994-11-04 1994-11-04 Photosetting moistureproof insulation coating and production of moistureproof insulated electronic part

Publications (1)

Publication Number Publication Date
JPH08134376A true JPH08134376A (en) 1996-05-28

Family

ID=17481455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27009494A Pending JPH08134376A (en) 1994-11-04 1994-11-04 Photosetting moistureproof insulation coating and production of moistureproof insulated electronic part

Country Status (1)

Country Link
JP (1) JPH08134376A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100540346B1 (en) * 2003-09-04 2006-01-11 장한진 Photosensitive resin composition for flexo printing plate
JP2007308679A (en) * 2006-04-21 2007-11-29 Hitachi Chem Co Ltd Photo-curable resin composition, photo-curable moisture-preventing insulation coating for mounting circuit board, electronic part and method for producing the same
JP2007308681A (en) * 2006-04-18 2007-11-29 Hitachi Chem Co Ltd Photo-curable resin composition, photo- curable moisture-preventing insulation coating for mounting circuit board, electronic part and method for producing the same
JP2007314756A (en) * 2006-04-25 2007-12-06 Hitachi Chem Co Ltd Photo-curable resin composition, photo-curable moistureproof insulating coating for mounted circuit board, electronic part and method for producing the same
JP2008280414A (en) * 2007-05-09 2008-11-20 Hitachi Chem Co Ltd Photocurable resin composition, photocurable moistureproof insulating coating for mounting circuit board, electronic part and its manufacturing method
JP2008291114A (en) * 2007-05-24 2008-12-04 Hitachi Chem Co Ltd Photosetting resin composition, photosetting and moistureproof insulating paint for mounted circuit board, electronic component and method for manufacturing the component
CN104231908A (en) * 2014-02-21 2014-12-24 江苏中瀛涂料有限公司 UV (ultraviolet) coating
JP2019011458A (en) * 2017-06-30 2019-01-24 第一工業製薬株式会社 Polymerizable resin composition and cured product thereof

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100540346B1 (en) * 2003-09-04 2006-01-11 장한진 Photosensitive resin composition for flexo printing plate
JP2007308681A (en) * 2006-04-18 2007-11-29 Hitachi Chem Co Ltd Photo-curable resin composition, photo- curable moisture-preventing insulation coating for mounting circuit board, electronic part and method for producing the same
JP2007308679A (en) * 2006-04-21 2007-11-29 Hitachi Chem Co Ltd Photo-curable resin composition, photo-curable moisture-preventing insulation coating for mounting circuit board, electronic part and method for producing the same
JP2007314756A (en) * 2006-04-25 2007-12-06 Hitachi Chem Co Ltd Photo-curable resin composition, photo-curable moistureproof insulating coating for mounted circuit board, electronic part and method for producing the same
JP2008280414A (en) * 2007-05-09 2008-11-20 Hitachi Chem Co Ltd Photocurable resin composition, photocurable moistureproof insulating coating for mounting circuit board, electronic part and its manufacturing method
JP2008291114A (en) * 2007-05-24 2008-12-04 Hitachi Chem Co Ltd Photosetting resin composition, photosetting and moistureproof insulating paint for mounted circuit board, electronic component and method for manufacturing the component
CN104231908A (en) * 2014-02-21 2014-12-24 江苏中瀛涂料有限公司 UV (ultraviolet) coating
JP2019011458A (en) * 2017-06-30 2019-01-24 第一工業製薬株式会社 Polymerizable resin composition and cured product thereof

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