JPS61184571A - Developing device - Google Patents

Developing device

Info

Publication number
JPS61184571A
JPS61184571A JP2480385A JP2480385A JPS61184571A JP S61184571 A JPS61184571 A JP S61184571A JP 2480385 A JP2480385 A JP 2480385A JP 2480385 A JP2480385 A JP 2480385A JP S61184571 A JPS61184571 A JP S61184571A
Authority
JP
Japan
Prior art keywords
developing device
aluminum
acidic solution
electrolytic etching
current density
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2480385A
Other languages
Japanese (ja)
Inventor
Shinichi Takano
高野 晋一
Shigeaki Nakada
中田 維明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2480385A priority Critical patent/JPS61184571A/en
Publication of JPS61184571A publication Critical patent/JPS61184571A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00Apparatus for electrographic processes using a charge pattern
    • G03G15/06Apparatus for electrographic processes using a charge pattern for developing
    • G03G15/08Apparatus for electrographic processes using a charge pattern for developing using a solid developer, e.g. powder developer
    • G03G15/09Apparatus for electrographic processes using a charge pattern for developing using a solid developer, e.g. powder developer using magnetic brush
    • G03G15/0921Details concerning the magnetic brush roller structure, e.g. magnet configuration
    • G03G15/0928Details concerning the magnetic brush roller structure, e.g. magnet configuration relating to the shell, e.g. structure, composition

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Magnetic Brush Developing In Electrophotography (AREA)
  • Dry Development In Electrophotography (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Abstract

PURPOSE:To generate fine pores by subjecting a developer holding member consisting of aluminum or aluminum alloy or nonmagnetic stainless steel contg. internally a magnetic field generating mechanism to DC electrolytic etching in an acidic soln. CONSTITUTION:Dissolution is considerably nonuniform if an environmental oxidizing agent and halogen ions exist in the acidic soln. in aluminum, aluminum alloy or stainless steel. There is a tendency to the progression from nonuniform corrosion to overall dissolution when the concn. of the halogen ions increases to >=10mol/l. The nonuniform corrosion progresses hardly at the low liquid temp. and >=60 deg.C is practicable. The influence of electrolytic current density is such that the density of the pores indicates a peak at certain current density and the pore size increases gradually thereafter. The circuit for electrolytic etching is constituted by disposing a counter electrode 2 to a member to be subjected to the surface treatment so as to face said member, connecting the electrodes through an external power source 3 and dipping the electrodes into the aq. acidic soln. 4 having electrical conductivity.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は複写機用現像装置に使用される現像剤保持部材
(以下スリーブと称す。)として用いられるアルミニウ
ム、アルミニウム合金、非磁性のステンレス鋼の表面処
理に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention is applied to the surface of aluminum, aluminum alloy, or non-magnetic stainless steel used as a developer holding member (hereinafter referred to as sleeve) used in a developing device for a copying machine. It is related to processing.

従来の技術 第2図の磁性体3よりなるローラーによって、現像剤で
示されるスリーブ1上に吸引されている。
BACKGROUND OF THE INVENTION A roller made of a magnetic material 3 as shown in FIG. 2 attracts the developer onto the sleeve 1 shown in FIG.

ここで潜像保持体の一種である感光体4に対向する位置
まで現像剤はスリーブ1の回転によって搬送される。一
般に搬送能力を高めるためにスリーブの表面は異物の存
在しない微細な凹凸の面から成っている。そこで従来の
表面処理法では上記の微細な凹凸を実現するために機械
的な外力を利用した方法、例えば微細な定形または不定
形の硬質粒子をスリーブ用部材に吹きつけるサンドブラ
スト法、(例えば特開昭58−57163号公報)や砥
石またはサンドペーパーで研摩する方法(特開昭56−
113172号公報)が提案されている。これらの方法
を採用することにより、スリーブ表面の凹凸のピッチを
2〜50μm1平均粗さd = 0.1〜8μmの表面
粗さとなり現像剤の搬送向上に効果があり長期にわたっ
て安定した画像を得ることができることが記載されてい
る。
Here, the developer is conveyed by the rotation of the sleeve 1 to a position facing the photoreceptor 4, which is a type of latent image holder. Generally, the surface of the sleeve is made of a finely textured surface free from foreign matter in order to improve the conveying ability. Therefore, conventional surface treatment methods utilize mechanical external force to achieve the above-mentioned fine irregularities, such as the sandblasting method in which fine fixed or irregularly shaped hard particles are sprayed onto the sleeve member (for example, (Japanese Unexamined Patent Publication No. 58-57163) and a method of polishing with a whetstone or sandpaper (Japanese Patent Application Laid-open No. 56-57
113172) has been proposed. By adopting these methods, the pitch of the irregularities on the sleeve surface can be set to a surface roughness of 2 to 50 μm, 1 average roughness d = 0.1 to 8 μm, which is effective in improving the conveyance of the developer, and provides stable images over a long period of time. It is stated that it can be done.

発明が解決しようとする問題点 しかしながら上記の機械的手法による表面処理法におい
て、処理の際に使用された微細な硬質粒子がスリーブ材
表面に付着したまま残留する可能性が高い。前記の硬質
微粒子が付着したスリーブ材を現像装置として用いると
以下の危険がある。
Problems to be Solved by the Invention However, in the above mechanical surface treatment method, there is a high possibility that the fine hard particles used during the treatment remain attached to the surface of the sleeve material. If the sleeve material to which the hard fine particles are attached is used as a developing device, there are the following dangers.

現像の過程は第2図のマグロールと呼ばれる磁石3によ
り現像剤がスリーブ1に吸着され、スリーブ1の回転と
ともに2のブレードでその量を規制されつつ4の感光体
と対向する位置まで搬送される。この位置に来た時、感
光体4の表面にある潜像の有する静電気力によってスリ
ーブ上の現像剤は感光体へ移動する。この時、スリーブ
上に前記硬質微粒子が残留する場合に現像剤との摩擦に
よって脱落し感光体に現像剤とともに移動しこれを損傷
・劣化させる危険がある。
In the developing process, the developer is attracted to the sleeve 1 by a magnet 3 called a mag roll shown in Fig. 2, and as the sleeve 1 rotates, the developer is conveyed to a position facing the photoreceptor 4 while the amount is regulated by a blade 2. . When the sleeve reaches this position, the electrostatic force of the latent image on the surface of the photoreceptor 4 causes the developer on the sleeve to move toward the photoreceptor. At this time, if the hard fine particles remain on the sleeve, there is a risk that they will fall off due to friction with the developer and move to the photoreceptor along with the developer, damaging or deteriorating it.

問題点を解決するための手段 本発明は上記の問題点に鑑み、前記微細硬質粒子の残留
をみない表面処理法による現像装置を提供するものであ
る。ある種の金属において腐食作用はある環境下で局部
的に集中して進行することが知られている。したがって
化学的に不均一な溶解を現出することにより前記微細硬
質粒子の残留をみない表面処理法が実現できる。アルミ
ニウムやアルミニウム合金またはステンレス鋼において
、酸性溶液中に環境酸化剤とノ・ロゲンイオンが存在す
る場合には前記の不均一な溶解が著しい。この時ハロゲ
ンイオンの濃度が1omol/R以上になると不均一な
腐食から全面的な溶解へと進行する傾向がある。また液
温も低温では不均一腐食が進行しにくく60℃以上が実
用的である。また電解電流密度の影響は、ある電流密度
で孔の密度がピークを示し、その後は次第に孔径が粗大
化する。
Means for Solving the Problems In view of the above-mentioned problems, the present invention provides a developing device using a surface treatment method that eliminates the residual of the fine hard particles. It is known that corrosion of certain metals progresses in a locally concentrated manner under certain environments. Therefore, by creating chemically non-uniform dissolution, it is possible to realize a surface treatment method in which the fine hard particles do not remain. In aluminum, aluminum alloys, or stainless steel, when an environmental oxidizing agent and nitrogen ions are present in an acidic solution, the above-mentioned non-uniform dissolution is significant. At this time, when the concentration of halogen ions exceeds 1 mmol/R, there is a tendency for uneven corrosion to progress to complete dissolution. Furthermore, if the liquid temperature is low, uneven corrosion is difficult to proceed, and a temperature of 60° C. or higher is practical. Further, as for the influence of the electrolytic current density, the pore density peaks at a certain current density, and thereafter the pore diameter gradually becomes coarser.

孔径は最も小さい時で0.8μm程度であり十分に実用
範囲に入る。そこで上記のハロゲンと環境酸化剤を適量
含む酸性溶液中に表面処理用部材を浸漬し外部電源を通
して同一の溶液中に存在する対極に接続して電解エツチ
ングの回路を構成した。
The pore diameter is approximately 0.8 μm at its smallest, which is well within the practical range. Therefore, an electrolytic etching circuit was constructed by immersing the surface treatment member in an acidic solution containing appropriate amounts of the above-mentioned halogen and environmental oxidizing agent, and connecting it to a counter electrode present in the same solution through an external power source.

作  用 本発明は上記の構成回路に外部電源から電流を供給しア
ノード電極である表面処理部材の表面を所望の形状に溶
解させるものである。金、属材料の表面では結晶粒界の
存在、転位、偏析、介在物。
Function The present invention supplies current from an external power source to the above-mentioned constituent circuit to dissolve the surface of the surface-treated member, which is an anode electrode, into a desired shape. The presence of grain boundaries, dislocations, segregation, and inclusions on the surface of metals and metals.

金属間化合物の存在等により微視的に化学的不均一性を
本質的に有する。よってこれを利用し、表面でも化学的
に不安定な部分を選択的に溶解し孔を発生させこれを成
長させるものである。
It inherently has microscopic chemical heterogeneity due to the presence of intermetallic compounds. Therefore, this is utilized to selectively dissolve chemically unstable portions on the surface to generate and grow pores.

実施例 (実施例1) 第1図は本発明による表面処理法を示している。Example (Example 1) FIG. 1 shows the surface treatment method according to the invention.

第1図において1は表面処理を施す部材であり、これと
向き合わせて2の対極を配して3の外部電源を通して連
絡し導電性の酸性水溶液中に浸漬することによって電解
エツチングの回路を構成している。3の外部電源からは
一定の直流電流を供給し、5のスタラーで溶液を攪拌し
6のマントルヒーターで液温を制御している。
In Fig. 1, 1 is a member to be subjected to surface treatment, and a counter electrode 2 is placed facing it, connected through an external power source 3, and immersed in a conductive acidic aqueous solution to form an electrolytic etching circuit. are doing. A constant DC current is supplied from an external power source 3, the solution is stirred by a stirrer 5, and the temperature of the solution is controlled by a mantle heater 6.

まず電解電流密度と孔径、径の密度の関係を第3図に示
す。電流密度0.4〜0.7 A / al付近で孔径
は最も小さくなり孔の密度も最大となる。この値は電解
エツチング実施後、2ovで化成処理し単一の孔径分布
をとるとして容量測定から計算した。なお表面処理部材
としてアルミ箔を用いた。
First, FIG. 3 shows the relationship between electrolytic current density, pore diameter, and diameter density. At a current density of 0.4 to 0.7 A/al, the pore diameter becomes the smallest and the pore density becomes the largest. This value was calculated from capacitance measurements assuming that after electrolytic etching, a chemical conversion treatment was performed at 2 ov to obtain a single pore size distribution. Note that aluminum foil was used as the surface treated member.

(実施例2) 第1図と同じ回路構成にして表面処理用部材にアルミ箔
を用いて電解液に添加する塩素イオンの影響を調べた。
(Example 2) The influence of chlorine ions added to the electrolytic solution was investigated using the same circuit configuration as in FIG. 1 and using aluminum foil as the surface treatment member.

塩素イオンの添加量の変化は塩化リチウムの添加量によ
って規制した。この時の孔の径と塩素濃度の関係を第4
図に示す。また一定量のボウ硝を加えその効果も調べた
。この図から分かることは、 (′)塩素447が3〜4°°1/lを越え奏と径は 
 第粗犬化が著しく表面溶解が激しくなる0(2)ボウ
硝の添加によって孔径は微細化する。
Changes in the amount of chlorine ion added were regulated by the amount of lithium chloride added. The relationship between the pore diameter and chlorine concentration at this time is expressed as
As shown in the figure. We also investigated the effect of adding a certain amount of salt. What can be seen from this figure is that (') Chlorine 447 exceeds 3 to 4°1/l and the diameter is
The pore size is made finer by the addition of 0(2) sulfur sulfate, which causes significant coarsening and intense surface dissolution.

また液温か高くなる程孔径も微細化する。In addition, as the liquid temperature increases, the pore diameter becomes finer.

発明の効果 以上の表面処理法によシ、従来のサンドブラスト法で得
られた表面粗さと変わらずに硬質粒子の残留の危険のな
いスリーブを提供することができる。またこの表面処理
法では金属材料の表面の活性点が数多く分散している材
料が有利であり、細晶粒の細かいものなどの部材では特
に有効である。
By using a surface treatment method that has more effects than those of the present invention, it is possible to provide a sleeve that has the same surface roughness as that obtained by the conventional sandblasting method and is free from the risk of hard particles remaining. In addition, this surface treatment method is advantageous for metal materials in which many active points are dispersed on the surface, and is particularly effective for members such as those with fine crystal grains.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例としての電解エツチングの構成
を示した図、第2図は従来の現像装置の断面図、第3図
は電解電流密度とエツチング孔の径と密度を示した図、
第4図は塩素イオン量と孔!・60表面3I!!−理部
材 2・・・対 棧 8・・・ タト#党源 1図      496.敵ン1佳遜咬5・・、ス7ラ
ー t・・・ピーク− 第2図          7.、21/−7’・20
.フ゛ルート 3・、、マグb−ル 第3図 を解質うえメ4  Ah?’ 窮4図
Fig. 1 is a diagram showing the configuration of electrolytic etching as an embodiment of the present invention, Fig. 2 is a cross-sectional view of a conventional developing device, and Fig. 3 is a diagram showing the electrolytic current density and the diameter and density of etching holes. ,
Figure 4 shows the amount of chlorine ions and pores!・60 surface 3I! ! - Logic component 2... vs. 棧8... Tato # party source 1 figure 496. Enemies 1, good and bad 5..., slur 7... peak - Figure 2 7. , 21/-7'・20
.. Flute 3... Solve figure 3 of the mag bar. 4 Ah? ' 4th picture

Claims (4)

【特許請求の範囲】[Claims] (1)表面に潜像を保持する部材と対向して設置された
現像装置において、内部に磁界発生機構を内包するアル
ミニウムまたはアルミニウム合金ないしは非磁性のステ
ンレス鋼よりなる現像剤保持部材を酸性溶液中で直流電
解エッチングすることにより微細な孔を発生させる表面
処理法を特徴とする現像装置。
(1) In a developing device installed facing a member that holds a latent image on its surface, a developer holding member made of aluminum, aluminum alloy, or non-magnetic stainless steel and containing a magnetic field generating mechanism inside is placed in an acidic solution. A developing device featuring a surface treatment method that generates fine pores by direct current electrolytic etching.
(2)酸性溶液はpH−2〜5、液温は30℃〜100
℃の範囲で、10A/cm^3以下の電流密度で電解エ
ッチングしたことを特徴とする特許請求の範囲第1項記
載の現像装置。
(2) Acidic solution has a pH of -2~5 and a liquid temperature of 30℃~100.
2. The developing device according to claim 1, wherein electrolytic etching is performed at a current density of 10 A/cm^3 or less in the range of .degree.
(3)酸性溶液中に硝酸、過酸化水素、過塩素酸塩、重
クロム酸塩類、過マンガン酸塩類酸素等の環境酸化剤、
および硫酸またはその塩類、塩化第二鉄を一種またはそ
れ以上、10^−^3〜10mol/lの範囲において
添加したことを特徴とする特許請求の範囲第1項または
第2項記載の現像装置。
(3) Environmental oxidants such as nitric acid, hydrogen peroxide, perchlorates, dichromates, permanganates, oxygen, etc. in an acidic solution;
The developing device according to claim 1 or 2, characterized in that one or more of sulfuric acid or its salts, and ferric chloride are added in a range of 10^-^3 to 10 mol/l. .
(4)酸性溶液中にハロゲンもしくはハロゲン基等の攻
撃性アニオンを一種またはそれ以上、10^−^3〜1
0mol/lの濃度範囲で添加したことを特徴とする特
許請求の範囲第1項、第2項または第3項記載の現像装
置。
(4) One or more types of aggressive anions such as halogens or halogen groups in an acidic solution, 10^-^3 to 1
3. The developing device according to claim 1, 2, or 3, wherein the additive is added in a concentration range of 0 mol/l.
JP2480385A 1985-02-12 1985-02-12 Developing device Pending JPS61184571A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2480385A JPS61184571A (en) 1985-02-12 1985-02-12 Developing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2480385A JPS61184571A (en) 1985-02-12 1985-02-12 Developing device

Publications (1)

Publication Number Publication Date
JPS61184571A true JPS61184571A (en) 1986-08-18

Family

ID=12148349

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2480385A Pending JPS61184571A (en) 1985-02-12 1985-02-12 Developing device

Country Status (1)

Country Link
JP (1) JPS61184571A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63305372A (en) * 1987-06-08 1988-12-13 Oki Electric Ind Co Ltd Developing device
JP2010128269A (en) * 2008-11-28 2010-06-10 Panasonic Corp Developing roll, method for manufacturing the same, and printing device
US8178188B2 (en) 2001-04-20 2012-05-15 Panasonic Corporation Base layer for manufacturing an electronic component by an etching process

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63305372A (en) * 1987-06-08 1988-12-13 Oki Electric Ind Co Ltd Developing device
US8178188B2 (en) 2001-04-20 2012-05-15 Panasonic Corporation Base layer for manufacturing an electronic component by an etching process
US8247474B2 (en) 2001-04-20 2012-08-21 Panasonic Corporation Method of manufacturing base layer, ink for inkjet and electronic components
US8507076B2 (en) 2001-04-20 2013-08-13 Panasonic Corporation Combination of base layer and ink for inkjet for manufacturing electronic component
JP2010128269A (en) * 2008-11-28 2010-06-10 Panasonic Corp Developing roll, method for manufacturing the same, and printing device

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